DE69332142D1 - Substrat mit aktiver Matrix - Google Patents

Substrat mit aktiver Matrix

Info

Publication number
DE69332142D1
DE69332142D1 DE69332142T DE69332142T DE69332142D1 DE 69332142 D1 DE69332142 D1 DE 69332142D1 DE 69332142 T DE69332142 T DE 69332142T DE 69332142 T DE69332142 T DE 69332142T DE 69332142 D1 DE69332142 D1 DE 69332142D1
Authority
DE
Germany
Prior art keywords
active matrix
matrix substrate
substrate
active
matrix
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
DE69332142T
Other languages
English (en)
Other versions
DE69332142T2 (de
Inventor
Kazuhiro Noda
Shinji Nakamura
Hisao Hayashi
Hisashi Kadota
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Sony Corp
Original Assignee
Sony Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from JP18908193A external-priority patent/JPH0720496A/ja
Priority claimed from JP5191714A external-priority patent/JPH0720481A/ja
Priority claimed from JP19171293A external-priority patent/JPH0720497A/ja
Application filed by Sony Corp filed Critical Sony Corp
Application granted granted Critical
Publication of DE69332142D1 publication Critical patent/DE69332142D1/de
Publication of DE69332142T2 publication Critical patent/DE69332142T2/de
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Classifications

    • GPHYSICS
    • G02OPTICS
    • G02FOPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/136Liquid crystal cells structurally associated with a semi-conducting layer or substrate, e.g. cells forming part of an integrated circuit
    • G02F1/1362Active matrix addressed cells
    • G02F1/136227Through-hole connection of the pixel electrode to the active element through an insulation layer
    • GPHYSICS
    • G02OPTICS
    • G02FOPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/136Liquid crystal cells structurally associated with a semi-conducting layer or substrate, e.g. cells forming part of an integrated circuit
    • G02F1/1362Active matrix addressed cells
    • G02F1/136209Light shielding layers, e.g. black matrix, incorporated in the active matrix substrate, e.g. structurally associated with the switching element
    • GPHYSICS
    • G02OPTICS
    • G02FOPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/136Liquid crystal cells structurally associated with a semi-conducting layer or substrate, e.g. cells forming part of an integrated circuit
    • G02F1/1362Active matrix addressed cells
    • G02F1/136222Colour filters incorporated in the active matrix substrate

Landscapes

  • Physics & Mathematics (AREA)
  • Nonlinear Science (AREA)
  • Engineering & Computer Science (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Mathematical Physics (AREA)
  • Chemical & Material Sciences (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Liquid Crystal (AREA)
DE69332142T 1992-12-25 1993-12-22 Substrat mit aktiver Matrix Expired - Lifetime DE69332142T2 (de)

Applications Claiming Priority (4)

Application Number Priority Date Filing Date Title
JP35918792 1992-12-25
JP18908193A JPH0720496A (ja) 1993-06-30 1993-06-30 アクティブマトリクス型液晶表示装置
JP5191714A JPH0720481A (ja) 1993-07-05 1993-07-05 アクティブマトリクス液晶表示装置
JP19171293A JPH0720497A (ja) 1993-07-05 1993-07-05 アクティブマトリクス液晶表示装置

Publications (2)

Publication Number Publication Date
DE69332142D1 true DE69332142D1 (de) 2002-08-29
DE69332142T2 DE69332142T2 (de) 2003-03-06

Family

ID=27475422

Family Applications (1)

Application Number Title Priority Date Filing Date
DE69332142T Expired - Lifetime DE69332142T2 (de) 1992-12-25 1993-12-22 Substrat mit aktiver Matrix

Country Status (4)

Country Link
US (1) US5585951A (de)
EP (1) EP0603866B1 (de)
KR (1) KR100248617B1 (de)
DE (1) DE69332142T2 (de)

