KR101748504B1 - 노광 장치, 노광 방법 및 디바이스 제조 방법 - Google Patents

노광 장치, 노광 방법 및 디바이스 제조 방법 Download PDF

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Publication number
KR101748504B1
KR101748504B1 KR1020157011338A KR20157011338A KR101748504B1 KR 101748504 B1 KR101748504 B1 KR 101748504B1 KR 1020157011338 A KR1020157011338 A KR 1020157011338A KR 20157011338 A KR20157011338 A KR 20157011338A KR 101748504 B1 KR101748504 B1 KR 101748504B1
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KR
South Korea
Prior art keywords
liquid
substrate
flow path
stage
optical system
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Expired - Fee Related
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KR1020157011338A
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English (en)
Korean (ko)
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KR20150055096A (ko
Inventor
히로유키 나가사카
Original Assignee
가부시키가이샤 니콘
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    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70858—Environment aspects, e.g. pressure of beam-path gas, temperature
    • G03F7/70866—Environment aspects, e.g. pressure of beam-path gas, temperature of mask or workpiece
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/027—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34
    • H01L21/0271—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34 comprising organic layers
    • H01L21/0273—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34 comprising organic layers characterised by the treatment of photoresist layers
    • H01L21/0274—Photolithographic processes
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03B—APPARATUS OR ARRANGEMENTS FOR TAKING PHOTOGRAPHS OR FOR PROJECTING OR VIEWING THEM; APPARATUS OR ARRANGEMENTS EMPLOYING ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ACCESSORIES THEREFOR
    • G03B27/00—Photographic printing apparatus
    • G03B27/32—Projection printing apparatus, e.g. enlarger, copying camera
    • G03B27/52—Details
    • G03B27/522—Projection optics
    • G03B27/525—Projection optics for slit exposure
    • G03B27/528—Projection optics for slit exposure in which the projection optics remain stationary
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • G03F7/2041—Exposure; Apparatus therefor in the presence of a fluid, e.g. immersion; using fluid cooling means
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70341—Details of immersion lithography aspects, e.g. exposure media or control of immersion liquid supply
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70691—Handling of masks or workpieces
    • G03F7/70716—Stages
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70691—Handling of masks or workpieces
    • G03F7/70716—Stages
    • G03F7/70725—Stages control
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70858—Environment aspects, e.g. pressure of beam-path gas, temperature

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Health & Medical Sciences (AREA)
  • Optics & Photonics (AREA)
  • Environmental & Geological Engineering (AREA)
  • Toxicology (AREA)
  • Atmospheric Sciences (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Epidemiology (AREA)
  • Public Health (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
KR1020157011338A 2004-01-05 2004-12-27 노광 장치, 노광 방법 및 디바이스 제조 방법 Expired - Fee Related KR101748504B1 (ko)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JPJP-P-2004-000236 2004-01-05
JP2004000236 2004-01-05
PCT/JP2004/019813 WO2005067013A1 (ja) 2004-01-05 2004-12-27 露光装置、露光方法及びデバイス製造方法

Related Parent Applications (1)

Application Number Title Priority Date Filing Date
KR1020117025142A Division KR101561727B1 (ko) 2004-01-05 2004-12-27 노광 장치, 노광 방법 및 디바이스 제조 방법

Related Child Applications (1)

Application Number Title Priority Date Filing Date
KR1020177015811A Division KR101911681B1 (ko) 2004-01-05 2004-12-27 노광 장치, 노광 방법 및 디바이스 제조 방법

Publications (2)

Publication Number Publication Date
KR20150055096A KR20150055096A (ko) 2015-05-20
KR101748504B1 true KR101748504B1 (ko) 2017-06-16

Family

ID=34746939

Family Applications (8)

Application Number Title Priority Date Filing Date
KR1020187030370A Ceased KR20180117228A (ko) 2004-01-05 2004-12-27 노광 장치, 노광 방법 및 디바이스 제조 방법
KR1020117025142A Expired - Fee Related KR101561727B1 (ko) 2004-01-05 2004-12-27 노광 장치, 노광 방법 및 디바이스 제조 방법
KR1020157011338A Expired - Fee Related KR101748504B1 (ko) 2004-01-05 2004-12-27 노광 장치, 노광 방법 및 디바이스 제조 방법
KR1020137017236A Expired - Fee Related KR101440743B1 (ko) 2004-01-05 2004-12-27 노광 장치, 노광 방법 및 디바이스 제조 방법
KR1020177015811A Expired - Fee Related KR101911681B1 (ko) 2004-01-05 2004-12-27 노광 장치, 노광 방법 및 디바이스 제조 방법
KR1020127025529A Expired - Fee Related KR101324810B1 (ko) 2004-01-05 2004-12-27 노광 장치, 노광 방법 및 디바이스 제조 방법
KR1020147014875A Expired - Fee Related KR101636632B1 (ko) 2004-01-05 2004-12-27 노광 장치, 노광 방법 및 디바이스 제조 방법
KR1020067008813A Expired - Fee Related KR101266648B1 (ko) 2004-01-05 2006-05-04 노광 장치, 노광 방법 및 디바이스 제조 방법

Family Applications Before (2)

Application Number Title Priority Date Filing Date
KR1020187030370A Ceased KR20180117228A (ko) 2004-01-05 2004-12-27 노광 장치, 노광 방법 및 디바이스 제조 방법
KR1020117025142A Expired - Fee Related KR101561727B1 (ko) 2004-01-05 2004-12-27 노광 장치, 노광 방법 및 디바이스 제조 방법

Family Applications After (5)

Application Number Title Priority Date Filing Date
KR1020137017236A Expired - Fee Related KR101440743B1 (ko) 2004-01-05 2004-12-27 노광 장치, 노광 방법 및 디바이스 제조 방법
KR1020177015811A Expired - Fee Related KR101911681B1 (ko) 2004-01-05 2004-12-27 노광 장치, 노광 방법 및 디바이스 제조 방법
KR1020127025529A Expired - Fee Related KR101324810B1 (ko) 2004-01-05 2004-12-27 노광 장치, 노광 방법 및 디바이스 제조 방법
KR1020147014875A Expired - Fee Related KR101636632B1 (ko) 2004-01-05 2004-12-27 노광 장치, 노광 방법 및 디바이스 제조 방법
KR1020067008813A Expired - Fee Related KR101266648B1 (ko) 2004-01-05 2006-05-04 노광 장치, 노광 방법 및 디바이스 제조 방법

Country Status (8)

Country Link
US (4) US8064044B2 (enExample)
EP (3) EP3376523A1 (enExample)
JP (9) JP4774735B2 (enExample)
KR (8) KR20180117228A (enExample)
AT (1) ATE467902T1 (enExample)
DE (1) DE602004027162D1 (enExample)
TW (4) TWI403853B (enExample)
WO (1) WO2005067013A1 (enExample)

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