JP2010183085A5 - - Google Patents

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Publication number
JP2010183085A5
JP2010183085A5 JP2010026002A JP2010026002A JP2010183085A5 JP 2010183085 A5 JP2010183085 A5 JP 2010183085A5 JP 2010026002 A JP2010026002 A JP 2010026002A JP 2010026002 A JP2010026002 A JP 2010026002A JP 2010183085 A5 JP2010183085 A5 JP 2010183085A5
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JP
Japan
Prior art keywords
immersion exposure
exposure system
liquid
optical element
terminal optical
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JP2010026002A
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English (en)
Japanese (ja)
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JP5152219B2 (ja
JP2010183085A (ja
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Publication of JP2010183085A5 publication Critical patent/JP2010183085A5/ja
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Expired - Fee Related legal-status Critical Current

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JP2010026002A 2003-04-10 2010-02-08 液浸リソグラフィ装置用の減圧排出を含む環境システム Expired - Fee Related JP5152219B2 (ja)

Applications Claiming Priority (4)

Application Number Priority Date Filing Date Title
US46211203P 2003-04-10 2003-04-10
US60/462,112 2003-04-10
US48447603P 2003-07-01 2003-07-01
US60/484,476 2003-07-01

Related Parent Applications (1)

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JP2006506634A Division JP4775256B2 (ja) 2003-04-10 2004-03-29 液浸リソグラフィ装置用の減圧排出を含む環境システム

Related Child Applications (1)

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JP2012083119A Division JP5541309B2 (ja) 2003-04-10 2012-03-30 露光装置及び露光方法

Publications (3)

Publication Number Publication Date
JP2010183085A JP2010183085A (ja) 2010-08-19
JP2010183085A5 true JP2010183085A5 (enExample) 2011-09-08
JP5152219B2 JP5152219B2 (ja) 2013-02-27

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ID=33162259

Family Applications (10)

Application Number Title Priority Date Filing Date
JP2006506634A Expired - Fee Related JP4775256B2 (ja) 2003-04-10 2004-03-29 液浸リソグラフィ装置用の減圧排出を含む環境システム
JP2010026002A Expired - Fee Related JP5152219B2 (ja) 2003-04-10 2010-02-08 液浸リソグラフィ装置用の減圧排出を含む環境システム
JP2011097540A Expired - Fee Related JP5550188B2 (ja) 2003-04-10 2011-04-25 露光装置、及び露光方法
JP2012083119A Expired - Fee Related JP5541309B2 (ja) 2003-04-10 2012-03-30 露光装置及び露光方法
JP2013167890A Expired - Fee Related JP5692304B2 (ja) 2003-04-10 2013-08-12 液浸リソグラフィ装置用の減圧排出を含む環境システム
JP2013272247A Expired - Lifetime JP5745611B2 (ja) 2003-04-10 2013-12-27 液浸リソグラフィ装置用の減圧排出を含む環境システム
JP2014227827A Expired - Fee Related JP5949876B2 (ja) 2003-04-10 2014-11-10 液浸リソグラフィ装置用の減圧排出を含む環境システム
JP2015218810A Expired - Fee Related JP6137276B2 (ja) 2003-04-10 2015-11-06 液浸リソグラフィ装置用の減圧排出を含む環境システム
JP2016201561A Expired - Fee Related JP6332394B2 (ja) 2003-04-10 2016-10-13 露光装置及び露光方法
JP2017229742A Pending JP2018028705A (ja) 2003-04-10 2017-11-30 液浸リソグラフィ装置用の減圧排出を含む環境システム

Family Applications Before (1)

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JP2006506634A Expired - Fee Related JP4775256B2 (ja) 2003-04-10 2004-03-29 液浸リソグラフィ装置用の減圧排出を含む環境システム

Family Applications After (8)

Application Number Title Priority Date Filing Date
JP2011097540A Expired - Fee Related JP5550188B2 (ja) 2003-04-10 2011-04-25 露光装置、及び露光方法
JP2012083119A Expired - Fee Related JP5541309B2 (ja) 2003-04-10 2012-03-30 露光装置及び露光方法
JP2013167890A Expired - Fee Related JP5692304B2 (ja) 2003-04-10 2013-08-12 液浸リソグラフィ装置用の減圧排出を含む環境システム
JP2013272247A Expired - Lifetime JP5745611B2 (ja) 2003-04-10 2013-12-27 液浸リソグラフィ装置用の減圧排出を含む環境システム
JP2014227827A Expired - Fee Related JP5949876B2 (ja) 2003-04-10 2014-11-10 液浸リソグラフィ装置用の減圧排出を含む環境システム
JP2015218810A Expired - Fee Related JP6137276B2 (ja) 2003-04-10 2015-11-06 液浸リソグラフィ装置用の減圧排出を含む環境システム
JP2016201561A Expired - Fee Related JP6332394B2 (ja) 2003-04-10 2016-10-13 露光装置及び露光方法
JP2017229742A Pending JP2018028705A (ja) 2003-04-10 2017-11-30 液浸リソグラフィ装置用の減圧排出を含む環境システム

Country Status (7)

Country Link
US (13) US7321415B2 (enExample)
EP (7) EP3232271A1 (enExample)
JP (10) JP4775256B2 (enExample)
KR (13) KR101319152B1 (enExample)
CN (7) CN104597717B (enExample)
SG (6) SG2014015184A (enExample)
WO (1) WO2004090634A2 (enExample)

Families Citing this family (215)

* Cited by examiner, † Cited by third party
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