TW201438135A - 用於供壓至半導體基板之裝置 - Google Patents
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- 239000000758 substrate Substances 0.000 title claims abstract description 387
- 239000004065 semiconductor Substances 0.000 title claims abstract description 39
- 230000002093 peripheral effect Effects 0.000 claims description 39
- 238000010438 heat treatment Methods 0.000 claims description 24
- 239000000463 material Substances 0.000 claims description 23
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- 238000000576 coating method Methods 0.000 claims description 7
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- 238000000034 method Methods 0.000 description 6
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- 230000006835 compression Effects 0.000 description 3
- 238000007906 compression Methods 0.000 description 3
- 238000005229 chemical vapour deposition Methods 0.000 description 2
- 238000004891 communication Methods 0.000 description 2
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- 230000004048 modification Effects 0.000 description 2
- 239000011253 protective coating Substances 0.000 description 2
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- 238000007789 sealing Methods 0.000 description 2
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N silicon dioxide Inorganic materials O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 2
- 238000013022 venting Methods 0.000 description 2
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 1
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 description 1
- 239000012159 carrier gas Substances 0.000 description 1
- 238000001816 cooling Methods 0.000 description 1
- 238000000151 deposition Methods 0.000 description 1
- 238000006073 displacement reaction Methods 0.000 description 1
- 229910052732 germanium Inorganic materials 0.000 description 1
- GNPVGFCGXDBREM-UHFFFAOYSA-N germanium atom Chemical compound [Ge] GNPVGFCGXDBREM-UHFFFAOYSA-N 0.000 description 1
- 229910002804 graphite Inorganic materials 0.000 description 1
- 239000010439 graphite Substances 0.000 description 1
- 239000001257 hydrogen Substances 0.000 description 1
- 229910052739 hydrogen Inorganic materials 0.000 description 1
- 230000006698 induction Effects 0.000 description 1
- NFFIWVVINABMKP-UHFFFAOYSA-N methylidynetantalum Chemical compound [Ta]#C NFFIWVVINABMKP-UHFFFAOYSA-N 0.000 description 1
- 230000001681 protective effect Effects 0.000 description 1
- 230000005855 radiation Effects 0.000 description 1
- 239000000376 reactant Substances 0.000 description 1
- 229910003468 tantalcarbide Inorganic materials 0.000 description 1
- 239000012780 transparent material Substances 0.000 description 1
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- H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
- H01L21/30—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26
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- H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
- H01L21/30—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26
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- H01L21/68714—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using mechanical means, e.g. chucks, clamps or pinches the wafers being placed on a susceptor, stage or support
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Abstract
本發明係關於用於製備具有減低濃度之缺陷之異質結構之裝置,該裝置包括用於供壓至半導體基板以允許該等基板依形於具有不同晶格常數之晶體之裝置。
Description
本申請案主張下列之權利:2012年12月31日申請之美國臨時申請案第61/747,613號;2013年3月15日申請之美國臨時申請案第61/793,999號;2013年3月15日申請之美國臨時申請案第61/790,445號及2013年3月15日申請之美國臨時申請案第61/788,744號,其每一者以引用方式併入本文中。
本揭示內容概言之係關於供壓至半導體基板之裝置。
業內不斷需要可用於供壓至半導體結構之裝置。
本揭示內容之一態樣係關於用於使半導體基板彎曲之裝置。該基板具有大致平面位置及彎曲位置。該裝置包括室及用於加熱該室之加熱器。在該室中安裝基板夾具。該夾具包括複數個間隔開的細長銷。每一銷具有用於接觸該基板之支撐表面。該等支撐表面經佈置用於在該彎曲位置處接觸該基板。
在另一態樣中,用於使半導體基板彎曲之裝置包括室、用於加熱該室之加熱器、用於在該基板兩端產生足以對該基板施加應力之壓力差之壓力調節器及安裝於該室中之基板夾具。該基板具有前表面、
背表面及周邊邊緣。該基板夾具包括前環及背環。每一環包括用於毗鄰該基板之周邊邊緣接觸該基板之環形支撐件。該前環適於接觸該基板之該前表面且該背環適於接觸該背表面。
在用於供壓至半導體基板之裝置之另一態樣中,該裝置包括室、用於加熱該室之加熱器及安裝於該室中之基板夾具。該基板具有前表面、背表面及周邊邊緣。該基板夾具具有前環、背環及用於固持該前環及該背環之夾子。每一環包括用於毗鄰該基板之周邊邊緣接觸該基板之環形支撐件。該前環適於接觸該基板之該前表面且該背環適於接觸該背表面。
在本揭示內容之另一態樣中,係關於用於供壓至大致圓形半導體基板之裝置。該基板具有中心軸、大致垂直於該中心軸之前表面及背表面、自該前表面延伸至該背表面之周邊邊緣及於該背表面中毗鄰該周邊邊緣之圓周凹槽。該裝置包括室、用於加熱該室之加熱器及安裝於該室中之基板夾具。該夾具包括大致平面背支撐件,其具有經定尺寸以容納於該基板之該背表面中之該凹槽中之環形轂。該轂可移動以對該基板施加應力。
在又一態樣中,用於供壓至大致圓形半導體基板之裝置包含室、加熱器及安裝於該室中之基板夾具。該基板具有中心軸、大致垂直於該中心軸之前表面及背表面。周邊邊緣自該前表面延伸至該背表面。該基板包括毗鄰該周邊邊緣接合至該背表面之環。該基板夾具包括大致平面背支撐件,其具有適於將該環銜接於該基板之該背表面上之凸緣。該支撐件可移動以對該基板施加應力。
在又一態樣中,用於使半導體基板彎曲之裝置包括室、用於加熱該室之加熱器、用於在該基板兩端產生足以對該基板施加應力之壓力差之壓力調節器及安裝於該室中之基板夾具。該基板具有前表面、背表面及周邊邊緣。該基板可在大致平面位置與彎曲位置之間移動。
該基板夾具包括具有複數個貫穿其之孔之凹形支撐件。該壓力調節器適於通過孔抽真空以藉此將該基板拉入凹形支撐件中。
本揭示內容之又一態樣係關於用於供壓至半導體基板之裝置。該基板具有中心軸、大致垂直於該中心軸之前表面及背表面。周邊邊緣自該前表面延伸至該背表面。該裝置包括室、用於加熱該室之加熱器及安裝於該室中之基板夾具。該夾具包括大致平面背支撐件及用於容納並壓縮該基板之壓件。該壓件適於在該基板之周邊邊緣處朝向其中心軸徑向向內大致均勻地壓縮該基板。
對於本揭示內容之上述態樣中記錄之特徵,存在各種改良。亦可將其他特徵納入本揭示內容之上述態樣中。該等改良及額外特徵可個別地或以任一組合存在。例如,下文所論述關於本揭示內容之所說明實施例中之任一者之各種特徵可單獨或以任一組合納入本揭示內容之上述態樣中之任一者中。
3‧‧‧通氣孔
3’‧‧‧通氣孔
4‧‧‧密封空腔
5‧‧‧系統控制器
9‧‧‧桿
11‧‧‧裝置
15‧‧‧加熱器
20‧‧‧基板夾具
22‧‧‧銷
22’‧‧‧銷
25‧‧‧安裝區塊
27‧‧‧壓力調節器
31‧‧‧室
31’‧‧‧室
33‧‧‧壁
47‧‧‧基板支撐件/基座
49‧‧‧半導體基板
120‧‧‧基板夾具
120’‧‧‧夾具
126‧‧‧平面支撐件
131‧‧‧前環
131’‧‧‧前環
132‧‧‧背環
132’‧‧‧背環
134‧‧‧環形前支撐件
136‧‧‧環形背支撐件
137‧‧‧保護性塗層
220‧‧‧基板夾具
231‧‧‧前環
232‧‧‧背環
234‧‧‧環形前支撐件
236‧‧‧環形背支撐件
240‧‧‧夾子
320‧‧‧基板夾具
346‧‧‧大致平面背支撐件
347‧‧‧環形轂
348‧‧‧凹槽
350‧‧‧前支撐件
352‧‧‧環形環
420‧‧‧基板夾具
446‧‧‧背支撐件
447‧‧‧轂
451‧‧‧前支撐件
455‧‧‧前轂
457‧‧‧凹槽
520‧‧‧供壓裝置/基板夾具
560‧‧‧大致環形壓件
561‧‧‧平面背支撐件
563‧‧‧弧形區段
620‧‧‧基板夾具
670‧‧‧第一凹形支撐件
671‧‧‧孔
672‧‧‧空腔
675‧‧‧第二凹形支撐件/環形支撐件
677‧‧‧上部分
678‧‧‧下部分
679‧‧‧通氣孔
720‧‧‧基板夾具
780‧‧‧環
781‧‧‧大致平面背支撐件
783‧‧‧凸緣
920‧‧‧基板夾具
989‧‧‧管
990‧‧‧導管
991‧‧‧安裝區塊
992‧‧‧凹形支撐件
993‧‧‧裝缷凹槽
994‧‧‧安裝區塊支撐件
996‧‧‧真空管
圖1係本揭示內容之一實施例之用於處理半導體基板之裝置之透視圖;圖2係為清晰起見移除室之一部分之圖1之裝置之透視圖;圖3係本揭示內容之一實施例之基板夾具之剖視圖;圖4係圖3之基板夾具之透視圖;圖5係本揭示內容之第二實施例之基板夾具之剖視圖;圖6係圖5之基板夾具中所用管形銷之透視圖;圖7係用於供壓至半導體基板之裝置之第二實施例之剖視圖;圖8係圖7中所顯示裝置之基板夾具之局部剖視圖;圖9係顯示基板之周邊邊緣上之塗層之基板夾具之局部剖視圖;圖10係用於供壓至半導體基板之裝置之第三實施例之剖視圖;圖11係圖10中所顯示裝置之基板夾具之局部剖視圖;
圖12係藉由箭頭說明在施加夾具後基板及頂環之移動之基板夾具之局部剖視圖;圖13係用於供壓至半導體基板之裝置之第四實施例之局部剖視圖;圖14係用於供壓至半導體基板之裝置之第五實施例之剖視圖;圖15係用於供壓至半導體基板之裝置之第六實施例之剖視圖;圖16係圖15中所顯示裝置之基板夾具之剖視圖;圖17係該裝置之剖視圖;圖18係藉由箭頭指示基板之拉伸之圖18之基板夾具之剖視圖;圖19係基板夾具之第三實施例之局部剖視圖;圖20係具有圖19之基板支撐件之裝置之局部剖視圖;圖21係圖19之基板夾具之局部剖視圖;圖22係基板夾具之第四實施例之局部剖視圖;圖23係具有圖22之基板支撐件之裝置之局部剖視圖;圖24係藉由箭頭說明前支撐件及背支撐件之施加方向之圖23之基板夾具之剖視圖;圖25係基板夾具之第五實施例之剖視圖;圖26係基板夾具之第六實施例之剖視圖;圖27係基板夾具之第七實施例之剖視圖;圖28係用於供壓至半導體基板之裝置之第七實施例之剖視圖;圖29係基板夾具之第八實施例之剖視圖;圖30係基板夾具之第十實施例之安裝區塊之底視圖;圖31係圖31之基板夾具之剖視圖;圖32係安裝至安裝區塊支撐件之基板夾具之剖視圖;圖33係上面裝載基板之基板夾具及安裝區塊支撐件之剖視圖;且
圖34係基板在受應力位置處之基板夾具及安裝區塊支撐件之剖視圖。
貫穿其之該等圖式,對應參考字元指示對應部件。
本揭示內容之態樣包括用於對半導體基板(例如矽基板(例如,晶圓))施加應力之裝置。現參照圖1至圖2,裝置11可包括室31及具有用於支撐半導體基板49之基板支撐件47之基板夾具20。所說明裝置11係單基板處理裝置;然而,本文所揭示之裝置及方法適合用於其他裝置,包括(例如)多基板處理裝置。
該裝置亦可包括用於供壓至基板之「供壓器」。例如,供壓器或供壓器總成可包括一或多個加熱器15或壓力調節器27。加熱器15可藉由使基板以不同於基板夾具(或該夾具之一部分)之比率擴張而供壓至基板,如下文所述。另一選擇為或另外,供壓器可為在基板兩端提供差壓之壓力調節器27。該等僅為可能供壓器之一些實例且其他涵蓋在本揭示內容之範圍內。
