JP6154829B2 - 疎油性コーティング - Google Patents
疎油性コーティング Download PDFInfo
- Publication number
- JP6154829B2 JP6154829B2 JP2014557686A JP2014557686A JP6154829B2 JP 6154829 B2 JP6154829 B2 JP 6154829B2 JP 2014557686 A JP2014557686 A JP 2014557686A JP 2014557686 A JP2014557686 A JP 2014557686A JP 6154829 B2 JP6154829 B2 JP 6154829B2
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- Japan
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- grams
- group
- carbon atoms
- silane
- fluorinated
- Prior art date
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- 238000000576 coating method Methods 0.000 title claims description 43
- 239000011248 coating agent Substances 0.000 title claims description 36
- 239000000758 substrate Substances 0.000 claims description 86
- BLRPTPMANUNPDV-UHFFFAOYSA-N Silane Chemical compound [SiH4] BLRPTPMANUNPDV-UHFFFAOYSA-N 0.000 claims description 73
- 229910000077 silane Inorganic materials 0.000 claims description 72
- PGFXOWRDDHCDTE-UHFFFAOYSA-N hexafluoropropylene oxide Chemical compound FC(F)(F)C1(F)OC1(F)F PGFXOWRDDHCDTE-UHFFFAOYSA-N 0.000 claims description 68
- 229920000642 polymer Polymers 0.000 claims description 50
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- 125000002887 hydroxy group Chemical group [H]O* 0.000 claims description 8
- 125000004432 carbon atom Chemical group C* 0.000 description 86
- 125000003118 aryl group Chemical group 0.000 description 69
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- 239000002904 solvent Substances 0.000 description 48
- OKKJLVBELUTLKV-UHFFFAOYSA-N Methanol Chemical compound OC OKKJLVBELUTLKV-UHFFFAOYSA-N 0.000 description 45
- 238000000034 method Methods 0.000 description 39
- 150000004756 silanes Chemical class 0.000 description 38
- RTZKZFJDLAIYFH-UHFFFAOYSA-N Diethyl ether Chemical compound CCOCC RTZKZFJDLAIYFH-UHFFFAOYSA-N 0.000 description 37
- 239000000523 sample Substances 0.000 description 36
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 30
- 239000000203 mixture Substances 0.000 description 27
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- 125000002837 carbocyclic group Chemical group 0.000 description 24
- 125000003710 aryl alkyl group Chemical group 0.000 description 20
- 238000006243 chemical reaction Methods 0.000 description 19
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- 125000000217 alkyl group Chemical group 0.000 description 16
- 229910052757 nitrogen Inorganic materials 0.000 description 15
- 125000002947 alkylene group Chemical group 0.000 description 14
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- 125000003808 silyl group Chemical group [H][Si]([H])([H])[*] 0.000 description 11
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- 125000001997 phenyl group Chemical group [H]C1=C([H])C([H])=C(*)C([H])=C1[H] 0.000 description 10
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- QTBSBXVTEAMEQO-UHFFFAOYSA-N Acetic acid Chemical compound CC(O)=O QTBSBXVTEAMEQO-UHFFFAOYSA-N 0.000 description 8
- 125000003545 alkoxy group Chemical group 0.000 description 8
- 125000004104 aryloxy group Chemical group 0.000 description 8
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- PYOKUURKVVELLB-UHFFFAOYSA-N trimethyl orthoformate Chemical compound COC(OC)OC PYOKUURKVVELLB-UHFFFAOYSA-N 0.000 description 8
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- 239000003054 catalyst Substances 0.000 description 6
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- 125000005843 halogen group Chemical group 0.000 description 6
- FYSNRJHAOHDILO-UHFFFAOYSA-N thionyl chloride Chemical compound ClS(Cl)=O FYSNRJHAOHDILO-UHFFFAOYSA-N 0.000 description 6
- OZAIFHULBGXAKX-UHFFFAOYSA-N 2-(2-cyanopropan-2-yldiazenyl)-2-methylpropanenitrile Chemical compound N#CC(C)(C)N=NC(C)(C)C#N OZAIFHULBGXAKX-UHFFFAOYSA-N 0.000 description 5
- 229910000831 Steel Inorganic materials 0.000 description 5
