WO2011155635A1 - 金属酸化物膜の製造方法及び金属酸化物膜、それを用いた素子、金属酸化物膜付き基板並びにそれを用いたデバイス - Google Patents
金属酸化物膜の製造方法及び金属酸化物膜、それを用いた素子、金属酸化物膜付き基板並びにそれを用いたデバイス Download PDFInfo
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- C01F17/00—Compounds of rare earth metals
- C01F17/20—Compounds containing only rare earth metals as the metal element
- C01F17/206—Compounds containing only rare earth metals as the metal element oxide or hydroxide being the only anion
- C01F17/224—Oxides or hydroxides of lanthanides
- C01F17/235—Cerium oxides or hydroxides
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05D—PROCESSES FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05D3/00—Pretreatment of surfaces to which liquids or other fluent materials are to be applied; After-treatment of applied coatings, e.g. intermediate treating of an applied coating preparatory to subsequent applications of liquids or other fluent materials
- B05D3/007—After-treatment
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- C01F17/00—Compounds of rare earth metals
- C01F17/20—Compounds containing only rare earth metals as the metal element
- C01F17/206—Compounds containing only rare earth metals as the metal element oxide or hydroxide being the only anion
- C01F17/212—Scandium oxides or hydroxides
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- C01F17/00—Compounds of rare earth metals
- C01F17/20—Compounds containing only rare earth metals as the metal element
- C01F17/206—Compounds containing only rare earth metals as the metal element oxide or hydroxide being the only anion
- C01F17/218—Yttrium oxides or hydroxides
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- C01F17/00—Compounds of rare earth metals
- C01F17/20—Compounds containing only rare earth metals as the metal element
- C01F17/206—Compounds containing only rare earth metals as the metal element oxide or hydroxide being the only anion
- C01F17/224—Oxides or hydroxides of lanthanides
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- C01F17/00—Compounds of rare earth metals
- C01F17/20—Compounds containing only rare earth metals as the metal element
- C01F17/206—Compounds containing only rare earth metals as the metal element oxide or hydroxide being the only anion
- C01F17/224—Oxides or hydroxides of lanthanides
- C01F17/229—Lanthanum oxides or hydroxides
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- C01F7/00—Compounds of aluminium
- C01F7/02—Aluminium oxide; Aluminium hydroxide; Aluminates
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- C01G23/00—Compounds of titanium
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- C01G23/047—Titanium dioxide
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- C01G25/00—Compounds of zirconium
- C01G25/02—Oxides
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- C01G39/00—Compounds of molybdenum
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- C01G41/00—Compounds of tungsten
- C01G41/02—Oxides; Hydroxides
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- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
- C03C17/006—Surface treatment of glass, not in the form of fibres or filaments, by coating with materials of composite character
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/02104—Forming layers
- H01L21/02365—Forming inorganic semiconducting materials on a substrate
- H01L21/02518—Deposited layers
- H01L21/02521—Materials
- H01L21/02565—Oxide semiconducting materials not being Group 12/16 materials, e.g. ternary compounds
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/02104—Forming layers
- H01L21/02365—Forming inorganic semiconducting materials on a substrate
- H01L21/02612—Formation types
- H01L21/02617—Deposition types
- H01L21/02623—Liquid deposition
- H01L21/02628—Liquid deposition using solutions
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- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C2217/00—Coatings on glass
- C03C2217/20—Materials for coating a single layer on glass
- C03C2217/21—Oxides
- C03C2217/212—TiO2
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- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C2217/00—Coatings on glass
- C03C2217/20—Materials for coating a single layer on glass
- C03C2217/21—Oxides
- C03C2217/214—Al2O3
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- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C2217/00—Coatings on glass
- C03C2217/20—Materials for coating a single layer on glass
- C03C2217/21—Oxides
- C03C2217/218—V2O5, Nb2O5, Ta2O5
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- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C2217/00—Coatings on glass
- C03C2217/20—Materials for coating a single layer on glass
- C03C2217/21—Oxides
- C03C2217/219—CrOx, MoOx, WOx
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- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C2217/00—Coatings on glass
- C03C2217/20—Materials for coating a single layer on glass
- C03C2217/21—Oxides
- C03C2217/22—ZrO2
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- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C2217/00—Coatings on glass
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- C03C2217/21—Oxides
- C03C2217/228—Other specific oxides
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- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C2217/00—Coatings on glass
- C03C2217/40—Coatings comprising at least one inhomogeneous layer
- C03C2217/42—Coatings comprising at least one inhomogeneous layer consisting of particles only
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- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C2218/00—Methods for coating glass
- C03C2218/10—Deposition methods
- C03C2218/11—Deposition methods from solutions or suspensions
- C03C2218/116—Deposition methods from solutions or suspensions by spin-coating, centrifugation
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- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C2218/00—Methods for coating glass
- C03C2218/10—Deposition methods
- C03C2218/11—Deposition methods from solutions or suspensions
- C03C2218/119—Deposition methods from solutions or suspensions by printing
Definitions
- the present invention relates to a metal oxide film and a method for producing the metal oxide film. Specifically, a metal oxide film formed on a substrate such as glass or plastic having high density and excellent film strength, and a metal obtained by the metal oxide film manufacturing method The present invention relates to an oxide film, and further relates to an element using the metal oxide film, a substrate with the metal oxide film, and a device using the substrate with the metal oxide film.
- Transparent electrode for display element such as liquid crystal display, electroluminescence, plasma display, transparent electrode for touch panel, solar cell, etc., forming material for transparent conductive film used for functional coating such as heat ray reflection, electromagnetic wave shielding, antistatic, antifogging etc.
- ITO Indium Tin Oxide
- a vapor deposition method such as a vacuum vapor deposition method, a sputtering method, or a chemical vapor deposition method is widely used. These methods can form a uniform ITO film (transparent conductive film) excellent in transparency and conductivity on a substrate.
- the film forming apparatus used for this is very expensive because it is based on a vacuum vessel, and the component gas pressure in the manufacturing apparatus must be precisely controlled every time the substrate is formed. There was a problem with sex.
- a method of applying on a substrate using a coating solution for forming a transparent conductive film in which an indium compound and a tin compound are dissolved in a solvent (hereinafter referred to as “coating method” or “wet coating method”).
- coating method an ITO film (transparent conductive film) is formed by a simple manufacturing process of applying a coating liquid for forming a transparent conductive film on a substrate, drying, and heat treatment.
- Application methods include inkjet printing, screen printing, gravure printing, offset printing, flexographic printing, dispenser printing, slit coating, die coating, doctor blade coating, wire bar coating, spin coating, A dip coating method, a spray coating method and the like are known.
- Such a coating solution using nitrate or halide has a problem that corrosive gases such as nitrogen oxides and chlorine are generated during heat treatment, resulting in equipment corrosion and environmental pollution.
