JP2002520835A5 - - Google Patents

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Publication number
JP2002520835A5
JP2002520835A5 JP2000559278A JP2000559278A JP2002520835A5 JP 2002520835 A5 JP2002520835 A5 JP 2002520835A5 JP 2000559278 A JP2000559278 A JP 2000559278A JP 2000559278 A JP2000559278 A JP 2000559278A JP 2002520835 A5 JP2002520835 A5 JP 2002520835A5
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JP
Japan
Prior art keywords
chamber
interior region
showerhead
plasma source
reactive
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JP2000559278A
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English (en)
Japanese (ja)
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JP2002520835A (ja
JP4514336B2 (ja
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Priority claimed from US09/115,111 external-priority patent/US6182603B1/en
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Publication of JP2002520835A publication Critical patent/JP2002520835A/ja
Publication of JP2002520835A5 publication Critical patent/JP2002520835A5/ja
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Publication of JP4514336B2 publication Critical patent/JP4514336B2/ja
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

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JP2000559278A 1998-07-13 1999-07-13 基板処理装置及びその洗浄方法 Expired - Fee Related JP4514336B2 (ja)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US09/115,111 US6182603B1 (en) 1998-07-13 1998-07-13 Surface-treated shower head for use in a substrate processing chamber
US09/115,111 1998-07-13
PCT/US1999/015867 WO2000003064A1 (en) 1998-07-13 1999-07-13 Gas distributor plate for a processing apparatus

Publications (3)

Publication Number Publication Date
JP2002520835A JP2002520835A (ja) 2002-07-09
JP2002520835A5 true JP2002520835A5 (enExample) 2006-01-05
JP4514336B2 JP4514336B2 (ja) 2010-07-28

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Application Number Title Priority Date Filing Date
JP2000559278A Expired - Fee Related JP4514336B2 (ja) 1998-07-13 1999-07-13 基板処理装置及びその洗浄方法

Country Status (6)

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US (2) US6182603B1 (enExample)
EP (1) EP1102870A1 (enExample)
JP (1) JP4514336B2 (enExample)
KR (2) KR100729900B1 (enExample)
TW (1) TW585934B (enExample)
WO (1) WO2000003064A1 (enExample)

Families Citing this family (605)

* Cited by examiner, † Cited by third party
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