KR100967981B1 - 표면 개질제 - Google Patents

표면 개질제 Download PDF

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Publication number
KR100967981B1
KR100967981B1 KR1020077025425A KR20077025425A KR100967981B1 KR 100967981 B1 KR100967981 B1 KR 100967981B1 KR 1020077025425 A KR1020077025425 A KR 1020077025425A KR 20077025425 A KR20077025425 A KR 20077025425A KR 100967981 B1 KR100967981 B1 KR 100967981B1
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surface modifier
formula
integer
compound represented
substrate
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KR20070118285A (ko
Inventor
야스오 이따미
테쯔야 마스따니
피터 씨. 헙필드
돈 리 클리여
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다이킨 고교 가부시키가이샤
다우 코닝 코포레이션
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    • CCHEMISTRY; METALLURGY
    • C07ORGANIC CHEMISTRY
    • C07FACYCLIC, CARBOCYCLIC OR HETEROCYCLIC COMPOUNDS CONTAINING ELEMENTS OTHER THAN CARBON, HYDROGEN, HALOGEN, OXYGEN, NITROGEN, SULFUR, SELENIUM OR TELLURIUM
    • C07F7/00Compounds containing elements of Groups 4 or 14 of the Periodic Table
    • C07F7/02Silicon compounds
    • C07F7/08Compounds having one or more C—Si linkages
    • C07F7/18Compounds having one or more C—Si linkages as well as one or more C—O—Si linkages
    • CCHEMISTRY; METALLURGY
    • C09DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09DCOATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
    • C09D183/00Coating compositions based on macromolecular compounds obtained by reactions forming in the main chain of the macromolecule a linkage containing silicon, with or without sulfur, nitrogen, oxygen, or carbon only; Coating compositions based on derivatives of such polymers
    • C09D183/10Block or graft copolymers containing polysiloxane sequences
    • C09D183/12Block or graft copolymers containing polysiloxane sequences containing polyether sequences
    • CCHEMISTRY; METALLURGY
    • C07ORGANIC CHEMISTRY
    • C07FACYCLIC, CARBOCYCLIC OR HETEROCYCLIC COMPOUNDS CONTAINING ELEMENTS OTHER THAN CARBON, HYDROGEN, HALOGEN, OXYGEN, NITROGEN, SULFUR, SELENIUM OR TELLURIUM
    • C07F7/00Compounds containing elements of Groups 4 or 14 of the Periodic Table
    • C07F7/02Silicon compounds
    • C07F7/08Compounds having one or more C—Si linkages
    • CCHEMISTRY; METALLURGY
    • C07ORGANIC CHEMISTRY
    • C07FACYCLIC, CARBOCYCLIC OR HETEROCYCLIC COMPOUNDS CONTAINING ELEMENTS OTHER THAN CARBON, HYDROGEN, HALOGEN, OXYGEN, NITROGEN, SULFUR, SELENIUM OR TELLURIUM
    • C07F7/00Compounds containing elements of Groups 4 or 14 of the Periodic Table
    • C07F7/02Silicon compounds
    • C07F7/08Compounds having one or more C—Si linkages
    • C07F7/18Compounds having one or more C—Si linkages as well as one or more C—O—Si linkages
    • C07F7/1804Compounds having Si-O-C linkages
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08GMACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G65/00Macromolecular compounds obtained by reactions forming an ether link in the main chain of the macromolecule
    • C08G65/002Macromolecular compounds obtained by reactions forming an ether link in the main chain of the macromolecule from unsaturated compounds
    • C08G65/005Macromolecular compounds obtained by reactions forming an ether link in the main chain of the macromolecule from unsaturated compounds containing halogens
    • C08G65/007Macromolecular compounds obtained by reactions forming an ether link in the main chain of the macromolecule from unsaturated compounds containing halogens containing fluorine
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08GMACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G65/00Macromolecular compounds obtained by reactions forming an ether link in the main chain of the macromolecule
    • C08G65/02Macromolecular compounds obtained by reactions forming an ether link in the main chain of the macromolecule from cyclic ethers by opening of the heterocyclic ring
    • C08G65/32Polymers modified by chemical after-treatment
    • C08G65/329Polymers modified by chemical after-treatment with organic compounds
    • C08G65/336Polymers modified by chemical after-treatment with organic compounds containing silicon
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08GMACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G77/00Macromolecular compounds obtained by reactions forming a linkage containing silicon with or without sulfur, nitrogen, oxygen or carbon in the main chain of the macromolecule
    • C08G77/04Polysiloxanes
    • C08G77/22Polysiloxanes containing silicon bound to organic groups containing atoms other than carbon, hydrogen and oxygen
    • C08G77/24Polysiloxanes containing silicon bound to organic groups containing atoms other than carbon, hydrogen and oxygen halogen-containing groups
    • CCHEMISTRY; METALLURGY
    • C09DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09DCOATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
    • C09D183/00Coating compositions based on macromolecular compounds obtained by reactions forming in the main chain of the macromolecule a linkage containing silicon, with or without sulfur, nitrogen, oxygen, or carbon only; Coating compositions based on derivatives of such polymers
    • C09D183/04Polysiloxanes
    • C09D183/08Polysiloxanes containing silicon bound to organic groups containing atoms other than carbon, hydrogen, and oxygen
    • GPHYSICS
    • G02OPTICS
    • G02BOPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B1/00Optical elements characterised by the material of which they are made; Optical coatings for optical elements
    • G02B1/10Optical coatings produced by application to, or surface treatment of, optical elements
    • G02B1/11Anti-reflection coatings
    • G02B1/111Anti-reflection coatings using layers comprising organic materials
    • GPHYSICS
    • G02OPTICS
    • G02BOPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B1/00Optical elements characterised by the material of which they are made; Optical coatings for optical elements
    • G02B1/10Optical coatings produced by application to, or surface treatment of, optical elements
    • G02B1/18Coatings for keeping optical surfaces clean, e.g. hydrophobic or photo-catalytic films
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10TTECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T428/00Stock material or miscellaneous articles
    • Y10T428/249921Web or sheet containing structurally defined element or component
    • Y10T428/249953Composite having voids in a component [e.g., porous, cellular, etc.]
    • Y10T428/249987With nonvoid component of specified composition
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10TTECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T428/00Stock material or miscellaneous articles
    • Y10T428/31504Composite [nonstructural laminate]
    • Y10T428/31551Of polyamidoester [polyurethane, polyisocyanate, polycarbamate, etc.]
    • Y10T428/31609Particulate metal or metal compound-containing
    • Y10T428/31612As silicone, silane or siloxane
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10TTECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T428/00Stock material or miscellaneous articles
    • Y10T428/31504Composite [nonstructural laminate]
    • Y10T428/31652Of asbestos
    • Y10T428/31663As siloxane, silicone or silane