- coating materials using metal alkoxides are easily hydrolyzed, there is a problem with the stability of the coating solution, and many coating solutions using organometallic compounds described in patent documents are wet with respect to the substrate. It has a problem that it is easy to form a non-uniform film due to poor properties.
- indium acetylacetonate (standard nomenclature: tris (acetylacetonato) indium: In (C 5 H 7 O 2) 3), acetylacetonate tin (official name: di -n- butyl Bis (2,4-pentanedionato) tin: [Sn (C 4 H 9 ) 2 (C 5 H 7 O 2 ) 2 ]), hydroxypropyl cellulose, and one or more selected from the group of alkylphenol and alkenylphenol
- a coating solution for forming a transparent conductive film containing one or two solvents selected from the group consisting of two solvents, a dibasic acid ester and benzyl acetate is disclosed (for example, see Patent Document 9).
- the coating solution disclosed in Patent Document 9 improves the wettability of the coating solution to the substrate by containing hydroxypropyl cellulose in a mixed solution of acetylacetone indium and acetylacetone tin, and at the same time, contains hydroxypropylcellulose as a viscosity agent.
- the viscosity of the coating solution is adjusted depending on the amount, and various coating methods such as spin coating, spray coating, dip coating, screen printing, and wire bar coating can be employed.
- an improved coating solution for spin coating contains an organic indium compound such as acetylacetone indium and indium octylate, an organic tin such as acetylacetone tin and tin octylate, and an organic solvent, and the organic solvent contains alkylphenol and alkenylphenol.
- Transparent conductive film using a solution obtained by diluting an acetylacetone solution in which one or two solvents selected from the group of 1 are dissolved with an alcohol an acetylacetone solution in which one or two solvents selected from the group of alkylphenol and alkenylphenol are diluted with alcohol
- a forming coating liquid (see, for example, Patent Document 10) has been proposed.
- This coating solution has a low viscosity and can be used for spray coating, dip coating as well as spin coating.
- the transparent conductive film may be referred to as a touch panel, a touch sensor, a liquid crystal display (sometimes referred to as LCD), an electroluminescence display (sometimes referred to as ELD), electronic paper, or an electrochromic display (ECD). ) And the like, there is a limit to aiming for stable and low cost.
- NTO film This niobium-doped TiO 2 film (NTO film) is formed on a glass substrate by using a physical vapor deposition method such as a sputtering method, a pulsed laser deposition method (PLD method), or an electron beam deposition method (EB deposition method). After forming a film at a substrate temperature of 250 ° C. to 500 ° C., a low resistance is obtained by performing heat treatment (reduction annealing) at 250 to 500 ° C. in a reducing atmosphere.
- PLD method pulsed laser deposition method
- EB deposition method electron beam deposition method
- a transparent conductive film mainly composed of indium oxide for example, a transparent conductive film mainly composed of titanium oxide which is a metal oxide other than indium oxide as described above is desired.
- a coating liquid for forming a transparent conductive film that is such a transparent conductive film has both excellent transparency and conductivity, and can form a transparent conductive film at low cost.
- metal oxide films such as hafnium oxide (HfO 2 ) and zirconium oxide (ZrO 2 ) have recently attracted attention as a gate insulating film of thin film transistor elements and have been actively studied.
- silicon dioxide which is a silicon oxide film
- TFT field effect thin film transistor
- a metal-organic chemical vapor deposition (MOCVD) method, an atomic layer deposition (ALD) method, or the like is used.
- MOCVD metal-organic chemical vapor deposition
- ALD atomic layer deposition
- the vapor deposition method (vapor phase method) is used, and the coating method is not used.
- a metal oxide film having a work function larger than the work function (about 4.6 to 4.8 eV) of the ITO film as the transparent conductive film is also referred to as an organic electroluminescence element (organic EL element) described later. ) Is being considered.
- a single metal oxide film such as ruthenium oxide (RuO 2 ), vanadium oxide (VO 2.5 ), molybdenum oxide (MoO 3 ) having a high work function, Alternatively, they are laminated on the ITO film, facilitating hole injection from the ITO film side as the anode electrode into the hole transport layer (in some cases, directly into the light emitting layer), and organic EL Attempts have been made to drive the device at a low voltage, improve the light emission efficiency, and extend the lifetime.
- RuO 2 ruthenium oxide
- VO 2.5 vanadium oxide
- MoO 3 molybdenum oxide
- Patent Document 11 physical vapor deposition methods such as electron beam evaporation, DC sputtering, RF magnetron sputtering, and ICB evaporation are used to form the metal oxide film having a high work function. Although described, a coating method is not used.
- aluminum oxide, silicon oxide, titanium oxide, zirconium oxide, and cerium oxide can be used for insulating overcoating formed on a (transparent) conductive film by applying their transparency and insulating properties. It can be used as a near-infrared absorbing material (heat ray shielding material) as a chromic display material or cesium-doped tungsten oxide doped with cesium or the like.
- a gate insulating film of a thin film transistor element a hole injection layer of an organic EL element, or a transparent electrode such as a display, a touch panel, a solar cell, etc., a metal oxide of higher quality including film strength etc.
- a membrane is desired.
- the present invention provides a metal oxide film having high density and excellent in film strength, which is formed using an ink coating method which is a low-cost and simple method for producing a metal oxide film. It is another object of the present invention to provide a method for producing the metal oxide film, an element using the metal oxide film, a substrate with the metal oxide film, and a device using the same.
- the first invention of the present invention is a coating process for forming a coating film by applying a coating solution for forming a metal oxide film containing an organometallic compound as a main component on a substrate, and drying the coating film.
- a method for producing a film, wherein the heat treatment step comprises at least said organometallic compound component in an oxygen-containing atmosphere having a dew point temperature of ⁇ 10 ° C. or lower in a dry coating film composed mainly of an organometallic compound formed in the drying step.
- a metal whose main component is a metal oxide by performing a heat treatment to raise the temperature to a temperature higher than the heating temperature at which mineralization occurs, and removing the organic components contained in the dried coating film by thermal decomposition or combustion, or thermal decomposition and combustion Oxide This is a step of forming a metal oxide fine particle layer in which particles are densely packed, and the organometallic compound is an organoaluminum compound, organosilicon compound, organoscandium compound, organotitanium compound, organovanadium compound, organochromium compound, Organic manganese compounds, organic iron compounds, organic cobalt compounds, organic nickel compounds, organic copper compounds, organic gallium compounds, organic germanium compounds, organic yttrium compounds, organic zirconium compounds, organic niobium compounds, organic molybdenum compounds, organic ruthenium compounds, organic antimony Compounds, organic lanthanum compounds, organic hafnium compounds, organic tantalum compounds, organic tungsten compounds, organic bismuth compounds, organic cerium compounds
- a dew point temperature of 0 ° C. is followed by a heat treatment in which the temperature is raised to at least a heating temperature at which mineralization of the organometallic compound occurs in an oxygen-containing atmosphere having a dew point temperature of ⁇ 10 ° C. or lower.
