FR2580828B1 - Composition d'encre de photoresist liquide photodurcissable - Google Patents

Composition d'encre de photoresist liquide photodurcissable

Info

Publication number
FR2580828B1
FR2580828B1 FR868605511A FR8605511A FR2580828B1 FR 2580828 B1 FR2580828 B1 FR 2580828B1 FR 868605511 A FR868605511 A FR 868605511A FR 8605511 A FR8605511 A FR 8605511A FR 2580828 B1 FR2580828 B1 FR 2580828B1
Authority
FR
France
Prior art keywords
ink composition
liquid photoresist
photoresist ink
photosetting liquid
photosetting
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
FR868605511A
Other languages
English (en)
French (fr)
Other versions
FR2580828A1 (fr
Inventor
Yuichi Kamayachi
Syoji Inagaki
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Taiyo Holdings Co Ltd
Original Assignee
Taiyo Ink Mfg Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Taiyo Ink Mfg Co Ltd filed Critical Taiyo Ink Mfg Co Ltd
Publication of FR2580828A1 publication Critical patent/FR2580828A1/fr
Application granted granted Critical
Publication of FR2580828B1 publication Critical patent/FR2580828B1/fr
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable
    • G03F7/0388—Macromolecular compounds which are rendered insoluble or differentially wettable with ethylenic or acetylenic bands in the side chains of the photopolymer
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/032—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S525/00—Synthetic resins or natural rubbers -- part of the class 520 series
    • Y10S525/922—Polyepoxide polymer having been reacted to yield terminal ethylenic unsaturation

Landscapes

  • Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Inks, Pencil-Leads, Or Crayons (AREA)
  • Non-Metallic Protective Coatings For Printed Circuits (AREA)
  • Manufacturing Of Printed Circuit Boards (AREA)
  • Epoxy Resins (AREA)
  • Macromonomer-Based Addition Polymer (AREA)
FR868605511A 1985-04-19 1986-04-17 Composition d'encre de photoresist liquide photodurcissable Expired - Lifetime FR2580828B1 (fr)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP60084987A JPS61243869A (ja) 1985-04-19 1985-04-19 レジストインキ組成物

Publications (2)

Publication Number Publication Date
FR2580828A1 FR2580828A1 (fr) 1986-10-24
FR2580828B1 true FR2580828B1 (fr) 1992-05-22

Family

ID=13845972

Family Applications (1)

Application Number Title Priority Date Filing Date
FR868605511A Expired - Lifetime FR2580828B1 (fr) 1985-04-19 1986-04-17 Composition d'encre de photoresist liquide photodurcissable

Country Status (7)

Country Link
US (1) US5009982B1 (cg-RX-API-DMAC10.html)
JP (1) JPS61243869A (cg-RX-API-DMAC10.html)
DE (1) DE3613107A1 (cg-RX-API-DMAC10.html)
FR (1) FR2580828B1 (cg-RX-API-DMAC10.html)
GB (1) GB2175908B (cg-RX-API-DMAC10.html)
HK (1) HK7690A (cg-RX-API-DMAC10.html)
SG (1) SG73389G (cg-RX-API-DMAC10.html)

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GB2175908B (en) 1989-09-06
JPH0154390B2 (cg-RX-API-DMAC10.html) 1989-11-17
HK7690A (en) 1990-02-09
GB2175908A (en) 1986-12-10
US5009982A (en) 1991-04-23
GB8608996D0 (en) 1986-05-21
SG73389G (en) 1990-03-02
FR2580828A1 (fr) 1986-10-24
JPS61243869A (ja) 1986-10-30
DE3613107C2 (cg-RX-API-DMAC10.html) 1993-01-21
US5009982B1 (en) 1994-03-15

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