裝置11包括室31,該室具有部分地由壁33界定之內部空間。室31之透視圖顯示於圖2中,其中移除室壁之部分以更好地說明裝置11。在室31之內部空間內為支撐半導體基板49之基板夾具20。圖1至圖2中所說明之夾具20係基座47,但涵蓋其他夾具配置(例如,管、環、夾子及諸如此類),該等夾具配置中之一些將在下文中予以更充分地闡述。該基板夾具在圖1至圖2中命名為20且在圖3至圖34中命名為20加上多個100(120、220、320等)。
室31可依靠於桿9或其他適宜支撐件上。裝置11(例如桿9)可包括用於使夾具夾取及/或釋放基板49之器件,例如適宜控制閥及/或氣動或液壓管線或拉索及諸如此類。在不背離本揭示內容之範圍之情況下,室31可包括與本文所顯示配置不同之配置。
該基板夾具或該夾具之部分可為大致不透明以吸收由可位於室31上方及下方之加熱器15(例如高強度輻射加熱燈)產生之輻射加熱光。該夾具可由塗覆有碳化矽之不透明石墨構造而成。室31之壁可由透明材料製成以允許輻射加熱光進入室中。例如,室31之壁可由透明石英製成。石英通常對於紅外光及可見光係透明的且在典型處理溫度下化學穩定。
可使用除高強度燈以外之加熱器15對室31提供熱,例如,電阻加熱器及感應加熱器。另外或另一選擇為,在不背離本揭示內容之範圍之情況下,加熱器15可包括在室31之內部空間內或可與室壁整合。換言之,該(等)加熱器可具有任一適宜類型、大小及形狀,且可佈置於該室內側或外側。可在室31上安裝紅外溫度感測器(未顯示)(例如高溫計)以藉由接收夾具20或基板49所發射之紅外輻射來監測夾具或基板之溫度。可使用系統控制器5(圖1)來控制與室31相關之各種操作參數,包括(例如)供壓器控制、氣體流速及室溫度及壓力。應理解,在不背離本揭示內容之範圍之情況下,可利用不同於圖1至2中所顯示之裝置及室設計。
在某些實施例中,裝置11可經組態用於對半導體基板施加應力及視情況在基板上沈積半導體材料(例如磊晶層)及/或包括適於達成此用途之結構。在該等實施例中,包括半導體材料之處理氣體可自處理氣體來源(例如氣缸)流入裝置11中,到達氣體歧管(未顯示)並流入室31中。可在處理之前、期間或之後將氣體引入室31中。氣體可在接觸基板49之前加熱。用於在半導體基板之表面上沈積磊晶層之方法可包括業內已知方法且如例如美國專利第5,789,309號、第5,904,769號及第5,769,942號中所闡述者。通常,藉由化學氣相沈積來達成磊晶層之生長。一般而言,化學氣相沈積涉及利用載氣(通常氫氣)將揮發性反應物引入室31中。
現將闡述用於對半導體基板施加應力之基板夾具之各個實施例。下文說明基板夾具及用於供壓至半導體基板之供壓器(例如,加熱器、壓力調節器及諸如此類)之一些替代實施例,但在本揭示內容之範圍內涵蓋其他夾具及供壓器。應理解,夾具及供壓器可用作上文所述裝置11及室31之一部分且可與用於加熱該室之加熱器組合使用。
現參照圖3至圖4,基板夾具20可包括多個支撐半導體基板49之間隔開的細長銷22。銷22係附接至安裝區塊25。可對基板49施加力以使基板移動(例如,彎曲)並接觸該等銷。銷22或其上部分可共同地界定支撐表面,該支撐表面經佈置用於在彎曲(即,受應力)位置處接觸基板49。
銷22或其上部分可以凹形圖案配置以使得在施加足夠的力後,基板49自其實質上平面形狀變形或彎曲以依形於該等銷之凹形配置。藉由以此方式變形,使基板49受到應力。
在某些其他實施例中,該裝置如圖1(及下文圖7)中所顯示包括壓力調節器以在基板兩端產生足以對基板施加應力之壓力差。在該等實施例中可使用其他供壓器。
如圖5至圖6中所顯示,銷22’可為管形,藉此界定用於流體流動之腔。在一些實施例中,銷22’與壓力調節器27(例如用於抽真空之幫浦)流體連接。對基板49施加之真空可藉由拉力朝向銷拉動基板。例如,銷與基板之間因銷之凹形圖案所致之距離差異可導致對基板各部分施加不同量之拉力。該等差異力導致向半導體基板49施加應力。
銷22、22’通常在垂直方向上支撐基板,但可經組態以使得其不限制基板在水平或徑向方向上之移動。在加熱期間使基板徑向移動允許基板徑向擴張而不會產生滑移及差排。銷可穿過安裝區塊延伸(而非自其延伸)並通過一系列導管連接,如下文在圖31至圖35中所闡述及顯示。
現參照圖7至圖12,在用於使半導體基板彎曲之裝置之一實施例中,該裝置包括基板夾具120,其具有前環131及背環132。前環131包括環形前支撐件134且背環132包括用於接觸並支撐基板49之環形背支撐件136。注意,該前環及該背環可具有L形橫截面,如圖8中所顯示。前環131通常適於在離散徑向位置處接觸基板49之前表面且背環132通常適於在離散徑向位置處接觸基板49之背表面。徑向位置自基板邊緣略微向內。在不背離本揭示內容之範圍之情況下,前環形支撐件134及背環形支撐件136接觸基板49之徑向位置可與圖8中所說明相同或可不同。
參照圖10,用於使基板49彎曲之裝置(例如,供壓器)可包括壓力調節器27(例如幫浦)以在基板兩端產生差壓。換言之,晶圓一側上之壓力高於另一側。此差壓供壓至基板且可使基板彎曲。在該等實施例中,前環131及背環132充當密封以使得可維持基板49兩端之差壓。壓力調節器27可與穿過室31之壁延伸至該室內之密封空腔4之通氣孔3流體連通。施加於基板49兩端之差壓可使基板在較小壓力之方向上彎曲。
基板49之彎曲可使基板之表面在前環131與背環132之間移動。此外,基板49之熱擴張(即,大於環131、132之熱擴張之熱擴張)可使該等表面在環131與環132之間移動。在一實施例中且如圖9中所顯示,保護性塗層137覆蓋基板49之一部分,且具體而言,覆蓋基板之周邊邊緣。塗層137通常可為在基板固持於環131與環132之間時防止晶圓損壞(例如滑移及差排)之任一保護性材料。
現參照圖13,夾具120’之前環131’及背環132’可經配置以使得該等環在基板之周邊邊緣附近而非在基板之周邊邊緣處接觸基板49,與裝置120之環130、131一樣(圖8)。環131’、132’可與室31’之蓋及/或底部整合。通氣孔3’可穿過室31’之環131’、132’延伸。通氣孔3’可位於
基板49之中心附近且在壓力調節器27啟動後可限制基板之偏轉。
夾具120’亦可包括(例如)在施加環131’、132’之前支撐基板49之平面支撐件126。在某些實施例中,基板49係附接至平面支撐件126。平面支撐件可由熱擴張係數不同於基板之材料製成(即,該等環以不同於基板之比率熱擴張)以在加熱或冷卻支撐件及基板時使基板壓縮或拉伸。
參照圖14,在該裝置之一些實施例中,該裝置利用基板之熱擴張對基板49施加應力。基板夾具220可包括夾子240,該夾子包括對基板49施加固持力之前環231及背環232。前環231包括環形前支撐件234且背環232包括環形背支撐件236。支撐件234、236在基板之周邊邊緣處接觸基板49且分別適於接觸基板之正面及背面。例如,圖14中所說明之基板夾具220可在無壓力調節器之情況下使用。應注意,亦可藉由任一機械方法(包括使用液壓裝置、氣動裝置、馬達及諸如此類)使本文所述環、支撐件、轂、夾子及諸如此類之各種夾具徑向移動。
環231、232可由熱擴張係數不同於基板之材料構造而成(即,該等環以不同於基板之比率熱擴張)。夾子240之固持力與在加熱或冷卻後環231、232之差異擴張率之組合在基板49中產生應力。在環231、232之擴張係數大於基板49之實施例中,該等環使基板徑向拉伸。在環231、232之擴張係數小於基板49之實施例中,環對基板施加內向力(即,基板壓縮),從而達成基板之彎曲。
現參照圖15至圖18,在另一實施例中,基板夾具320包括大致平面背支撐件346,該背支撐件包括經定尺寸及定形以容納於基板49背面中之凹槽348中之環形轂347。轂347可移動以使得其對基板49施加應力。例如,背支撐件346可由在加熱後擴張率小於基板49而壓縮基板之材料製成。另一選擇為,背支撐件346可由在加熱後擴張率大於基板49而拉伸基板之材料製成。
基板夾具320亦可包括用於密封基板並允許壓力調節器在基板兩端產生壓力差以供壓至基板之類似於圖8中所顯示前環131及背環132之具有環形支撐件之前環及背環(未顯示)。含有夾具320之室31可包括通氣孔3及用於施加真空或壓力之密封空腔4(圖17)。該背環可在背支撐件346內部且該前環可與該背環對準或可經定尺寸及定形以比該背環更靠近基板之周邊邊緣。基板可如圖9中所顯示包括塗層。
在一些實施例中且如圖19至圖21中所顯示,基板夾具320亦包括前板350,其具有自前支撐件延伸之環形環352。環352對基板49施加向下力以防止該基板在加熱期間在該基板壓縮或擴張期間自轂347移出。用於達成此功能之其他結構涵蓋在本揭示內容之範圍內。
在其他實施例中且如圖22至圖24中所顯示,基板夾具420與圖15至圖21中所顯示類似或相同包括背支撐件446及轂447。基板夾具420亦包括前支撐件451及前轂455,該前轂經定尺寸及定形以容納於基板49之前表面中之凹槽457中。前支撐件451亦可由在加熱後擴張率小於基板49而壓縮基板之材料製成或可由在加熱後擴張率大於基板49而拉伸基板之材料製成。
參照圖25至圖27,此實施例之供壓裝置520包括用於支撐基板49之平面背支撐件561及用於容納並壓縮該結構之具有圓形開口之大致環形壓件560。該平面支撐件可僅朝向該基板之中心部分地延伸,如在圖26至圖28中,或可在基板49下面連續地延伸。壓件560可連續地環繞該結構,或如圖27中所顯示,可包括形成用於容納基板49之開口之複數個弧形區段563。壓件560及/或區段563可相對於基板49向內移動以壓縮該基板。例如,壓件560因由擴張率小於基板49之材料組成而可移動,以使得在施加熱後壓件將壓縮基板。基板夾具520亦可如上文所述包括前環及/或背環(未顯示)以在使用壓力調節器在該基板兩端產生壓力差後形成密封。
現參照圖28,基板夾具620包括第一凹形支撐件670及與該第一凹形支撐件相對之第二凹形支撐件675。第一凹形支撐件670包括於其中形成之複數個孔671,該等孔用於經由該等孔抽真空且用於將基板49拉向該第一凹形支撐件。第一支撐件670之上部分677在基板49之未彎曲位置處接觸該基板之一部分。通常大於該上部分且含有用於抽真空之孔671之下部分678當該基板在其彎曲位置時接觸該基板。在第二支撐件675中形成通氣孔679且該支撐件形成空腔672以允許經由通氣孔及空腔抽真空以供壓至基板。環形支撐件675通常僅在基板之周邊邊緣處或其附近接觸基板49。
參照圖29,基板夾具720包括大致平面背支撐件781及凸緣783。基板49包括在該基板之周邊邊緣附近附接至該基板之背表面之環780。凸緣783適於銜接環780。支撐件781及凸緣783可相對於該基板移動以壓縮該基板。例如,支撐件781及/或凸緣783因由擴張率大於基板49之材料組成而可移動以使得在施加熱後凸緣783將拉伸基板。在基板之環780在凸緣783(未顯示)內部之實施例中,支撐件781及/或凸緣783因由擴張率小於基板49之材料組成而可移動,以使得在施加熱後凸緣783將壓縮基板。
圖30說明基板夾具920之安裝區塊991之底部。一系列管989穿過安裝區塊991延伸至凹形支撐件992(圖32)。管989係經由一系列導管990連接。安裝區塊991可包括用於自處理室31(圖1)插入及移除安裝區塊之裝缷凹槽993。如圖32中所顯示,安裝區塊991可支撐於該室內之安裝區塊支撐件994上。真空管996穿過安裝區塊支撐件994延伸且在將安裝區塊插入室31(圖1)中後與導管990及管989流體連通。在安裝區塊991上放置基板49(圖33)。在施加真空後,基板49朝向凹形支撐件992彎曲,從而在基板中產生應力(圖34)。
通常,可藉由利用(例如)圖14至圖27及圖29中所顯示之裝置之實
施例壓縮或拉伸使基板上之應力垂直於基板之軸定向。另一選擇為,可例如利用(例如)圖5、圖7至圖13、圖28及圖30至圖34中所顯示之裝置之實施例使應力沿或平行於基板之軸定向。
在介紹本揭示內容或其較佳實施例之要素時,冠詞「一(a)」、「一(an)」、「該(the)」及「該(said)」意味著存在一或多個該等要素。術語「包含(包含)」、「包括(包括)」及「具有(having)」意欲具有囊括性且意味著除所列示要素以外亦可存在其他要素。
因在不背離本揭示內容之範圍之情況下可對上文裝置及方法作出各種改動,故上文說明書所含及附圖中所顯示之所有內容將意欲理解為具有說明性而不具有限制意義。
49‧‧‧半導體基板
320‧‧‧基板夾具
346‧‧‧大致平面背支撐件
347‧‧‧環形轂
348‧‧‧凹槽
Claims (60)
- 一種用於使半導體基板彎曲之裝置,該基板具有大致平面位置及彎曲位置,該裝置包含:室,用於加熱該室之加熱器,安裝於該室中之基板夾具,該夾具包括:複數個間隔開的細長銷,每一銷具有用於接觸該基板之支撐表面,該等支撐表面經佈置用於在該彎曲位置處接觸該基板。
- 如請求項1之裝置,其中每一銷係管形且具有用於在該基板上抽真空之流體通道。
- 如請求項2之裝置,其進一步包含用於抽真空之幫浦。
- 如請求項2之裝置,其中該基板夾具在大致垂直方向上支撐該基板且不限制該基板在大致水平方向上之移動。
- 如請求項1之裝置,其中該室係用於施加磊晶層之磊晶室。
- 如請求項1之裝置,其進一步包含用於在該基板兩端產生足以對該基板施加應力之壓力差之壓力調節器。
- 如請求項6之裝置,其中該等銷無貫穿其之流體通道,該等銷經佈置以在該基板兩端存在壓力差時防止該基板之進一步偏轉。
- 如請求項1之裝置,其中該等銷中之至少一些之支撐表面具有尖端。
- 一種用於使半導體基板彎曲之裝置,該基板具有前表面、背表面及周邊邊緣,該裝置包含:室,用於加熱該室之加熱器, 用於在該基板兩端產生足以對該基板施加應力之壓力差之壓力調節器,安裝於該室中之基板夾具,該夾具包括:前環及背環,每一環包括用於毗鄰該基板之周邊邊緣接觸該基板之環形支撐件,該前環適於接觸該基板之該前表面且該背環適於接觸該背表面。
- 如請求項9之裝置,其中每一支撐件在離散徑向位置處接觸該基板。
- 如請求項9之裝置,其中該壓力調節器係幫浦。
- 如請求項9之裝置,其中該前環及該背環適於與該基板形成密封以促使在該基板兩端產生壓力差。
- 如請求項12之裝置,其中該環形支撐件包括實質上密封之空腔及單一通氣孔,該支撐件適於接觸該基板之該等表面中之一者並與其形成密封,該通氣孔使得能夠經由該空腔抽真空以對該基板施加應力。
- 如請求項9之裝置,其與該基板組合,該基板包括毗鄰該周邊邊緣佈置之塗層。
- 如請求項9之裝置,其中該室係用於施加磊晶層之磊晶室。
- 一種用於供壓至半導體基板之裝置,該基板具有前表面、背表面及周邊邊緣,該裝置包含:室,用於加熱該室之加熱器,安裝於該室中之基板夾具,該夾具包括:前環,背環, 用於固持該前環及該背環之夾子,及每一環包括用於毗鄰該基板之周邊邊緣接觸該基板之環形支撐件,該前環適於接觸該基板之該前表面且該背環適於接觸該背表面。
- 如請求項16之裝置,其中該等環及夾子由熱擴張係數不同於該基板之材料製成,以使得加熱該等環及夾子會在該基板上產生應力。
- 如請求項16之裝置,其中該等環及夾子由擴張率大於該基板之材料製成,以使得施加至該基板及該等環及夾子之熱將使該基板拉伸。
- 如請求項16之裝置,其中該等環及夾子由擴張率小於該基板之材料製成,以使得施加至該基板及該等環及夾子之熱將使該基板壓縮。
- 一種用於供壓至大致圓形半導體基板之裝置,該基板具有中心軸、大致垂直於該中心軸之前表面及背表面、自該前表面延伸至該背表面之周邊邊緣及於該背表面中毗鄰該周邊邊緣之圓周凹槽,該裝置包含:室,用於加熱該室之加熱器,安裝於該室中之基板夾具,該夾具包括:大致平面背支撐件,其具有經定尺寸以容納於該基板之該背表面中之該凹槽中之環形轂(環),該轂可移動以對該基板施加應力。
- 如請求項20之裝置,其中該背支撐件由擴張率大於該基板之材料製成,以使得施加至該基板及支撐件之熱將使該基板拉伸。
- 如請求項20之裝置,其中該背支撐件由擴張率小於該基板之材 料製成,以使得施加至該基板及支撐件之熱將使該基板壓縮。
- 如請求項20之裝置,其進一步包含毗鄰該基板之該前表面佈置之前支撐件。