- a third aspect of the present invention in the oxygen-containing atmosphere having the dew point temperature of ⁇ 10 ° C. or lower, following the heat treatment for raising the temperature to at least the heating temperature at which the mineralization of the organometallic compound occurs, a neutral atmosphere or The method for producing a metal oxide film according to the first invention, wherein the heat treatment is performed in a reducing atmosphere.
- the heat treatment in an atmosphere containing oxygen having a dew point temperature of 0 ° C. or higher is followed by heat treatment in a neutral atmosphere or a reducing atmosphere. It is a manufacturing method of the metal oxide film of description.
- the neutral atmosphere is at least one of nitrogen gas and inert gas, or the reducing atmosphere is hydrogen gas or the neutral atmosphere is at least hydrogen gas or organic solvent vapor.
- the dew point temperature of the oxygen-containing atmosphere in the heat treatment in the oxygen-containing atmosphere having a dew point temperature of ⁇ 10 ° C. or lower is ⁇ 20 ° C. or lower.
- the energy ray irradiation is performed when the heat treatment is performed in an oxygen-containing atmosphere having a dew point temperature of ⁇ 10 ° C. or lower. It is a manufacturing method of the metal oxide film of description.
- the metal oxide film according to the seventh aspect wherein the energy ray irradiation is irradiation with ultraviolet rays including at least a wavelength of 200 nm or less as one of main components. It is a manufacturing method.
- the irradiation of ultraviolet rays having a wavelength of at least 200 nm as one of the main components is irradiation of ultraviolet rays emitted from any one of a low-pressure mercury lamp, an amalgam lamp, and an excimer lamp.
- a method for producing a metal oxide film according to an eighth aspect of the invention is irradiation of ultraviolet rays emitted from any one of a low-pressure mercury lamp, an amalgam lamp, and an excimer lamp.
- the organometallic compound comprises an acetylacetone metal complex compound or a metal alkoxide compound, or an acetylacetone metal complex compound and a metal alkoxide compound. It is a manufacturing method of the metal oxide film of description.
- the method for applying the coating liquid for forming a metal oxide film on the substrate in the coating step is an inkjet printing method, a screen printing method, a gravure printing method, an offset printing method, a flexographic printing method, Metal according to the first invention, characterized in that it is any one of a dispenser printing method, a slit coating method, a die coating method, a doctor blade coating method, a wire bar coating method, a spin coating method, a dip coating method and a spray coating method. It is a manufacturing method of an oxide film.
- the twelfth invention of the present invention is a metal oxide film obtained by the method for producing a metal oxide film according to any one of the first to eleventh inventions.
- a thirteenth aspect of the present invention is an element including a metal oxide fine particle layer, wherein the metal oxide fine particle layer is the metal oxide film according to the twelfth invention.
- a fourteenth aspect of the present invention is the element according to the thirteenth aspect, wherein the element is a thin film transistor using the metal oxide fine particle layer as a gate insulating film of the thin film transistor.
- a fifteenth invention of the present invention is a substrate with a metal oxide film comprising a metal oxide film on the substrate, wherein the metal oxide film is the metal oxide film according to the twelfth invention.
- This is a substrate with a metal oxide film.
- the sixteenth invention of the present invention is a device comprising a transparent electrode, wherein the transparent electrode is the substrate with a metal oxide film according to the fifteenth invention.
- a seventeenth aspect of the present invention is the device according to the sixteenth aspect, wherein the device is one selected from a light emitting device, a power generation device, a display device, and an input device.
- the metal oxide in the initial stage of the heat treatment is applied.
- the metal oxide film according to the present invention can be used for various coatings, elements, and devices.
- the metal oxide film is applied as a transparent conductive film (for example, the aforementioned NTO film)
- the metal oxide film is formed on the substrate.
- LED elements As a substrate with a metal oxide film on which the above metal oxide film is formed, LED elements, electroluminescence lamps (electroluminescence elements), light emission devices such as field emission lamps, power generation devices such as solar cells, liquid crystal displays (liquid crystal elements) It is suitable for display devices such as electroluminescence displays (electroluminescence elements), plasma displays, electronic paper elements, electrochromic elements, and input devices such as touch panels.
- Various optical coatings such as anti-reflective coating and highly reflective coating It can be used for Ting etc.
- aluminum oxide, silicon oxide, titanium oxide, zirconium oxide, and cerium oxide can be used for insulating overcoating formed on a (transparent) conductive film by applying their transparency and insulating properties. It can be used as a near-infrared absorbing material (heat ray shielding material) as a chromic display material or cesium-doped tungsten oxide doped with cesium or the like.
- FIG. 2 is a transmission electron micrograph (TEM image) of a cross section of a metal oxide film according to Example 1.
- FIG. 4 is a transmission electron micrograph (TEM image) of a cross section of a metal oxide film according to Example 2.
- FIG. 4 is a transmission electron micrograph (TEM image) of a cross section of a metal oxide film according to Example 3.
- FIG. It is a figure which shows the reflection profile of the metal oxide film which concerns on Example 4 and the comparative example 4.
- FIG. 6 is a transmission electron micrograph (TEM image) of a cross section of a metal oxide film according to Example 4.
- FIG. It is a figure which shows the reflection profile of the metal oxide film which concerns on Example 5 and the comparative example 5.
- FIG. It is a schematic diagram which shows another example of the heat processing process (energy beam irradiation combined use) in the metal oxide film manufacturing process by the coating method which concerns on this invention.
- TEM image 2 is a transmission electron micrograph (TEM image) of a cross section of a metal oxide film according to Comparative Example 1.
- 4 is a transmission electron micrograph (TEM image) of a cross section of a metal oxide film according to Comparative Example 2.
- 10 is a transmission electron micrograph (TEM image) of a cross section of a metal oxide film according to Comparative Example 3.
- 10 is a transmission electron micrograph (TEM image) of a cross section of a metal oxide film according to Comparative Example 4.
- the method for producing a metal oxide film of the present invention is a method for producing a metal oxide film formed by applying a coating liquid for forming a metal oxide film containing an organometallic compound as a main component onto a substrate, drying, and heat treatment.
- the conductivity can be improved, and when it is used for a high refractive index film, the refractive index can be improved. That is, when used as various functional films, the function of the film can be improved.
- metal oxide film structure First, the metal oxide film structure will be described. For example, when a metal oxide film is formed using a vapor phase growth method such as sputtering, a polycrystalline metal oxide film structure in which metal oxide crystal grains are usually arranged through grain boundaries The metal oxide fine particles are hardly observed in the film structure.
