JP2003511505A5 - - Google Patents
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- Publication number
- JP2003511505A5 JP2003511505A5 JP2001528488A JP2001528488A JP2003511505A5 JP 2003511505 A5 JP2003511505 A5 JP 2003511505A5 JP 2001528488 A JP2001528488 A JP 2001528488A JP 2001528488 A JP2001528488 A JP 2001528488A JP 2003511505 A5 JP2003511505 A5 JP 2003511505A5
- Authority
- JP
- Japan
- Prior art keywords
- group
- anion
- alkyl
- ionic salt
- peracid
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 12
- 239000000203 mixture Substances 0.000 description 12
- 125000000217 alkyl group Chemical group 0.000 description 9
- 150000003839 salts Chemical class 0.000 description 8
- 150000001768 cations Chemical class 0.000 description 7
- 229910052731 fluorine Inorganic materials 0.000 description 7
- 150000002891 organic anions Chemical class 0.000 description 7
- 239000002253 acid Substances 0.000 description 6
- 229910052757 nitrogen Inorganic materials 0.000 description 6
- 150000004965 peroxy acids Chemical class 0.000 description 6
- YCKRFDGAMUMZLT-UHFFFAOYSA-N Fluorine atom Chemical compound [F] YCKRFDGAMUMZLT-UHFFFAOYSA-N 0.000 description 5
- 150000001450 anions Chemical class 0.000 description 5
- 239000011737 fluorine Substances 0.000 description 5
- 125000003118 aryl group Chemical group 0.000 description 4
- 125000004432 carbon atom Chemical group C* 0.000 description 4
- -1 cycloaliphatic Chemical group 0.000 description 4
- 229910052739 hydrogen Inorganic materials 0.000 description 4
- 239000000155 melt Substances 0.000 description 4
- 125000001997 phenyl group Chemical group [H]C1=C([H])C([H])=C(*)C([H])=C1[H] 0.000 description 4
- 229920001169 thermoplastic Polymers 0.000 description 4
- 150000001875 compounds Chemical class 0.000 description 3
- 230000000699 topical effect Effects 0.000 description 3
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 description 2
- 125000002877 alkyl aryl group Chemical group 0.000 description 2
- 125000003710 aryl alkyl group Chemical group 0.000 description 2
- 125000004122 cyclic group Chemical group 0.000 description 2
- 125000006575 electron-withdrawing group Chemical group 0.000 description 2
- 125000005842 heteroatom Chemical group 0.000 description 2
- 239000001257 hydrogen Substances 0.000 description 2
- ZXMGHDIOOHOAAE-UHFFFAOYSA-N 1,1,1-trifluoro-n-(trifluoromethylsulfonyl)methanesulfonamide Chemical compound FC(F)(F)S(=O)(=O)NS(=O)(=O)C(F)(F)F ZXMGHDIOOHOAAE-UHFFFAOYSA-N 0.000 description 1
- 239000007983 Tris buffer Substances 0.000 description 1
- 125000002015 acyclic group Chemical group 0.000 description 1
- 125000002723 alicyclic group Chemical group 0.000 description 1
- 239000003513 alkali Substances 0.000 description 1
- 125000004390 alkyl sulfonyl group Chemical group 0.000 description 1
- 239000000835 fiber Substances 0.000 description 1
- 150000003949 imides Chemical class 0.000 description 1
- 239000011810 insulating material Substances 0.000 description 1
- 239000007788 liquid Substances 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- 125000005525 methide group Chemical group 0.000 description 1
- 238000000034 method Methods 0.000 description 1
Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US09/412,850 | 1999-10-06 | ||