- 如請求項23之裝置,其中該基板於該前表面中包括圓周凹槽且該前支撐件包括欲容納於該凹槽中之環形轂。
- 如請求項24之裝置,其中該前支撐件由擴張率大於該基板之材料製成,以使得施加至該基板及支撐件之熱將使該基板拉伸。
- 如請求項24之裝置,其中該前支撐件由擴張率小於該基板之材料製成,以使得施加至該基板及支撐件之熱將使該基板壓縮。
- 如請求項20之裝置,其進一步包含用於在該基板兩端產生足以對該基板施加應力之壓力差之壓力調節器,該基板夾具進一步包括:前環及背環,每一環包括用於毗鄰該基板之周邊邊緣在離散徑向位置處接觸該基板之環形支撐件,該前環適於接觸該基板之該前表面且該背環適於接觸該背表面。
- 如請求項27之裝置,其中該前環及該背環適於與該基板形成密封以促使在該基板兩端產生壓力差。
- 如請求項27之裝置,其中該環形支撐件包括實質上密封之空腔及單一通氣孔,該支撐件適於接觸該基板之該等表面中之一者並與其形成密封,該通氣孔使得能夠經由該空腔抽真空以對該基板施加應力。
- 如請求項20之裝置,其與該基板組合,該基板包括毗鄰該周邊邊緣佈置之塗層。
- 如請求項20之裝置,其中該室係用於施加磊晶層之磊晶室。
- 一種用於供壓至大致圓形半導體基板之裝置,該基板具有中心 軸、大致垂直於該中心軸之前表面及背表面、自該前表面延伸至該背表面之周邊邊緣及毗鄰該周邊邊緣接合至該背表面之環,該裝置包含:室,用於加熱該室之加熱器,安裝於該室中之基板夾具,該夾具包括:大致平面背支撐件,其具有適於銜接該基板之該背表面上之該環之凸緣,該支撐件可移動以對該基板施加應力。
- 如請求項32之裝置,其中該背支撐件由擴張率大於該基板之材料製成,以使得施加至該基板及支撐件之熱將使該基板拉伸。
- 如請求項33之裝置,其中該凸緣係在該環內部。
- 如請求項32之裝置,其中該背支撐件由擴張率小於該基板之材料製成,以使得施加至該基板及支撐件之熱將使該基板壓縮。
- 如請求項35之裝置,其中該環係在該凸緣內部。
- 如請求項32之裝置,其進一步包含毗鄰該基板之該前表面佈置之前支撐件。
- 如請求項32之裝置,其進一步包含用於在該基板兩端產生足以對該基板施加應力之壓力差之壓力調節器,該基板夾具進一步包括:前環及背環,每一環包括用於毗鄰該基板之周邊邊緣在離散徑向位置處接觸該基板之環形支撐件,該前環適於接觸該基板之該前表面且該背環適於接觸該背表面。
- 如請求項38之裝置,其中該前環及該背環適於與該基板形成密封以促使在該基板兩端產生壓力差。
- 如請求項38之裝置,其中該環形支撐件包括實質上密封之空腔及單一通氣孔,該支撐件適於接觸該基板之該等表面中之一者並與其形成密封,該通氣孔使得能夠經由該空腔抽真空以對該基板施加應力。
- 如請求項32之裝置,其與該基板組合,該基板包括毗鄰該周邊邊緣佈置之塗層。
- 如請求項32之裝置,其中該室係用於施加磊晶層之磊晶室。
- 一種用於使半導體基板彎曲之裝置,該基板具有前表面、背表面及周邊邊緣,該基板可在大致平面位置與彎曲位置之間移動,該裝置包含:室,用於加熱該室之加熱器,用於在該基板兩端產生足以對該基板施加應力之壓力差之壓力調節器,安裝於該室中之基板夾具,該夾具包括:具有複數個貫穿其之孔之凹形支撐件,該壓力調節器適於經由該等孔抽真空以藉此將該基板拉入該凹形支撐件中。
- 如請求項43之裝置,其中該凹形支撐件包括用於在該基板之平面位置處接觸該基板之一部分之上部分,且其中當該基板在其彎曲位置處時該基板之相對較大部分接觸該凹形支撐件。
- 如請求項43之裝置,其進一步包含與第一參考支撐件相對佈置並與其間隔開之第二凹形支撐件。
- 如請求項43之裝置,其進一步包含與該凹形支撐件相對佈置並與其間隔開之環形支撐件。
- 如請求項46之裝置,其中該環形支撐件包括空腔及通氣孔,該支撐件適於接觸該基板之該等表面中之一者並與其形成密封, 該空腔及該通氣孔使得能夠經由其來抽真空以對該基板施加應力。
- 如請求項46之裝置,其中該環形支撐件適於僅毗鄰該基板之該周邊邊緣接觸該基板。
- 如請求項43之裝置,其與該基板組合,該基板包括毗鄰該周邊邊緣佈置之塗層。
- 如請求項43之裝置,其中該室係用於施加磊晶層之磊晶室。
- 一種用於供壓至半導體基板之裝置,該基板具有中心軸、大致垂直於該中心軸之前表面及背表面及自該前表面延伸至該背表面之周邊邊緣,該裝置包含:室,用於加熱該室之加熱器,安裝於該室中之基板夾具,該夾具包括:大致平面背支撐件,用於容納及壓縮該基板之壓件,該壓件適於在該基板之周邊邊緣處朝向其中心軸徑向向內大致均勻地壓縮該基板。
- 如請求項51之裝置,其中該基板係大致圓形且該壓件包括用於容納該基板之大致圓形開口。
- 如請求項52之裝置,其中該壓件包括複數個形成用於容納該基板之該開口之弧形區段,該等區段可向內移動以壓縮該基板。
- 如請求項51之裝置,其進一步包含用於在該基板兩端產生足以對該基板施加應力之壓力差之壓力調節器,該基板夾具進一步包括:前環及背環,每一環包括毗鄰該基板之周邊邊緣在離散徑向位置處接觸該基板之環形支撐件,該前環適於接觸該基板之該前表面且 該背環適於接觸該背表面。
- 如請求項54之裝置,其中該前環及該背環適於與該基板形成密封以促使在該基板兩端產生壓力差。
- 如請求項54之裝置,其中該環形支撐件包括實質上密封之空腔及單一通氣孔,該支撐件適於接觸該基板之該等表面中之一者並與其形成密封,該通氣孔使得能夠經由該空腔抽真空以對該基板施加應力。
- 如請求項52之裝置,其中該壓件由擴張率小於該基板之材料製成,以使得施加至該基板及該壓件之熱將使該基板壓縮。
- 如請求項52之裝置,其與該基板組合,該基板包括毗鄰該周邊邊緣佈置之塗層。
- 如請求項52之裝置,其中該室係用於施加磊晶層之磊晶室。
- 一種用於使半導體結構徑向膨脹之裝置,該半導體結構具有前表面、背表面、圓周邊緣及中心軸,該裝置包含:向內指向中心軸之三角形區段,該等區段經組態用於自該中心軸向外移動以使該結構膨脹;及在每一區段中形成之用於在該區段與該結構之間形成真空之流體通道。
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TW102149282A TW201438135A (zh) | 2012-12-31 | 2013-12-31 | 用於供壓至半導體基板之裝置 |
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Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
TWI638387B (zh) * | 2015-12-01 | 2018-10-11 | 世創電子材料公司 | 在沉積室中製造具有磊晶層的半導體晶圓的方法、用於製造具有磊晶層的半導體晶圓的設備、及具有磊晶層的半導體晶圓 |
Families Citing this family (202)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US20130023129A1 (en) | 2011-07-20 | 2013-01-24 | Asm America, Inc. | Pressure transmitter for a semiconductor processing environment |
US10714315B2 (en) | 2012-10-12 | 2020-07-14 | Asm Ip Holdings B.V. | Semiconductor reaction chamber showerhead |
US10361097B2 (en) | 2012-12-31 | 2019-07-23 | Globalwafers Co., Ltd. | Apparatus for stressing semiconductor substrates |
US20160376700A1 (en) | 2013-02-01 | 2016-12-29 | Asm Ip Holding B.V. | System for treatment of deposition reactor |
WO2014191624A1 (en) * | 2013-05-29 | 2014-12-04 | Beneq Oy | Substrate holder and arrangement for holding substrates |
WO2014191621A1 (en) * | 2013-05-29 | 2014-12-04 | Beneq Oy | Substrate carrier and arrangement for supporting substrates |
US10941490B2 (en) | 2014-10-07 | 2021-03-09 | Asm Ip Holding B.V. | Multiple temperature range susceptor, assembly, reactor and system including the susceptor, and methods of using the same |
US10276355B2 (en) | 2015-03-12 | 2019-04-30 | Asm Ip Holding B.V. | Multi-zone reactor, system including the reactor, and method of using the same |
US10458018B2 (en) | 2015-06-26 | 2019-10-29 | Asm Ip Holding B.V. | Structures including metal carbide material, devices including the structures, and methods of forming same |
US10211308B2 (en) | 2015-10-21 | 2019-02-19 | Asm Ip Holding B.V. | NbMC layers |
US11139308B2 (en) | 2015-12-29 | 2021-10-05 | Asm Ip Holding B.V. | Atomic layer deposition of III-V compounds to form V-NAND devices |
US10529554B2 (en) | 2016-02-19 | 2020-01-07 | Asm Ip Holding B.V. | Method for forming silicon nitride film selectively on sidewalls or flat surfaces of trenches |
US11453943B2 (en) | 2016-05-25 | 2022-09-27 | Asm Ip Holding B.V. | Method for forming carbon-containing silicon/metal oxide or nitride film by ALD using silicon precursor and hydrocarbon precursor |
US9859151B1 (en) | 2016-07-08 | 2018-01-02 | Asm Ip Holding B.V. | Selective film deposition method to form air gaps |
US10612137B2 (en) | 2016-07-08 | 2020-04-07 | Asm Ip Holdings B.V. | Organic reactants for atomic layer deposition |
CN107623028B (zh) * | 2016-07-13 | 2021-02-19 | 环球晶圆股份有限公司 | 半导体基板及其加工方法 |
US9812320B1 (en) | 2016-07-28 | 2017-11-07 | Asm Ip Holding B.V. | Method and apparatus for filling a gap |
US9887082B1 (en) | 2016-07-28 | 2018-02-06 | Asm Ip Holding B.V. | Method and apparatus for filling a gap |
WO2018037799A1 (ja) * | 2016-08-25 | 2018-03-01 | 日本ゼオン株式会社 | プラズマエッチング方法 |
US11532757B2 (en) | 2016-10-27 | 2022-12-20 | Asm Ip Holding B.V. | Deposition of charge trapping layers |
US10714350B2 (en) | 2016-11-01 | 2020-07-14 | ASM IP Holdings, B.V. | Methods for forming a transition metal niobium nitride film on a substrate by atomic layer deposition and related semiconductor device structures |
KR102546317B1 (ko) | 2016-11-15 | 2023-06-21 | 에이에스엠 아이피 홀딩 비.브이. | 기체 공급 유닛 및 이를 포함하는 기판 처리 장치 |
KR20180068582A (ko) | 2016-12-14 | 2018-06-22 | 에이에스엠 아이피 홀딩 비.브이. | 기판 처리 장치 |
US11581186B2 (en) | 2016-12-15 | 2023-02-14 | Asm Ip Holding B.V. | Sequential infiltration synthesis apparatus |
US11447861B2 (en) | 2016-12-15 | 2022-09-20 | Asm Ip Holding B.V. | Sequential infiltration synthesis apparatus and a method of forming a patterned structure |
US10269558B2 (en) | 2016-12-22 | 2019-04-23 | Asm Ip Holding B.V. | Method of forming a structure on a substrate |
US10068787B2 (en) * | 2016-12-30 | 2018-09-04 | Sunpower Corporation | Bowing semiconductor wafers |
US11390950B2 (en) | 2017-01-10 | 2022-07-19 | Asm Ip Holding B.V. | Reactor system and method to reduce residue buildup during a film deposition process |
US10468261B2 (en) | 2017-02-15 | 2019-11-05 | Asm Ip Holding B.V. | Methods for forming a metallic film on a substrate by cyclical deposition and related semiconductor device structures |