- a metal oxide film is formed using a vapor phase growth method such as sputtering
- a polycrystalline metal oxide film structure in which metal oxide crystal grains are usually arranged through grain boundaries The metal oxide fine particles are hardly observed in the film structure.
- metal oxide fine particles are usually bonded together.
- Metal oxide that has a film structure and the size of the metal oxide fine particles and the size of the voids existing between the metal oxide fine particles vary depending on the heat treatment conditions, etc. It is known that a metal oxide film composed of physical fine particles is obtained.
- the conductive mechanism in the metal oxide film has a contact portion (bonded portion) of the metal oxide fine particles.
- the metal oxide fine particles come into contact with each other in a very small area and the conductivity decreases at the contact area. Oxygen and water vapor in the atmosphere enter the film through the open gap. This causes deterioration of the conductivity over time due to atmospheric exposure, which is considered to occur due to deterioration of the contact between the metal oxide fine particles, and a decrease in film strength which is considered to occur due to the rough filling of the metal oxide fine particles.
- the present invention densely fills the metal oxide fine particles and at the same time promotes the crystal growth of the metal oxide fine particles, thereby reducing the number of open pores. And forming a film structure having a metal oxide fine particle layer in which the contact between the metal oxide fine particles is reinforced, and it is possible to improve the conductivity and the film strength. . Furthermore, it is possible to greatly suppress the deterioration of conductivity over time.
- the dense metal oxide fine particle layer has a low water vapor content in the temperature rising process during the heat treatment in the coating method using the above-described coating solution for forming a metal oxide film, that is, the dew point temperature. Is formed by applying a low oxygen-containing atmosphere.
- an oxygen-containing atmosphere having a low water vapor content that is, a low dew point temperature
- the metal in the metal oxide film depends on the type of metal oxide.
- the packing density of the oxide fine particles can be increased to about 90% of the true specific gravity of the metal oxide.
- the packing density remains at about 60 to 70% of the true specific gravity.
- the organometallic compounds used in the present invention include organoaluminum compounds, organosilicon compounds, organoscandium compounds, organotitanium compounds, organovanadium compounds, organochromium compounds, organomanganese compounds, organoiron compounds, organocobalt compounds, organonickel compounds, Organic copper compounds, organic gallium compounds, organic germanium compounds, organic yttrium compounds, organic zirconium compounds, organic niobium compounds, organic molybdenum compounds, organic ruthenium compounds, organic antimony compounds, organic lanthanum compounds, organic hafnium compounds, organic tantalum compounds, organic tungsten Compounds, organic bismuth compounds, organic cerium compounds, organic neodymium compounds, organic samarium compounds, organic gadolinium compounds, organic magnesium compounds, organic calcium compounds, organic organic compounds
- the metal oxide is composed of at least one of
- samarium, gadolinium oxide, magnesium oxide, calcium oxide, strontium oxide, barium oxide and the like are preferable.
- acetylacetone aluminum (formal name: aluminum (III) -2,4-pentanedionate) [Al (C 5 H 7 O 2 ) 3 ] as an aluminum acetylacetone complex, aluminum (III ) ethoxide [Al (C 2 H 5 O ) 3], aluminum (III)-n-butoxide [Al (C 4 H 9 O ) 3], aluminum (III)-tert-butoxide [Al (C 4 H 9 O 3 ], aluminum (III) isopropoxide [Al (C 3 H 7 O) 3 ], etc., are basically dissolved in a solvent, and chlorine gas, nitrogen oxide gas, etc. during the heat treatment Any organic aluminum compound that decomposes into an oxide without generating any harmful gas may be used. Among these, acetylacetone aluminum and aluminum (III) -n-butoxide are preferable because they are relatively inexpensive and easily available.
- an organic scandium compound of an organometallic compound for example, acetylacetone scandium (formal name: scandium (III) -2,4-pentandionate) [Sc (C 5 H 7 O 2 ) 3 ] as a scandium acetylacetone complex
- any organic scandium compound that dissolves in a solvent and decomposes into an oxide without generating a harmful gas such as chlorine gas or nitrogen oxide gas during heat treatment may be used.
- an organotitanium compound of an organometallic compound for example, acetylacetone titanium (formal name: titanium (IV) di-n-butoxide bis (2,4-pentanedionate) [Ti (C 4 H 9 O) as a titanium acetylacetone complex ) 2 (C 5 H 7 O 2 ) 2 ]), titanyl (IV) acetylacetonate [(C 5 H 7 O 2 ) 2 TiO], titanium (IV) diisopropoxide bis (2,4-pentanedio Nate) [Ti (C 3 H 7 O) 2 (C 5 H 7 O 2 ) 2 ] and the like, titanium (IV) tetraethoxide [Ti (C 2 H 5 O) 4 ], titanium ( IV)-tert-butoxide [Ti (C 4 H 9 O ) 4], titanium (IV) tetra -n- butoxide [Ti (C 4 H 9 O ) 4], titanium (IV Although
- organic vanadium compound of an organometallic compound for example, vanadium (IV) oxide bis-2,4-pentandionate [VO (C 5 H 7 O 2 ) 2 ] as a vanadium acetylacetone complex, acetylacetone vanadium (formal name: Vanadium (III) -2,4-pentanedionate) [V (C 5 H 7 O 2 ) 3 ] and the like are basically used, but it is dissolved in a solvent and oxidized with chlorine gas or nitrogen during heat treatment. Any organic vanadium compound that decomposes into an oxide without generating a harmful gas such as a product gas may be used.
- organic chromium compound of an organometallic compound for example, acetylacetone chromium (formal name: chromium (III) -2,4-pentandionate) [Cr (C 5 H 7 O 2 ) 3 ] as a chromium acetylacetone complex, Chromium (III) isopropoxide [Cr (C 3 H 7 O) 3 ] as a chromium alkoxide, such as chromium (II) acetate [Cr (CH 3 COO) 2 ], chromium chromium acetate (III) ) [Cr (CH 3 COO) 2 (OH)], etc., are basically dissolved in a solvent and oxidized without generating harmful gases such as chlorine gas and nitrogen oxide gas during heat treatment. Any organic chromium compound that decomposes into a material may be used.
- organomanganese compound of the organometallic compound for example, acetylacetone manganese ⁇ (formal name: manganese (II) -2,4-pentanedionate) [Mn (C 5 H 7 O 2 ) 2 ], as a manganese acetylacetone complex, Formal name: Manganese (III) -2,4-pentanedionate) [Mn (C 5 H 7 O 2 ) 3 ] ⁇ and the like, and manganese (II) acetate [Mn (CH 3 COO) 2 as an organic acid manganese Basically, any organic manganese compound that dissolves in a solvent and decomposes into an oxide without generating a harmful gas such as chlorine gas or nitrogen oxide gas during heat treatment may be used.
