JP3626933B2 - 基板載置台の製造方法 - Google Patents

基板載置台の製造方法 Download PDF

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Publication number
JP3626933B2
JP3626933B2 JP2001393918A JP2001393918A JP3626933B2 JP 3626933 B2 JP3626933 B2 JP 3626933B2 JP 2001393918 A JP2001393918 A JP 2001393918A JP 2001393918 A JP2001393918 A JP 2001393918A JP 3626933 B2 JP3626933 B2 JP 3626933B2
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JP
Japan
Prior art keywords
substrate
dielectric material
material film
susceptor
mounting table
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
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JP2001393918A
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English (en)
Japanese (ja)
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JP2002313898A5 (enExample
JP2002313898A (ja
Inventor
穣一 潮田
孝一 佐藤
務 里吉
博道 伊藤
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Tokyo Electron Ltd
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Tokyo Electron Ltd
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Publication date
Application filed by Tokyo Electron Ltd filed Critical Tokyo Electron Ltd
Priority to JP2001393918A priority Critical patent/JP3626933B2/ja
Priority to TW091102269A priority patent/TW548691B/zh
Priority to US10/067,506 priority patent/US20020134511A1/en
Priority to KR1020020007113A priority patent/KR20020066198A/ko
Publication of JP2002313898A publication Critical patent/JP2002313898A/ja
Publication of JP2002313898A5 publication Critical patent/JP2002313898A5/ja
Priority to US11/032,138 priority patent/US20050120962A1/en
Application granted granted Critical
Publication of JP3626933B2 publication Critical patent/JP3626933B2/ja
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    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32009—Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
    • H01J37/32082—Radio frequency generated discharge
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/458—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for supporting substrates in the reaction chamber
    • C23C16/4581—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for supporting substrates in the reaction chamber characterised by material of construction or surface finish of the means for supporting the substrate
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/02—Details
    • H01J2237/022—Avoiding or removing foreign or contaminating particles, debris or deposits on sample or tube
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T279/00—Chucks or sockets
    • Y10T279/23—Chucks or sockets with magnetic or electrostatic means

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  • Chemical & Material Sciences (AREA)
  • Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Analytical Chemistry (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • General Chemical & Material Sciences (AREA)
  • Plasma & Fusion (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Nonlinear Science (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
  • Drying Of Semiconductors (AREA)
JP2001393918A 2001-02-08 2001-12-26 基板載置台の製造方法 Expired - Lifetime JP3626933B2 (ja)

Priority Applications (5)

Application Number Priority Date Filing Date Title
JP2001393918A JP3626933B2 (ja) 2001-02-08 2001-12-26 基板載置台の製造方法
TW091102269A TW548691B (en) 2001-02-08 2002-02-07 Substrate supporting table, method for manufacturing the same and processing apparatus
US10/067,506 US20020134511A1 (en) 2001-02-08 2002-02-07 Substrate supporting table,method for producing same, and processing system
KR1020020007113A KR20020066198A (ko) 2001-02-08 2002-02-07 기판지지대 및 그 제조방법과 처리장치
US11/032,138 US20050120962A1 (en) 2001-02-08 2005-01-11 Substrate supporting table, method for producing same, and processing system

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP2001-32712 2001-02-08
JP2001032712 2001-02-08
JP2001393918A JP3626933B2 (ja) 2001-02-08 2001-12-26 基板載置台の製造方法

Related Child Applications (2)

Application Number Title Priority Date Filing Date
JP2004121463A Division JP4126286B2 (ja) 2001-02-08 2004-04-16 処理装置
JP2004287124A Division JP2005033221A (ja) 2001-02-08 2004-09-30 基板載置台および処理装置

Publications (3)

Publication Number Publication Date
JP2002313898A JP2002313898A (ja) 2002-10-25
JP2002313898A5 JP2002313898A5 (enExample) 2004-10-28
JP3626933B2 true JP3626933B2 (ja) 2005-03-09

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Application Number Title Priority Date Filing Date
JP2001393918A Expired - Lifetime JP3626933B2 (ja) 2001-02-08 2001-12-26 基板載置台の製造方法

Country Status (4)

Country Link
US (2) US20020134511A1 (enExample)
JP (1) JP3626933B2 (enExample)
KR (1) KR20020066198A (enExample)
TW (1) TW548691B (enExample)

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