US10770286B2 (en) | 2017-05-08 | 2020-09-08 | Asm Ip Holdings B.V. | Methods for selectively forming a silicon nitride film on a substrate and related semiconductor device structures |
KR102015336B1 (ko) * | 2017-06-12 | 2019-08-28 | 삼성전자주식회사 | 반도체 패키지 기판의 휨 감소 방법 및 휨 감소 장치 |
US11306395B2 (en) | 2017-06-28 | 2022-04-19 | Asm Ip Holding B.V. | Methods for depositing a transition metal nitride film on a substrate by atomic layer deposition and related deposition apparatus |
KR20190009245A (ko) | 2017-07-18 | 2019-01-28 | 에이에스엠 아이피 홀딩 비.브이. | 반도체 소자 구조물 형성 방법 및 관련된 반도체 소자 구조물 |
US11374112B2 (en) | 2017-07-19 | 2022-06-28 | Asm Ip Holding B.V. | Method for depositing a group IV semiconductor and related semiconductor device structures |
US10590535B2 (en) | 2017-07-26 | 2020-03-17 | Asm Ip Holdings B.V. | Chemical treatment, deposition and/or infiltration apparatus and method for using the same |
US10692741B2 (en) | 2017-08-08 | 2020-06-23 | Asm Ip Holdings B.V. | Radiation shield |
US10770336B2 (en) | 2017-08-08 | 2020-09-08 | Asm Ip Holding B.V. | Substrate lift mechanism and reactor including same |
US11769682B2 (en) | 2017-08-09 | 2023-09-26 | Asm Ip Holding B.V. | Storage apparatus for storing cassettes for substrates and processing apparatus equipped therewith |
US11830730B2 (en) | 2017-08-29 | 2023-11-28 | Asm Ip Holding B.V. | Layer forming method and apparatus |
US11295980B2 (en) | 2017-08-30 | 2022-04-05 | Asm Ip Holding B.V. | Methods for depositing a molybdenum metal film over a dielectric surface of a substrate by a cyclical deposition process and related semiconductor device structures |
US10658205B2 (en) | 2017-09-28 | 2020-05-19 | Asm Ip Holdings B.V. | Chemical dispensing apparatus and methods for dispensing a chemical to a reaction chamber |
US11127617B2 (en) | 2017-11-27 | 2021-09-21 | Asm Ip Holding B.V. | Storage device for storing wafer cassettes for use with a batch furnace |
CN111344522B (zh) | 2017-11-27 | 2022-04-12 | 阿斯莫Ip控股公司 | 包括洁净迷你环境的装置 |
US10872771B2 (en) | 2018-01-16 | 2020-12-22 | Asm Ip Holding B. V. | Method for depositing a material film on a substrate within a reaction chamber by a cyclical deposition process and related device structures |
TWI799494B (zh) | 2018-01-19 | 2023-04-21 | 荷蘭商Asm 智慧財產控股公司 | 沈積方法 |
CN111630203A (zh) | 2018-01-19 | 2020-09-04 | Asm Ip私人控股有限公司 | 通过等离子体辅助沉积来沉积间隙填充层的方法 |
US11081345B2 (en) | 2018-02-06 | 2021-08-03 | Asm Ip Holding B.V. | Method of post-deposition treatment for silicon oxide film |
US10896820B2 (en) | 2018-02-14 | 2021-01-19 | Asm Ip Holding B.V. | Method for depositing a ruthenium-containing film on a substrate by a cyclical deposition process |
US11685991B2 (en) | 2018-02-14 | 2023-06-27 | Asm Ip Holding B.V. | Method for depositing a ruthenium-containing film on a substrate by a cyclical deposition process |
KR102636427B1 (ko) | 2018-02-20 | 2024-02-13 | 에이에스엠 아이피 홀딩 비.브이. | 기판 처리 방법 및 장치 |
US10975470B2 (en) | 2018-02-23 | 2021-04-13 | Asm Ip Holding B.V. | Apparatus for detecting or monitoring for a chemical precursor in a high temperature environment |
US11473195B2 (en) | 2018-03-01 | 2022-10-18 | Asm Ip Holding B.V. | Semiconductor processing apparatus and a method for processing a substrate |
US11629406B2 (en) | 2018-03-09 | 2023-04-18 | Asm Ip Holding B.V. | Semiconductor processing apparatus comprising one or more pyrometers for measuring a temperature of a substrate during transfer of the substrate |
KR102646467B1 (ko) | 2018-03-27 | 2024-03-11 | 에이에스엠 아이피 홀딩 비.브이. | 기판 상에 전극을 형성하는 방법 및 전극을 포함하는 반도체 소자 구조 |
US11230766B2 (en) | 2018-03-29 | 2022-01-25 | Asm Ip Holding B.V. | Substrate processing apparatus and method |
KR20190128558A (ko) | 2018-05-08 | 2019-11-18 | 에이에스엠 아이피 홀딩 비.브이. | 기판 상에 산화물 막을 주기적 증착 공정에 의해 증착하기 위한 방법 및 관련 소자 구조 |
KR102596988B1 (ko) | 2018-05-28 | 2023-10-31 | 에이에스엠 아이피 홀딩 비.브이. | 기판 처리 방법 및 그에 의해 제조된 장치 |
US11201079B2 (en) * | 2018-05-30 | 2021-12-14 | Taiwan Semiconductor Manufacturing Company, Ltd. | Wafer chuck |
US11270899B2 (en) | 2018-06-04 | 2022-03-08 | Asm Ip Holding B.V. | Wafer handling chamber with moisture reduction |
US11718913B2 (en) | 2018-06-04 | 2023-08-08 | Asm Ip Holding B.V. | Gas distribution system and reactor system including same |
US11286562B2 (en) | 2018-06-08 | 2022-03-29 | Asm Ip Holding B.V. | Gas-phase chemical reactor and method of using same |
US10797133B2 (en) | 2018-06-21 | 2020-10-06 | Asm Ip Holding B.V. | Method for depositing a phosphorus doped silicon arsenide film and related semiconductor device structures |
KR102568797B1 (ko) | 2018-06-21 | 2023-08-21 | 에이에스엠 아이피 홀딩 비.브이. | 기판 처리 시스템 |
JP2021529254A (ja) | 2018-06-27 | 2021-10-28 | エーエスエム・アイピー・ホールディング・ベー・フェー | 金属含有材料ならびに金属含有材料を含む膜および構造体を形成するための周期的堆積方法 |
WO2020003000A1 (en) | 2018-06-27 | 2020-01-02 | Asm Ip Holding B.V. | Cyclic deposition methods for forming metal-containing material and films and structures including the metal-containing material |
US10612136B2 (en) | 2018-06-29 | 2020-04-07 | ASM IP Holding, B.V. | Temperature-controlled flange and reactor system including same |
US10388513B1 (en) | 2018-07-03 | 2019-08-20 | Asm Ip Holding B.V. | Method for depositing silicon-free carbon-containing film as gap-fill layer by pulse plasma-assisted deposition |
US10755922B2 (en) | 2018-07-03 | 2020-08-25 | Asm Ip Holding B.V. | Method for depositing silicon-free carbon-containing film as gap-fill layer by pulse plasma-assisted deposition |
US11430674B2 (en) | 2018-08-22 | 2022-08-30 | Asm Ip Holding B.V. | Sensor array, apparatus for dispensing a vapor phase reactant to a reaction chamber and related methods |
US11024523B2 (en) | 2018-09-11 | 2021-06-01 | Asm Ip Holding B.V. | Substrate processing apparatus and method |
KR20200030162A (ko) | 2018-09-11 | 2020-03-20 | 에이에스엠 아이피 홀딩 비.브이. | 박막 증착 방법 |
CN110970344A (zh) | 2018-10-01 | 2020-04-07 | Asm Ip控股有限公司 | 衬底保持设备、包含所述设备的系统及其使用方法 |
US11232963B2 (en) | 2018-10-03 | 2022-01-25 | Asm Ip Holding B.V. | Substrate processing apparatus and method |
KR102592699B1 (ko) | 2018-10-08 | 2023-10-23 | 에이에스엠 아이피 홀딩 비.브이. | 기판 지지 유닛 및 이를 포함하는 박막 증착 장치와 기판 처리 장치 |
KR102605121B1 (ko) | 2018-10-19 | 2023-11-23 | 에이에스엠 아이피 홀딩 비.브이. | 기판 처리 장치 및 기판 처리 방법 |
KR102546322B1 (ko) | 2018-10-19 | 2023-06-21 | 에이에스엠 아이피 홀딩 비.브이. | 기판 처리 장치 및 기판 처리 방법 |
US11087997B2 (en) | 2018-10-31 | 2021-08-10 | Asm Ip Holding B.V. | Substrate processing apparatus for processing substrates |
KR20200051105A (ko) | 2018-11-02 | 2020-05-13 | 에이에스엠 아이피 홀딩 비.브이. | 기판 지지 유닛 및 이를 포함하는 기판 처리 장치 |
US11572620B2 (en) | 2018-11-06 | 2023-02-07 | Asm Ip Holding B.V. | Methods for selectively depositing an amorphous silicon film on a substrate |
US10818758B2 (en) | 2018-11-16 | 2020-10-27 | Asm Ip Holding B.V. | Methods for forming a metal silicate film on a substrate in a reaction chamber and related semiconductor device structures |