Families Citing this family (149)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6262784B1 (en) * 1993-06-01 2001-07-17 Samsung Electronics Co., Ltd Active matrix display devices having improved opening and contrast ratios and methods of forming same and a storage electrode line
US5719065A (en) 1993-10-01 1998-02-17 Semiconductor Energy Laboratory Co., Ltd. Method for manufacturing semiconductor device with removable spacers
US5682211A (en) * 1994-04-28 1997-10-28 Xerox Corporation Integrated dark matrix for an active matrix liquid crystal display with pixel electrodes overlapping gate data lines
TW426806B (en) * 1994-05-18 2001-03-21 Toshiba Corp Fabricating method of liquid crystal display apparatus
JP3312083B2 (ja) 1994-06-13 2002-08-05 株式会社半導体エネルギー研究所 表示装置
JPH08122768A (ja) * 1994-10-19 1996-05-17 Sony Corp 表示装置
JP3240858B2 (ja) * 1994-10-19 2001-12-25 ソニー株式会社 カラー表示装置
JP2864464B2 (ja) * 1994-12-22 1999-03-03 日本ビクター株式会社 反射型アクティブ・マトリクス・ディスプレイ・パネル及びその製造方法
US5814529A (en) * 1995-01-17 1998-09-29 Semiconductor Energy Laboratory Co., Ltd. Method for producing a semiconductor integrated circuit including a thin film transistor and a capacitor
JPH0926603A (ja) * 1995-05-08 1997-01-28 Semiconductor Energy Lab Co Ltd 表示装置
JP3315834B2 (ja) * 1995-05-31 2002-08-19 富士通株式会社 薄膜トランジスタマトリクス装置及びその製造方法
US6372534B1 (en) 1995-06-06 2002-04-16 Lg. Philips Lcd Co., Ltd Method of making a TFT array with photo-imageable insulating layer over address lines
US5994721A (en) 1995-06-06 1999-11-30 Ois Optical Imaging Systems, Inc. High aperture LCD with insulating color filters overlapping bus lines on active substrate
KR970011972A (ko) * 1995-08-11 1997-03-29 쯔지 하루오 투과형 액정 표시 장치 및 그 제조 방법
JPH0968721A (ja) * 1995-08-31 1997-03-11 Sharp Corp 液晶表示素子
JP3027541B2 (ja) * 1995-09-27 2000-04-04 シャープ株式会社 液晶表示装置
JP3299869B2 (ja) 1995-09-27 2002-07-08 シャープ株式会社 液晶表示装置とその製造方法
JP3604106B2 (ja) * 1995-09-27 2004-12-22 シャープ株式会社 液晶表示装置
JPH0990337A (ja) * 1995-09-28 1997-04-04 Sharp Corp 透過型液晶表示装置
JP3418653B2 (ja) 1995-09-28 2003-06-23 シャープ株式会社 アクティブマトリクス型液晶表示装置
JPH09236826A (ja) * 1995-09-28 1997-09-09 Sharp Corp 液晶表示素子およびその製造方法
JPH0990397A (ja) * 1995-09-28 1997-04-04 Sharp Corp アクティブマトリクス基板およびそれを用いた表示装置
JP3272212B2 (ja) * 1995-09-29 2002-04-08 シャープ株式会社 透過型液晶表示装置およびその製造方法
JPH09105952A (ja) * 1995-10-11 1997-04-22 Toshiba Electron Eng Corp アクティブマトリクス型液晶表示装置
JP3458562B2 (ja) * 1995-10-12 2003-10-20 株式会社日立製作所 液晶表示装置及びその製造方法
KR100283733B1 (ko) * 1995-10-16 2001-03-02 마찌다 가쯔히꼬 액티브 매트릭스형 액정 표시 장치 및 그 단선 수정 방법
JPH09113931A (ja) * 1995-10-16 1997-05-02 Sharp Corp 液晶表示装置
US5917563A (en) 1995-10-16 1999-06-29 Sharp Kabushiki Kaisha Liquid crystal display device having an insulation film made of organic material between an additional capacity and a bus line
JP3209317B2 (ja) * 1995-10-31 2001-09-17 シャープ株式会社 透過型液晶表示装置およびその製造方法
JP3187306B2 (ja) * 1995-10-31 2001-07-11 シャープ株式会社 透過型液晶表示装置
TWI228625B (en) 1995-11-17 2005-03-01 Semiconductor Energy Lab Display device