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- 239000007788 liquid Substances 0.000 description 5
- 125000000956 methoxy group Chemical group [H]C([H])([H])O* 0.000 description 5
- 239000007787 solid Substances 0.000 description 5
- 239000010959 steel Substances 0.000 description 5
- ZDHXKXAHOVTTAH-UHFFFAOYSA-N trichlorosilane Chemical compound Cl[SiH](Cl)Cl ZDHXKXAHOVTTAH-UHFFFAOYSA-N 0.000 description 5
- 239000005052 trichlorosilane Substances 0.000 description 5
- 210000002268 wool Anatomy 0.000 description 5
- SJBBXFLOLUTGCW-UHFFFAOYSA-N 1,3-bis(trifluoromethyl)benzene Chemical compound FC(F)(F)C1=CC=CC(C(F)(F)F)=C1 SJBBXFLOLUTGCW-UHFFFAOYSA-N 0.000 description 4
- VEXZGXHMUGYJMC-UHFFFAOYSA-N Hydrochloric acid Chemical compound Cl VEXZGXHMUGYJMC-UHFFFAOYSA-N 0.000 description 4
- MHAJPDPJQMAIIY-UHFFFAOYSA-N Hydrogen peroxide Chemical compound OO MHAJPDPJQMAIIY-UHFFFAOYSA-N 0.000 description 4
- CSNNHWWHGAXBCP-UHFFFAOYSA-L Magnesium sulfate Chemical compound [Mg+2].[O-][S+2]([O-])([O-])[O-] CSNNHWWHGAXBCP-UHFFFAOYSA-L 0.000 description 4
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- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 4
- 238000005299 abrasion Methods 0.000 description 4
- 125000004423 acyloxy group Chemical group 0.000 description 4
- 125000002102 aryl alkyloxo group Chemical group 0.000 description 4
- 238000009835 boiling Methods 0.000 description 4
- 238000004140 cleaning Methods 0.000 description 4
- RCNRJBWHLARWRP-UHFFFAOYSA-N ethenyl-[ethenyl(dimethyl)silyl]oxy-dimethylsilane;platinum Chemical compound [Pt].C=C[Si](C)(C)O[Si](C)(C)C=C RCNRJBWHLARWRP-UHFFFAOYSA-N 0.000 description 4
- 238000001914 filtration Methods 0.000 description 4
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- 239000010410 layer Substances 0.000 description 4
- 229910052751 metal Inorganic materials 0.000 description 4
- 239000002184 metal Substances 0.000 description 4
- BDAGIHXWWSANSR-UHFFFAOYSA-N methanoic acid Natural products OC=O BDAGIHXWWSANSR-UHFFFAOYSA-N 0.000 description 4
- 239000002480 mineral oil Substances 0.000 description 4
- 235000010446 mineral oil Nutrition 0.000 description 4
- CTSLXHKWHWQRSH-UHFFFAOYSA-N oxalyl chloride Chemical compound ClC(=O)C(Cl)=O CTSLXHKWHWQRSH-UHFFFAOYSA-N 0.000 description 4
- BASFCYQUMIYNBI-UHFFFAOYSA-N platinum Substances [Pt] BASFCYQUMIYNBI-UHFFFAOYSA-N 0.000 description 4
- 239000000741 silica gel Substances 0.000 description 4
- 229910002027 silica gel Inorganic materials 0.000 description 4
- 238000005507 spraying Methods 0.000 description 4
- 239000005341 toughened glass Substances 0.000 description 4
- 239000008096 xylene Substances 0.000 description 4
- ZWEHNKRNPOVVGH-UHFFFAOYSA-N 2-Butanone Chemical compound CCC(C)=O ZWEHNKRNPOVVGH-UHFFFAOYSA-N 0.000 description 3
- QGZKDVFQNNGYKY-UHFFFAOYSA-N Ammonia Chemical compound N QGZKDVFQNNGYKY-UHFFFAOYSA-N 0.000 description 3
- ZMXDDKWLCZADIW-UHFFFAOYSA-N N,N-Dimethylformamide Chemical compound CN(C)C=O ZMXDDKWLCZADIW-UHFFFAOYSA-N 0.000 description 3
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 3
- QAOWNCQODCNURD-UHFFFAOYSA-N Sulfuric acid Chemical compound OS(O)(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-N 0.000 description 3
- 229960000583 acetic acid Drugs 0.000 description 3
- 150000001335 aliphatic alkanes Chemical group 0.000 description 3
- BHELZAPQIKSEDF-UHFFFAOYSA-N allyl bromide Chemical compound BrCC=C BHELZAPQIKSEDF-UHFFFAOYSA-N 0.000 description 3
- 230000003373 anti-fouling effect Effects 0.000 description 3
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- KRKNYBCHXYNGOX-UHFFFAOYSA-N citric acid Chemical compound OC(=O)CC(O)(C(O)=O)CC(O)=O KRKNYBCHXYNGOX-UHFFFAOYSA-N 0.000 description 3
- 239000012141 concentrate Substances 0.000 description 3
- 238000003618 dip coating Methods 0.000 description 3
- 238000004821 distillation Methods 0.000 description 3
- 125000001033 ether group Chemical group 0.000 description 3
