JP6409106B1 - 硬化性樹脂組成物、ドライフィルム、硬化物およびプリント配線板 - Google Patents
硬化性樹脂組成物、ドライフィルム、硬化物およびプリント配線板 Download PDFInfo
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- JP6409106B1 JP6409106B1 JP2017165805A JP2017165805A JP6409106B1 JP 6409106 B1 JP6409106 B1 JP 6409106B1 JP 2017165805 A JP2017165805 A JP 2017165805A JP 2017165805 A JP2017165805 A JP 2017165805A JP 6409106 B1 JP6409106 B1 JP 6409106B1
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- 238000009864 tensile test Methods 0.000 description 1
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- KCNSDMPZCKLTQP-UHFFFAOYSA-N tetraphenylen-1-ol Chemical compound C12=CC=CC=C2C2=CC=CC=C2C2=CC=CC=C2C2=C1C=CC=C2O KCNSDMPZCKLTQP-UHFFFAOYSA-N 0.000 description 1
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- KUAZQDVKQLNFPE-UHFFFAOYSA-N thiram Chemical compound CN(C)C(=S)SSC(=S)N(C)C KUAZQDVKQLNFPE-UHFFFAOYSA-N 0.000 description 1
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- HQYALQRYBUJWDH-UHFFFAOYSA-N trimethoxy(propyl)silane Chemical compound CCC[Si](OC)(OC)OC HQYALQRYBUJWDH-UHFFFAOYSA-N 0.000 description 1
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- RYFMWSXOAZQYPI-UHFFFAOYSA-K trisodium phosphate Chemical compound [Na+].[Na+].[Na+].[O-]P([O-])([O-])=O RYFMWSXOAZQYPI-UHFFFAOYSA-K 0.000 description 1
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Classifications
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- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08K—Use of inorganic or non-macromolecular organic substances as compounding ingredients
- C08K3/00—Use of inorganic substances as compounding ingredients
- C08K3/02—Elements
- C08K3/04—Carbon
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08J—WORKING-UP; GENERAL PROCESSES OF COMPOUNDING; AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F, C08G or C08H
- C08J5/00—Manufacture of articles or shaped materials containing macromolecular substances
- C08J5/18—Manufacture of films or sheets
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08K—Use of inorganic or non-macromolecular organic substances as compounding ingredients
- C08K3/00—Use of inorganic substances as compounding ingredients