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  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Physics & Mathematics (AREA)
  • Polymers & Plastics (AREA)
  • Medicinal Chemistry (AREA)
  • Health & Medical Sciences (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Wood Science & Technology (AREA)
  • General Chemical & Material Sciences (AREA)
  • Paints Or Removers (AREA)
  • Surface Treatment Of Optical Elements (AREA)
  • Materials Applied To Surfaces To Minimize Adherence Of Mist Or Water (AREA)
  • Coating Of Shaped Articles Made Of Macromolecular Substances (AREA)
  • Compositions Of Macromolecular Compounds (AREA)
  • Polyethers (AREA)
  • Surface Treatment Of Glass (AREA)
  • Polarising Elements (AREA)
  • Eyeglasses (AREA)
  • Electroluminescent Light Sources (AREA)
  • Devices For Indicating Variable Information By Combining Individual Elements (AREA)
  • Silicon Polymers (AREA)
KR1020077025425A 2005-04-01 2006-03-30 표면 개질제 Active KR100967981B1 (ko)

Applications Claiming Priority (4)

Application Number Priority Date Filing Date Title
US66748205P 2005-04-01 2005-04-01
US60/667,482 2005-04-01
US74093905P 2005-11-30 2005-11-30
US60/740,939 2005-11-30

Publications (2)

Publication Number Publication Date
KR20070118285A KR20070118285A (ko) 2007-12-14
KR100967981B1 true KR100967981B1 (ko) 2010-07-07

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Family Applications (1)

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Country Status (7)

