JP2015096489A - 有機アミノシラン前駆体およびこれを含む膜の堆積方法 - Google Patents

有機アミノシラン前駆体およびこれを含む膜の堆積方法 Download PDF

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JP2015096489A
JP2015096489A JP2014190075A JP2014190075A JP2015096489A JP 2015096489 A JP2015096489 A JP 2015096489A JP 2014190075 A JP2014190075 A JP 2014190075A JP 2014190075 A JP2014190075 A JP 2014190075A JP 2015096489 A JP2015096489 A JP 2015096489A
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group
branched
linear
disilabutane
disilapropane
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Japanese (ja)
Inventor
マーク　レオナルド　オニール
O'neal Leonard Marc
レオナルド オニール マーク
マンチャオ　シャオ
Manchao Xiao
シャオ マンチャオ
レイ シンジャン
Xinjian Lei
レイ シンジャン
ホ リチャード
Richard Ho
ホ リチャード
チャンドラ ハリピン
Chandra Hairpin
チャンドラ ハリピン
アール．マクドナルド マシュー
R Macdonald Matthew
アール．マクドナルド マシュー
メイリャン ワン
Meiliang Wang
メイリャン ワン
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Air Products and Chemicals Inc
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Air Products and Chemicals Inc
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    • H10P14/6681—Formation of materials, e.g. in the shape of layers or pillars of insulating materials characterised by the type of materials the materials being characterised by the deposition precursor materials the precursor containing a compound comprising Si
    • H10P14/6687—Formation of materials, e.g. in the shape of layers or pillars of insulating materials characterised by the type of materials the materials being characterised by the deposition precursor materials the precursor containing a compound comprising Si the compound comprising silicon and nitrogen
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    • C07F7/02—Silicon compounds
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    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
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    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
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    • C23C16/50—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating using electric discharges
    • C23C16/513—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating using electric discharges using plasma jets
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  • Chemical & Material Sciences (AREA)
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  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • General Chemical & Material Sciences (AREA)
  • Mechanical Engineering (AREA)
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  • Plasma & Fusion (AREA)
  • Physics & Mathematics (AREA)
  • Inorganic Chemistry (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Wood Science & Technology (AREA)
  • Chemical Vapour Deposition (AREA)
  • Formation Of Insulating Films (AREA)
  • Electrodes Of Semiconductors (AREA)
  • Low-Molecular Organic Synthesis Reactions Using Catalysts (AREA)
JP2014190075A 2013-09-20 2014-09-18 有機アミノシラン前駆体およびこれを含む膜の堆積方法 Withdrawn JP2015096489A (ja)

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US201361880261P 2013-09-20 2013-09-20
US61/880,261 2013-09-20
US14/483,751 2014-09-11
US14/483,751 US10453675B2 (en) 2013-09-20 2014-09-11 Organoaminosilane precursors and methods for depositing films comprising same

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JP2018081224A Active JP6777680B2 (ja) 2013-09-20 2018-04-20 有機アミノシラン前駆体およびこれを含む膜の堆積方法
JP2019120928A Active JP6928035B2 (ja) 2013-09-20 2019-06-28 有機アミノシラン前駆体およびこれを含む膜の堆積方法
JP2021129199A Pending JP2021185150A (ja) 2013-09-20 2021-08-05 有機アミノシラン前駆体およびこれを含む膜の堆積方法
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JP2018081224A Active JP6777680B2 (ja) 2013-09-20 2018-04-20 有機アミノシラン前駆体およびこれを含む膜の堆積方法
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