NL2003179A1 - Lithographic apparatus and device manufacturing method and scatterometry method and measurement system used therein. - Google Patents

Lithographic apparatus and device manufacturing method and scatterometry method and measurement system used therein. Download PDF

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Publication number
NL2003179A1
NL2003179A1 NL2003179A NL2003179A NL2003179A1 NL 2003179 A1 NL2003179 A1 NL 2003179A1 NL 2003179 A NL2003179 A NL 2003179A NL 2003179 A NL2003179 A NL 2003179A NL 2003179 A1 NL2003179 A1 NL 2003179A1
Authority
NL
Netherlands
Prior art keywords
measurement system
device manufacturing
system used
lithographic apparatus
scatterometry
Prior art date
Application number
NL2003179A
Other languages
English (en)
Inventor
Willem Coene
Hugo Cramer
Irwan Setija
Original Assignee
Asml Netherlands Bv
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Asml Netherlands Bv filed Critical Asml Netherlands Bv
Publication of NL2003179A1 publication Critical patent/NL2003179A1/nl

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Classifications

    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/17—Systems in which incident light is modified in accordance with the properties of the material investigated
    • G01N21/55—Specular reflectivity
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70483—Information management; Active and passive control; Testing; Wafer monitoring, e.g. pattern monitoring
    • G03F7/70605—Workpiece metrology
    • G03F7/70616—Monitoring the printed patterns
    • G03F7/70625—Dimensions, e.g. line width, critical dimension [CD], profile, sidewall angle or edge roughness
NL2003179A 2008-07-18 2009-07-10 Lithographic apparatus and device manufacturing method and scatterometry method and measurement system used therein. NL2003179A1 (nl)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US8189008P 2008-07-18 2008-07-18

Publications (1)

Publication Number Publication Date
NL2003179A1 true NL2003179A1 (nl) 2010-01-19

Family

ID=40978235

Family Applications (1)

Application Number Title Priority Date Filing Date
NL2003179A NL2003179A1 (nl) 2008-07-18 2009-07-10 Lithographic apparatus and device manufacturing method and scatterometry method and measurement system used therein.

Country Status (4)

Country Link
US (1) US8520212B2 (nl)
IL (1) IL210390A (nl)
NL (1) NL2003179A1 (nl)
WO (1) WO2010007010A1 (nl)

Families Citing this family (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US9619878B2 (en) * 2013-04-16 2017-04-11 Kla-Tencor Corporation Inspecting high-resolution photolithography masks
WO2014194095A1 (en) 2013-05-30 2014-12-04 Kla-Tencor Corporation Combined imaging and scatterometry metrology
KR102512180B1 (ko) 2015-04-28 2023-03-20 케이엘에이 코포레이션 계산 효율적인 x 선 기반의 오버레이 측정
WO2017178220A1 (en) 2016-04-11 2017-10-19 Asml Netherlands B.V. Metrology target, method and apparatus, target design method, computer program and lithographic system
EP3279735A1 (en) * 2016-08-01 2018-02-07 ASML Netherlands B.V. Metrology method and apparatus, computer program and lithographic system
EP3321738A1 (en) * 2016-11-10 2018-05-16 ASML Netherlands B.V. Method of measuring a parameter of a device manufacturing process, metrology apparatus, substrate, target, device manufacturing system, and device manufacturing method
CN110023234B (zh) * 2016-12-02 2024-01-09 分子印记公司 在压印光刻工艺中配置光学层
US11085754B2 (en) * 2017-12-12 2021-08-10 Kla Corporation Enhancing metrology target information content

Family Cites Families (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US7791727B2 (en) 2004-08-16 2010-09-07 Asml Netherlands B.V. Method and apparatus for angular-resolved spectroscopic lithography characterization
US7258953B2 (en) 2005-01-28 2007-08-21 Lsi Corporation Multi-layer registration and dimensional test mark for scatterometrical measurement
US7522293B2 (en) * 2006-03-30 2009-04-21 Tokyo Electron Limited Optical metrology of multiple patterned layers

Also Published As

Publication number Publication date
IL210390A (en) 2016-12-29
US8520212B2 (en) 2013-08-27
US20110304851A1 (en) 2011-12-15
IL210390A0 (en) 2011-03-31
WO2010007010A1 (en) 2010-01-21

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WDAP Patent application withdrawn

Effective date: 20100323