- C08K3/01—Use of inorganic substances as compounding ingredients characterized by their specific function
- C08K3/013—Fillers, pigments or reinforcing additives
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08K—Use of inorganic or non-macromolecular organic substances as compounding ingredients
- C08K3/00—Use of inorganic substances as compounding ingredients
- C08K3/01—Use of inorganic substances as compounding ingredients characterized by their specific function
- C08K3/014—Stabilisers against oxidation, heat, light or ozone
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K1/00—Printed circuits
- H05K1/02—Details
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K1/00—Printed circuits
- H05K1/02—Details
- H05K1/03—Use of materials for the substrate
- H05K1/0313—Organic insulating material
- H05K1/0353—Organic insulating material consisting of two or more materials, e.g. two or more polymers, polymer + filler, + reinforcement
- H05K1/0373—Organic insulating material consisting of two or more materials, e.g. two or more polymers, polymer + filler, + reinforcement containing additives, e.g. fillers
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08K—Use of inorganic or non-macromolecular organic substances as compounding ingredients
- C08K2201/00—Specific properties of additives
- C08K2201/002—Physical properties
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Landscapes
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- Engineering & Computer Science (AREA)
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- Manufacturing & Machinery (AREA)
- Microelectronics & Electronic Packaging (AREA)
- General Physics & Mathematics (AREA)
- Materials Engineering (AREA)
- Spectroscopy & Molecular Physics (AREA)
- Materials For Photolithography (AREA)
- Non-Metallic Protective Coatings For Printed Circuits (AREA)
- Paints Or Removers (AREA)
- Compositions Of Macromolecular Compounds (AREA)
- Laminated Bodies (AREA)
- Macromonomer-Based Addition Polymer (AREA)
Abstract
Description
(A)光硬化性成分は、光硬化性反応基を含有するものであるが、光硬化性反応基および熱硬化性反応基の両方を含有するものでもよい。即ち、(A)光硬化性成分は、光硬化反応および熱硬化反応の両方に寄与する光および熱硬化性成分であってもよい。
エチレン性不飽和基を有する化合物としては、公知慣用の光硬化性モノマーである光重合性オリゴマー、光重合性ビニルモノマー等を用いることができる。