| US09/412,850 US6372829B1 (en) | 1999-10-06 | 1999-10-06 | Antistatic composition |
| PCT/US2000/006597 WO2001025326A1 (en) | 1999-10-06 | 2000-03-14 | Antistatic composition |
Related Child Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2012270411A Division JP5395248B2 (ja) | 1999-10-06 | 2012-12-11 | イオン性塩 |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JP2003511505A JP2003511505A (ja) | 2003-03-25 |
| JP2003511505A5 true JP2003511505A5 (enExample) | 2007-05-10 |
| JP5412629B2 JP5412629B2 (ja) | 2014-02-12 |
Family
ID=23634751
Family Applications (3)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2001528488A Expired - Fee Related JP5412629B2 (ja) | 1999-10-06 | 2000-03-14 | 帯電防止組成物 |
| JP2012270411A Expired - Fee Related JP5395248B2 (ja) | 1999-10-06 | 2012-12-11 | イオン性塩 |
| JP2013171136A Expired - Fee Related JP5643401B2 (ja) | 1999-10-06 | 2013-08-21 | 帯電防止組成物 |
Family Applications After (2)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2012270411A Expired - Fee Related JP5395248B2 (ja) | 1999-10-06 | 2012-12-11 | イオン性塩 |
| JP2013171136A Expired - Fee Related JP5643401B2 (ja) | 1999-10-06 | 2013-08-21 | 帯電防止組成物 |
Country Status (9)
| Country | Link |
|---|---|
| US (2) | US6372829B1 (enExample) |
| EP (1) | EP1232206B1 (enExample) |
| JP (3) | JP5412629B2 (enExample) |
| KR (1) | KR100755813B1 (enExample) |
| AU (1) | AU3743500A (enExample) |
| CA (1) | CA2385476C (enExample) |
| DE (1) | DE60018597T2 (enExample) |
| TW (1) | TWI230176B (enExample) |
| WO (1) | WO2001025326A1 (enExample) |
Families Citing this family (131)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US6372829B1 (en) * | 1999-10-06 | 2002-04-16 | 3M Innovative Properties Company | Antistatic composition |
| GB9928290D0 (en) * | 1999-12-01 | 2000-01-26 | Univ Belfast | Process for preparing ambient temperature ionic liquids |
| US6592988B1 (en) * | 1999-12-29 | 2003-07-15 | 3M Innovative Properties Company | Water-and oil-repellent, antistatic composition |
| AU2001262242A1 (en) * | 2000-05-12 | 2001-11-20 | Bayer Aktiengesellschaft | Antistatic agent |
| JP2002124108A (ja) * | 2000-10-17 | 2002-04-26 | Koito Mfg Co Ltd | 車両用灯具 |
| US20030054172A1 (en) * | 2001-05-10 | 2003-03-20 | 3M Innovative Properties Company | Polyoxyalkylene ammonium salts and their use as antistatic agents |
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| JP4677134B2 (ja) * | 2001-07-27 | 2011-04-27 | 株式会社イノアックコーポレーション | 帯電防止シート |
| CN100351294C (zh) * | 2001-08-02 | 2007-11-28 | 3M创新有限公司 | 光学透明和抗静电的压敏粘合剂 |
| US6740413B2 (en) * | 2001-11-05 | 2004-05-25 | 3M Innovative Properties Company | Antistatic compositions |
| US6924329B2 (en) * | 2001-11-05 | 2005-08-02 | 3M Innovative Properties Company | Water- and oil-repellent, antistatic compositions |
| US6531270B1 (en) * | 2001-11-21 | 2003-03-11 | Eastman Kodak Company | Ionic liquids as coupler solvents in photothermographic systems |
| US6531273B1 (en) * | 2001-11-21 | 2003-03-11 | Eastman Kodak Company | Dispersions of ionic liquids for photothermographic systems and methods of making such systems |
| US6586166B1 (en) | 2001-11-21 | 2003-07-01 | Eastman Kodak Company | Ionic liquids as addenda in photothermographic systems |