US6800875B1 (en) 1995-11-17 2004-10-05 Semiconductor Energy Laboratory Co., Ltd. Active matrix electro-luminescent display device with an organic leveling layer
JPH09146108A (ja) * 1995-11-17 1997-06-06 Semiconductor Energy Lab Co Ltd 液晶表示装置およびその駆動方法
US6294799B1 (en) * 1995-11-27 2001-09-25 Semiconductor Energy Laboratory Co., Ltd. Semiconductor device and method of fabricating same
US5940732A (en) 1995-11-27 1999-08-17 Semiconductor Energy Laboratory Co., Method of fabricating semiconductor device
TW309633B (de) 1995-12-14 1997-07-01 Handotai Energy Kenkyusho Kk
WO1997028483A1 (fr) * 1996-01-30 1997-08-07 Seiko Epson Corporation Substrat pour affichage a cristaux liquides, procede de production d'un substrat pour affichage a cristaux liquides, affichage a cristaux liquides et dispositif electronique
JP3647542B2 (ja) * 1996-02-20 2005-05-11 株式会社半導体エネルギー研究所 液晶表示装置
US5852485A (en) * 1996-02-27 1998-12-22 Sharp Kabushiki Kaisha Liquid crystal display device and method for producing the same
US6157428A (en) * 1997-05-07 2000-12-05 Sanyo Electric Co., Ltd. Liquid crystal display
JP3205501B2 (ja) * 1996-03-12 2001-09-04 シャープ株式会社 アクティブマトリクス表示装置およびその修正方法
JP3332773B2 (ja) * 1996-03-15 2002-10-07 シャープ株式会社 アクティブマトリクス基板およびアクティブマトリクス基板の製造方法
DE19712233C2 (de) * 1996-03-26 2003-12-11 Lg Philips Lcd Co Flüssigkristallanzeige und Herstellungsverfahren dafür
JPH09258247A (ja) * 1996-03-26 1997-10-03 Sharp Corp 液晶表示装置の製造方法および成膜装置
KR100244450B1 (ko) * 1996-08-30 2000-02-01 구본준 액정표시장치의 기판의 제조방법 및 그 제조방법에 의하여 제조 되는 기판의 구조
KR100202231B1 (ko) * 1996-04-08 1999-06-15 구자홍 액정표시장치의 제조방법 및 액정표시장치의 구조
JPH09281508A (ja) 1996-04-12 1997-10-31 Semiconductor Energy Lab Co Ltd 液晶表示装置およびその作製方法
KR100209277B1 (ko) * 1996-04-25 1999-07-15 구자홍 박막트랜지스터 어레이 기판 및 그 제조방법
JP2853656B2 (ja) * 1996-05-22 1999-02-03 日本電気株式会社 液晶パネル
KR100223153B1 (ko) * 1996-05-23 1999-10-15 구자홍 액티브 매트릭스 액정표시장치의 제조방법 및 액티브매트릭스액정표시장치
JP3396130B2 (ja) * 1996-06-03 2003-04-14 シャープ株式会社 液晶表示装置
JP3317387B2 (ja) * 1996-06-03 2002-08-26 シャープ株式会社 アクティブマトリクス基板およびその製造方法
TW384409B (en) * 1996-06-04 2000-03-11 Sharp Kk Liquid crystal display device
JP3126661B2 (ja) 1996-06-25 2001-01-22 株式会社半導体エネルギー研究所 液晶表示装置
JP3312101B2 (ja) * 1996-07-02 2002-08-05 シャープ株式会社 液晶表示装置
JPH1039333A (ja) 1996-07-19 1998-02-13 Sharp Corp アクティブマトリクス型表示装置およびその欠陥修正方法
TW373114B (en) 1996-08-05 1999-11-01 Sharp Kk Liquid crystal display device
US6038006A (en) * 1996-09-02 2000-03-14 Casio Computer Co., Ltd. Liquid crystal display device with light shield and color filter overlapping two edges of pixel electrode
JP3634089B2 (ja) * 1996-09-04 2005-03-30 株式会社半導体エネルギー研究所 表示装置
JPH10111518A (ja) * 1996-10-04 1998-04-28 Sharp Corp アクティブマトリクス基板およびその製造方法
JP3454340B2 (ja) * 1996-11-22 2003-10-06 シャープ株式会社 液晶表示装置
JP3788649B2 (ja) * 1996-11-22 2006-06-21 株式会社半導体エネルギー研究所 液晶表示装置
TW542933B (en) 1996-12-19 2003-07-21 Sharp Kk Liquid crystal display device and process for producing the same