本発明の硬化性樹脂組成物は、(B)光重合開始剤を必須成分として含有する。(B)光重合開始剤としては、光重合開始剤や光ラジカル発生剤として公知の光重合開始剤であれば、いずれのものを用いることもできる。
本発明の硬化性樹脂組成物は、(C)平均粒子径が1〜300nmの無機フィラーを必須成分として含有するが、この無機フィラーと、(C1)平均粒子径が300nmを超える無機フィラーとを併用することが好ましい。さらに、(C)無機フィラーと(C1)無機フィラーを、合計で、組成物の固形分の総質量の45質量%以上含有することが強度、貯蔵安定性を高め、線膨張係数(CTE)を低くする観点から好ましい。この比率は60質量%以上、70質量%以上、80質量%以上である場合にさらに有効であり、83質量%以上の場合に特に有効である。同様に、(C)平均粒子径が1〜300nmの無機フィラーは、貯蔵弾性率等の硬化物の強度を向上させるためには、組成物の固形分の総質量の5質量%以上含有することが好ましく、10質量%以上である場合にさらに有効であり、15質量%以上の場合に特に有効である。
ここで、本明細書において、(C)無機フィラーおよび(C1)無機フィラーの平均粒子径は、一次粒子の粒子径だけでなく、二次粒子(凝集体)の粒子径も含めた平均粒子径(D50)であり、レーザー回折法により測定されたD50の値である。レーザー回折法による測定装置としては、日機装社製のMicrotrac MT3300EXIIが挙げられる。なお、最大粒子径(D100)および粒子径(D10)についても上記の装置にて同様に測定することができる。
(C)無機フィラーおよび(C1)無機フィラーは、本発明の硬化性樹脂組成物の使用態様により、粉体または固体状態で(A)成分等と配合してもよく、溶剤や分散剤と混合してスラリーとした後で(A)成分等と配合してもよい。
上記の通り、強度や貯蔵弾性率を高め、線膨張係数(CTE)を低くする観点から、(C)無機フィラーおよび(C1)無機フィラーを、組成物の固形分の総質量の45質量%以上含有することが好ましく、特に83質量%以上含有することが好ましいが、配合比率を高くすると開口部の形成がより困難となる。しかしながら、本発明の硬化性樹脂組成物においては、(D)紫外線吸収剤を必須成分として含有することにより、(C)無機フィラーおよび(C1)無機フィラーの配合比率が高い場合でも開口部を容易に形成することができる。
本発明に係る(D)紫外線吸収剤は波長300nm〜450nmの光を吸収するものであれば、いずれのものを用いることもできる。
本発明の硬化性樹脂組成物は、(E)熱硬化性成分を含有することがより好ましい。また、本発明の硬化性樹脂組成物は、(E)熱硬化性成分としての、アルカリ可溶性樹脂および分子中に複数の環状エーテル基または環状チオエーテル基を有する化合物とを含有することがさらに好ましい。(E)熱硬化性成分を含有することにより、硬化膜の強度を向上させることができる。(E)熱硬化性成分は、1種を単独または2種以上を組み合わせて用いることができる。
(E)熱硬化性成分としては、公知のものをいずれも用いることができる。例えば、メラミン樹脂、ベンゾグアナミン樹脂、メラミン誘導体、ベンゾグアナミン誘導体等のアミノ樹脂、イソシアネート化合物、ブロックイソシアネート化合物、シクロカーボネート化合物、エポキシ化合物、オキセタン化合物、エピスルフィド樹脂、ビスマレイミド、カルボジイミド樹脂、アルカリ可溶性樹脂等の公知の熱硬化性成分を使用できる。特に好ましいのは、分子中に複数の環状エーテル基または環状チオエーテル基(以下、環状(チオ)エーテル基と略す)を有する化合物とアルカリ可溶性樹脂である。
本発明の硬化性樹脂組成物が(E)熱硬化性成分を含有する場合は、熱硬化触媒を併せて含有することが好ましい。熱硬化触媒としては、例えば、イミダゾール、2−メチルイミダゾール、2−エチルイミダゾール、2−エチル−4−メチルイミダゾール、2−フェニルイミダゾール、4−フェニルイミダゾール、1−シアノエチル−2−フェニルイミダゾール、1−(2−シアノエチル)−2−エチル−4−メチルイミダゾール等のイミダゾール誘導体;ジシアンジアミド、ベンジルジメチルアミン、4−(ジメチルアミノ)−N,N−ジメチルベンジルアミン、4−メトキシ−N,N−ジメチルベンジルアミン、4−メチル−N,N−ジメチルベンジルアミン等のアミン化合物、アジピン酸ジヒドラジド、セバシン酸ジヒドラジド等のヒドラジン化合物;トリフェニルホスフィン等のリン化合物等が挙げられる。また、グアナミン、アセトグアナミン、ベンゾグアナミン、メラミン、2,4−ジアミノ−6−メタクリロイルオキシエチル−S−トリアジン、2−ビニル−2,4−ジアミノ−S−トリアジン、2−ビニル−4,6−ジアミノ−S−トリアジン・イソシアヌル酸付加物、2,4−ジアミノ−6−メタクリロイルオキシエチル−S−トリアジン・イソシアヌル酸付加物等のS−トリアジン誘導体を用いることもでき、好ましくはこれら密着性付与剤としても機能する化合物を熱硬化触媒と併用する。