Country Link
US (1) US8211544B2 (enExample)
EP (1) EP1871780B1 (enExample)
JP (3) JP5274839B2 (enExample)
KR (1) KR100967981B1 (enExample)
CN (2) CN103551076B (enExample)
TW (2) TWI481648B (enExample)
WO (1) WO2006107083A2 (enExample)

Cited By (5)

* Cited by examiner, † Cited by third party
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KR101945712B1 (ko) * 2016-07-27 2019-02-08 제이에스아이실리콘주식회사 지문 방지용 플로오로실리콘 화합물 및 이의 제조 방법
KR20230123789A (ko) 2022-02-17 2023-08-24 동우 화인켐 주식회사 퍼플루오로폴리에테르기 함유 실란 화합물 및 이를 포함하는 표면 처리용 조성물
KR20230127507A (ko) 2022-02-25 2023-09-01 동우 화인켐 주식회사 퍼플루오로폴리에테르기 함유 실란 화합물 및 이를 포함하는 표면 처리용 조성물
KR20240050168A (ko) 2022-10-11 2024-04-18 동우 화인켐 주식회사 퍼플루오로폴리에테르기 함유 실란 화합물 및 이를 포함하는 표면 처리용 조성물
KR20240050255A (ko) 2022-10-11 2024-04-18 동우 화인켐 주식회사 퍼플루오로폴리에테르기 함유 실란 화합물 및 이를 포함하는 표면 처리용 조성물