- HCDGVLDPFQMKDK-UHFFFAOYSA-N hexafluoropropylene Chemical group FC(F)=C(F)C(F)(F)F HCDGVLDPFQMKDK-UHFFFAOYSA-N 0.000 description 3
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- WZLFPVPRZGTCKP-UHFFFAOYSA-N 1,1,1,3,3-pentafluorobutane Chemical compound CC(F)(F)CC(F)(F)F WZLFPVPRZGTCKP-UHFFFAOYSA-N 0.000 description 2
- PDCBZHHORLHNCZ-UHFFFAOYSA-N 1,4-bis(trifluoromethyl)benzene Chemical compound FC(F)(F)C1=CC=C(C(F)(F)F)C=C1 PDCBZHHORLHNCZ-UHFFFAOYSA-N 0.000 description 2
- PAMIQIKDUOTOBW-UHFFFAOYSA-N 1-methylpiperidine Chemical compound CN1CCCCC1 PAMIQIKDUOTOBW-UHFFFAOYSA-N 0.000 description 2
- GQHTUMJGOHRCHB-UHFFFAOYSA-N 2,3,4,6,7,8,9,10-octahydropyrimido[1,2-a]azepine Chemical compound C1CCCCN2CCCN=C21 GQHTUMJGOHRCHB-UHFFFAOYSA-N 0.000 description 2
- QCAHUFWKIQLBNB-UHFFFAOYSA-N 3-(3-methoxypropoxy)propan-1-ol Chemical compound COCCCOCCCO QCAHUFWKIQLBNB-UHFFFAOYSA-N 0.000 description 2
- OSWFIVFLDKOXQC-UHFFFAOYSA-N 4-(3-methoxyphenyl)aniline Chemical compound COC1=CC=CC(C=2C=CC(N)=CC=2)=C1 OSWFIVFLDKOXQC-UHFFFAOYSA-N 0.000 description 2
- WKBOTKDWSSQWDR-UHFFFAOYSA-N Bromine atom Chemical compound [Br] WKBOTKDWSSQWDR-UHFFFAOYSA-N 0.000 description 2
- FERIUCNNQQJTOY-UHFFFAOYSA-N Butyric acid Chemical compound CCCC(O)=O FERIUCNNQQJTOY-UHFFFAOYSA-N 0.000 description 2
- ZAMOUSCENKQFHK-UHFFFAOYSA-N Chlorine atom Chemical compound [Cl] ZAMOUSCENKQFHK-UHFFFAOYSA-N 0.000 description 2
- ROSDSFDQCJNGOL-UHFFFAOYSA-N Dimethylamine Chemical compound CNC ROSDSFDQCJNGOL-UHFFFAOYSA-N 0.000 description 2
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- 125000004429 atom Chemical group 0.000 description 2
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- GDTBXPJZTBHREO-UHFFFAOYSA-N bromine Substances BrBr GDTBXPJZTBHREO-UHFFFAOYSA-N 0.000 description 2
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- 125000002915 carbonyl group Chemical group [*:2]C([*:1])=O 0.000 description 2
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- 125000000951 phenoxy group Chemical group [H]C1=C([H])C([H])=C(O*)C([H])=C1[H] 0.000 description 2
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- JRMUNVKIHCOMHV-UHFFFAOYSA-M tetrabutylammonium bromide Chemical compound [Br-].CCCC[N+](CCCC)(CCCC)CCCC JRMUNVKIHCOMHV-UHFFFAOYSA-M 0.000 description 2
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- CWIFAKBLLXGZIC-UHFFFAOYSA-N 1,1,2,2-tetrafluoro-1-(2,2,2-trifluoroethoxy)ethane Chemical compound FC(F)C(F)(F)OCC(F)(F)F CWIFAKBLLXGZIC-UHFFFAOYSA-N 0.000 description 1
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- SGUVLZREKBPKCE-UHFFFAOYSA-N 1,5-diazabicyclo[4.3.0]-non-5-ene Chemical compound C1CCN=C2CCCN21 SGUVLZREKBPKCE-UHFFFAOYSA-N 0.000 description 1
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- JWOTWWORMYMZCR-UHFFFAOYSA-N 1-methyl-4-[3-(1-methylpiperidin-4-yl)propyl]piperidine Chemical compound C1CN(C)CCC1CCCC1CCN(C)CC1 JWOTWWORMYMZCR-UHFFFAOYSA-N 0.000 description 1
- OXEZLYIDQPBCBB-UHFFFAOYSA-N 4-(3-piperidin-4-ylpropyl)piperidine Chemical compound C1CNCCC1CCCC1CCNCC1 OXEZLYIDQPBCBB-UHFFFAOYSA-N 0.000 description 1
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- 229920000544 Gore-Tex Polymers 0.000 description 1
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- GRYLNZFGIOXLOG-UHFFFAOYSA-N Nitric acid Chemical compound O[N+]([O-])=O GRYLNZFGIOXLOG-UHFFFAOYSA-N 0.000 description 1
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- OFOBLEOULBTSOW-UHFFFAOYSA-N Propanedioic acid Natural products OC(=O)CC(O)=O OFOBLEOULBTSOW-UHFFFAOYSA-N 0.000 description 1
- 235000021355 Stearic acid Nutrition 0.000 description 1
- 239000005358 alkali aluminosilicate glass Substances 0.000 description 1
- 229910052782 aluminium Inorganic materials 0.000 description 1
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 1
- 229910000147 aluminium phosphate Inorganic materials 0.000 description 1
