JP2012138364A - Euvプラズマ源ターゲット供給システム - Google Patents
Euvプラズマ源ターゲット供給システム Download PDFInfo
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- JP2012138364A JP2012138364A JP2012039168A JP2012039168A JP2012138364A JP 2012138364 A JP2012138364 A JP 2012138364A JP 2012039168 A JP2012039168 A JP 2012039168A JP 2012039168 A JP2012039168 A JP 2012039168A JP 2012138364 A JP2012138364 A JP 2012138364A
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- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05G—X-RAY TECHNIQUE
- H05G2/00—Apparatus or processes specially adapted for producing X-rays, not involving X-ray tubes, e.g. involving generation of a plasma
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- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05G—X-RAY TECHNIQUE
- H05G2/00—Apparatus or processes specially adapted for producing X-rays, not involving X-ray tubes, e.g. involving generation of a plasma
- H05G2/001—X-ray radiation generated from plasma
- H05G2/003—X-ray radiation generated from plasma being produced from a liquid or gas
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- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05G—X-RAY TECHNIQUE
- H05G2/00—Apparatus or processes specially adapted for producing X-rays, not involving X-ray tubes, e.g. involving generation of a plasma
- H05G2/001—X-ray radiation generated from plasma
- H05G2/003—X-ray radiation generated from plasma being produced from a liquid or gas
- H05G2/005—X-ray radiation generated from plasma being produced from a liquid or gas containing a metal as principal radiation generating component
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- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05G—X-RAY TECHNIQUE
- H05G2/00—Apparatus or processes specially adapted for producing X-rays, not involving X-ray tubes, e.g. involving generation of a plasma
- H05G2/001—X-ray radiation generated from plasma
- H05G2/003—X-ray radiation generated from plasma being produced from a liquid or gas
- H05G2/006—X-ray radiation generated from plasma being produced from a liquid or gas details of the ejection system, e.g. constructional details of the nozzle
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- Engineering & Computer Science (AREA)
- Optics & Photonics (AREA)
- Plasma & Fusion (AREA)
- X-Ray Techniques (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
Abstract
【解決手段】磁歪材料又は電歪材料を含むターゲット液滴形成機構と出力オリフィスで終端する液体プラズマ源材料通路と液滴形成噴出流又は選択経路に沿って通路を出る個々の液滴に電荷を印加する帯電機構と出力オリフィスとプラズマ開始部位の中間にあって液滴を選択経路から定期的に偏向させる液滴偏向器と入力開口部と出力オリフィスとを有する液体ターゲット材料供給通路を含む液体ターゲット材料供給機構と液体ターゲット材料内で外乱力を発生させる外乱起電力発生機構と出力オリフィスを有する液体ターゲット供給液滴形成機構と及び/又は出力オリフィスの周辺の湿潤障壁とを含むことができるEUVプラズマ形成ターゲット供給システム及び方法が開示される。
【選択図】図8
Description
本出願は、代理人整理番号第2004−0023−01号である2004年12月22日出願の「EUV光源光学素子」という名称の同時係属の米国特許出願第11/021,261号、代理人整理番号第2004−0088−01号である2004年11月1日出願の「EUVコレクタデブリ管理」という名称の米国特許出願第10/979,945号、代理人整理番号第2004−0064−01号である2004年11月1日出願の「LPP EUV光源」という名称の米国特許出願第10/979,919号、代理人整理番号第2004−0044−01号である「EUV光源」という名称の米国特許出願第10/900,839号、代理人整理番号第2003−0083−01号である「EUV光源用コレクタ」という名称の米国特許出願第10/798,740号に関連し、これらの開示内容は引用により本明細書に組み込まれ、更に、本出願は、代理人整理番号第2004−0097−01号である本出願と同日出願の「EUVプラズマ光源ターゲット供給ターゲット材料処理方法及び装置」という名称の同時係属の米国特許出願第11/067,073号に関連し、該特許の開示内容は引用により本明細書に組み込まれる。