Families Citing this family (115)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US7674927B2 (en) * 2005-05-23 2010-03-09 Innovation Chemical Technologies, Ltd Fluorinated organic silicon coating material
JP5241504B2 (ja) 2006-10-31 2013-07-17 株式会社ニコン・エシロール 眼鏡レンズ及びその製造方法
CN100457803C (zh) * 2006-11-28 2009-02-04 苏州大学 一种新型含氟烷氧丙基甲基硅油及其制备方法
EP1946832A1 (en) * 2007-01-19 2008-07-23 Università Degli Studi Di Milano - Bicocca A processing method for surfaces of stone materials and composites
JPWO2009087981A1 (ja) * 2008-01-11 2011-05-26 株式会社Kri 重合性化合物及びこの製造方法
KR101587308B1 (ko) * 2008-10-01 2016-01-20 가부시키가이샤 가쓰라야마 테쿠노로지 코팅용 조성물, 방오처리 방법 및 방오성 기재
WO2011059430A1 (en) * 2009-11-11 2011-05-19 Essilor International Surface treatment composition, process for producing the same, and surface-treated article
US9523004B2 (en) 2009-11-11 2016-12-20 Essilor International Surface treatment composition, process for producing the same, and surface-treated article
US9000069B1 (en) 2010-07-02 2015-04-07 The Sherwin-Williams Company Self-stratifying coatings
KR101821225B1 (ko) * 2010-11-10 2018-01-23 다우 코닝 코포레이션 표면 처리 조성물, 표면 처리 조성물의 제조 방법 및 표면-처리된 용품
JP2012157856A (ja) * 2011-01-13 2012-08-23 Central Glass Co Ltd 防汚性物品及びその製造方法
US20120237777A1 (en) * 2011-02-02 2012-09-20 Ppg Industries Ohio, Inc. Process for forming an anti-fouling coating system
WO2012148537A1 (en) 2011-04-29 2012-11-01 Ppg Industries Ohio, Inc. Process for forming an anti-fouling coating system
US9611399B2 (en) 2011-11-15 2017-04-04 3M Innovative Properties Company Fluorinated coatings with lubricious additive
US9957609B2 (en) 2011-11-30 2018-05-01 Corning Incorporated Process for making of glass articles with optical and easy-to-clean coatings
US10077207B2 (en) 2011-11-30 2018-09-18 Corning Incorporated Optical coating method, apparatus and product
EP2785661B1 (en) 2011-11-30 2020-05-06 Corning Incorporated Optical coating method and product
CN104114564B (zh) 2012-02-17 2017-06-30 旭硝子株式会社 含氟醚化合物、含氟醚组合物及涂覆液以及具有表面处理层的基材及其制造方法
EP2816045B1 (en) 2012-02-17 2019-04-03 AGC Inc. Fluorinated ether compound, fluorinated ether composition and coating fluid, and substrate having surface-treated layer and method for its production
TWI579347B (zh) 2012-02-17 2017-04-21 Asahi Glass Co Ltd A fluorine-containing ether compound, a fluorine-containing ether composition and a coating liquid, and a substrate having a surface treatment layer and a method for producing the same (3)
JP6154829B2 (ja) * 2012-02-20 2017-06-28 スリーエム イノベイティブ プロパティズ カンパニー 疎油性コーティング
CN103257377B (zh) * 2012-02-21 2015-03-25 江苏视客光电新材料有限公司 一种镀膜cr39树脂镜片
KR20140116540A (ko) * 2012-02-28 2014-10-02 다이킨 고교 가부시키가이샤 불소-함유 실란계 막을 갖는 물품의 제조 방법
WO2013146110A1 (ja) 2012-03-29 2013-10-03 ダイキン工業株式会社 表面処理組成物およびそれを使用して得られる物品
TW201400562A (zh) 2012-04-05 2014-01-01 Daikin Ind Ltd 具有含氟矽烷系塗覆層之物品的製造方法
JP5354125B1 (ja) * 2012-05-11 2013-11-27 ダイキン工業株式会社 光学部材用表面処理剤および光学部材
US20150118502A1 (en) * 2012-06-13 2015-04-30 Daikin Industries, Ltd. Silane compound containing perfluoropolyether group and surface-treating agent
KR101634895B1 (ko) * 2012-07-10 2016-06-29 닛뽕소다 가부시키가이샤 자기 조직화막을 갖는 박막 적층체
JP6127438B2 (ja) * 2012-10-15 2017-05-17 旭硝子株式会社 含フッ素エーテル組成物、該組成物から形成された表面層を有する基材およびその製造方法
JP5747928B2 (ja) * 2013-02-13 2015-07-15 大日本印刷株式会社 反射防止物品の製造方法
JP2014194530A (ja) * 2013-02-28 2014-10-09 Asahi Glass Co Ltd 光学素子
US9062213B2 (en) 2013-03-12 2015-06-23 Dow Corning Corporation Non-aqueous emulsions and methods of preparing surface-treated articles