- an organic iron compound of an organometallic compound for example, acetylacetone iron (formal name: iron (III) -2,4-pentanedionate) [Fe (C 5 H 7 O 2 ) 3 ] as an iron acetylacetone complex, Iron (III) ethoxide [Fe (C 2 H 5 O) 3 ] as an iron alkoxide and iron acetate (III) [Fe (CH 3 COO) 3 ] as an organic acid iron can be mentioned, but basically May be any organic iron compound that dissolves in a solvent and decomposes into an oxide without generating harmful gases such as chlorine gas or nitrogen oxide gas during heat treatment.
- organic cobalt compound of the organometallic compound for example, acetylacetone cobalt ⁇ (formal name: cobalt (II) -2,4-pentandionate) [Co (C 5 H 7 O 2 ) 2 ], as a cobalt acetylacetone complex, (Formal name: Cobalt (III) -2,4-pentanedionate) [Co (C 5 H 7 O 2 ) 3 ] ⁇ and the like, and cobalt (II) acetate [Co (CH 3 COO) as an organic acid cobalt 2 ] etc., but basically, any organic cobalt compound that dissolves in a solvent and decomposes into an oxide without generating harmful gases such as chlorine gas and nitrogen oxide gas during heat treatment may be used. .
- an organic nickel compound of an organometallic compound for example, acetylacetone nickel (formal name: nickel (II) -2,4-pentanedionate) [Ni (C 5 H 7 O 2 ) 2 ] as a nickel acetylacetone complex, etc.
- nickel acetate (II) [Ni (CH 3 COO) 2 ] as organic acid nickel, etc. are basically dissolved in a solvent and heated Any organic nickel compound that decomposes into oxides without generating harmful gases such as chlorine gas and nitrogen oxide gas during the treatment may be used.
- an organic copper compound of an organic metal compound for example, acetylacetone copper (formal name: copper (II) -2,4-pentanedionate) [Cu (C 5 H 7 O 2 ) 2 ] as a copper acetylacetone complex, Copper (II) ethoxide [Cu (C 2 H 5 O) 2 ] as a copper alkoxide, such as copper (II) formate [Cu (HCOO) 2 ], copper (II) acetate [Cu (CH 3 ) as an organic acid copper COO) 2 ] and the like.
- it may be an organic copper compound that dissolves in a solvent and decomposes into an oxide without generating harmful gases such as chlorine gas and nitrogen oxide gas during heat treatment. It ’s fine.
- acetylacetone gallium (formal name: gallium (III) -2,4-pentandionate) [Ga (C 5 H 7 O 2 ) 3 ]
- gallium alkoxide as a gallium acetylacetone complex
- Gallium (III) ethoxide [Ga (C 2 H 5 O) 3 ]
- germanium (IV) tetraethoxide, germanium (IV) tetra-n-butoxide, and germanium (IV) tetraisopropoxide are preferable because they are relatively inexpensive and easily available.
- organic yttrium compound of an organometallic compound for example, acetylacetone yttrium (formal name: yttrium (III) -2,4-pentandionate) [Y (C 5 H 7 O 2 ) 3 ] as an yttrium acetylacetone complex
- examples include yttrium (III) isopropoxide [Y (C 3 H 7 O) 3 ] as yttrium alkoxide, and yttrium acetate (III) [Y (CH 3 COO) 3 ] as organic acid yttrium.
- it may be an organic yttrium compound that dissolves in a solvent and decomposes into an oxide without generating harmful gases such as chlorine gas and nitrogen oxide gas during heat treatment.
- niobium (V) ethoxide as a niobium alkoxide [Nb (C 2 H 5 O) 5 ], niobium (V) -n-butoxide [Nb (C 4 H 9 O) 5 ] and the like, but basically, any organic niobium compound that dissolves in a solvent and decomposes into an oxide without generating harmful gases such as chlorine gas and nitrogen oxide gas during heat treatment may be used. .
- organomolybdenum compound of the organometallic compound examples include molybdenum (VI) oxide bis-2,4-pentanedionate [MoO 2 (C 5 H 7 O 2 ) 2 ] as a molybdenum acetylacetone complex and molybdenum as a molybdenum alkoxide.
- V Ethoxide [Mo (C 2 H 5 O) 5 ] and the like can be mentioned, but basically, it is dissolved in a solvent, and no harmful gas such as chlorine gas or nitrogen oxide gas is generated during heat treatment. Any organic molybdenum compound that decomposes into an oxide can be used.
- organoruthenium compound of the organometallic compound examples include acetylacetone ruthenium (formal name: ruthenium (III) -2,4-pentandionate) [Ru (C 5 H 7 O 2 ) 3 ] as a ruthenium acetylacetone complex.
- ruthenium (III) -2,4-pentandionate) [Ru (C 5 H 7 O 2 ) 3 ] as a ruthenium acetylacetone complex.
- any organic ruthenium compound that dissolves in a solvent and decomposes into an oxide without generating harmful gases such as chlorine gas and nitrogen oxide gas during heat treatment may be used.
- organic antimony compound of the organometallic compound for example, antimony (III) acetate [Sb (CH 3 COO) 3 ], antimony (III) ethoxide as antimony alkoxide [Sb (C 2 H 5 O) 3 ], antimony ( III) -n-butoxide [Sb (C 4 H 9 O) 3 ] and the like are basically mentioned, but basically, it is dissolved in a solvent, and harmful gases such as chlorine gas and nitrogen oxide gas are generated during the heat treatment. Any organic antimony compound that can be decomposed into an oxide without being used. Among these, antimony (III) -n-butoxide is preferable because it is relatively inexpensive and easily available.
- organic lanthanum compound of an organometallic compound for example, acetylacetone lanthanum (formal name: lanthanum (III) -2,4-pentanedionate) [La (C 5 H 7 O 2 ) 3 ] as a lanthanum acetylacetone complex
- examples include lanthanum (III) isopropoxide [La (C 3 H 7 O) 3 ] as lanthanum alkoxide and lanthanum acetate (III) [La (CH 3 COO) 3 ] as organic acid lanthanum.
- it may be an organic lanthanum compound that dissolves in a solvent and decomposes into an oxide without generating harmful gases such as chlorine gas and nitrogen oxide gas during heat treatment.
- hafnium (IV) di-n-butoxide bis (2,4-pentandionate) [Hf (C 4 H 9 O) 2 (C 5 H) as a hafnium acetylacetone complex is used.
- hafnium (IV) -n-butoxide as hafnium alkoxide [ Hf (C 2 H 5 O) 4]
- hafnium (IV)-n-butoxide hafnium (IV)-tert-butoxide
- hafnium (IV) isopropoxide mono isopropylate Hf (C 3 H 7 O ) 4 (C 3 H 7 OH)]
- Hitoshigakyo Is but basically, dissolved in a solvent may be any decomposed organic hafnium compound oxide without generating harmful gas such as chlorine gas or nitrogen oxide gas at the time of the heating process.