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- 230000003667 anti-reflective effect Effects 0.000 description 1
- 239000008346 aqueous phase Substances 0.000 description 1
- 239000002969 artificial stone Substances 0.000 description 1
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 1
- 150000007942 carboxylates Chemical class 0.000 description 1
- 150000001735 carboxylic acids Chemical class 0.000 description 1
- 239000007795 chemical reaction product Substances 0.000 description 1
- XTEGARKTQYYJKE-UHFFFAOYSA-N chloric acid Chemical compound OCl(=O)=O XTEGARKTQYYJKE-UHFFFAOYSA-N 0.000 description 1
- 229940005991 chloric acid Drugs 0.000 description 1
- 150000008280 chlorinated hydrocarbons Chemical class 0.000 description 1
- 239000012320 chlorinating reagent Substances 0.000 description 1
- 238000004891 communication Methods 0.000 description 1
- 239000002131 composite material Substances 0.000 description 1
- 239000004567 concrete Substances 0.000 description 1
- 238000009833 condensation Methods 0.000 description 1
- 230000005494 condensation Effects 0.000 description 1
- 239000000356 contaminant Substances 0.000 description 1
- 238000010411 cooking Methods 0.000 description 1
- DIOQZVSQGTUSAI-NJFSPNSNSA-N decane Chemical compound CCCCCCCCC[14CH3] DIOQZVSQGTUSAI-NJFSPNSNSA-N 0.000 description 1
- 238000000354 decomposition reaction Methods 0.000 description 1
- ZXPDYFSTVHQQOI-UHFFFAOYSA-N diethoxysilane Chemical compound CCO[SiH2]OCC ZXPDYFSTVHQQOI-UHFFFAOYSA-N 0.000 description 1
- 238000001035 drying Methods 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 150000002148 esters Chemical class 0.000 description 1
- 150000002170 ethers Chemical class 0.000 description 1
- 125000001495 ethyl group Chemical group [H]C([H])([H])C([H])([H])* 0.000 description 1
- 239000007888 film coating Substances 0.000 description 1
- 238000009501 film coating Methods 0.000 description 1
- 239000005357 flat glass Substances 0.000 description 1
- 229910052731 fluorine Inorganic materials 0.000 description 1
- 125000001153 fluoro group Chemical group F* 0.000 description 1
- 125000000524 functional group Chemical group 0.000 description 1
- 239000007789 gas Substances 0.000 description 1
- 239000012362 glacial acetic acid Substances 0.000 description 1
- 239000011440 grout Substances 0.000 description 1
- 229910052739 hydrogen Inorganic materials 0.000 description 1
- 230000007062 hydrolysis Effects 0.000 description 1
- 238000006460 hydrolysis reaction Methods 0.000 description 1
- QWPPOHNGKGFGJK-UHFFFAOYSA-N hypochlorous acid Chemical compound ClO QWPPOHNGKGFGJK-UHFFFAOYSA-N 0.000 description 1
- 150000002576 ketones Chemical class 0.000 description 1
- 230000014759 maintenance of location Effects 0.000 description 1
- VZCYOOQTPOCHFL-UPHRSURJSA-N maleic acid Chemical compound OC(=O)\C=C/C(O)=O VZCYOOQTPOCHFL-UPHRSURJSA-N 0.000 description 1
- 239000011976 maleic acid Substances 0.000 description 1
- 239000012528 membrane Substances 0.000 description 1
- 229910001510 metal chloride Inorganic materials 0.000 description 1
- 125000002496 methyl group Chemical group [H]C([H])([H])* 0.000 description 1
- 229940104873 methyl perfluorobutyl ether Drugs 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 239000004570 mortar (masonry) Substances 0.000 description 1
- DIOQZVSQGTUSAI-UHFFFAOYSA-N n-butylhexane Natural products CCCCCCCCCC DIOQZVSQGTUSAI-UHFFFAOYSA-N 0.000 description 1
- 229910017604 nitric acid Inorganic materials 0.000 description 1
- QIQXTHQIDYTFRH-UHFFFAOYSA-N octadecanoic acid Chemical compound CCCCCCCCCCCCCCCCCC(O)=O QIQXTHQIDYTFRH-UHFFFAOYSA-N 0.000 description 1
- OQCDKBAXFALNLD-UHFFFAOYSA-N octadecanoic acid Natural products CCCCCCCC(C)CCCCCCCCC(O)=O OQCDKBAXFALNLD-UHFFFAOYSA-N 0.000 description 1
- 150000002902 organometallic compounds Chemical class 0.000 description 1
- 125000001181 organosilyl group Chemical group [SiH3]* 0.000 description 1