JP6060884B2 (ja) * 2013-03-14 2017-01-18 信越化学工業株式会社 表面改質剤及び表面改質方法
CN105102505B (zh) * 2013-04-04 2017-04-05 旭硝子株式会社 含氟醚化合物、含氟醚组合物及涂布液,以及具有表面层的基材及其制造方法
KR20160061348A (ko) 2013-09-16 2016-05-31 허니웰 인터내셔날 인코포레이티드 폴리 플루오르 함유 실록산 코팅
DE102013020551A1 (de) 2013-12-12 2015-06-18 Merck Patent Gmbh Emulsionen von Perfluorpolyethern
WO2015115522A1 (ja) * 2014-01-31 2015-08-06 Dic株式会社 表面改質剤、コーティング組成物及び物品
JP6451279B2 (ja) * 2014-03-31 2019-01-16 信越化学工業株式会社 フルオロポリエーテル基含有ポリマー変性シラン、表面処理剤及び物品
US9982156B1 (en) 2014-04-17 2018-05-29 Lockheed Martin Corporation Transmissive surfaces and polymeric coatings therefore, for fortification of visible, infrared, and laser optical devices
US9616459B1 (en) * 2014-04-17 2017-04-11 Lockheed Martin Corporation Polymeric coatings for fortification of visible, infrared, and laser optical devices
WO2016021408A1 (ja) 2014-08-07 2016-02-11 ダイキン工業株式会社 防汚処理組成物、処理装置、処理方法および処理物品
KR101990759B1 (ko) 2014-09-03 2019-06-18 다이킨 고교 가부시키가이샤 방오성 물품
JP6398500B2 (ja) 2014-09-10 2018-10-03 信越化学工業株式会社 含フッ素コーティング剤及び該コーティング剤で処理された物品
JPWO2016047523A1 (ja) * 2014-09-26 2017-07-13 旭硝子株式会社 光学素子及び撮像装置
EP3225646B1 (en) * 2014-11-28 2020-06-03 Daikin Industries, Ltd. Modified fluorooxymethylene group-containing perfluoropolyether
JP6008037B2 (ja) 2015-01-29 2016-10-19 ダイキン工業株式会社 表面処理剤
WO2016163368A1 (ja) 2015-04-10 2016-10-13 ダイキン工業株式会社 防汚処理組成物、処理装置、処理方法および処理物品
EP3085749B1 (en) 2015-04-20 2017-06-28 Shin-Etsu Chemical Co., Ltd. Fluoropolyether-containing polymer-modified silane, surface treating agent, and treated article
JP6260579B2 (ja) * 2015-05-01 2018-01-17 信越化学工業株式会社 フルオロポリエーテル基含有ポリマー変性シラン、表面処理剤及び物品
JP6390521B2 (ja) 2015-06-03 2018-09-19 信越化学工業株式会社 フルオロポリエーテル基含有ポリマー変性シラン
TWI637977B (zh) 2015-06-12 2018-10-11 大金工業股份有限公司 表面處理劑
TWI644942B (zh) 2015-06-12 2018-12-21 日商大金工業股份有限公司 表面處理劑
US10351247B2 (en) 2015-06-15 2019-07-16 Subaru Corporation Wing and anti-icing system
JP6582652B2 (ja) * 2015-07-13 2019-10-02 ダイキン工業株式会社 表面処理剤
US10450413B2 (en) 2015-07-31 2019-10-22 Daikin Industries, Ltd. Silane compound containing perfluoro(poly)ether group
EP3345955B1 (en) 2015-08-31 2022-04-06 Daikin Industries, Ltd. Perfluoro(poly)ether group-containing silane compound
JP6531833B2 (ja) 2015-11-06 2019-06-19 信越化学工業株式会社 表面処理された樹脂製品
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CN106810684A (zh) * 2015-12-02 2017-06-09 中昊晨光化工研究院有限公司 一种氟硅防水拒油剂及其合成方法和应用
JP6642589B2 (ja) 2015-12-14 2020-02-05 信越化学工業株式会社 フルオロポリエーテル基含有ポリマー変性シラン、表面処理剤及び物品
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CN120865691A (zh) 2016-09-08 2025-10-31 大金工业株式会社 含有含全氟(聚)醚基的硅烷化合物的组合物
CN107915835B (zh) * 2016-10-09 2019-08-27 中昊晨光化工研究院有限公司 一种氟硅防水拒油剂及其利用一锅法进行合成的方法
EP3556551A4 (en) 2016-12-13 2020-07-22 Daikin Industries, Ltd. STAIN-INSENSITIVE ARTICLE
US11560485B2 (en) 2017-01-12 2023-01-24 Daikin Industries, Ltd. Surface-treating agent comprising perfluoro(poly)ether group-containing compound
CN107057056B (zh) * 2017-01-18 2018-06-01 泉州市思康新材料发展有限公司 一种全氟聚醚改性硅烷化合物及包含其的表面处理组合物和薄膜
US20200002551A1 (en) 2017-02-03 2020-01-02 Daikin Industries, Ltd. Perfluoro(poly)ether group-containing compound, and surface treatment agent and article including same
WO2018169002A1 (ja) 2017-03-17 2018-09-20 ダイキン工業株式会社 パーフルオロ(ポリ)エーテル基含有シラン化合物
EP3623440A4 (en) 2017-05-12 2021-01-20 Daikin Industries, Ltd. SURFACE TREATMENT PRODUCTS WITH PERFLUORINE (POLY) ETHER GROUP CONTAINING COMPOUNDS
CN110662810B (zh) 2017-05-23 2022-06-17 信越化学工业株式会社 含氟涂布剂组合物和含有该组合物的表面处理剂以及物品
KR102565511B1 (ko) 2017-05-25 2023-08-10 신에쓰 가가꾸 고교 가부시끼가이샤 플루오로폴리에테르기 함유 폴리머 변성 유기 규소 화합물, 표면처리제 및 물품