US11217444B2 (en) | 2018-11-30 | 2022-01-04 | Asm Ip Holding B.V. | Method for forming an ultraviolet radiation responsive metal oxide-containing film |
KR102636428B1 (ko) | 2018-12-04 | 2024-02-13 | 에이에스엠 아이피 홀딩 비.브이. | 기판 처리 장치를 세정하는 방법 |
US11158513B2 (en) | 2018-12-13 | 2021-10-26 | Asm Ip Holding B.V. | Methods for forming a rhenium-containing film on a substrate by a cyclical deposition process and related semiconductor device structures |
TW202037745A (zh) | 2018-12-14 | 2020-10-16 | 荷蘭商Asm Ip私人控股有限公司 | 形成裝置結構之方法、其所形成之結構及施行其之系統 |
TWI819180B (zh) | 2019-01-17 | 2023-10-21 | 荷蘭商Asm 智慧財產控股公司 | 藉由循環沈積製程於基板上形成含過渡金屬膜之方法 |
KR20200091543A (ko) | 2019-01-22 | 2020-07-31 | 에이에스엠 아이피 홀딩 비.브이. | 기판 처리 장치 |
KR20200102357A (ko) * | 2019-02-20 | 2020-08-31 | 에이에스엠 아이피 홀딩 비.브이. | 3-d nand 응용의 플러그 충진체 증착용 장치 및 방법 |
KR102638425B1 (ko) | 2019-02-20 | 2024-02-21 | 에이에스엠 아이피 홀딩 비.브이. | 기판 표면 내에 형성된 오목부를 충진하기 위한 방법 및 장치 |
KR102626263B1 (ko) | 2019-02-20 | 2024-01-16 | 에이에스엠 아이피 홀딩 비.브이. | 처리 단계를 포함하는 주기적 증착 방법 및 이를 위한 장치 |
JP2020136677A (ja) | 2019-02-20 | 2020-08-31 | エーエスエム・アイピー・ホールディング・ベー・フェー | 基材表面内に形成された凹部を充填するための周期的堆積方法および装置 |
JP2020133004A (ja) | 2019-02-22 | 2020-08-31 | エーエスエム・アイピー・ホールディング・ベー・フェー | 基材を処理するための基材処理装置および方法 |
KR20200108242A (ko) | 2019-03-08 | 2020-09-17 | 에이에스엠 아이피 홀딩 비.브이. | 실리콘 질화물 층을 선택적으로 증착하는 방법, 및 선택적으로 증착된 실리콘 질화물 층을 포함하는 구조체 |
US11742198B2 (en) | 2019-03-08 | 2023-08-29 | Asm Ip Holding B.V. | Structure including SiOCN layer and method of forming same |
KR20200110047A (ko) * | 2019-03-15 | 2020-09-23 | 주식회사 케이씨텍 | 기판 처리 장치 |
JP7279465B2 (ja) * | 2019-03-28 | 2023-05-23 | 住友金属鉱山株式会社 | 支持基板、支持基板の保持方法、及び、成膜方法 |
JP2020167398A (ja) | 2019-03-28 | 2020-10-08 | エーエスエム・アイピー・ホールディング・ベー・フェー | ドアオープナーおよびドアオープナーが提供される基材処理装置 |
KR20200116855A (ko) | 2019-04-01 | 2020-10-13 | 에이에스엠 아이피 홀딩 비.브이. | 반도체 소자를 제조하는 방법 |
KR20200123380A (ko) | 2019-04-19 | 2020-10-29 | 에이에스엠 아이피 홀딩 비.브이. | 층 형성 방법 및 장치 |
KR20200125453A (ko) | 2019-04-24 | 2020-11-04 | 에이에스엠 아이피 홀딩 비.브이. | 기상 반응기 시스템 및 이를 사용하는 방법 |
KR20200130118A (ko) | 2019-05-07 | 2020-11-18 | 에이에스엠 아이피 홀딩 비.브이. | 비정질 탄소 중합체 막을 개질하는 방법 |
KR20200130121A (ko) | 2019-05-07 | 2020-11-18 | 에이에스엠 아이피 홀딩 비.브이. | 딥 튜브가 있는 화학물질 공급원 용기 |
KR20200130652A (ko) | 2019-05-10 | 2020-11-19 | 에이에스엠 아이피 홀딩 비.브이. | 표면 상에 재료를 증착하는 방법 및 본 방법에 따라 형성된 구조 |
JP2020188254A (ja) | 2019-05-16 | 2020-11-19 | エーエスエム アイピー ホールディング ビー.ブイ. | ウェハボートハンドリング装置、縦型バッチ炉および方法 |
JP2020188255A (ja) | 2019-05-16 | 2020-11-19 | エーエスエム アイピー ホールディング ビー.ブイ. | ウェハボートハンドリング装置、縦型バッチ炉および方法 |
USD975665S1 (en) | 2019-05-17 | 2023-01-17 | Asm Ip Holding B.V. | Susceptor shaft |
USD947913S1 (en) | 2019-05-17 | 2022-04-05 | Asm Ip Holding B.V. | Susceptor shaft |
KR20200141002A (ko) | 2019-06-06 | 2020-12-17 | 에이에스엠 아이피 홀딩 비.브이. | 배기 가스 분석을 포함한 기상 반응기 시스템을 사용하는 방법 |
KR20200143254A (ko) | 2019-06-11 | 2020-12-23 | 에이에스엠 아이피 홀딩 비.브이. | 개질 가스를 사용하여 전자 구조를 형성하는 방법, 상기 방법을 수행하기 위한 시스템, 및 상기 방법을 사용하여 형성되는 구조 |
USD944946S1 (en) | 2019-06-14 | 2022-03-01 | Asm Ip Holding B.V. | Shower plate |
KR20210005515A (ko) | 2019-07-03 | 2021-01-14 | 에이에스엠 아이피 홀딩 비.브이. | 기판 처리 장치용 온도 제어 조립체 및 이를 사용하는 방법 |
JP2021015791A (ja) | 2019-07-09 | 2021-02-12 | エーエスエム アイピー ホールディング ビー.ブイ. | 同軸導波管を用いたプラズマ装置、基板処理方法 |
CN112216646A (zh) | 2019-07-10 | 2021-01-12 | Asm Ip私人控股有限公司 | 基板支撑组件及包括其的基板处理装置 |
KR20210010307A (ko) | 2019-07-16 | 2021-01-27 | 에이에스엠 아이피 홀딩 비.브이. | 기판 처리 장치 |
KR20210010820A (ko) | 2019-07-17 | 2021-01-28 | 에이에스엠 아이피 홀딩 비.브이. | 실리콘 게르마늄 구조를 형성하는 방법 |
KR20210010816A (ko) | 2019-07-17 | 2021-01-28 | 에이에스엠 아이피 홀딩 비.브이. | 라디칼 보조 점화 플라즈마 시스템 및 방법 |
US11643724B2 (en) | 2019-07-18 | 2023-05-09 | Asm Ip Holding B.V. | Method of forming structures using a neutral beam |
CN112242296A (zh) | 2019-07-19 | 2021-01-19 | Asm Ip私人控股有限公司 | 形成拓扑受控的无定形碳聚合物膜的方法 |
CN112309843A (zh) | 2019-07-29 | 2021-02-02 | Asm Ip私人控股有限公司 | 实现高掺杂剂掺入的选择性沉积方法 |
CN112309899A (zh) | 2019-07-30 | 2021-02-02 | Asm Ip私人控股有限公司 | 基板处理设备 |
CN112309900A (zh) | 2019-07-30 | 2021-02-02 | Asm Ip私人控股有限公司 | 基板处理设备 |
US11587814B2 (en) | 2019-07-31 | 2023-02-21 | Asm Ip Holding B.V. | Vertical batch furnace assembly |
US11227782B2 (en) | 2019-07-31 | 2022-01-18 | Asm Ip Holding B.V. | Vertical batch furnace assembly |
US11587815B2 (en) | 2019-07-31 | 2023-02-21 | Asm Ip Holding B.V. | Vertical batch furnace assembly |
CN112323048B (zh) | 2019-08-05 | 2024-02-09 | Asm Ip私人控股有限公司 | 用于化学源容器的液位传感器 |
USD965044S1 (en) | 2019-08-19 | 2022-09-27 | Asm Ip Holding B.V. | Susceptor shaft |
USD965524S1 (en) | 2019-08-19 | 2022-10-04 | Asm Ip Holding B.V. | Susceptor support |
JP2021031769A (ja) | 2019-08-21 | 2021-03-01 | エーエスエム アイピー ホールディング ビー.ブイ. | 成膜原料混合ガス生成装置及び成膜装置 |
USD940837S1 (en) | 2019-08-22 | 2022-01-11 | Asm Ip Holding B.V. | Electrode |
USD979506S1 (en) | 2019-08-22 | 2023-02-28 | Asm Ip Holding B.V. | Insulator |
KR20210024423A (ko) | 2019-08-22 | 2021-03-05 | 에이에스엠 아이피 홀딩 비.브이. | 홀을 구비한 구조체를 형성하기 위한 방법 |
USD949319S1 (en) | 2019-08-22 | 2022-04-19 | Asm Ip Holding B.V. | Exhaust duct |
US11286558B2 (en) | 2019-08-23 | 2022-03-29 | Asm Ip Holding B.V. | Methods for depositing a molybdenum nitride film on a surface of a substrate by a cyclical deposition process and related semiconductor device structures including a molybdenum nitride film |
KR20210024420A (ko) | 2019-08-23 | 2021-03-05 | 에이에스엠 아이피 홀딩 비.브이. | 비스(디에틸아미노)실란을 사용하여 peald에 의해 개선된 품질을 갖는 실리콘 산화물 막을 증착하기 위한 방법 |
KR20210029090A (ko) | 2019-09-04 | 2021-03-15 | 에이에스엠 아이피 홀딩 비.브이. | 희생 캡핑 층을 이용한 선택적 증착 방법 |
KR20210029663A (ko) | 2019-09-05 | 2021-03-16 | 에이에스엠 아이피 홀딩 비.브이. | 기판 처리 장치 |
US11562901B2 (en) | 2019-09-25 | 2023-01-24 | Asm Ip Holding B.V. | Substrate processing method |
CN112593212B (zh) | 2019-10-02 | 2023-12-22 | Asm Ip私人控股有限公司 | 通过循环等离子体增强沉积工艺形成拓扑选择性氧化硅膜的方法 |
TW202129060A (zh) | 2019-10-08 | 2021-08-01 | 荷蘭商Asm Ip控股公司 | 基板處理裝置、及基板處理方法 |
KR20210043460A (ko) | 2019-10-10 | 2021-04-21 | 에이에스엠 아이피 홀딩 비.브이. | 포토레지스트 하부층을 형성하기 위한 방법 및 이를 포함한 구조체 |
KR20210045930A (ko) | 2019-10-16 | 2021-04-27 | 에이에스엠 아이피 홀딩 비.브이. | 실리콘 산화물의 토폴로지-선택적 막의 형성 방법 |
US11637014B2 (en) | 2019-10-17 | 2023-04-25 | Asm Ip Holding B.V. | Methods for selective deposition of doped semiconductor material |
KR20210047808A (ko) | 2019-10-21 | 2021-04-30 | 에이에스엠 아이피 홀딩 비.브이. | 막을 선택적으로 에칭하기 위한 장치 및 방법 |
US11328944B2 (en) * | 2019-10-23 | 2022-05-10 | Eugenus, Inc. | Systems and methods of placing substrates in semiconductor manufacturing equipment |
KR20210050453A (ko) | 2019-10-25 | 2021-05-07 | 에이에스엠 아이피 홀딩 비.브이. | 기판 표면 상의 갭 피처를 충진하는 방법 및 이와 관련된 반도체 소자 구조 |
US11646205B2 (en) | 2019-10-29 | 2023-05-09 | Asm Ip Holding B.V. | Methods of selectively forming n-type doped material on a surface, systems for selectively forming n-type doped material, and structures formed using same |
KR20210054983A (ko) | 2019-11-05 | 2021-05-14 | 에이에스엠 아이피 홀딩 비.브이. | 도핑된 반도체 층을 갖는 구조체 및 이를 형성하기 위한 방법 및 시스템 |