JP3420675B2 (ja) * 1996-12-26 2003-06-30 シャープ株式会社 液晶表示装置およびその製造方法
JPH10198292A (ja) 1996-12-30 1998-07-31 Semiconductor Energy Lab Co Ltd 半導体装置およびその作製方法
US6088070A (en) * 1997-01-17 2000-07-11 Semiconductor Energy Laboratory Co., Ltd. Active matrix liquid crystal with capacitor between light blocking film and pixel connecting electrode
US6433764B1 (en) * 1997-01-23 2002-08-13 Lg. Philips Lcd Co., Ltd. Liquid crystal display
JPH10239698A (ja) * 1997-02-25 1998-09-11 Sharp Corp 液晶表示装置
JP3343645B2 (ja) * 1997-03-25 2002-11-11 シャープ株式会社 液晶表示装置及びその製造方法
US6927826B2 (en) 1997-03-26 2005-08-09 Semiconductor Energy Labaratory Co., Ltd. Display device
JP3883641B2 (ja) * 1997-03-27 2007-02-21 株式会社半導体エネルギー研究所 コンタクト構造およびアクティブマトリクス型表示装置
JP3784491B2 (ja) * 1997-03-28 2006-06-14 株式会社半導体エネルギー研究所 アクティブマトリクス型の表示装置
JP3656076B2 (ja) 1997-04-18 2005-06-02 シャープ株式会社 表示装置
US5868951A (en) * 1997-05-09 1999-02-09 University Technology Corporation Electro-optical device and method
TW523630B (en) * 1997-05-16 2003-03-11 Hitachi Ltd Active matrix type liquid crystal display device
JP3269787B2 (ja) * 1997-05-27 2002-04-02 シャープ株式会社 液晶表示装置
JPH112835A (ja) * 1997-06-13 1999-01-06 Sharp Corp アクティブマトリクス基板
JP3738530B2 (ja) * 1997-06-30 2006-01-25 ソニー株式会社 カラー表示装置
US6195140B1 (en) 1997-07-28 2001-02-27 Sharp Kabushiki Kaisha Liquid crystal display in which at least one pixel includes both a transmissive region and a reflective region
US6330047B1 (en) 1997-07-28 2001-12-11 Sharp Kabushiki Kaisha Liquid crystal display device and method for fabricating the same
KR100262954B1 (ko) * 1997-09-03 2000-08-01 구본준 액정 표시 장치 제조 방법 및 그 제조 방법에 의한 구조
JPH11109391A (ja) 1997-10-01 1999-04-23 Sanyo Electric Co Ltd 液晶表示装置
JP3398025B2 (ja) 1997-10-01 2003-04-21 三洋電機株式会社 液晶表示装置
JP3830115B2 (ja) * 1997-10-06 2006-10-04 シャープ株式会社 液晶表示素子
US6359672B2 (en) 1997-10-20 2002-03-19 Guardian Industries Corp. Method of making an LCD or X-ray imaging device with first and second insulating layers
US6011274A (en) * 1997-10-20 2000-01-04 Ois Optical Imaging Systems, Inc. X-ray imager or LCD with bus lines overlapped by pixel electrodes and dual insulating layers therebetween
JP3279234B2 (ja) * 1997-10-27 2002-04-30 キヤノン株式会社 半導体装置の製造方法
KR100271041B1 (ko) * 1997-11-05 2000-11-01 구본준, 론 위라하디락사 액정표시장치의 기판의 제조방법 및 액정표시장치의 기판의 구조(substrate of a siquid crystal display and method of manufacturing the same)
JP4307582B2 (ja) 1997-11-18 2009-08-05 三洋電機株式会社 液晶表示装置
JP4049422B2 (ja) 1997-11-18 2008-02-20 三洋電機株式会社 液晶表示装置の製造方法
JP3723336B2 (ja) 1997-11-18 2005-12-07 三洋電機株式会社 液晶表示装置
EP0919850B1 (de) * 1997-11-25 2008-08-27 NEC LCD Technologies, Ltd. Aktiv-Matrix-Flüssigkristallanzeige und deren Herstellungsverfahren
TW583433B (en) * 1998-02-09 2004-04-11 Seiko Epson Corp An electro-optical apparatus and a projection type apparatus
JP2000010119A (ja) * 1998-06-23 2000-01-14 Mitsubishi Electric Corp 液晶表示装置および該装置に用いるアレイ基板の製法