本発明の硬化性樹脂組成物は、組成物の調製や、基板やキャリアフィルムに塗布する際の粘度調整等の目的で、有機溶剤を含有させることができる。有機溶剤としては、メチルエチルケトン、シクロヘキサノン等のケトン類;トルエン、キシレン、テトラメチルベンゼン等の芳香族炭化水素類;セロソルブ、メチルセロソルブ、ブチルセロソルブ、カルビトール、メチルカルビトール、ブチルカルビトール、プロピレングリコールモノメチルエーテル、ジプロピレングリコールモノメチルエーテル、ジプロピレングリコールジエチルエーテル、ジエチレングリコールモノメチルエーテルアセテート、トリプロピレングリコールモノメチルエーテル等のグリコールエーテル類;酢酸エチル、酢酸ブチル、乳酸ブチル、セロソルブアセテート、ブチルセロソルブアセテート、カルビトールアセテート、ブチルカルビトールアセテート、プロピレングリコールモノメチルエーテルアセテート、ジプロピレングリコールモノメチルエーテルアセテート、炭酸プロピレン等のエステル類;オクタン、デカン等の脂肪族炭化水素類;石油エーテル、石油ナフサ、ソルベントナフサ等の石油系溶剤など、公知慣用の有機溶剤が使用できる。これらの有機溶剤は、1種を単独または2種以上を組み合わせて用いることができる。
本発明の硬化性樹脂組成物には、必要に応じてさらに、光開始助剤、シアネート化合物、エラストマー、メルカプト化合物、熱硬化触媒、ウレタン化触媒、チキソ化剤、密着促進剤、ブロック共重合体、連鎖移動剤、重合禁止剤、銅害防止剤、酸化防止剤、防錆剤、微粉シリカ、有機ベントナイト、モンモリロナイト等の増粘剤、シリコーン系、フッ素系、高分子系等の消泡剤および/またはレベリング剤、イミダゾール系、チアゾール系、トリアゾール系等のシランカップリング剤、ホスフィン酸塩、燐酸エステル誘導体、フォスファゼン化合物等のリン化合物等の難燃剤、着色剤などの成分を配合することができる。これらは、電子材料の分野において公知の物を使用することができる。
本発明の硬化性樹脂組成物は、上記のような現像液により硬化膜のパターンを形成する用途だけでなく、パターンを形成しない用途、例えばモールド用途(封止用途)に使用してもよい。
(アルカリ可溶性樹脂の合成)
温度計、窒素導入装置兼アルキレンオキシド導入装置および撹拌装置を備えたオートクレーブに、ノボラック型クレゾール樹脂(商品名「ショウノールCRG951」、昭和電工社製、OH当量:119.4)119.4部、水酸化カリウム1.19部およびトルエン119.4部を導入し、撹拌しつつ系内を窒素置換し、加熱昇温した。次に、プロピレンオキシド63.8部を徐々に滴下し、125〜132℃、0〜4.8kg/cm2で16時間反応させた。その後、室温まで冷却し、この反応溶液に89%リン酸1.56部を添加混合して水酸化カリウムを中和し、不揮発分62.1%、水酸基価が182.2mgKOH/g(307.9g/eq.)であるノボラック型クレゾール樹脂のプロピレンオキシド反応溶液を得た。これは、フェノール性水酸基1当量当りプロピレンオキシドが平均1.08モル付加したものであった。
得られたノボラック型クレゾール樹脂のプロピレンオキシド反応溶液293.0部、アクリル酸43.2部、メタンスルホン酸11.53部、メチルハイドロキノン0.18部およびトルエン252.9部を、撹拌機、温度計および空気吹き込み管を備えた反応器に導入し、空気を10ml/分の速度で吹き込み、撹拌しながら、110℃で12時間反応させた。反応により生成した水は、トルエンとの共沸混合物として、12.6部の水が留出した。その後、室温まで冷却し、得られた反応溶液を15%水酸化ナトリウム水溶液35.35部で中和し、次いで水洗した。その後、エバポレーターにてトルエンをジエチレングリコールモノエチルエーテルアセテート118.1部で置換しつつ留去し、ノボラック型アクリレート樹脂溶液を得た。次に、得られたノボラック型アクリレート樹脂溶液332.5部およびトリフェニルホスフィン1.22部を、撹拌器、温度計および空気吹き込み管を備えた反応器に導入し、空気を10ml/分の速度で吹き込み、撹拌しながら、テトラヒドロフタル酸無水物60.8部を徐々に加え、95〜101℃で6時間反応させ、冷却後、取り出した。このようにして、固形分65%、固形分の酸価87.7mgKOH/gの感光性のカルボキシル基含有樹脂の溶液を得た。以下、このカルボキシル基含有感光性樹脂を(E)合成例1のアルカリ可溶性樹脂と称す。
アドマテック社製球状シリカ(アドマファインSO−E2)700g、溶剤としてPMA(プロピレングリコールモノメチルエーテルアセテート)300g、ビーズミルにて0.5μmのジルコニアビーズを用い分散処理を行なった。これを3回繰り返して3μmフィルターでろ過し、平均粒子径が500nmとなるシリカスラリーを調製した。なお、この(C1)無機フィラー1は、粒子径D10が250nmであり、最大粒子径D100が3μmである。
アドマテック社のビニル基を有する平均粒子径50nmのシリカスラリー(YA050C、PMA(プロピレングリコールモノメチルエーテルアセテート)溶剤)を使用した。なお、この(C)無機フィラーは、粒子径D10が20nmであり、最大粒子径D100が0.2μmである。
平均粒径4μmのアルミナスラリーとして、電気化学社製球状アルミナ(DAW−03)を使用した。