- 125000001820 oxy group Chemical group [*:1]O[*:2] 0.000 description 1
- 239000001301 oxygen Substances 0.000 description 1
- 229910052760 oxygen Inorganic materials 0.000 description 1
- 239000008188 pellet Substances 0.000 description 1
- 229960004624 perflexane Drugs 0.000 description 1
- YPJUNDFVDDCYIH-UHFFFAOYSA-N perfluorobutyric acid Chemical compound OC(=O)C(F)(F)C(F)(F)C(F)(F)F YPJUNDFVDDCYIH-UHFFFAOYSA-N 0.000 description 1
- LGUZHRODIJCVOC-UHFFFAOYSA-N perfluoroheptane Chemical compound FC(F)(F)C(F)(F)C(F)(F)C(F)(F)C(F)(F)C(F)(F)C(F)(F)F LGUZHRODIJCVOC-UHFFFAOYSA-N 0.000 description 1
- ZJIJAJXFLBMLCK-UHFFFAOYSA-N perfluorohexane Chemical compound FC(F)(F)C(F)(F)C(F)(F)C(F)(F)C(F)(F)C(F)(F)F ZJIJAJXFLBMLCK-UHFFFAOYSA-N 0.000 description 1
- YVBBRRALBYAZBM-UHFFFAOYSA-N perfluorooctane Chemical compound FC(F)(F)C(F)(F)C(F)(F)C(F)(F)C(F)(F)C(F)(F)C(F)(F)C(F)(F)F YVBBRRALBYAZBM-UHFFFAOYSA-N 0.000 description 1
- 150000002978 peroxides Chemical class 0.000 description 1
- 239000004033 plastic Substances 0.000 description 1
- 229920003023 plastic Polymers 0.000 description 1
- 239000002985 plastic film Substances 0.000 description 1
- 229920006255 plastic film Polymers 0.000 description 1
- 238000005498 polishing Methods 0.000 description 1
- 239000011496 polyurethane foam Substances 0.000 description 1
- 229910000027 potassium carbonate Inorganic materials 0.000 description 1
- 239000000843 powder Substances 0.000 description 1
- 230000008569 process Effects 0.000 description 1
- 235000019260 propionic acid Nutrition 0.000 description 1
- 238000000746 purification Methods 0.000 description 1
- IUVKMZGDUIUOCP-BTNSXGMBSA-N quinbolone Chemical compound O([C@H]1CC[C@H]2[C@H]3[C@@H]([C@]4(C=CC(=O)C=C4CC3)C)CC[C@@]21C)C1=CCCC1 IUVKMZGDUIUOCP-BTNSXGMBSA-N 0.000 description 1
- 150000003254 radicals Chemical class 0.000 description 1
- 230000009257 reactivity Effects 0.000 description 1
- 230000000717 retained effect Effects 0.000 description 1
- 230000002441 reversible effect Effects 0.000 description 1
- 230000035807 sensation Effects 0.000 description 1
- 238000000926 separation method Methods 0.000 description 1
- FZHAPNGMFPVSLP-UHFFFAOYSA-N silanamine Chemical class [SiH3]N FZHAPNGMFPVSLP-UHFFFAOYSA-N 0.000 description 1
- 239000010703 silicon Substances 0.000 description 1
- 125000005373 siloxane group Chemical class [SiH2](O*)* 0.000 description 1
- 239000010454 slate Substances 0.000 description 1
- 239000011780 sodium chloride Substances 0.000 description 1
- 238000007655 standard test method Methods 0.000 description 1
- 239000008117 stearic acid Substances 0.000 description 1
- 238000003860 storage Methods 0.000 description 1
- TXDNPSYEJHXKMK-UHFFFAOYSA-N sulfanylsilane Chemical compound S[SiH3] TXDNPSYEJHXKMK-UHFFFAOYSA-N 0.000 description 1
- YLQBMQCUIZJEEH-UHFFFAOYSA-N tetrahydrofuran Natural products C=1C=COC=1 YLQBMQCUIZJEEH-UHFFFAOYSA-N 0.000 description 1
- 125000004149 thio group Chemical group *S* 0.000 description 1
- 125000000101 thioether group Chemical group 0.000 description 1
- KFUSEUYYWQURPO-OWOJBTEDSA-N trans-1,2-dichloroethene Chemical group Cl\C=C\Cl KFUSEUYYWQURPO-OWOJBTEDSA-N 0.000 description 1
- VZCYOOQTPOCHFL-UHFFFAOYSA-N trans-butenedioic acid Natural products OC(=O)C=CC(O)=O VZCYOOQTPOCHFL-UHFFFAOYSA-N 0.000 description 1
- 125000005369 trialkoxysilyl group Chemical group 0.000 description 1
- FOQJQXVUMYLJSU-UHFFFAOYSA-N triethoxy(1-triethoxysilylethyl)silane Chemical compound CCO[Si](OCC)(OCC)C(C)[Si](OCC)(OCC)OCC FOQJQXVUMYLJSU-UHFFFAOYSA-N 0.000 description 1
- ITMCEJHCFYSIIV-UHFFFAOYSA-N triflic acid Chemical compound OS(=O)(=O)C(F)(F)F ITMCEJHCFYSIIV-UHFFFAOYSA-N 0.000 description 1
- ODHXBMXNKOYIBV-UHFFFAOYSA-N triphenylamine Chemical compound C1=CC=CC=C1N(C=1C=CC=CC=1)C1=CC=CC=C1 ODHXBMXNKOYIBV-UHFFFAOYSA-N 0.000 description 1
- 229940005605 valeric acid Drugs 0.000 description 1