US7106400B1 (en) * 1998-09-28 2006-09-12 Sharp Kabushiki Kaisha Method of making LCD with asperities in insulation layer under reflective electrode
JP4094759B2 (ja) * 1999-02-05 2008-06-04 株式会社日立製作所 液晶表示装置
JP4242963B2 (ja) * 1999-02-10 2009-03-25 三洋電機株式会社 カラー液晶表示装置
US6576926B1 (en) 1999-02-23 2003-06-10 Semiconductor Energy Laboratory Co., Ltd. Semiconductor device and fabrication method thereof
JP3362008B2 (ja) 1999-02-23 2003-01-07 シャープ株式会社 液晶表示装置およびその製造方法
US7821065B2 (en) 1999-03-02 2010-10-26 Semiconductor Energy Laboratory Co., Ltd. Semiconductor device comprising a thin film transistor comprising a semiconductor thin film and method of manufacturing the same
US6475836B1 (en) 1999-03-29 2002-11-05 Semiconductor Energy Laboratory Co., Ltd. Semiconductor device and manufacturing method thereof
US6400440B1 (en) 1999-06-23 2002-06-04 International Business Machines Corporation Passive liquid crystal display having pre-tilt control structure and light absorbent material at a center
US6256080B1 (en) 1999-06-23 2001-07-03 International Business Machines Corporation Self-aligned structures for improved wide viewing angle for liquid crystal displays
JP3447619B2 (ja) * 1999-06-25 2003-09-16 株式会社東芝 アクティブマトリクス基板の製造方法、中間転写基板
JP2001175198A (ja) 1999-12-14 2001-06-29 Semiconductor Energy Lab Co Ltd 半導体装置およびその作製方法
KR100679096B1 (ko) * 1999-12-30 2007-02-05 엘지.필립스 엘시디 주식회사 액정표시장치
JP4089123B2 (ja) * 2000-02-29 2008-05-28 ソニー株式会社 液晶表示装置及びその製造方法
US7130014B2 (en) 2000-02-29 2006-10-31 Sony Corporation Liquid crystal display device with particular electrode taper using switching devices and a method of manufacturing the same
JP2001267578A (ja) * 2000-03-17 2001-09-28 Sony Corp 薄膜半導体装置及びその製造方法
TW513753B (en) 2000-03-27 2002-12-11 Semiconductor Energy Lab Semiconductor display device and manufacturing method thereof
TW504846B (en) * 2000-06-28 2002-10-01 Semiconductor Energy Lab Semiconductor device and manufacturing method thereof
US6734924B2 (en) 2000-09-08 2004-05-11 Semiconductor Energy Laboratory Co., Ltd. Liquid crystal display device
US7167226B2 (en) 2000-11-02 2007-01-23 Semiconductor Energy Laboratory Co., Ltd. Liquid crystal display device having particular configuration of pixel electrodes
US6511869B2 (en) 2000-12-05 2003-01-28 International Business Machines Corporation Thin film transistors with self-aligned transparent pixel electrode
JP3841198B2 (ja) * 2001-03-13 2006-11-01 日本電気株式会社 アクティブマトリクス基板及びその製造方法
US6452088B1 (en) 2001-04-16 2002-09-17 Airify Communications, Inc. Power generating display
JP2003084122A (ja) * 2001-06-29 2003-03-19 Koninkl Philips Electronics Nv カラーフィルタ及びこれを用いた液晶表示装置並びにその製造方法
KR100858297B1 (ko) * 2001-11-02 2008-09-11 삼성전자주식회사 반사-투과형 액정표시장치 및 그 제조 방법
JP4302347B2 (ja) * 2001-12-18 2009-07-22 シャープ株式会社 薄膜トランジスタ基板及びその製造方法
US7038239B2 (en) 2002-04-09 2006-05-02 Semiconductor Energy Laboratory Co., Ltd. Semiconductor element and display device using the same
JP3989761B2 (ja) 2002-04-09 2007-10-10 株式会社半導体エネルギー研究所 半導体表示装置