CN111548026B (zh) 2017-06-21 2022-04-12 Agc株式会社 带拒水拒油层的物品及其制造方法
JP7074139B2 (ja) * 2017-08-18 2022-05-24 Agc株式会社 組成物および物品ならびに組成物を製造する方法
WO2019039226A1 (ja) * 2017-08-22 2019-02-28 Agc株式会社 含フッ素エーテル化合物、含フッ素エーテル組成物、コーティング液、物品およびその製造方法
US10544260B2 (en) 2017-08-30 2020-01-28 Ppg Industries Ohio, Inc. Fluoropolymers, methods of preparing fluoropolymers, and coating compositions containing fluoropolymers
KR102589656B1 (ko) 2017-09-27 2023-10-16 신에쓰 가가꾸 고교 가부시끼가이샤 함불소 코팅제 조성물, 표면처리제 및 물품
CN111315834B (zh) 2017-10-20 2022-03-01 信越化学工业株式会社 含氟涂布剂组合物、表面处理剂和物品
KR20240161847A (ko) 2017-10-26 2024-11-12 신에쓰 가가꾸 고교 가부시끼가이샤 친유성 기 함유 오가노실란 화합물, 표면처리제 및 물품
CN111356717B (zh) 2017-11-21 2023-06-23 信越化学工业株式会社 含氟聚醚基聚合物、表面处理剂及物品
US11560494B2 (en) 2018-01-22 2023-01-24 Shin-Etsu Chemical Co., Ltd. Coating composition, surface treatment agent containing said composition, and article which is surface-treated with said surface treatment agent
CN118324799A (zh) 2018-02-13 2024-07-12 信越化学工业株式会社 有机硅氧烷化合物和表面处理剂
WO2019176458A1 (ja) 2018-03-14 2019-09-19 信越化学工業株式会社 含フッ素コーティング剤組成物、表面処理剤及び物品
WO2020022505A1 (ja) * 2018-07-27 2020-01-30 京セラ株式会社 車載カメラ及び移動体
KR102808189B1 (ko) 2018-07-31 2025-05-16 신에쓰 가가꾸 고교 가부시끼가이샤 친유성 기 함유 오가노실란 화합물, 표면처리제 및 물품
EP3882370B1 (en) 2018-11-13 2024-01-10 Agc Inc. Substrate with water repellent oil repellent layer, vapor deposition material, and method for producing substrate with water repellent oil repellent layer
WO2020111138A1 (ja) 2018-11-30 2020-06-04 ダイキン工業株式会社 ポリエーテル基含有化合物
KR102738551B1 (ko) 2018-12-26 2024-12-04 에이지씨 가부시키가이샤 발수 발유층 형성 기재, 및 그 제조 방법
JP7631808B2 (ja) 2019-02-08 2025-02-19 Agc株式会社 含フッ素エーテル化合物、含フッ素エーテル組成物、コーティング液、物品、物品の製造方法、及び含フッ素化合物の製造方法
KR102808181B1 (ko) 2019-08-09 2025-05-16 신에쓰 가가꾸 고교 가부시끼가이샤 플루오로폴리에테르기 함유 폴리머, 표면처리제 및 물품
JP6758725B1 (ja) * 2019-10-11 2020-09-23 株式会社ハーベス 含フッ素シラン化合物、表面処理剤、及び該表面処理剤を用いた物品
CN114746475B (zh) 2019-12-03 2024-03-22 信越化学工业株式会社 含有氟聚醚基的聚合物、表面处理剂及物品
JP7456499B2 (ja) 2020-04-14 2024-03-27 信越化学工業株式会社 フルオロポリエーテル基含有ポリマー及び/又はその部分(加水分解)縮合物を含む表面処理剤及び物品
JP7367864B2 (ja) 2020-05-11 2023-10-24 信越化学工業株式会社 コーティング剤組成物、該組成物を含む表面処理剤、及び該表面処理剤で表面処理された物品
CN111808483B (zh) * 2020-07-31 2021-12-21 南北兄弟药业投资有限公司 一种包含锌改性纳米碳纤维和表面改性剂的涂料
US20230416566A1 (en) 2020-11-13 2023-12-28 Shin-Etsu Chemical Co., Ltd. Coating agent composition, surface treatment agent comprising said composition, and article surface-treated with said surface treatment agent
US20240132665A1 (en) 2020-12-17 2024-04-25 Shin-Etsu Chemical Co., Ltd. Surface treatment agent and article treated with said surface treatment agent
KR20220105255A (ko) * 2021-01-19 2022-07-27 삼성디스플레이 주식회사 지문방지 코팅용 화합물, 이를 포함하는 디스플레이 보호층 및 전자 장치
CN117222689A (zh) 2021-04-28 2023-12-12 信越化学工业株式会社 含有氟聚醚基的聚合物、表面处理剂和物品
WO2023022038A1 (ja) 2021-08-17 2023-02-23 信越化学工業株式会社 表面処理された物品、並びに撥水性を有する物品の耐uvc性を向上させる方法
JPWO2023140177A1 (enExample) 2022-01-19 2023-07-27
JP7644377B2 (ja) 2022-03-31 2025-03-12 ダイキン工業株式会社 硬化性組成物
JPWO2023204024A1 (enExample) 2022-04-19 2023-10-26
KR20250060235A (ko) 2022-09-06 2025-05-07 신에쓰 가가꾸 고교 가부시끼가이샤 함불소 조성물, 표면처리제 및 물품
CN120092049A (zh) 2022-10-07 2025-06-03 信越化学工业株式会社 含有氟聚醚基的聚合物组合物、涂布剂和物品以及物品的表面改性方法
JPWO2024135362A1 (enExample) 2022-12-22 2024-06-27
KR20250133721A (ko) * 2023-01-13 2025-09-08 유니마테크 가부시키가이샤 표면개질제
CN120584035A (zh) 2023-01-25 2025-09-02 信越化学工业株式会社 物品和物品的表面改性方法
EP4663712A1 (en) 2023-02-07 2025-12-17 Shin-Etsu Chemical Co., Ltd. Fluorine-containing coating agent, article, and method for modifying surface of article

Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2000144097A (ja) * 1998-01-31 2000-05-26 Toppan Printing Co Ltd 防汚剤、防汚層の形成方法、光学部材、反射防止光学部材、光学機能性部材及び表示装置
KR20030029494A (ko) * 2001-10-05 2003-04-14 신에쓰 가가꾸 고교 가부시끼가이샤 퍼플루오로폴리에테르-변성 실란, 표면처리제, 및반사방지 필터
US20050202452A1 (en) * 2000-11-16 2005-09-15 Lambeth J. D. Mitogenic oxygenase regulators

Family Cites Families (33)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
NL292285A (enExample) * 1962-09-07
US3646085A (en) * 1970-09-24 1972-02-29 Du Pont Perfluoroalkyletheramidoalkyltrialkoxysilanes
JPH0629332B2 (ja) 1985-04-26 1994-04-20 旭硝子株式会社 防汚性・低反射性プラスチツク
JPS63250389A (ja) 1987-04-03 1988-10-18 Shin Etsu Chem Co Ltd 含フツ素有機ケイ素化合物およびその製造法
US5041588A (en) * 1989-07-03 1991-08-20 Dow Corning Corporation Chemically reactive fluorinated organosilicon compounds and their polymers
JP2907515B2 (ja) * 1990-09-07 1999-06-21 松下電器産業株式会社 末端パーフルオロアルキルシラン化合物及びその製造方法
JPH0778066B2 (ja) 1991-10-17 1995-08-23 信越化学工業株式会社 含フッ素有機ケイ素化合物およびその製造方法
JP2668472B2 (ja) * 1991-10-17 1997-10-27 信越化学工業株式会社 含フッ素有機ケイ素化合物
JPH0716940A (ja) 1993-06-23 1995-01-20 Toray Ind Inc 防汚性を有する光学物品
JP3196621B2 (ja) * 1995-04-20 2001-08-06 信越化学工業株式会社 水溶性表面処理剤
JP3494195B2 (ja) * 1995-06-15 2004-02-03 住友化学工業株式会社 反射防止フィルター
DE19539789A1 (de) * 1995-10-26 1997-04-30 Merck Patent Gmbh Mittel und Verfahren zur Herstellung von wasserabweisenden Beschichtungen auf optischen Substraten
JPH09259406A (ja) 1996-03-25 1997-10-03 Sony Corp 磁気ヘッドとその製造方法
JP3233024B2 (ja) 1996-06-03 2001-11-26 信越化学工業株式会社 有機ケイ素化合物及びその製造方法
JP4420476B2 (ja) 1996-10-18 2010-02-24 ソニー株式会社 表面改質膜用組成物,表面改質膜,表示装置用フィルター,表示装置及び表示装置用フィルターの製造方法
JPH1129585A (ja) * 1997-07-04 1999-02-02 Shin Etsu Chem Co Ltd パーフルオロポリエーテル変性アミノシラン及び表面処理剤
US6277485B1 (en) * 1998-01-27 2001-08-21 3M Innovative Properties Company Antisoiling coatings for antireflective surfaces and methods of preparation
DE19825100A1 (de) * 1998-06-05 1999-12-16 Merck Patent Gmbh Mittel zur Herstellung von wasserabweisenden Beschichtungen auf optischen Substraten
JP4174867B2 (ja) 1998-09-17 2008-11-05 凸版印刷株式会社 防汚層の形成方法
US6296796B1 (en) * 1999-02-02 2001-10-02 Trw Inc. Method for molding a two-material part using a rotatable mold insert member
JP3932732B2 (ja) 1999-09-21 2007-06-20 株式会社日立製作所 燃料噴射弁とそれを用いた筒内噴射式エンジン
JP2001188102A (ja) * 1999-12-27 2001-07-10 Toppan Printing Co Ltd 反射防止フィルム
JP2001269442A (ja) 2000-03-24 2001-10-02 Koichi Miki ネットワークを使用した遊技システム
JP2001269942A (ja) 2000-03-27 2001-10-02 Seiko Epson Corp 微細構造体および映像表示デバイスの製造方法
JP2002056887A (ja) 2000-08-10 2002-02-22 Ngk Insulators Ltd ナトリウム−硫黄電池を構成する絶縁リングと陽極金具の熱圧接合部材の製造方法
US6656258B2 (en) * 2001-03-20 2003-12-02 3M Innovative Properties Company Compositions comprising fluorinated silanes and compressed fluid CO2
JP4412450B2 (ja) 2001-10-05 2010-02-10 信越化学工業株式会社 反射防止フィルター
US6592659B1 (en) 2001-11-15 2003-07-15 3M Innovative Properties Company Compositions for aqueous delivery of fluorinated silanes
JP2003145971A (ja) 2001-11-19 2003-05-21 Hitachi Ltd 記録媒体
DE10217151A1 (de) * 2002-04-17 2003-10-30 Clariant Gmbh Nanoimprint-Resist
JP3951886B2 (ja) 2002-10-23 2007-08-01 株式会社日立製作所 配線基板,表示デバイス,表示デバイス用カラーフィルター、及び配線基板形成方法,表示デバイス形成方法,表示デバイス用カラーフィルター形成方法
JP4309694B2 (ja) * 2003-05-09 2009-08-05 株式会社日立製作所 撥水膜を有する物品及びその製法
US7695781B2 (en) * 2004-02-16 2010-04-13 Fujifilm Corporation Antireflective film, polarizing plate including the same, image display unit including the same and method for producing antireflective film