- hafnium (IV) -n-butoxide as hafnium alkoxide [ Hf (C 2 H 5 O) 4]
- hafnium (IV)-n-butoxide hafnium (IV)-n-butoxide
- hafnium (IV)-tert-butoxide hafnium (IV) isopropoxide mono iso
- Examples of the organic tantalum compound of the organometallic compound include, for example, tantalum (V) tetraethoxide-pentanedionate as a tantalum acetylacetone complex) [Ta (C 5 H 7 O 2 ) (OC 2 H 5 ) 4 ], tantalum alkoxide.
- V tantalum tetraethoxide-pentanedionate as a tantalum acetylacetone complex
- Ta (C 5 H 7 O 2 ) (OC 2 H 5 ) 4 tantalum alkoxide.
- organotungsten compound of the organometallic compound examples include tungsten (V) ethoxide [W (C 2 H 5 O) 5 ] and tungsten (VI) ethoxide [W (C 2 H 5 O) 6 ] as tungsten alkoxide.
- tungsten (V) ethoxide [W (C 2 H 5 O) 5 ] and tungsten (VI) ethoxide [W (C 2 H 5 O) 6 ] as tungsten alkoxide.
- any organic tungsten compound that dissolves in a solvent and decomposes into an oxide without generating harmful gases such as chlorine gas and nitrogen oxide gas during heat treatment may be used.
- organic bismuth compound of an organometallic compound for example, acetylacetone bismuth (formal name: bismuth (III) -2,4-pentanedionate) [Bi (C 5 H 7 O 2 ) 3 ] as a bismuth acetylacetone complex, etc.
- an organic cerium compound of an organometallic compound for example, acetylacetone cerium (formal name: cerium (III) -2,4-pentandionate) [Ce (C 5 H 7 O 2 ) 3 ], cerium as a cerium acetylacetone complex Cerium (IV) methoxyethoxide [Ce (CH 3 OC 2 H 5 O) 4 ], cerium (IV) -tert-butoxide [Ce (C 4 H 9 O) 4 ], cerium (IV) isopropoxy as alkoxides [Ce (C 3 H 7 O) 4 ] and the like, but basically, the oxide is dissolved in a solvent and does not generate harmful gas such as chlorine gas or nitrogen oxide gas during heat treatment. Any organic cerium compound that can be decomposed into any one may be used.
- organic neodymium compound of an organometallic compound for example, acetylacetone neodymium (formal name: neodymium (III) -2,4-pentanedionate) [Nd (C 5 H 7 O 2 ) 3 ] as a neodymium acetylacetone complex, Examples thereof include neodymium (III) methoxyethoxide [Nd (CH 3 OC 2 H 4 O) 3 ] as neodymium alkoxide, neodymium acetate (III) [Nd (CH 3 COO) 3 ] as organic acid neodymium, and the like.
- any organic neodymium compound that dissolves in a solvent and decomposes into an oxide without generating harmful gases such as chlorine gas and nitrogen oxide gas during heat treatment may be used.
- an organic samarium compound of an organometallic compound for example, acetylacetone samarium (formal name: samarium (III) -2,4-pentandionate) [Sm (C 5 H 7 O 2 ) 3 ] as a samarium acetylacetone complex, Samarium (III) isopropoxide [Sm (C 3 H 7 O) 3 ] and the like as samarium alkoxide, and samarium acetate (III) [Sm (CH 3 COO) 3 ] and the like as organic acid samarium, etc.
- it may be an organic samarium compound that dissolves in a solvent and decomposes into an oxide without generating harmful gases such as chlorine gas and nitrogen oxide gas during heat treatment.
- an organic gadolinium compound of an organometallic compound for example, acetylacetone gadolinium (formal name: gadolinium (III) -2,4-pentandionate) [Gd (C 5 H 7 O 2 ) 3 ] as a gadolinium acetylacetone complex, etc.
- gadolinium acetate (III) [Gd (CH 3 COO) 3 ] as an organic acid gadolinium can be used, but basically, it is dissolved in a solvent, and harmful gases such as chlorine gas and nitrogen oxide gas are used during heat treatment. Any organic gadolinium compound that decomposes into oxide without generating gas may be used.
- an organomagnesium compound of an organometallic compound for example, acetylacetone magnesium (formal name: magnesium (II) -2,4-pentandionate) [Mg (C 5 H 7 O 2 ) 2 ] as a magnesium acetylacetone complex, etc.
- magnesium (II) n-propoxide [Mg (C 3 H 7 O) 2 ] and the like as magnesium alkoxide are basically used. May be any organic magnesium compound that dissolves in a solvent and decomposes into an oxide without generating harmful gases such as chlorine gas and nitrogen oxide gas during heat treatment.
- organic calcium compound of an organometallic compound for example, acetylacetone calcium (formal name: calcium (II) -2,4-pentandionate) [Ca (C 5 H 7 O 2 ) 2 ] as a calcium acetylacetone complex
- examples include calcium (II) ethoxide [Ca (C 2 H 5 O) 2 ] as calcium alkoxide, calcium acetate (II) [Ca (CH 3 COO) 2 ] as organic acid calcium, and the like.
- an organic strontium compound of an organometallic compound for example, acetylacetone strontium (formal name: strontium (II) -2,4-pentandionate) [Sr (C 5 H 7 O 2 ) 2 ] as a strontium acetylacetone complex
- strontium (II) isopropoxide Sr (C 3 H 7 O) 2
- strontium acetate II
- strontium (CH 3 COO) 2 organic acid strontium.
- it may be an organic strontium compound that dissolves in a solvent and decomposes into an oxide without generating harmful gases such as chlorine gas and nitrogen oxide gas during heat treatment.
- organic barium compound of an organometallic compound for example, acetylacetone barium (formal name: barium (II) -2,4-pentanedionate) [Ba (C 5 H 7 O 2 ) 2 ] as a barium acetylacetone complex
- examples include barium (II) isopropoxide [Ba (C 3 H 7 O) 2 ] as barium alkoxide and barium acetate (II) [Ba (CH 3 COO) 2 ] as organic acid barium.
- it may be an organic barium compound that dissolves in a solvent and decomposes into an oxide without generating harmful gases such as chlorine gas and nitrogen oxide gas during heat treatment.
- the organometallic compound in the coating solution for forming a metal oxide film is a main compound raw material for forming a metal oxide film on a substrate, and its content is preferably in the range of 1 to 30% by weight, More preferably, the content is 5 to 20% by weight. If the total content is less than 1% by weight, only a thin metal oxide film can be obtained, and sufficient conductivity cannot be obtained. On the other hand, if it exceeds 30% by weight, the organometallic compound in the coating solution for forming a metal oxide film is likely to be precipitated and the stability of the coating solution is reduced, or the resulting metal oxide film becomes too thick and cracks ( Cracks) may occur.
