DK1704585T3 - Fremgangsmåder til fremstilling af isolerede mikro- og nanostrukturer under anvendelse af blød litografi eller tryklitografi - Google Patents

Fremgangsmåder til fremstilling af isolerede mikro- og nanostrukturer under anvendelse af blød litografi eller tryklitografi Download PDF

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DK1704585T3
DK1704585T3 DK04821787.1T DK04821787T DK1704585T3 DK 1704585 T3 DK1704585 T3 DK 1704585T3 DK 04821787 T DK04821787 T DK 04821787T DK 1704585 T3 DK1704585 T3 DK 1704585T3
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pfpe
particles
mold
patterned
substrate
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DK04821787.1T
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Joseph M Desimone
Jason P Rolland
Ansley E Exner
Edward T Samulski
R Jude Samulski
Benjamin W Maynor
Larken E Euliss
Ginger M Denison
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Univ North Carolina Chapel Hill
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    • A—HUMAN NECESSITIES
    • A61—MEDICAL OR VETERINARY SCIENCE; HYGIENE
    • A61K—PREPARATIONS FOR MEDICAL, DENTAL OR TOILETRY PURPOSES
    • A61K9/00—Medicinal preparations characterised by special physical form
    • A61K9/14—Particulate form, e.g. powders, Processes for size reducing of pure drugs or the resulting products, Pure drug nanoparticles
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/027—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34
    • H01L21/0271—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34 comprising organic layers
    • H01L21/0273—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34 comprising organic layers characterised by the treatment of photoresist layers
    • H01L21/0274—Photolithographic processes
    • A—HUMAN NECESSITIES
    • A61—MEDICAL OR VETERINARY SCIENCE; HYGIENE
    • A61K—PREPARATIONS FOR MEDICAL, DENTAL OR TOILETRY PURPOSES
    • A61K47/00—Medicinal preparations characterised by the non-active ingredients used, e.g. carriers or inert additives; Targeting or modifying agents chemically bound to the active ingredient
    • A61K47/30—Macromolecular organic or inorganic compounds, e.g. inorganic polyphosphates
    • A61K47/34—Macromolecular compounds obtained otherwise than by reactions only involving carbon-to-carbon unsaturated bonds, e.g. polyesters, polyamino acids, polysiloxanes, polyphosphazines, copolymers of polyalkylene glycol or poloxamers
    • A—HUMAN NECESSITIES
    • A61—MEDICAL OR VETERINARY SCIENCE; HYGIENE
    • A61K—PREPARATIONS FOR MEDICAL, DENTAL OR TOILETRY PURPOSES
    • A61K9/00—Medicinal preparations characterised by special physical form
    • A61K9/0087—Galenical forms not covered by A61K9/02 - A61K9/7023
    • A61K9/0097—Micromachined devices; Microelectromechanical systems [MEMS]; Devices obtained by lithographic treatment of silicon; Devices comprising chips
    • A—HUMAN NECESSITIES
    • A61—MEDICAL OR VETERINARY SCIENCE; HYGIENE
    • A61K—PREPARATIONS FOR MEDICAL, DENTAL OR TOILETRY PURPOSES
    • A61K9/00—Medicinal preparations characterised by special physical form
    • A61K9/48—Preparations in capsules, e.g. of gelatin, of chocolate
    • A61K9/50—Microcapsules having a gas, liquid or semi-solid filling; Solid microparticles or pellets surrounded by a distinct coating layer, e.g. coated microspheres, coated drug crystals
    • A61K9/51—Nanocapsules; Nanoparticles
    • A61K9/5107—Excipients; Inactive ingredients
    • A61K9/513—Organic macromolecular compounds; Dendrimers
    • A61K9/5138—Organic macromolecular compounds; Dendrimers obtained by reactions only involving carbon-to-carbon unsaturated bonds, e.g. polyvinyl pyrrolidone, poly(meth)acrylates
    • A—HUMAN NECESSITIES
    • A61—MEDICAL OR VETERINARY SCIENCE; HYGIENE
    • A61K—PREPARATIONS FOR MEDICAL, DENTAL OR TOILETRY PURPOSES
    • A61K9/00—Medicinal preparations characterised by special physical form
    • A61K9/48—Preparations in capsules, e.g. of gelatin, of chocolate
    • A61K9/50—Microcapsules having a gas, liquid or semi-solid filling; Solid microparticles or pellets surrounded by a distinct coating layer, e.g. coated microspheres, coated drug crystals
    • A61K9/51—Nanocapsules; Nanoparticles