US11501968B2 (en) | 2019-11-15 | 2022-11-15 | Asm Ip Holding B.V. | Method for providing a semiconductor device with silicon filled gaps |
KR20210062561A (ko) | 2019-11-20 | 2021-05-31 | 에이에스엠 아이피 홀딩 비.브이. | 기판의 표면 상에 탄소 함유 물질을 증착하는 방법, 상기 방법을 사용하여 형성된 구조물, 및 상기 구조물을 형성하기 위한 시스템 |
KR20210065848A (ko) | 2019-11-26 | 2021-06-04 | 에이에스엠 아이피 홀딩 비.브이. | 제1 유전체 표면과 제2 금속성 표면을 포함한 기판 상에 타겟 막을 선택적으로 형성하기 위한 방법 |
CN112951697A (zh) | 2019-11-26 | 2021-06-11 | Asm Ip私人控股有限公司 | 基板处理设备 |
CN112885693A (zh) | 2019-11-29 | 2021-06-01 | Asm Ip私人控股有限公司 | 基板处理设备 |
CN112885692A (zh) | 2019-11-29 | 2021-06-01 | Asm Ip私人控股有限公司 | 基板处理设备 |
JP2021090042A (ja) | 2019-12-02 | 2021-06-10 | エーエスエム アイピー ホールディング ビー.ブイ. | 基板処理装置、基板処理方法 |
KR20210070898A (ko) | 2019-12-04 | 2021-06-15 | 에이에스엠 아이피 홀딩 비.브이. | 기판 처리 장치 |
US11885013B2 (en) | 2019-12-17 | 2024-01-30 | Asm Ip Holding B.V. | Method of forming vanadium nitride layer and structure including the vanadium nitride layer |
US11527403B2 (en) | 2019-12-19 | 2022-12-13 | Asm Ip Holding B.V. | Methods for filling a gap feature on a substrate surface and related semiconductor structures |
JP2021109175A (ja) | 2020-01-06 | 2021-08-02 | エーエスエム・アイピー・ホールディング・ベー・フェー | ガス供給アセンブリ、その構成要素、およびこれを含む反応器システム |
US11993847B2 (en) | 2020-01-08 | 2024-05-28 | Asm Ip Holding B.V. | Injector |
US11791192B2 (en) * | 2020-01-19 | 2023-10-17 | Taiwan Semiconductor Manufacturing Company, Ltd. | Workpiece holder, wafer chuck, wafer holding method |
KR20210095050A (ko) | 2020-01-20 | 2021-07-30 | 에이에스엠 아이피 홀딩 비.브이. | 박막 형성 방법 및 박막 표면 개질 방법 |
TW202130846A (zh) | 2020-02-03 | 2021-08-16 | 荷蘭商Asm Ip私人控股有限公司 | 形成包括釩或銦層的結構之方法 |
KR20210100010A (ko) | 2020-02-04 | 2021-08-13 | 에이에스엠 아이피 홀딩 비.브이. | 대형 물품의 투과율 측정을 위한 방법 및 장치 |
US11776846B2 (en) | 2020-02-07 | 2023-10-03 | Asm Ip Holding B.V. | Methods for depositing gap filling fluids and related systems and devices |
TW202146715A (zh) | 2020-02-17 | 2021-12-16 | 荷蘭商Asm Ip私人控股有限公司 | 用於生長磷摻雜矽層之方法及其系統 |
TW202203344A (zh) | 2020-02-28 | 2022-01-16 | 荷蘭商Asm Ip控股公司 | 專用於零件清潔的系統 |
US11876356B2 (en) | 2020-03-11 | 2024-01-16 | Asm Ip Holding B.V. | Lockout tagout assembly and system and method of using same |
KR20210116240A (ko) | 2020-03-11 | 2021-09-27 | 에이에스엠 아이피 홀딩 비.브이. | 조절성 접합부를 갖는 기판 핸들링 장치 |
KR20210117157A (ko) | 2020-03-12 | 2021-09-28 | 에이에스엠 아이피 홀딩 비.브이. | 타겟 토폴로지 프로파일을 갖는 층 구조를 제조하기 위한 방법 |
KR20210124042A (ko) | 2020-04-02 | 2021-10-14 | 에이에스엠 아이피 홀딩 비.브이. | 박막 형성 방법 |
TW202146689A (zh) | 2020-04-03 | 2021-12-16 | 荷蘭商Asm Ip控股公司 | 阻障層形成方法及半導體裝置的製造方法 |
TW202145344A (zh) | 2020-04-08 | 2021-12-01 | 荷蘭商Asm Ip私人控股有限公司 | 用於選擇性蝕刻氧化矽膜之設備及方法 |
US11821078B2 (en) | 2020-04-15 | 2023-11-21 | Asm Ip Holding B.V. | Method for forming precoat film and method for forming silicon-containing film |
US11996289B2 (en) | 2020-04-16 | 2024-05-28 | Asm Ip Holding B.V. | Methods of forming structures including silicon germanium and silicon layers, devices formed using the methods, and systems for performing the methods |
KR20210132600A (ko) | 2020-04-24 | 2021-11-04 | 에이에스엠 아이피 홀딩 비.브이. | 바나듐, 질소 및 추가 원소를 포함한 층을 증착하기 위한 방법 및 시스템 |
JP2021172884A (ja) | 2020-04-24 | 2021-11-01 | エーエスエム・アイピー・ホールディング・ベー・フェー | 窒化バナジウム含有層を形成する方法および窒化バナジウム含有層を含む構造体 |
KR20210132605A (ko) | 2020-04-24 | 2021-11-04 | 에이에스엠 아이피 홀딩 비.브이. | 냉각 가스 공급부를 포함한 수직형 배치 퍼니스 어셈블리 |
KR20210134226A (ko) | 2020-04-29 | 2021-11-09 | 에이에스엠 아이피 홀딩 비.브이. | 고체 소스 전구체 용기 |
KR20210134869A (ko) | 2020-05-01 | 2021-11-11 | 에이에스엠 아이피 홀딩 비.브이. | Foup 핸들러를 이용한 foup의 빠른 교환 |
KR20210141379A (ko) | 2020-05-13 | 2021-11-23 | 에이에스엠 아이피 홀딩 비.브이. | 반응기 시스템용 레이저 정렬 고정구 |
KR20210143653A (ko) | 2020-05-19 | 2021-11-29 | 에이에스엠 아이피 홀딩 비.브이. | 기판 처리 장치 |
KR20210145078A (ko) | 2020-05-21 | 2021-12-01 | 에이에스엠 아이피 홀딩 비.브이. | 다수의 탄소 층을 포함한 구조체 및 이를 형성하고 사용하는 방법 |
TW202200837A (zh) | 2020-05-22 | 2022-01-01 | 荷蘭商Asm Ip私人控股有限公司 | 用於在基材上形成薄膜之反應系統 |
TW202201602A (zh) | 2020-05-29 | 2022-01-01 | 荷蘭商Asm Ip私人控股有限公司 | 基板處理方法 |
TW202218133A (zh) | 2020-06-24 | 2022-05-01 | 荷蘭商Asm Ip私人控股有限公司 | 形成含矽層之方法 |
TW202217953A (zh) | 2020-06-30 | 2022-05-01 | 荷蘭商Asm Ip私人控股有限公司 | 基板處理方法 |
KR20220010438A (ko) | 2020-07-17 | 2022-01-25 | 에이에스엠 아이피 홀딩 비.브이. | 포토리소그래피에 사용하기 위한 구조체 및 방법 |
TW202204662A (zh) | 2020-07-20 | 2022-02-01 | 荷蘭商Asm Ip私人控股有限公司 | 用於沉積鉬層之方法及系統 |
TW202212623A (zh) | 2020-08-26 | 2022-04-01 | 荷蘭商Asm Ip私人控股有限公司 | 形成金屬氧化矽層及金屬氮氧化矽層的方法、半導體結構、及系統 |
USD990534S1 (en) | 2020-09-11 | 2023-06-27 | Asm Ip Holding B.V. | Weighted lift pin |
USD1012873S1 (en) | 2020-09-24 | 2024-01-30 | Asm Ip Holding B.V. | Electrode for semiconductor processing apparatus |
TW202229613A (zh) | 2020-10-14 | 2022-08-01 | 荷蘭商Asm Ip私人控股有限公司 | 於階梯式結構上沉積材料的方法 |
KR20220053482A (ko) | 2020-10-22 | 2022-04-29 | 에이에스엠 아이피 홀딩 비.브이. | 바나듐 금속을 증착하는 방법, 구조체, 소자 및 증착 어셈블리 |
TW202223136A (zh) | 2020-10-28 | 2022-06-16 | 荷蘭商Asm Ip私人控股有限公司 | 用於在基板上形成層之方法、及半導體處理系統 |
TW202235675A (zh) | 2020-11-30 | 2022-09-16 | 荷蘭商Asm Ip私人控股有限公司 | 注入器、及基板處理設備 |
US11946137B2 (en) | 2020-12-16 | 2024-04-02 | Asm Ip Holding B.V. | Runout and wobble measurement fixtures |
TW202231903A (zh) | 2020-12-22 | 2022-08-16 | 荷蘭商Asm Ip私人控股有限公司 | 過渡金屬沉積方法、過渡金屬層、用於沉積過渡金屬於基板上的沉積總成 |
USD980814S1 (en) | 2021-05-11 | 2023-03-14 | Asm Ip Holding B.V. | Gas distributor for substrate processing apparatus |
USD981973S1 (en) | 2021-05-11 | 2023-03-28 | Asm Ip Holding B.V. | Reactor wall for substrate processing apparatus |
USD1023959S1 (en) | 2021-05-11 | 2024-04-23 | Asm Ip Holding B.V. | Electrode for substrate processing apparatus |
USD980813S1 (en) | 2021-05-11 | 2023-03-14 | Asm Ip Holding B.V. | Gas flow control plate for substrate processing apparatus |
USD990441S1 (en) | 2021-09-07 | 2023-06-27 | Asm Ip Holding B.V. | Gas flow control plate |
US20240035161A1 (en) * | 2022-07-26 | 2024-02-01 | Applied Materials, Inc. | Actively controlled pre-heat ring for process temperature control |
Family Cites Families (130)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS54112164A (en) | 1978-02-22 | 1979-09-01 | Nec Home Electronics Ltd | Manufacture of semiconductor device |
JPS54134564A (en) | 1978-04-12 | 1979-10-19 | Hitachi Ltd | Wafer dividing unit |
DE3110341C2 (de) | 1980-03-19 | 1983-11-17 | Hitachi, Ltd., Tokyo | Verfahren und Vorrichtung zum Ausrichten eines dünnen Substrats in der Bildebene eines Kopiergerätes |
US4473455A (en) | 1981-12-21 | 1984-09-25 | At&T Bell Laboratories | Wafer holding apparatus and method |
JPS59117235A (ja) | 1982-12-24 | 1984-07-06 | Hitachi Yonezawa Denshi Kk | ウエハブレ−キング方法および装置 |
US4542298A (en) | 1983-06-09 | 1985-09-17 | Varian Associates, Inc. | Methods and apparatus for gas-assisted thermal transfer with a semiconductor wafer |
US4704886A (en) | 1985-04-22 | 1987-11-10 | Aluminum Company Of America | Stretch-forming process |
JPH0697674B2 (ja) * | 1986-02-19 | 1994-11-30 | キヤノン株式会社 | ボ−ル接触型ウエハチヤツク |
JPS62284707A (ja) | 1986-06-03 | 1987-12-10 | セイコーエプソン株式会社 | ウエハ−ブレ−キング装置 |