- 238000009736 wetting Methods 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
- C09D127/00—Coating compositions based on homopolymers or copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by a halogen; Coating compositions based on derivatives of such polymers
- C09D127/02—Coating compositions based on homopolymers or copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by a halogen; Coating compositions based on derivatives of such polymers not modified by chemical after-treatment
- C09D127/12—Coating compositions based on homopolymers or copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by a halogen; Coating compositions based on derivatives of such polymers not modified by chemical after-treatment containing fluorine atoms
- C09D127/20—Homopolymers or copolymers of hexafluoropropene
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
- C09D171/00—Coating compositions based on polyethers obtained by reactions forming an ether link in the main chain; Coating compositions based on derivatives of such polymers
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
- C03C17/28—Surface treatment of glass, not in the form of fibres or filaments, by coating with organic material
- C03C17/32—Surface treatment of glass, not in the form of fibres or filaments, by coating with organic material with synthetic or natural resins
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
- C09D183/00—Coating compositions based on macromolecular compounds obtained by reactions forming in the main chain of the macromolecule a linkage containing silicon, with or without sulfur, nitrogen, oxygen, or carbon only; Coating compositions based on derivatives of such polymers
- C09D183/04—Polysiloxanes
- C09D183/08—Polysiloxanes containing silicon bound to organic groups containing atoms other than carbon, hydrogen, and oxygen
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
- C09D183/00—Coating compositions based on macromolecular compounds obtained by reactions forming in the main chain of the macromolecule a linkage containing silicon, with or without sulfur, nitrogen, oxygen, or carbon only; Coating compositions based on derivatives of such polymers
- C09D183/10—Block or graft copolymers containing polysiloxane sequences
- C09D183/12—Block or graft copolymers containing polysiloxane sequences containing polyether sequences
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
- C09D201/00—Coating compositions based on unspecified macromolecular compounds
- C09D201/02—Coating compositions based on unspecified macromolecular compounds characterised by the presence of specified groups, e.g. terminal or pendant functional groups
- C09D201/10—Coating compositions based on unspecified macromolecular compounds characterised by the presence of specified groups, e.g. terminal or pendant functional groups containing hydrolysable silane groups
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G77/00—Macromolecular compounds obtained by reactions forming a linkage containing silicon with or without sulfur, nitrogen, oxygen or carbon in the main chain of the macromolecule
- C08G77/04—Polysiloxanes
- C08G77/22—Polysiloxanes containing silicon bound to organic groups containing atoms other than carbon, hydrogen and oxygen
- C08G77/24—Polysiloxanes containing silicon bound to organic groups containing atoms other than carbon, hydrogen and oxygen halogen-containing groups
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G77/00—Macromolecular compounds obtained by reactions forming a linkage containing silicon with or without sulfur, nitrogen, oxygen or carbon in the main chain of the macromolecule
- C08G77/42—Block-or graft-polymers containing polysiloxane sequences
- C08G77/46—Block-or graft-polymers containing polysiloxane sequences containing polyether sequences
Landscapes
- Chemical & Material Sciences (AREA)