| AU2003237797B2 (en) | 2002-04-05 | 2009-02-26 | University Of South Alabama | Functionalized ionic liquids, and methods of use thereof |
| US6580006B1 (en) | 2002-05-02 | 2003-06-17 | 3M Innovative Properties Company | Catalytic process for preparing perfluoroethanesulfonyl fluoride and/or perfluorodiethylsulfone |
| US20040077519A1 (en) * | 2002-06-28 | 2004-04-22 | The Procter & Gamble Co. | Ionic liquid based products and method of using the same |
| US6900257B2 (en) * | 2002-08-06 | 2005-05-31 | General Electric Company | Antistatic agents and polymer compositions derived therefrom |
| US6841598B2 (en) * | 2002-08-16 | 2005-01-11 | General Electric Company | Antistatic and antidust agents, compositions thereof, and methods of manufacture |
| US7320947B2 (en) * | 2002-09-16 | 2008-01-22 | Milliken & Company | Static dissipative textile and method for producing the same |
| AU2003287507B2 (en) * | 2002-11-04 | 2008-05-01 | Solutia Inc. | Functional fluid compositions containing erosion inhibitors |
| JP4625255B2 (ja) * | 2002-12-27 | 2011-02-02 | 三洋化成工業株式会社 | 帯電防止剤および帯電防止性樹脂組成物 |
| JP4615855B2 (ja) * | 2003-01-15 | 2011-01-19 | 住友ゴム工業株式会社 | 制電性ポリマー組成物からなる成形品 |
| WO2004078898A1 (ja) * | 2003-03-06 | 2004-09-16 | Tokuyama Corporation | 帯電防止性洗浄剤 |
| JP4519487B2 (ja) * | 2003-03-06 | 2010-08-04 | 株式会社トクヤマ | 洗浄用組成物 |
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| US7220792B2 (en) | 2003-12-30 | 2007-05-22 | General Electric Company | Water resistant permanent antistatic thermoplastic composition |
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| US7094861B2 (en) | 2003-12-30 | 2006-08-22 | General Electric Company | Thermoplastic composition containing polymeric anti-static salt, method of making, and use thereof |
| JP5384279B2 (ja) * | 2004-03-08 | 2014-01-08 | 日東電工株式会社 | 粘着剤組成物、粘着シート類及び表面保護フィルム |
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| TWI388640B (zh) * | 2004-06-01 | 2013-03-11 | Nitto Denko Corp | 壓敏黏合劑組成物、壓敏黏合片及表面保護膜 |
| TWI387629B (zh) | 2004-07-26 | 2013-03-01 | Nitto Denko Corp | 壓感黏合劑組成物、壓感黏合片及表面保護膜 |
| JP4559800B2 (ja) * | 2004-08-30 | 2010-10-13 | 株式会社トクヤマ | 電気・電子部品用の洗浄剤 |
| US7776810B2 (en) * | 2004-11-01 | 2010-08-17 | The Procter & Gamble Company | Compositions containing ionic liquid actives |
| US20060094616A1 (en) * | 2004-11-01 | 2006-05-04 | Hecht Stacie E | Ionic liquids derived from surfactants |
| US20060090271A1 (en) * | 2004-11-01 | 2006-05-04 | Price Kenneth N | Processes for modifying textiles using ionic liquids |
| US20060090777A1 (en) * | 2004-11-01 | 2006-05-04 | Hecht Stacie E | Multiphase cleaning compositions having ionic liquid phase |
| US7737102B2 (en) | 2004-11-01 | 2010-06-15 | The Procter & Gamble Company | Ionic liquids derived from functionalized anionic surfactants |
| US7939485B2 (en) * | 2004-11-01 | 2011-05-10 | The Procter & Gamble Company | Benefit agent delivery system comprising ionic liquid |
| JP2006137106A (ja) * | 2004-11-12 | 2006-06-01 | Nitto Denko Corp | 溶剤含有物除去用粘着シート |
| JP4888680B2 (ja) * | 2004-11-15 | 2012-02-29 | パイオトレック株式会社 | 帯電防止剤およびその使用方法 |
| JP4767561B2 (ja) * | 2004-12-13 | 2011-09-07 | 広栄化学工業株式会社 | 樹脂組成物用帯電防止剤 |
| US7786065B2 (en) * | 2005-02-18 | 2010-08-31 | The Procter & Gamble Company | Ionic liquids derived from peracid anions |
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