US4842683A (en) | 1986-12-19 | 1989-06-27 | Applied Materials, Inc. | Magnetic field-enhanced plasma etch reactor |
US5096536A (en) | 1990-06-12 | 1992-03-17 | Micron Technology, Inc. | Method and apparatus useful in the plasma etching of semiconductor materials |
DE4024576A1 (de) * | 1990-08-02 | 1992-02-06 | Bosch Gmbh Robert | Vorrichtung zum einseitigen aetzen einer halbleiterscheibe |
KR0164618B1 (ko) * | 1992-02-13 | 1999-02-01 | 이노우에 쥰이치 | 플라즈마 처리방법 |
US5343012A (en) * | 1992-10-06 | 1994-08-30 | Hardy Walter N | Differentially pumped temperature controller for low pressure thin film fabrication process |
US5326725A (en) * | 1993-03-11 | 1994-07-05 | Applied Materials, Inc. | Clamping ring and susceptor therefor |
JPH0897159A (ja) | 1994-09-29 | 1996-04-12 | Handotai Process Kenkyusho:Kk | エピタキシャル成長方法および成長装置 |
US5868847A (en) | 1994-12-16 | 1999-02-09 | Applied Materials, Inc. | Clamp ring for shielding a substrate during film layer deposition |
JPH08176798A (ja) | 1994-12-27 | 1996-07-09 | Idoutai Tsushin Sentan Gijutsu Kenkyusho:Kk | 機能薄膜の製造方法 |
JP3220619B2 (ja) | 1995-05-24 | 2001-10-22 | 松下電器産業株式会社 | ガス伝熱プラズマ処理装置 |
US5618759A (en) | 1995-05-31 | 1997-04-08 | Texas Instruments Incorporated | Methods of and apparatus for immobilizing semiconductor wafers during sawing thereof |
US6093252A (en) | 1995-08-03 | 2000-07-25 | Asm America, Inc. | Process chamber with inner support |
JP3865803B2 (ja) * | 1995-08-29 | 2007-01-10 | 株式会社半導体エネルギー研究所 | 光処理方法および半導体装置の作製方法 |
JP3180208B2 (ja) | 1995-09-18 | 2001-06-25 | 株式会社新川 | ペレットピックアップ装置 |
JPH0992625A (ja) | 1995-09-20 | 1997-04-04 | Tokyo Electron Ltd | 熱処理用ボ−ト |
JP3477953B2 (ja) | 1995-10-18 | 2003-12-10 | 東京エレクトロン株式会社 | 熱処理装置 |
JP3725598B2 (ja) | 1996-01-12 | 2005-12-14 | 東芝セラミックス株式会社 | エピタキシャルウェハの製造方法 |
US6133550A (en) | 1996-03-22 | 2000-10-17 | Sandia Corporation | Method and apparatus for thermal processing of semiconductor substrates |
US5753566A (en) | 1996-05-23 | 1998-05-19 | Taiwan Semiconductor Manufactured Company, Ltd. | Method of spin-on-glass etchback using hot backside helium |
JPH10106907A (ja) | 1996-10-01 | 1998-04-24 | Canon Inc | 固相接合方法 |
US5789309A (en) | 1996-12-30 | 1998-08-04 | Memc Electronic Materials, Inc. | Method and system for monocrystalline epitaxial deposition |
US5936829A (en) | 1997-01-02 | 1999-08-10 | Cvc Products, Inc. | Thermally conductive chuck for vacuum processor |
DE19781631T1 (de) * | 1997-01-02 | 1999-04-01 | Cvc Products Inc | Wärmeleitendes Spannfutter für Vakuumbearbeitungsvorrichtung |
JP3257442B2 (ja) * | 1997-04-09 | 2002-02-18 | 松下電器産業株式会社 | 窒化ガリウム結晶の製造方法 |
US6113479A (en) * | 1997-07-25 | 2000-09-05 | Obsidian, Inc. | Wafer carrier for chemical mechanical planarization polishing |
JPH1154437A (ja) * | 1997-07-30 | 1999-02-26 | Kyocera Corp | 化合物半導体膜の形成方法 |
JP3662404B2 (ja) | 1997-11-19 | 2005-06-22 | 芝浦メカトロニクス株式会社 | ウエハシート引伸ばし装置およびそれを用いたペレットボンディング装置 |
JPH11154662A (ja) * | 1997-11-20 | 1999-06-08 | Seiko Instruments Inc | 半導体製造装置 |
DE19802977A1 (de) * | 1998-01-27 | 1999-07-29 | Forschungszentrum Juelich Gmbh | Verfahren zur Herstellung einer einkristallinen Schicht auf einem nicht gitterangepaßten Substrat, sowie eine oder mehrere solcher Schichten enthaltendes Bauelement |
JPH11240795A (ja) | 1998-02-27 | 1999-09-07 | Super Silicon Kenkyusho:Kk | エピタキシャル成長装置 |
JP3178517B2 (ja) | 1998-03-05 | 2001-06-18 | 日本電気株式会社 | パターン露光装置用試料台 |
CN1063224C (zh) * | 1998-06-16 | 2001-03-14 | 中国科学院化工冶金研究所 | 气升式周期浸没光照植物细胞组织器官培养方法及培养反应器 |
JP2000031253A (ja) | 1998-07-10 | 2000-01-28 | Komatsu Ltd | 基板処理装置及び方法 |
JP3544481B2 (ja) * | 1998-11-25 | 2004-07-21 | 東芝セラミックス株式会社 | 半導体製造用炭化珪素質組立ウェーハボート |
US6277198B1 (en) | 1999-06-04 | 2001-08-21 | Applied Materials, Inc. | Use of tapered shadow clamp ring to provide improved physical vapor deposition system |
US6513848B1 (en) | 1999-09-17 | 2003-02-04 | Applied Materials, Inc. | Hydraulically actuated wafer clamp |
US6191399B1 (en) | 2000-02-01 | 2001-02-20 | Asm America, Inc. | System of controlling the temperature of a processing chamber |
US6726537B1 (en) * | 2000-04-21 | 2004-04-27 | Agere Systems Inc. | Polishing carrier head |
KR20010111058A (ko) * | 2000-06-09 | 2001-12-15 | 조셉 제이. 스위니 | 전체 영역 온도 제어 정전기 척 및 그 제조방법 |
EP1184894B1 (en) * | 2000-08-29 | 2007-11-21 | Qimonda Dresden GmbH & Co. oHG | Method of operating a susceptor for semiconductor wafers |
TWI303084B (en) | 2000-09-08 | 2008-11-11 | Tokyo Electron Ltd | Shower head structure, film forming method, and gas processing apparauts |
KR100382491B1 (ko) * | 2000-11-28 | 2003-05-09 | 엘지전자 주식회사 | 유기 el의 새도우 마스크 |
US6649480B2 (en) | 2000-12-04 | 2003-11-18 | Amberwave Systems Corporation | Method of fabricating CMOS inverter and integrated circuits utilizing strained silicon surface channel MOSFETs |
FR2818254B1 (fr) | 2000-12-15 | 2003-02-28 | Immunotech Sa | Conditionnement pour colorants photosensibles |
US6855037B2 (en) | 2001-03-12 | 2005-02-15 | Asm-Nutool, Inc. | Method of sealing wafer backside for full-face electrochemical plating |
DE10111761A1 (de) * | 2001-03-12 | 2002-10-02 | Infineon Technologies Ag | Anordnung und Verfahren zum rückseitigen Kontaktieren eines Halbleitersubstrats |
US6743495B2 (en) | 2001-03-30 | 2004-06-01 | Memc Electronic Materials, Inc. | Thermal annealing process for producing silicon wafers with improved surface characteristics |
US6855649B2 (en) * | 2001-06-12 | 2005-02-15 | International Business Machines Corporation | Relaxed SiGe layers on Si or silicon-on-insulator substrates by ion implantation and thermal annealing |
US6930375B2 (en) * | 2001-06-22 | 2005-08-16 | Memc Electronic Materials, Inc. | Silicon on insulator structure having an epitaxial layer and intrinsic gettering |
TW554069B (en) | 2001-08-10 | 2003-09-21 | Ebara Corp | Plating device and method |
US6743296B2 (en) * | 2001-10-12 | 2004-06-01 | Taiwan Semiconductor Manufacturing Co., Ltd | Apparatus and method for self-centering a wafer in a sputter chamber |
JP2003204048A (ja) | 2002-01-09 | 2003-07-18 | Shin Etsu Handotai Co Ltd | Soiウエーハの製造方法及びsoiウエーハ |
JP2003234289A (ja) | 2002-02-12 | 2003-08-22 | Yoshihisa Hirose | 歪み緩和膜の製造方法、および、歪み緩和膜を有する積層体 |
KR100995715B1 (ko) | 2002-04-09 | 2010-11-19 | 파나소닉 주식회사 | 플라즈마 처리 방법 및 장치와 플라즈마 처리용 트레이 |
US20030209326A1 (en) * | 2002-05-07 | 2003-11-13 | Mattson Technology, Inc. | Process and system for heating semiconductor substrates in a processing chamber containing a susceptor |
JP2004146727A (ja) * | 2002-10-28 | 2004-05-20 | Tokyo Seimitsu Co Ltd | ウェーハの搬送方法 |
SG121819A1 (en) | 2002-11-12 | 2006-05-26 | Asml Netherlands Bv | Lithographic apparatus and device manufacturing method |
JP2004179452A (ja) | 2002-11-28 | 2004-06-24 | Shin Etsu Handotai Co Ltd | ヘテロエピタキシャルウエーハ |
US7972663B2 (en) | 2002-12-20 | 2011-07-05 | Applied Materials, Inc. | Method and apparatus for forming a high quality low temperature silicon nitride layer |