- Life Sciences & Earth Sciences (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Organic Chemistry (AREA)
- Wood Science & Technology (AREA)
- Chemical Kinetics & Catalysis (AREA)
- General Chemical & Material Sciences (AREA)
- Geochemistry & Mineralogy (AREA)
- Paints Or Removers (AREA)
- Application Of Or Painting With Fluid Materials (AREA)
Description
本発明は概して疎油性コーティングの分野に関する。特に本発明は、低下した摩擦係数及び増加した耐摩耗性を有する、増加した分子量を有するヘキサフルオロプロピレンオキシド誘導シランコーティングである。
撥油性及び/又は撥水性(疎油性及び/又は疎水性)などの低表面エネルギーの特徴を付与するために、フルオロケミカル材料のさまざまな組成物が表面に適用されてきた。これらのフルオロケミカル材料の幾つかはフッ素化シランである。フッ素化シラン、すなわち、ガラス及びセラミックスなどの基材を撥油性及び撥水性にするための1個以上のフッ素化基を有するシラン化合物、の使用は既知である。さまざまなフッ素化シランが、例えば、米国特許第7,294,731 B1号(Flynnら)、米国特許出願公開第2006/0014895号(Shiono)、米国特許出願公開第2009/0208728号(Itamiら)、及び米国特許第3,250,808号(Mooreら)に記述されている。
1つの実施形態において、本発明はガラス基材のためのポリマーコーティングである。ポリマーコーティングとして、ヘキサフルオロプロピレンオキシド誘導シランポリマーが挙げられる。ヘキサフルオロプロピレンオキシド誘導シランポリマーは、約5500を超える分子量、約2〜約15ナノメートルの厚さ、及び約0.35未満の一定摩擦係数を有する。ポリマーヘキサフルオロプロピレンオキシド誘導シランコーティングの水接触角は、10000回の摩耗サイクル後に約27%未満減少する。
1モル当たり約5500グラム以上の数平均分子量を有するヘキサフルオロプロピレンオキシド誘導シランポリマーを含む、コーティング組成物が提供される。コーティング組成物は、物品を形成するために珪質基材に適用され得る。ポリマーヘキサフルオロプロピレンオキシド誘導シランは、珪質基材の表面と反応して−Si−O−Si−結合を形成することができるシリル基を有する。得られる物品は、耐摩耗性、洗浄容易性、良好な触感(すなわち、指が容易に表面を滑ることができる)、又はこれらの組み合わせを有する表面を提供するために使用し得る。コーティング組成物の分子量と耐摩耗性との間に驚くべき関係が見出された。更に驚くべきことに、コーティング組成物の分子量の修正により、摩擦係数が修正及び改善され得ることが見出された。コーティング組成物の分子量が増えると、耐摩耗性が増大する。コーティングの分子量の増大に伴い、摩擦係数が減少し、改善された摩擦係数となる。
−CF2−O−CF2−などの二価の基である。
F(CF(CF3)CF2O)nCF(CF3)−CH2O−CH2CH2CH2−L−Si(R1)3−x(R2)x
(I)
F(CF(CF3)CF2O)nCF(CF3)−CH2O−CH2CH2CH2−Si(R1)3−x(R2)x
(IA)
F(CF(CF3)CF2O)nCF(CF3)−CH2O−CH2CH2CH2−S−CH2CH2CH2−Si(R1)3−x(R2)x
(IB)
F(CF(CF3)CF2O)nCF(CF3)−(CO)OCH3
(II)
F(CF(CF3)CF2O)nCF(CF3)−(CO)OH
(III)
F(CF(CF3)CF2O)nCF(CF3)−CH2OH
(IV)
F(CF(CF3)CF2O)nCF(CF3)−CH2OCH2CH=CH2
(V)
F(CF(CF3)CF2O)nCF(CF3)−CH2OCH2CH2CH2−Si(OMe)3
(VI)
Si(R3)4−y(R4)y
(VII)
R5−[Si(R6)3−z(R7)z]2
(VIII)
すべての溶媒は商用源から入手される標準の試薬グレードであり、特記しない限り更に精製せずに使用した。
2つのタイプのガラスプレート、フロートガラス又は化学強化ガラスを試験に使用した。これらは、実施例のセクションを通して「フロートガラス」又は「化学強化ガラス」と呼ばれる。
コーティングされた基材は、上述の堆積方法を使用して、以下の実施例に記述のように調製された。
Taber Industries of North Tonawanda(NY,USA)から入手したTABER 5900リニア摩耗試験機を使用して、2つの摩耗試験方法の1つを行った。
ASTM D1894−08(プラスチックフィルム及びシートの静及び動摩擦係数の標準試験方法(Standard Test Method for Static and Kinetic Coefficients of Frictionof Plastic Film and Sheeting))に記述された方法の修正を使用して、コーティングされたガラス基材上の摩擦係数(CoF)を測定した。
メチルエステル F(CF(CF3)CF2O)aCF(CF3)C(O)OCH3(式中、変数aは4〜100の範囲の平均値を有する)を、その記述を本明細書に援用する、米国特許第3,250,808号(Mooreら)に記述の方法に従って、ジグリム溶媒中で、ヘキサフルオロプロピレンオキシドの金属フッ化物開始オリゴマー化により調製した。低沸点成分を除去するために、蒸留により製品を精製した。以下の調製実施例に記述の化学に従って、幾つかの異なる数平均分子量の材料を調製し、対応するアリルエーテルに転換した。
E.I Du Pont de Nemours & Co.(Wilmington,DE,USA)から入手可能な、KRYTOX 157FS(H)(249.9グラム、0.042モル、MN=5900、C3F7O[CF(CF3)CF2O]nCF(CF3)CO2H)及びジメチルホルムアミド(5.0グラム、0.069モル)をオーバーヘッドスターラー、並びに乾燥窒素源及び希釈炭酸カリウム水溶液を含むスクラバーに繋がる窒素T管を最上部に取り付けた水冷却器を備えた、500mLの三頚丸底フラスコに加えた。混合物を75℃に加熱し、次いで、塩化チオニル(10.1グラム、0.085モル、Aldrich Chemical Company,Milwaukee,WIから入手)を、フラスコの第3の頚からピペットで加えた。(65℃で実行される反応では、当量の塩化オキサリルが塩化チオニルと置き換えられ得る。)ガスの発生が観測され、75℃で更に16時間、反応物を撹拌した。生成物は、HFPO−誘導カルボン酸塩化物であった。
HFPO−誘導メチルエステルC3F7O[CF(CF3)CF2O]nCF(CF3)CO2CH3(MN=5900、195.5グラム、0.033モル)、NOVEC(商標)7100(293グラム)、及びテトラヒドロフラン(60グラム)を、オーバーヘッドスターラーを備えた1Lの三頚丸底フラスコに入れた。溶液を氷浴により約3℃に冷却した。Aldrich Chemical Company(Milwaukee,WI,USA)から入手した水素化ホウ素ナトリウム(5.16グラム、0.136モル)を溶液に加えた。温度が1℃に到達した時点で、無水メタノール(4.4グラム)を加えた。
HFPO−誘導アルコールC3F7O[CF(CF3)CF2O]nCF(CF3)CH2OH(MN=5900、181グラム、0.031モル)及びNOVEC(商標)7200(360グラム)を、オーバーヘッドスターラーを備えた1Lの三頚丸底フラスコに入れた。水酸化カリウム(4.33グラム、0.066モル)の脱イオン水(7グラム)溶液及びテトラブチルアンモニウムブロミド(2グラム)を加えた。反応混合物を63℃で30分間加熱した。次いで、アリルブロミド(9.3グラム、0.076モル)を加え、反応混合物を63℃で約16時間保持した。次いで、冷却した反応混合物を分液漏斗に移し、水相を分離し廃棄した。有機相を、約2Nの塩酸水溶液250mLで、次いで飽和塩化ナトリウム水溶液50mLで洗浄した。次いで、下位の有機相を分離し、硫酸マグネシウムで乾燥し、ろ過した。次いで、シリカゲル(15グラム)を加え、溶液を短時間かき混ぜ、シリカゲルをろ過により除去した。ロータリーエバポレーターにより減圧(60℃、10torr(1.3kPa))下で溶媒を除去し、出発原料アルコールを依然として若干含む、173グラムのアリルエーテル生成物C3F7O[CF(CF3)CF2O]nCF(CF3)CH2OCH2CH=CH2を、約94重量パーセントの純度で得た。