- organic indium compounds As needed, you may add any one or more of a small amount of organic indium compounds, organic tin compounds, and organic zinc compounds to the coating liquid for transparent conductive film formation.
- organic indium compound acetylacetone indium (formal name: tris (acetylacetonato) indium (III)) [In (C 5 H 7 O 2 ) 3 ], indium (ethyl) ethyl acetate (III) [In ( C 7 H 15 COO 2 ) 3 ], indium formate (III) [In (HCOO) 3 ], indium (III) acetate [In (CH 3 COO) 3 ], indium (III) methoxyethoxide as indium alkoxide [ In (CH 3 OC 2 H 4 O) 3 ] and the like are basically used, but the oxide is dissolved in a solvent and does not generate harmful gas such as chlorine gas or nitrogen oxide gas during heat treatment.
- any organic indium compound that can be decomposed into any one may be used.
- indium acetylacetone is preferable because it is highly soluble in an organic solvent and is thermally decomposed and burned (oxidized) at a temperature of about 200 to 250 ° C. to form an oxide.
- organic tin compound (the valence of tin in the compound is not limited to bivalent and tetravalent), for example, acetylacetone tin (formal name: di-n-butyl bis (2,4-pentanedionato) tin (IV ), [Sn (C 4 H 9) 2 (C 5 H 7 O 2) 2], 2- ethylhexanoate (II) (also known as tin octylate (II)) [Sn (C 7 H 15 COO 2 ) 2 ], tin (II) acetate [Sn (CH 3 COO) 2 ], tin (IV) [Sn (CH 3 COO) 4 ], di-n-butyltin (IV) diacetate [Sn (C 4) H 9 ) 2 (CH 3 COO) 2 ], tin (II) formate [Sn (HCOO) 2 ], tin (IV) -tert-butoxide [Sn
- any organic tin compound that decomposes into an oxide without generating harmful gases such as chlorine gas, nitrogen oxide gas, etc.
- acetylacetone tin is preferable because it is relatively inexpensive and easily available.
- organic zinc compound for example, acetylacetone zinc (formal name: zinc (II) -2,4-pentandionate) [Zn (C 5 H 7 O 2 ) 2 ], zinc (II) — as a zinc acetylacetone complex 2,2,6,6-tetramethyl-3,5-heptanedionate [Zn (C 11 H 19 O 2 ) 2 ], zinc (II) methoxyethoxide as zinc alkoxide [Zn (CH 3 OC 2 H) 4 O) 2 ] and the like.
- it is an organic zinc compound that dissolves in a solvent and decomposes into an oxide without generating harmful gases such as chlorine gas and nitrogen oxide gas during heat treatment. I need it.
- zinc acetylacetone is preferable because it is inexpensive and easily available.
- an organic binder may be added to the coating solution for forming a metal oxide film, if necessary.
- an organic binder By adding an organic binder, the wettability with respect to the substrate is improved, and at the same time, the viscosity of the coating solution can be adjusted.
- the organic binder is preferably a material that burns or thermally decomposes during heat treatment, and as such a material, a cellulose derivative, an acrylic resin, or the like is effective.
- cellulose derivatives used in organic binders include methylcellulose, ethylcellulose, hydroxymethylcellulose, hydroxyethylcellulose, hydroxypropylcellulose, hydroxyethylmethylcellulose, hydroxypropylmethylcellulose, ethylhydroxyethylcellulose, carboxymethylcellulose, carboxyethylcellulose, carboxyethylmethylcellulose, nitrocellulose, etc.
- hydroxypropyl cellulose hereinafter sometimes referred to as “HPC”
- HPC hydroxypropyl cellulose
- many types of cellulose derivatives and acrylic resins having different molecular weights are commercially available.
- HPC has a high molecular weight type, a medium molecular weight type, and a low molecular weight type depending on the size of the molecular weight.
- the viscosity of the coating liquid for forming a metal oxide film blended as a binder can be increased as the molecular weight increases.
- the selection of the molecular weight type and determination of the blending amount must be optimized as needed depending on the coating properties of the coating solution for forming a metal oxide film and the coating method and coating thickness of the coating solution for forming a metal oxide film. is there.
- the combustion start temperature of HPC is about 300 ° C., and if the heat treatment is performed at a heating temperature of 300 ° C. or more, preferably 350 ° C. or more, it burns. However, it is possible to produce a metal oxide film with good quality.
- the content of HPC is more than 5% by weight, it becomes gelled and tends to remain in the coating solution, forming a very porous metal oxide film, and the transparency and conductivity are significantly impaired.
- the viscosity of the coating liquid can be set lower than that when HPC is usually used, but a high-viscosity coating liquid is preferable. Etc., the pattern printability is slightly lowered.
- the acrylic resin is preferably an acrylic resin that burns at a relatively low temperature.
- NMP N-methyl-2-pyrrolidone
- ⁇ -butyrolactone capable of dissolving various metal acetylacetone complex compounds and various metal alkoxide compounds at high concentrations are preferable.
- NMP N-methyl-2-pyrrolidone
- ⁇ -butyrolactone capable of dissolving various metal acetylacetone complex compounds and various metal alkoxide compounds at high concentrations.
- another preferred solvent either or both of alkylphenol and alkenylphenol and a dibasic acid ester, or either or both of alkylphenol and alkenylphenol and benzyl acetate, or a mixed solution thereof can be mentioned.
- alkylphenol or alkenylphenol examples include cresols, xylenol, ethylphenol, p-tert-butylphenol, octylphenol, nonylphenol, cashew nut shell liquid [3 pentadecadeseal phenol], and the like.
- basic acid dimethyl, dibasic acid diethyl and the like succinic acid ester, glutaric acid ester, adipic acid ester, malonic acid ester, phthalic acid ester and the like are used.
- the solvent to be mixed with the coating solution for forming a metal oxide film is compatible with a solution in which various organometallic compounds and cellulose derivatives or acrylic resins are dissolved.
- a solution in which various organometallic compounds and cellulose derivatives or acrylic resins are dissolved As other solvents, water, methanol (MA), ethanol (EA), 1-propanol (NPA), isopropanol (IPA), butanol, pentanol, benzyl alcohol, diacetone alcohol (DAA), etc.
- Alcohol solvents such as cyclohexanone, isophorone, ethyl acetate, butyl acetate, isobutyl acetate, amyl formate, isoamyl acetate, butyl propionate , Isopropyl butyrate, ethyl butyrate Butyl butyrate, methyl lactate, ethyl lactate, methyl oxyacetate, ethyl oxyacetate, butyl oxyacetate, methyl methoxyacetate, ethyl methoxyacetate, butyl methoxyacetate, methyl ethoxyacetate, ethyl ethoxyacetate, methyl 3-oxypropionate, 3 -Ethyl oxypropionate, methyl 3-methoxypropionate, 3 -Ethyl oxypropionate, methyl 3-methoxypropionate, 3 -Ethyl oxypropionate, methyl 3-methoxypropionate
- the solvents used include methyl ethyl ketone (MEK), cyclohexanone, propylene glycol monomethyl ether (PGM), N-methyl-2-pyrrolidone (NMP), ⁇ -butyrolactone, and the like. preferable.