    • A61K9/5107—Excipients; Inactive ingredients
    • A61K9/513—Organic macromolecular compounds; Dendrimers
    • A61K9/5146—Organic macromolecular compounds; Dendrimers obtained otherwise than by reactions only involving carbon-to-carbon unsaturated bonds, e.g. polyethylene glycol, polyamines, polyanhydrides
    • A61K9/5153—Polyesters, e.g. poly(lactide-co-glycolide)
    • A—HUMAN NECESSITIES
    • A61—MEDICAL OR VETERINARY SCIENCE; HYGIENE
    • A61K—PREPARATIONS FOR MEDICAL, DENTAL OR TOILETRY PURPOSES
    • A61K9/00—Medicinal preparations characterised by special physical form
    • A61K9/48—Preparations in capsules, e.g. of gelatin, of chocolate
    • A61K9/50—Microcapsules having a gas, liquid or semi-solid filling; Solid microparticles or pellets surrounded by a distinct coating layer, e.g. coated microspheres, coated drug crystals
    • A61K9/51—Nanocapsules; Nanoparticles
    • A61K9/5192—Processes
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B81—MICROSTRUCTURAL TECHNOLOGY
    • B81C—PROCESSES OR APPARATUS SPECIALLY ADAPTED FOR THE MANUFACTURE OR TREATMENT OF MICROSTRUCTURAL DEVICES OR SYSTEMS
    • B81C99/00—Subject matter not provided for in other groups of this subclass
    • B81C99/0075—Manufacture of substrate-free structures
    • B81C99/0085—Manufacture of substrate-free structures using moulds and master templates, e.g. for hot-embossing
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B82—NANOTECHNOLOGY
    • B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
    • B82Y10/00—Nanotechnology for information processing, storage or transmission, e.g. quantum computing or single electron logic
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B82—NANOTECHNOLOGY
    • B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
    • B82Y40/00—Manufacture or treatment of nanostructures
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/0002—Lithographic processes using patterning methods other than those involving the exposure to radiation, e.g. by stamping
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K71/00—Manufacture or treatment specially adapted for the organic devices covered by this subclass
    • H10K71/10—Deposition of organic active material
    • H10K71/12—Deposition of organic active material using liquid deposition, e.g. spin coating
    • H10K71/13—Deposition of organic active material using liquid deposition, e.g. spin coating using printing techniques, e.g. ink-jet printing or screen printing
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K71/00—Manufacture or treatment specially adapted for the organic devices covered by this subclass
    • H10K71/60—Forming conductive regions or layers, e.g. electrodes
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
    • Y02E—REDUCTION OF GREENHOUSE GAS [GHG] EMISSIONS, RELATED TO ENERGY GENERATION, TRANSMISSION OR DISTRIBUTION
    • Y02E10/00—Energy generation through renewable energy sources
    • Y02E10/50—Photovoltaic [PV] energy
    • Y02E10/549—Organic PV cells
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
    • Y02P—CLIMATE CHANGE MITIGATION TECHNOLOGIES IN THE PRODUCTION OR PROCESSING OF GOODS
    • Y02P70/00—Climate change mitigation technologies in the production process for final industrial or consumer products
    • Y02P70/50—Manufacturing or production processes characterised by the final manufactured product
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T428/00—Stock material or miscellaneous articles
    • Y10T428/24—Structurally defined web or sheet [e.g., overall dimension, etc.]
    • Y10T428/24273—Structurally defined web or sheet [e.g., overall dimension, etc.] including aperture
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T428/00—Stock material or miscellaneous articles
    • Y10T428/24—Structurally defined web or sheet [e.g., overall dimension, etc.]
    • Y10T428/24479—Structurally defined web or sheet [e.g., overall dimension, etc.] including variation in thickness
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T428/00—Stock material or miscellaneous articles
    • Y10T428/31504—Composite [nonstructural laminate]
    • Y10T428/3154—Of fluorinated addition polymer from unsaturated monomers