HFPO−誘導チオエーテルシランは、その記述が本明細書に援用される、米国特許第7,294,731号(Flynnら)に記述の方法にほぼ従って、調製した。数平均分子量が1450グラム/モルに等しい、HFPO−誘導チオエーテルシランの調製は、以下の通りであった。
数平均分子量が3300グラム/モルに等しい、HFPO−誘導チオエーテルシランの調製は、以下の通りであった。
数平均分子量が5860グラム/モルに等しい、HFPO−誘導チオエーテルシランの調製は、以下の通りであった。
HFPO−誘導アリルエーテル、C3F7O[CF(CF3)CF2O]nCF(CF3)CH2OCH2CH=CH2(MN=2300、25グラム、0.0109モル、MN=5900のアリルエーテルに関する上の記述とほぼ同じように調整された)、及び1,3−ビス(トリフルオロメチル)ベンゼン(50mL、TCI America(Portland OR,USA)から入手)を、熱電対、並びに乾燥窒素源及び鉱物油のバブラーに繋がるガラスT管を最上部に取り付けた冷却器を備えた100mL丸底フラスコに入れた。次いで反応溶液を60℃に加熱し、トリクロロシラン(6.68グラム、0.049モル、Alfa Aesar(Ward Hill,MA,USA)から入手)を加えた。次いで、白金(0)−1,3−ジビニル−1,1,3,3−テトラメチルジシロキサン錯体のキシレン中の溶液(Aldrich Chemical Company(Milwaukee,WI,USA)から入手した、約2重量パーセントPtを0.15グラム)を、60℃に保持した溶液に、2時間かけて3回、毎回約0.05グラムの単位で加えた。溶液を、更に2時間60℃で保持した。次いで、均質溶液を室温に冷却し、過剰のシランを真空下で除去した。次いで、残った混合物にオルトギ酸トリメチル(14.2グラム、0.134モル、Alfa Aesar(Ward Hill,MA,USA)から入手)溶液及びメタノール(0.5グラム)を加えた。反応混合物を、16時間60℃に加熱した。更に15グラムのメタノールを加え、混合物を45分間60℃に加熱した。温かい溶液を分液漏斗に移し、室温まで冷却した。下位相を分離し、シラン中に残存する少量の溶媒をロータリーエバポレーターにより減圧(50℃、15torr(2kPa))で除去して、20.3グラムの透明なHFPO−誘導エーテルシラン(MN=2420)C3F7O[CF(CF3)CF2O]nCF(CF3)CH2OCH2CH2CH2Si(OMe)3を得た。
HFPO−誘導アリルエーテル、C3F7O[CF(CF3)CF2O]nCF(CF3)CH2OCH2CH=CH2(MN=5588、20.4グラム、0.0037モル)及び1,3−ビス(トリフルオロメチル)ベンゼン(50mL)を、熱電対、並びに乾燥窒素源及び鉱物油のバブラーに繋がるガラスT管を最上部に取り付けた冷却器を備えた100mL丸底フラスコに入れた。次いで、反応溶液を60℃に加熱し、トリクロロシラン(5.6グラム、0.041モル)を加えた。次いで、白金(0)−1,3−ジビニル−1,1,3,3−テトラメチルジシロキサン錯体のキシレン中の溶液(約2重量パーセントPtを0.15グラム)を、溶液に、3時間かけて3回、毎回約0.05グラムの単位で加えた。溶液を、更に3時間60℃で保持した。次いで、均質溶液を室温に冷却し、過剰のシランを真空下で除去した。次いで、残った混合物にオルトギ酸トリメチル(10.0グラム、0.094モル)溶液及びメタノール(0.5グラム)を加えた。混合物を16時間60℃に加熱した。更に10グラムのメタノールを加え、混合物を45分間60℃に加熱した。温かい溶液を分液漏斗に移し、室温まで冷却した。下位相を分離し、シラン中に残存する少量の溶媒をロータリーエバポレーターにより減圧(50℃、15torr(2kPa))で除去して、16.8グラムの透明なHFPO−誘導エーテルシラン(MN=5711)C3F7O[CF(CF3)CF2O]nCF(CF3)CH2OCH2CH2CH2Si(OMe)3を得た。
上述のように調製した、HFPO−誘導アリルエーテル、C3F7O[CF(CF3)CF2O]nCF(CF3)CH2OCH2CH=CH2(MN=7002、43.4グラム、0.0062モル)、及び1,4−ビス(トリフルオロメチル)ベンゼン(164グラム、これはAlfa Aesarから購入できる)を、熱電対、並びに乾燥窒素源及び鉱物油のバブラーに繋がるガラスT管を最上部に取り付けた冷却器を備えた500mL丸底フラスコに入れた。トリクロロシラン(11.7グラム、0.086モル)を加え、次いで、反応溶液を60℃に加熱した。次いで、白金(0)−1,3−ジビニル−1,1,3,3−テトラメチルジシロキサン錯体のキシレン中の溶液(約2重量パーセントPtを約0.4グラム)を溶液に加え、溶液を60℃で16時間保持した。次いで、均質溶液を室温に冷却し、過剰のシランを真空下で除去した。次いで、残存する混合物に、オルトギ酸トリメチル(9.1グラム、0.085モル)を加え、混合物を16時間60℃に加熱した。溶液を分液漏斗に移し、メタノル(200mL)を加えた。下側相を分離し、シラン中に残存する少量の溶媒をロータリーエバポレーターにより減圧(50℃、15torr(2kPa))で除去し、43.6グラムの透明なHFPO−誘導エーテルシラン(MN=7124)C3F7O[CF(CF3)CF2O]nCF(CF3)CH2OCH2CH2CH2Si(OMe)3を得た。
上述のように調製した、HFPO−誘導アリルエーテル、C3F7O[CF(CF3)CF2O]nCF(CF3)CH2OCH2CH=CH2(MN=14500、37.3グラム、0.0026モル)、及び1,4−ビス(トリフルオロメチル)ベンゼン(166グラム)を、熱電対、並びに乾燥窒素源及び鉱物油のバブラーに繋がるガラスT管を最上部に取り付けた冷却器を備えた500mL丸底フラスコに入れた。トリクロロシラン(6.76グラム、0.049モル)を加え、次いで、反応溶液を60℃に加熱した。次いで、白金(0)−1,3−ジビニル−1,1,3,3−テトラメチルジシロキサン錯体のキシレン中の溶液(約2重量パーセントPtを約0.4グラム)を溶液に加え、溶液を60℃で16時間保持した。次いで、均質溶液を室温に冷却し、過剰のシランを真空下で除去した。次いで、残存する混合物に、オルトギ酸トリメチル(5.3グラム、0.05モル)を加え、混合物を16時間60℃に加熱した。溶液を分液漏斗に移し、メタノール(200mL)を加えた。下側相を分離し、メタノール(50mL)で2回洗浄し、残留物をNOVEC(商標)7200に取り込み、溶媒をロータリーエバポレーターにより減圧(50℃、15torr(2kPa))で除去して、37グラムの透明なHFPO−誘導エーテルシラン(MN=14634)、C3F7O[CF(CF3)CF2O]nCF(CF3)CH2OCH2CH2CH2Si(OMe)3を得た。
下記のすべての試料を、洗浄したフロートガラス基材にコーティングし、硬化させ、特に断りのない限り、上記の方法(堆積方法)に従って試験した。試料を上記の第2の方法に従って洗浄した。
下記のすべての試料を、洗浄したフロートガラス基材にコーティングし、硬化させ、特に断りのない限り、上記の方法(堆積方法)に従って試験した。試料を上記の第2の方法に従って洗浄した。
下記のすべての試料を、洗浄した化学強化ガラス基材上にコーティングし、硬化させ、特に断りのない限り、上記の方法(液体堆積方法)に従って試験した。試料を、上記のように方法1、続いて方法3により洗浄した。
下記のすべての試料を、洗浄したフロートガラス基材上にコーティング、硬化させ、特に断りのない限り、上記の方法(液体堆積方法)に従って試験した。
Claims (2)
- ガラス基材のためのポリマーコーティングであって、
式(I)で表されるヘキサフルオロプロピレンオキシド誘導シランポリマーを含み、
ヘキサフルオロプロピレンオキシド誘導シランポリマーが、約5500を超える分子量を有し、
ヘキサフルオロプロピレンオキシド誘導シランポリマーコーティングの水接触角が、10000回の摩耗サイクル後に約27%未満減少し、
ヘキサフルオロプロピレンオキシド誘導シランポリマーコーティングが、約2〜約15ナノメートルの厚さを有し、
ヘキサフルオロプロピレンオキシド誘導シランポリマーコーティングが、約0.35未満の一定摩擦係数を有する、ポリマーコーティング。
F(CF(CF 3 )CF 2 O) n CF(CF 3 )−CH 2 O−CH 2 CH 2 CH 2 −L−Si(R 1 ) 3−x (R 2 ) x (I)
(式中、Lは単結合又は−S−CH 2 CH 2 CH 2 −であり、R 1 基はヒドロキシ基又は加水分解性基であり、R 2 基は非加水分解性基であり、変数xは、0、1、又は2であり、変数nは、約4〜約150の範囲の整数である。) - ポリマーコーティングが、民生用電子機器上に適用される、請求項1に記載のポリマーコーティング。
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