平均粒子径300nmのアルミナスラリーとして、電気化学社の球状アルミナ(ASFP−20)を使用した。
硬化性樹脂組成物を銅箔上に全面塗布し、80℃30分で乾燥し、組成物上で1露光量が50mJ/cm2となるようにダイレクトイメージング露光装置(光源は高圧水銀灯)により光照射し、30℃の1wt%炭酸ナトリウム水溶液で現像し、硬化物のパターンを形成した。パターン形成後、80μmの開口径が形成でき、かつ、形状が良好であるかどうかを評価した。
◎:開口部を形成可能であり、開口部の壁面がストレート形状である。
○:開口部を形成可能である。
×:開口部を形成できない。
GTS−MP箔(古河サーキットフォイル社製)の光沢面側(銅箔)を上にして、上記で作製した実施例および比較例にかかる各ドライフィルムを、樹脂層が銅箔に接するように、真空ラミネーター(CVP−300:ニッコーマテリアル社製)を用いて80℃の第一チャンバーにて真空圧3hPa、バキューム時間30秒の条件下でラミネートした後、プレス圧0.5MPa、プレス時間30秒の条件でプレスを行いキャリアフィルムを剥離した。これを、UVコンベア炉にて積算露光量1000mJ/cm2の条件で紫外線照射した後、170℃で60分加熱して硬化した。その後、硬化膜を銅箔より剥離した後、測定サイズ(40mm×10mm×20μmのサイズ(縦×幅×厚さ))にサンプルを切り出した。サンプルを引張試験装置AG−X(島津製作所社製)に供し、引張速度1mm/secとして25℃における貯蔵弾性率を測定した。
◎:25℃において貯蔵弾性率が10GPa以上。
○:25℃において貯蔵弾性率が8GPa以上。
×:25℃において貯蔵弾性率が8GPa未満。
GTS−MP箔(古河サーキットフォイル社製)の光沢面側(銅箔)を上にして、上記で作製した実施例および比較例にかかる各ドライフィルムを、樹脂層が銅箔に接するように、上記と同様に真空ラミネーターを用いて張り合わせることにより、銅箔上に樹脂層を形成しキャリアフィルムを剥離した。これを、UVコンベア炉にて積算露光量1000mJ/cm2の条件で紫外線照射した後、170℃で60分加熱して硬化した。その後、硬化膜を銅箔より剥離した後、測定サイズ(5mm×50mm×20μmのサイズ(縦×幅×厚さ))にサンプルを切り出し、セイコーインスツル社製TMA6100に供した。TMA測定は、試験加重5g、サンプルを10℃/分の昇温速度で室温より昇温、連続して2回測定した。2回目における線膨張係数の異なる2接線の交点をガラス転移温度(Tg)とし、Tg以下の領域における線膨張係数(CTE(α1))として評価した。判定基準は以下のとおりである。
◎:Tg温度以下でのCTEが10ppm以下。
○:Tg温度以下でのCTEが20ppm以下。
×:Tg温度以下でのCTEが20ppm超。
*2:IGM社製OmniradTPO(2,4,6−トリメチルベンゾイル−ジフェニル−フォスフィンオキサイド)(光重合開始剤)
*3:上記で調製した(C1)無機フィラー、シリカ
*4:上記で調製した(C)無機フィラー、シリカ
*5:上記(C1)無機フィラー、アルミナ
*6:上記(C)無機フィラー、アルミナ
*7:三菱化学社製MA−100(紫外線吸収剤)
*8:三菱マテリアル社製13M−C(紫外線吸収剤)
*9:BASF社製TINUVIN460(紫外線吸収剤)
*10:DIC社製エピクロンN−730A(熱硬化性成分)
*11:合成例1のアルカリ可溶性樹脂(固形分65質量%)(熱硬化性成分)
2 硬化性樹脂組成物
3 マスク
4 紫外線
5 無機フィラー
6 紫外線吸収剤
Claims (6)
- (A)光硬化性成分、
(B)光重合開始剤、
(C)平均粒子径が1〜300nmの無機フィラー、
(C1)平均粒子径が300nmを超える無機フィラー、および、
(D)紫外線吸収剤
を含有する硬化性樹脂組成物であって、
前記(C)平均粒子径が1〜300nmの無機フィラーおよび前記(C1)平均粒子径が300nmを超える無機フィラーの合計配合量で、前記硬化性樹脂組成物の固形分の総質量の45質量%以上含有し、
前記(C)平均粒子径が1〜300nmの無機フィラーおよび前記(C1)平均粒子径が300nmを超える無機フィラーの材質が、ともにシリカ及び/または酸化アルミニウムであることを特徴とする硬化性樹脂組成物。 - 前記(D)紫外線吸収剤として、カーボンブラックを含有することを特徴とする請求項1に記載の硬化性樹脂組成物。
- 前記(D)紫外線吸収剤を、前記硬化性樹脂組成物の固形分の総質量の0.01〜10質量%含有することを特徴とする請求項1または2に記載の硬化性樹脂組成物。
- 請求項1〜3のいずれか一項に記載の硬化性樹脂組成物から得られる樹脂層を有することを特徴とするドライフィルム。
- 請求項1〜3のいずれか一項に記載の硬化性樹脂組成物または請求項4に記載のドライフィルムの樹脂層を硬化して得られることを特徴とする硬化物。
- 請求項5に記載の硬化物を有することを特徴とするプリント配線板。
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