JP3989763B2 (ja) 2002-04-15 2007-10-10 株式会社半導体エネルギー研究所 半導体表示装置
TWI270919B (en) 2002-04-15 2007-01-11 Semiconductor Energy Lab Display device and method of fabricating the same
TWI269248B (en) 2002-05-13 2006-12-21 Semiconductor Energy Lab Display device
US20030214624A1 (en) * 2002-05-14 2003-11-20 Takamichi Fujii Liquid crystal display device and optical laminate
US7256421B2 (en) 2002-05-17 2007-08-14 Semiconductor Energy Laboratory, Co., Ltd. Display device having a structure for preventing the deterioration of a light emitting device
TW564327B (en) * 2002-10-14 2003-12-01 Hannstar Display Corp Active color filter on array structure and its manufacturing method
JP3964324B2 (ja) * 2002-12-27 2007-08-22 三菱電機株式会社 半透過型表示装置の製造方法および半透過型表示装置
KR20040080778A (ko) * 2003-03-13 2004-09-20 삼성전자주식회사 4색 구동 액정 표시 장치 및 이에 사용하는 표시판
US20040260405A1 (en) * 2003-06-18 2004-12-23 Ron Eddie Modular monitoring, control and device management for use with process control systems
KR100611148B1 (ko) 2003-11-25 2006-08-09 삼성에스디아이 주식회사 박막트랜지스터, 그의 제조방법 및 이를 사용하는 유기전계발광소자
KR101003829B1 (ko) * 2004-04-30 2010-12-23 엘지디스플레이 주식회사 씨오티 구조 액정표시장치 및 그 제조 방법
JP4522145B2 (ja) 2004-05-25 2010-08-11 シャープ株式会社 表示装置用基板、その製造方法及び表示装置
US7551247B2 (en) * 2004-06-09 2009-06-23 Sharp Kabushiki Kaisha Reflection type display device and method with pixel electrodes having predetermined dimensions and relationships to each other as to gap width therebetween on both short and long sides and pitch of cubic corner cubes
KR101108345B1 (ko) * 2004-12-09 2012-01-25 엘지디스플레이 주식회사 액정표시패널의 제조장치 및 방법
US20070063982A1 (en) * 2005-09-19 2007-03-22 Tran Bao Q Integrated rendering of sound and image on a display
JP5258156B2 (ja) * 2005-10-27 2013-08-07 株式会社ジャパンディスプレイ 液晶表示装置およびその製造方法
JP5258277B2 (ja) 2006-12-26 2013-08-07 株式会社半導体エネルギー研究所 液晶表示装置
US8629960B2 (en) * 2008-10-02 2014-01-14 Sharp Kabushiki Kaisha Display device substrate, display device substrate manufacturing method, display device, liquid crystal display device, liquid crystal display device manufacturing method and organic electroluminescent display device
TWI585955B (zh) 2008-11-28 2017-06-01 半導體能源研究所股份有限公司 光感測器及顯示裝置
KR20120015187A (ko) * 2010-08-11 2012-02-21 삼성모바일디스플레이주식회사 반사형 액정표시장치
KR101830301B1 (ko) * 2011-10-24 2018-02-21 삼성디스플레이 주식회사 유기 발광 표시 장치
US9366922B2 (en) * 2012-02-07 2016-06-14 Shenzhen China Star Optoelectronics Technology Co., Ltd. Thin film transistor array and method for manufacturing the same
CN203084391U (zh) * 2012-12-19 2013-07-24 北京京东方光电科技有限公司 一种tft阵列基板及液晶显示器
KR102154075B1 (ko) * 2013-10-21 2020-09-09 삼성전자주식회사 반도체 소자의 검사 방법 및 반도체 검사 시스템
KR20150137214A (ko) * 2014-05-28 2015-12-09 삼성디스플레이 주식회사 유기발광 디스플레이 장치 및 그 제조방법
US10139663B2 (en) * 2015-05-29 2018-11-27 Semiconductor Energy Laboratory Co., Ltd. Input/output device and electronic device
JP6762845B2 (ja) * 2016-10-28 2020-09-30 株式会社ジャパンディスプレイ 表示装置及び配線基板
KR102661122B1 (ko) 2016-11-21 2024-04-26 삼성디스플레이 주식회사 표시 장치 및 이의 제조 방법