92 液滴発生装置
94 帯電液滴
96 偏向プレート
102 帯電リング
114 出力ノズル
Claims (6)
- 液体ターゲット材料液滴の形態でターゲット液滴供給毛細管及び/又は出力オリフィスと協働する磁歪材料又は電歪材料を含むターゲット液滴形成機構を含むことを特徴とするEUVプラズマ形成ターゲット供給システム。
- 前記磁歪材料又は電歪材料は、半径方向の膨張及び収縮が前記毛細管と相互作用するように配置される、
ことを更に含む請求項1に記載のシステム。 - 入力開口部と出力オリフィスとを有する液体ターゲット材料供給通路を含む液体ターゲット材料供給機構と、
前記入力開口部と出力オリフィスとの中間にある前記液体ターゲット材料に印加された電界又は磁界もしくはその組み合わせの結果として前記液体ターゲット材料内で外乱力を発生させる外乱起電力発生機構と、
を含むことを特徴とするEUVターゲット供給システム。 - 前記外乱起電力発生機構が、
前記液体ターゲット材料を通る電流を発生させる電流発生機構と、
前記液体ターゲット材料を通る電流の流れの方向にほぼ直交した、前記液体ターゲット材料を通る磁界を発生させる磁界発生機構と、
を含む、
ことを更に含む請求項3に記載のシステム。 - 出力オリフィスを有する液体ターゲット供給液滴形成機構と、
前記出力オリフィスの周辺の湿潤障壁と、
を含む、
ことを特徴とするEUVターゲット供給システム。 - 前記湿潤障壁が、前記出力オリフィスから分離された液体回収構造を含む、
ことを更に含む請求項5に記載のシステム。
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US11/067,124 | 2005-02-25 | ||
US11/067,124 US7405416B2 (en) | 2005-02-25 | 2005-02-25 | Method and apparatus for EUV plasma source target delivery |
Related Parent Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2007557068A Division JP5455308B2 (ja) | 2005-02-25 | 2006-02-17 | Euvプラズマ源ターゲット供給方法及び装置 |
Publications (2)
Publication Number | Publication Date |
---|---|
JP2012138364A true JP2012138364A (ja) | 2012-07-19 |
JP5643779B2 JP5643779B2 (ja) | 2014-12-17 |
Family
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Family Applications (3)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2007557068A Expired - Fee Related JP5455308B2 (ja) | 2005-02-25 | 2006-02-17 | Euvプラズマ源ターゲット供給方法及び装置 |
JP2007557062A Active JP5490362B2 (ja) | 2005-02-25 | 2006-02-17 | Euv光源ターゲット材料を処理する方法及び装置 |
JP2012039168A Active JP5643779B2 (ja) | 2005-02-25 | 2012-02-24 | Euvプラズマ源ターゲット供給システム |
Family Applications Before (2)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2007557068A Expired - Fee Related JP5455308B2 (ja) | 2005-02-25 | 2006-02-17 | Euvプラズマ源ターゲット供給方法及び装置 |
JP2007557062A Active JP5490362B2 (ja) | 2005-02-25 | 2006-02-17 | Euv光源ターゲット材料を処理する方法及び装置 |
Country Status (5)
Country | Link |
---|---|
US (3) | US7405416B2 (ja) |
EP (1) | EP1867218B1 (ja) |
JP (3) | JP5455308B2 (ja) |
KR (1) | KR101235023B1 (ja) |
WO (1) | WO2006093693A2 (ja) |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
WO2015040674A1 (ja) * | 2013-09-17 | 2015-03-26 | ギガフォトン株式会社 | ターゲット供給装置およびeuv光生成装置 |
JP2020198306A (ja) * | 2015-03-11 | 2020-12-10 | ケーエルエー コーポレイション | 光維持プラズマ形成によって広帯域光を生成する光学システム |
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JP2020198306A (ja) * | 2015-03-11 | 2020-12-10 | ケーエルエー コーポレイション | 光維持プラズマ形成によって広帯域光を生成する光学システム |
Also Published As
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JP5643779B2 (ja) | 2014-12-17 |
US20080283776A1 (en) | 2008-11-20 |
US20060192154A1 (en) | 2006-08-31 |
WO2006093693A2 (en) | 2006-09-08 |
EP1867218B1 (en) | 2018-08-22 |
JP5455308B2 (ja) | 2014-03-26 |
JP2008532286A (ja) | 2008-08-14 |
EP1867218A4 (en) | 2011-07-06 |
KR20070110886A (ko) | 2007-11-20 |
WO2006093693A3 (en) | 2009-04-16 |
US7405416B2 (en) | 2008-07-29 |
US20060192155A1 (en) | 2006-08-31 |
EP1867218A2 (en) | 2007-12-19 |
US7838854B2 (en) | 2010-11-23 |
JP2008532228A (ja) | 2008-08-14 |
JP5490362B2 (ja) | 2014-05-14 |
US7122816B2 (en) | 2006-10-17 |
KR101235023B1 (ko) | 2013-02-21 |
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