JP2001154363A5 - - Google Patents
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- Publication number
- JP2001154363A5 JP2001154363A5 JP1999340785A JP34078599A JP2001154363A5 JP 2001154363 A5 JP2001154363 A5 JP 2001154363A5 JP 1999340785 A JP1999340785 A JP 1999340785A JP 34078599 A JP34078599 A JP 34078599A JP 2001154363 A5 JP2001154363 A5 JP 2001154363A5
- Authority
- JP
- Japan
- Prior art keywords
- electron beam
- compound
- group
- fluorine atom
- resist composition
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 238000010894 electron beam technology Methods 0.000 claims 11
- 229910052731 fluorine Inorganic materials 0.000 claims 11
- 125000001153 fluoro group Chemical group F* 0.000 claims 11
- 239000002253 acid Substances 0.000 claims 7
- 150000001875 compounds Chemical class 0.000 claims 7
- -1 vinyl compound Chemical class 0.000 claims 6
- 125000003118 aryl group Chemical group 0.000 claims 3
- 125000006165 cyclic alkyl group Chemical group 0.000 claims 3
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 claims 2
- 125000003545 alkoxy group Chemical group 0.000 claims 2
- 125000002091 cationic group Chemical group 0.000 claims 2
- 125000004122 cyclic group Chemical group 0.000 claims 2
- 125000004435 hydrogen atom Chemical group [H]* 0.000 claims 2
- 239000011347 resin Substances 0.000 claims 2
- 229920005989 resin Polymers 0.000 claims 2
- 125000000547 substituted alkyl group Chemical group 0.000 claims 2
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 claims 1
- YCKRFDGAMUMZLT-UHFFFAOYSA-N Fluorine atom Chemical compound [F] YCKRFDGAMUMZLT-UHFFFAOYSA-N 0.000 claims 1
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 claims 1
- NINIDFKCEFEMDL-UHFFFAOYSA-N Sulfur Chemical compound [S] NINIDFKCEFEMDL-UHFFFAOYSA-N 0.000 claims 1
- 125000002252 acyl group Chemical group 0.000 claims 1
- 125000004423 acyloxy group Chemical group 0.000 claims 1
- 150000001336 alkenes Chemical class 0.000 claims 1
- 125000004453 alkoxycarbonyl group Chemical group 0.000 claims 1
- 125000000217 alkyl group Chemical group 0.000 claims 1
- 150000001450 anions Chemical class 0.000 claims 1
- ILFFFKFZHRGICY-UHFFFAOYSA-N anthracene-1-sulfonic acid Chemical compound C1=CC=C2C=C3C(S(=O)(=O)O)=CC=CC3=CC2=C1 ILFFFKFZHRGICY-UHFFFAOYSA-N 0.000 claims 1
- 125000003710 aryl alkyl group Chemical group 0.000 claims 1
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 claims 1
- 229910052799 carbon Inorganic materials 0.000 claims 1
- 238000004090 dissolution Methods 0.000 claims 1
- 238000001035 drying Methods 0.000 claims 1
- 239000011737 fluorine Substances 0.000 claims 1
- 230000005484 gravity Effects 0.000 claims 1
- 125000005843 halogen group Chemical group 0.000 claims 1
- 125000002887 hydroxy group Chemical group [H]O* 0.000 claims 1
- 230000002401 inhibitory effect Effects 0.000 claims 1
- 238000000034 method Methods 0.000 claims 1
- PSZYNBSKGUBXEH-UHFFFAOYSA-N naphthalene-1-sulfonic acid Chemical compound C1=CC=C2C(S(=O)(=O)O)=CC=CC2=C1 PSZYNBSKGUBXEH-UHFFFAOYSA-N 0.000 claims 1
- 229910052757 nitrogen Inorganic materials 0.000 claims 1
- JRZJOMJEPLMPRA-UHFFFAOYSA-N olefin Natural products CCCCCCCC=C JRZJOMJEPLMPRA-UHFFFAOYSA-N 0.000 claims 1
- 229910052760 oxygen Inorganic materials 0.000 claims 1
- 239000001301 oxygen Substances 0.000 claims 1
- LLHKCFNBLRBOGN-UHFFFAOYSA-N propylene glycol methyl ether acetate Chemical compound COCC(C)OC(C)=O LLHKCFNBLRBOGN-UHFFFAOYSA-N 0.000 claims 1
- 229920006395 saturated elastomer Polymers 0.000 claims 1
- 229910052710 silicon Inorganic materials 0.000 claims 1
- 239000010703 silicon Substances 0.000 claims 1
- 239000002904 solvent Substances 0.000 claims 1
- 125000000472 sulfonyl group Chemical group *S(*)(=O)=O 0.000 claims 1
- 229910052717 sulfur Inorganic materials 0.000 claims 1
- 239000011593 sulfur Substances 0.000 claims 1
- 239000004094 surface-active agent Substances 0.000 claims 1
- 229920002554 vinyl polymer Polymers 0.000 claims 1
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP34078599A JP4049237B2 (ja) | 1999-11-30 | 1999-11-30 | ポジ型電子線又はｘ線レジスト組成物 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP34078599A JP4049237B2 (ja) | 1999-11-30 | 1999-11-30 | ポジ型電子線又はｘ線レジスト組成物 |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JP2001154363A JP2001154363A (ja) | 2001-06-08 |
| JP2001154363A5 true JP2001154363A5 (enExample) | 2005-07-07 |
| JP4049237B2 JP4049237B2 (ja) | 2008-02-20 |
Family
ID=18340282
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP34078599A Expired - Lifetime JP4049237B2 (ja) | 1999-11-30 | 1999-11-30 | ポジ型電子線又はｘ線レジスト組成物 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JP4049237B2 (enExample) |
Families Citing this family (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| TW548520B (en) * | 2000-02-18 | 2003-08-21 | Fuji Photo Film Co Ltd | Positive resist composition for X-rays or electron beams |
| US6949329B2 (en) | 2001-06-22 | 2005-09-27 | Matsushita Electric Industrial Co., Ltd. | Pattern formation method |
| US7521168B2 (en) * | 2002-02-13 | 2009-04-21 | Fujifilm Corporation | Resist composition for electron beam, EUV or X-ray |
| JP4492786B2 (ja) * | 2004-02-16 | 2010-06-30 | 三菱瓦斯化学株式会社 | 感放射線性組成物 |
| CN111198479B (zh) * | 2018-11-20 | 2024-05-28 | 东京应化工业株式会社 | 抗蚀剂组合物以及抗蚀剂图案形成方法 |
| JP7414457B2 (ja) * | 2018-11-20 | 2024-01-16 | 東京応化工業株式会社 | レジスト組成物及びレジストパターン形成方法 |
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1999
- 1999-11-30 JP JP34078599A patent/JP4049237B2/ja not_active Expired - Lifetime