Family Cites Families (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS59172627A (ja) * 1983-03-23 1984-09-29 Canon Inc 表示パネル
JPS62254122A (ja) * 1986-04-28 1987-11-05 Stanley Electric Co Ltd Tft組込型カラ−液晶表示素子
JPH01156725A (ja) * 1987-12-15 1989-06-20 Seiko Epson Corp 表示装置
US5365357A (en) * 1988-04-21 1994-11-15 Asahi Glass Company Ltd. Color liquid crystal display having color filters and light blocking layers in the periphery
JP2619062B2 (ja) * 1989-03-15 1997-06-11 株式会社東芝 電極基板及び液晶表示装置の製造方法
US5056895A (en) * 1990-05-21 1991-10-15 Greyhawk Systems, Inc. Active matrix liquid crystal liquid crystal light valve including a dielectric mirror upon a leveling layer and having fringing fields
JPH04220626A (ja) * 1990-12-21 1992-08-11 Matsushita Electric Ind Co Ltd 液晶表示装置
JP2655941B2 (ja) * 1991-01-30 1997-09-24 シャープ株式会社 アクティブマトリクス型液晶表示装置およびその製造方法
JPH04320212A (ja) * 1991-04-19 1992-11-11 Sony Corp 液晶表示装置
JPH04323625A (ja) * 1991-04-23 1992-11-12 Sony Corp 液晶表示装置
EP0536898B1 (de) * 1991-09-10 1997-07-02 Sharp Kabushiki Kaisha Flüssigkristall-Anzeigegerät vom Reflexionstyp und Verfahren zu dessen Herstellung
JP3067362B2 (ja) * 1991-12-19 2000-07-17 ソニー株式会社 液晶パネルの製造方法

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KR100248617B1 (ko) 2000-03-15

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