JP4487306B2 (ja) | 2003-03-17 | 2010-06-23 | Toto株式会社 | 複合構造物形成装置および形成方法 |
JP4325242B2 (ja) * | 2003-03-27 | 2009-09-02 | 富士電機デバイステクノロジー株式会社 | 半導体装置の製造方法 |
DE10318284A1 (de) | 2003-04-22 | 2004-11-25 | Forschungszentrum Jülich GmbH | Verfahren zur Herstellung einer verspannten Schicht auf einem Substrat und Schichtstruktur |
JP2004342819A (ja) | 2003-05-15 | 2004-12-02 | Toshiba Ceramics Co Ltd | 半導体基板およびその製造方法 |
JP4557505B2 (ja) | 2003-05-19 | 2010-10-06 | コバレントマテリアル株式会社 | 半導体基板の製造方法 |
US7223320B2 (en) * | 2003-06-12 | 2007-05-29 | Symbol Technologies, Inc. | Method and apparatus for expanding a semiconductor wafer |
US6951775B2 (en) * | 2003-06-28 | 2005-10-04 | International Business Machines Corporation | Method for forming interconnects on thin wafers |
US20050178336A1 (en) | 2003-07-15 | 2005-08-18 | Heng Liu | Chemical vapor deposition reactor having multiple inlets |
US7439158B2 (en) | 2003-07-21 | 2008-10-21 | Micron Technology, Inc. | Strained semiconductor by full wafer bonding |
US7824498B2 (en) | 2004-02-24 | 2010-11-02 | Applied Materials, Inc. | Coating for reducing contamination of substrates during processing |
JP2006080481A (ja) * | 2004-08-11 | 2006-03-23 | Canon Inc | 半導体基板及びその製造方法 |
WO2006033292A1 (ja) * | 2004-09-24 | 2006-03-30 | Shin-Etsu Handotai Co., Ltd. | 半導体ウェーハの製造方法 |
US7273800B2 (en) | 2004-11-01 | 2007-09-25 | International Business Machines Corporation | Hetero-integrated strained silicon n- and p-MOSFETs |
JP2006237262A (ja) * | 2005-02-24 | 2006-09-07 | Tokyo Electron Ltd | 加熱処理装置 |
US7642205B2 (en) | 2005-04-08 | 2010-01-05 | Mattson Technology, Inc. | Rapid thermal processing using energy transfer layers |
JP4666473B2 (ja) * | 2005-05-12 | 2011-04-06 | 大日本スクリーン製造株式会社 | 基板熱処理装置 |
JP5050374B2 (ja) | 2005-05-16 | 2012-10-17 | 富士電機株式会社 | 半導体装置の製造方法 |
US7262112B2 (en) | 2005-06-27 | 2007-08-28 | The Regents Of The University Of California | Method for producing dislocation-free strained crystalline films |
US20070049020A1 (en) | 2005-08-29 | 2007-03-01 | Applied Materials, Inc. | Method and apparatus for reducing tensile stress in a deposited layer |
EP1763069B1 (en) * | 2005-09-07 | 2016-04-13 | Soitec | Method for forming a semiconductor heterostructure |
US20080000579A1 (en) * | 2005-11-08 | 2008-01-03 | Giovanni Bortolato | Procedure and Equipment for Decoration of Objects by Sublimation Inks |
TWI276535B (en) * | 2005-12-07 | 2007-03-21 | Nano Prec Corp | Film attaching method and screen of rear projection television |
JP4851795B2 (ja) * | 2006-01-13 | 2012-01-11 | 株式会社ディスコ | ウエーハの分割装置 |
JP2007214199A (ja) | 2006-02-07 | 2007-08-23 | Canon Inc | 半導体基板及びその製造方法 |
US20070283884A1 (en) * | 2006-05-30 | 2007-12-13 | Applied Materials, Inc. | Ring assembly for substrate processing chamber |
EP1901345A1 (en) | 2006-08-30 | 2008-03-19 | Siltronic AG | Multilayered semiconductor wafer and process for manufacturing the same |
DE102006055038B4 (de) * | 2006-11-22 | 2012-12-27 | Siltronic Ag | Epitaxierte Halbleiterscheibe sowie Vorrichtung und Verfahren zur Herstellung einer epitaxierten Halbleiterscheibe |
US8580078B2 (en) | 2007-01-26 | 2013-11-12 | Lam Research Corporation | Bevel etcher with vacuum chuck |
JP2008198656A (ja) * | 2007-02-08 | 2008-08-28 | Shin Etsu Chem Co Ltd | 半導体基板の製造方法 |
US7732301B1 (en) | 2007-04-20 | 2010-06-08 | Pinnington Thomas Henry | Bonded intermediate substrate and method of making same |
JP2009016524A (ja) | 2007-07-04 | 2009-01-22 | Rohm Co Ltd | 薄膜形成装置及びZnO系薄膜 |
JP5024382B2 (ja) * | 2007-08-03 | 2012-09-12 | 信越半導体株式会社 | サセプタ及びシリコンエピタキシャルウェーハの製造方法 |
JP2009135430A (ja) * | 2007-10-10 | 2009-06-18 | Semiconductor Energy Lab Co Ltd | 半導体装置の作製方法 |
US8324063B2 (en) * | 2007-11-08 | 2012-12-04 | Sumco Corporation | Epitaxial film growing method, wafer supporting structure and susceptor |
JP5493863B2 (ja) * | 2007-11-08 | 2014-05-14 | 株式会社Sumco | エピタキシャルウェーハの製造方法 |
TW200935506A (en) * | 2007-11-16 | 2009-08-16 | Panasonic Corp | Plasma dicing apparatus and semiconductor chip manufacturing method |
EP2151852B1 (en) | 2008-08-06 | 2020-01-15 | Soitec | Relaxation and transfer of strained layers |
US8652260B2 (en) * | 2008-08-08 | 2014-02-18 | Taiwan Semiconductor Manufacturing Company, Ltd. | Apparatus for holding semiconductor wafers |
JP2010073782A (ja) * | 2008-09-17 | 2010-04-02 | Sumco Corp | 半導体ウェーハの熱処理方法 |
KR20100108418A (ko) | 2008-11-14 | 2010-10-06 | 도쿄엘렉트론가부시키가이샤 | 접합 장치 및 접합 방법 |
JP5161748B2 (ja) | 2008-12-16 | 2013-03-13 | 信越半導体株式会社 | 気相成長用サセプタ及び気相成長装置並びにエピタキシャルウェーハの製造方法 |
DE102009005182A1 (de) | 2009-01-15 | 2010-07-29 | Suss Microtec Test Systems Gmbh | Chuck und Verfahren zur Aufnahme und Halterung dünner Testsubstrate |
IT1392678B1 (it) | 2009-01-19 | 2012-03-16 | Valeo Spa | Dispositivo di sicurezza per maniglie di veicoli e maniglia di veicoli comprendente questo dispositivo di sicurezza |
JP5476006B2 (ja) | 2009-02-13 | 2014-04-23 | 株式会社国際電気セミコンダクターサービス | 基板処理装置、基板処理装置の基板保持具の固定部及び半導体装置の製造方法 |
JP2010189745A (ja) | 2009-02-20 | 2010-09-02 | Sumco Corp | 半導体ウェーハの製造方法 |
JP2011029303A (ja) | 2009-07-23 | 2011-02-10 | Panasonic Corp | 半導体装置及びその製造方法 |
JP2011035146A (ja) | 2009-07-31 | 2011-02-17 | Toppan Printing Co Ltd | 基板保持方法および基板処理装置 |
JP5480645B2 (ja) * | 2010-01-22 | 2014-04-23 | リンテック株式会社 | 支持フレーム |
US8747092B2 (en) * | 2010-01-22 | 2014-06-10 | Nanonex Corporation | Fast nanoimprinting apparatus using deformale mold |
JP5627649B2 (ja) | 2010-09-07 | 2014-11-19 | 株式会社東芝 | 窒化物半導体結晶層の製造方法 |
JP5810517B2 (ja) | 2010-12-02 | 2015-11-11 | 富士電機株式会社 | 吸着装置および吸着方法 |
JP5605264B2 (ja) * | 2011-02-23 | 2014-10-15 | 富士通株式会社 | 成膜方法及び成膜装置 |
SG10201601916TA (en) * | 2011-03-28 | 2016-04-28 | Applied Materials Inc | Method and apparatus for the selective deposition of epitaxial germanium stressor alloys |
KR20120119781A (ko) | 2011-04-22 | 2012-10-31 | 삼성전자주식회사 | 지지 유닛 및 이를 가지는 기판 처리 장치 |
EP2704182B1 (en) | 2011-04-26 | 2018-01-03 | Nikon Corporation | Substrate bonding apparatus and substrate bonding method |
US8397540B2 (en) * | 2011-05-05 | 2013-03-19 | Corning Incorporated | Methods and apparatus for reforming a glass sheet |
US9224904B1 (en) | 2011-07-24 | 2015-12-29 | Ananda Kumar | Composite substrates of silicon and ceramic |
JP5895676B2 (ja) * | 2012-04-09 | 2016-03-30 | 三菱電機株式会社 | 半導体装置の製造方法 |
US20140239529A1 (en) * | 2012-09-28 | 2014-08-28 | Nanonex Corporation | System and Methods For Nano-Scale Manufacturing |
US10361097B2 (en) * | 2012-12-31 | 2019-07-23 | Globalwafers Co., Ltd. | Apparatus for stressing semiconductor substrates |
US9230862B2 (en) | 2013-05-14 | 2016-01-05 | Texas Instruments Incorporated | Wafer die separation |
JP6384479B2 (ja) | 2013-06-28 | 2018-09-05 | 株式会社ニコン | 移動体装置及び露光装置、並びにデバイス製造方法 |
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