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2000144097A (ja) * 1998-01-31 2000-05-26 Toppan Printing Co Ltd 防汚剤、防汚層の形成方法、光学部材、反射防止光学部材、光学機能性部材及び表示装置
US20050202452A1 (en) * 2000-11-16 2005-09-15 Lambeth J. D. Mitogenic oxygenase regulators
KR20030029494A (ko) * 2001-10-05 2003-04-14 신에쓰 가가꾸 고교 가부시끼가이샤 퍼플루오로폴리에테르-변성 실란, 표면처리제, 및반사방지 필터

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR101945712B1 (ko) * 2016-07-27 2019-02-08 제이에스아이실리콘주식회사 지문 방지용 플로오로실리콘 화합물 및 이의 제조 방법
KR20230123789A (ko) 2022-02-17 2023-08-24 동우 화인켐 주식회사 퍼플루오로폴리에테르기 함유 실란 화합물 및 이를 포함하는 표면 처리용 조성물
KR20230127507A (ko) 2022-02-25 2023-09-01 동우 화인켐 주식회사 퍼플루오로폴리에테르기 함유 실란 화합물 및 이를 포함하는 표면 처리용 조성물
KR20240050168A (ko) 2022-10-11 2024-04-18 동우 화인켐 주식회사 퍼플루오로폴리에테르기 함유 실란 화합물 및 이를 포함하는 표면 처리용 조성물
KR20240050255A (ko) 2022-10-11 2024-04-18 동우 화인켐 주식회사 퍼플루오로폴리에테르기 함유 실란 화합물 및 이를 포함하는 표면 처리용 조성물

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