Claims (12)

1. Fremgangsmåde til fremstilling af monodisperse partikler med mikro- eller nanostør-relse, hvilken fremgangsmåde omfatter: indføring af et materiale i en mønstret template, hvor den mønstrede template definerer en flerhed af fordybninger deri, idet hver fordybning af flerheden af fordybninger omfatter en i det væsentlige ækvivalent tredimensionel designet form, og den mønstrede template er ikke-befugtende og omfatter et opløsningsmiddelresistent elastomert materiale med en overfladeenergi på mindre end 18 mN/m; behandling af materialet, mens materialet er i kontakt med fordybningerne i den mønstrede template, til dannelse af en flerhed af i det væsentlige ækvivalente designede strukturer, hvor strukturerne er partikler med mikro- eller nanostørrelse, hvor partiklerne er i det væsentlige fri for et skumlag; og fjernelse af partiklerne fra fordybningerne i den mønstrede template for at tilvejebringe en flerhed af isolerede monodisperse partikler med mikro- eller nanostørrelse, som er i det væsentlige fri for et skumlag.
2. Fremgangsmåde ifølge krav 1, hvor det elastomere materiale er en fluorpolymer.
3. Fremgangsmåde ifølge krav 1, hvor det elastomere materiale er perfluorpolyether.
4. Fremgangsmåde ifølge krav 1, hvor det elastomere materiales overfladeenergi er mindre end 15 mN/m.
5. Fremgangsmåde ifølge krav 1, hvor det elastomere materiales overfladeenergi er mindre end 12 mN/m.
6. Fremgangsmåde ifølge krav 1, hvor fordybningen omfatter en største dimension på mindre end 10 mikrometer, eller hvor fordybningen omfatter en største dimension på mindre end 3 mikrometer, eller hvor fordybningen omfatter en største dimension på mindre end 1 mikrometer, eller hvor fordybningen omfatter en største dimension på mindre end 750 nanometer, eller hvor fordybningen omfatter en største dimension på mindre end 500 nanometer, eller hvor fordybningen omfatter en største dimension på mindre end 250 nanometer, eller hvor fordybningen omfatter en største dimension på mindre end 200 nanometer, eller hvor fordybningen omfatter en største dimension på mindre end 100 nanometer, eller hvor fordybningen omfatter en største dimension på mindre end 90 nanometer, eller hvor fordybningen omfatter en største dimension på mindre end 70 nanometer, eller hvor fordybningen omfatter en største dimension på mindre end 50 nanometer.
7. Monodispers flerhed af isolerede partikler med mikro- eller nanostørrelse, som er i det væsentlige fri for et skumlag og kan opnås ved en fremgangsmåde ifølge krav 1, hvor et terapeutisk middel er inkorporeret i de isolerede partikler.
8. Fremgangsmåde til fremstilling af en flerhed af monodisperse partikler med mikro-eller nanostørrelse, hvilken fremgangsmåde omfatter: indføring af et materiale i en støbeform, hvor støbeformen omfatter et elastomert materiale med en overfladeenergi på mindre end 18 mN/m; behandling af materialet, mens materialet er i kontakt med støbeformen, til dannelse af en flerhed af partikler, hvor partiklerne er i det væsentlige fri for et skumlag; og fjernelse af partiklerne fra støbeformen for at tilvejebringe en flerhed af fritstående monodisperse partikler.
9. Fremgangsmåde ifølge krav 8, hvor det elastomere materiale omfatter et fluorela-stomermateriale.
10. Fremgangsmåde ifølge krav 9, hvorfluorelastomermaterialet omfatter perfluorpoly-ether.
11. Fremgangsmåde ifølge krav 8, hvor det elastomere materiale har en overfladeenergi på mindre end 15 mN/m.
12. Fremgangsmåde ifølge krav 8, hvor det elastomere materiale har en overfladeenergi på mindre end 12 mN/m.
DK04821787.1T 2003-12-19 2004-12-20 Fremgangsmåder til fremstilling af isolerede mikro- og nanostrukturer under anvendelse af blød litografi eller tryklitografi DK1704585T3 (da)

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US53153103P 2003-12-19 2003-12-19
US58317004P 2004-06-25 2004-06-25
US60497004P 2004-08-27 2004-08-27
PCT/US2004/042706 WO2005101466A2 (en) 2003-12-19 2004-12-20 Methods for fabricating isolated micro- and nano- structures using soft or imprint lithography

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US (8) US8263129B2 (da)
EP (2) EP3242318A1 (da)
JP (2) JP6067954B2 (da)
KR (4) KR101376715B1 (da)
AU (1) AU2004318602B2 (da)
BR (1) BRPI0417848B1 (da)
CA (2) CA2549341C (da)
DK (1) DK1704585T3 (da)
ES (1) ES2625345T3 (da)
IL (2) IL176254A (da)
MX (1) MXPA06006738A (da)
PT (1) PT1704585T (da)
WO (1) WO2005101466A2 (da)

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