- the coating solution for forming a metal oxide film used in the present invention includes the above organoaluminum compound, organosilicon compound, organoscandium compound, organotitanium compound, organovanadium compound, organochromium compound, organomanganese compound, organoiron compound, and organocobalt compound.
- the melting by heating is usually performed by setting the heating temperature to 60 to 200 ° C. and stirring for 0.5 to 12 hours.
- the heating temperature is lower than 60 ° C., it is not sufficiently dissolved.
- a coating solution for forming a metal oxide film mainly composed of an organic indium compound precipitation and separation of a metal compound such as acetylacetone indium occurs. If the stability of the coating solution is lowered and the temperature is higher than 200 ° C., the evaporation of the solvent becomes remarkable and the composition of the coating solution changes, which is not preferable.
- the viscosity of the coating solution for forming a metal oxide film can be adjusted by the molecular weight and content of the organic binder and the type of solvent, the inkjet printing method, the screen printing method, the gravure printing method, the offset printing method, the flexographic printing method. It can be adjusted to the viscosity suitable for each coating method such as coating method, dispenser printing method, slit coating method, die coating method, doctor blade coating method, wire bar coating method, spin coating method, spray coating method, etc. .
- a coating solution having a high viscosity (about 5,000 to 50,000 mPa ⁇ s) can be prepared by containing a high molecular weight organic binder in an amount of 5% by weight or less, preferably 2 to 4% by weight, and has a low viscosity (about 5 to 500 mPa ⁇ s).
- a medium viscosity (500 to 5000 mPa ⁇ s) coating solution can be produced by mixing a high viscosity coating solution and a low viscosity coating solution.
- the manufacturing method of the metal oxide film of the present invention includes a coating process in which a coating liquid for forming a metal oxide film is applied on a substrate to form a coating film, a drying process in which the coating film is dried to form a dry coating film, and the drying It forms through each process of the heat processing process which heat-processes a coating film in oxygen-containing atmosphere with low dew point temperature, and forms an inorganic film.
- (A) Application process Application of the coating solution for forming a metal oxide film on a substrate is performed by inkjet printing, screen printing, gravure printing, offset printing, flexographic printing, dispenser printing, slit coating, or die coating.
- the coating is performed using various coating methods such as a coating method, a doctor blade coating method, a wire bar coating method, a spin coating method, and a spray coating method. These coatings are preferably performed in a clean atmosphere such as a clean room where the temperature and humidity are controlled.
- the temperature is generally room temperature (about 25 ° C.) and the humidity is generally 40 to 60% RH.
- inorganic substrates such as soda lime glass, alkali-free glass and quartz glass, polyethylene naphthalate (PEN), polyethylene terephthalate (PET), nylon, polyethersulfone (PES), urethane, cycloolefin resin ( ZEONOR [manufactured by Nippon Zeon Co., Ltd.] or Arton [manufactured by JSR Co., Ltd.]), a resin substrate (heat-resistant plastic film) such as fluorine-based resin and polyimide (PI) can be used.
- PEN polyethylene naphthalate
- PET polyethylene terephthalate
- PET nylon
- PES polyethersulfone
- urethane urethane
- cycloolefin resin ZEONOR [manufactured by Nippon Zeon Co., Ltd.] or Arton [manufactured by JSR Co., Ltd.]
- a resin substrate heat-resistant plastic film
- drying step In the next drying step, the substrate coated with the coating solution for forming a metal oxide film is usually kept in the atmosphere at 80 to 180 ° C. for 1 to 30 minutes, preferably 2 to 10 minutes to form a coating film. Drying is performed to prepare a dry coating film.
- the drying conditions drying temperature, drying time
- drying time may be appropriately selected depending on the type of substrate to be used, the coating thickness of the coating solution for forming a metal oxide film, and the like, and are not limited to the above drying conditions. However, in consideration of productivity, it is desirable that the drying time is shortened to the minimum necessary so that the quality of the obtained dry coating film does not deteriorate.
- the drying temperature needs to be equal to or lower than the heat resistance temperature of the substrate to be used.
- the PEN film it is necessary to set it to about 200 ° C. or less (depending on the drying time).
- it can replace with drying in air
- inflation pressure 1 kPa or less normally.
- this drying under reduced pressure the solvent in the applied coating liquid for forming a transparent conductive film is forcibly removed under reduced pressure, and the drying proceeds. Therefore, drying at a lower temperature is possible compared to drying in the air. Therefore, it is useful when a substrate made of a material having poor heat resistance or solvent resistance is used.
- the produced dry coating film is obtained by volatilizing and removing the organic solvent from the coating solution for forming a metal oxide film, and the above-mentioned organometallic compound (an organic indium compound added in a small amount as necessary, Organic tin compounds, organic zinc compounds), and organic components such as organic binders.
- organometallic compound an organic indium compound added in a small amount as necessary, Organic tin compounds, organic zinc compounds
- organic components such as organic binders.
- (C) Heat treatment step In the heat treatment step, the dried coating film produced in the drying step is heated in an oxygen-containing atmosphere having a low dew point temperature, and the organometallic compound in the dried coating film or a small amount of the organometallic compound is added.
- a dense inorganic film (metal oxide fine particles) made of inorganic components (metal oxide as a main component) by mineralizing organic components such as organic binders and organic binders containing pyroxene by thermal decomposition and combustion (oxidation) Forming a metal oxide film as a finely packed metal oxide fine particle layer).
- the organometallic compounds including those containing a small amount of organometallic compounds
- mineralization so-called mineralization
- the heating temperature rises further and usually exceeds the range of 300 to 330 ° C, or even if it remains in the range of 300 to 330 ° C, crystallization of the metal oxide occurs when the heating time is prolonged, and further crystal growth As a result, metal oxide fine particles are formed, which is a constituent element of the final metal oxide film.
- the temperature of 300 to 330 ° C. indicates a general temperature range in which mineralization and crystallization are likely to occur. For example, when the heating time is long, the above-described metal oxidation is performed even at about 270 ° C. Since the mineralization, crystallization, and crystal growth of the product may occur, the heating temperature in the heat treatment step of the present invention is not limited to 300 ° C. or higher.
- the organic binder is also gradually pyrolyzed and burned (oxidized) during the heating process of the heat treatment process, but it is mainly converted to carbon dioxide (CO 2 ) and volatilized in the atmosphere and disappears from the film.
- CO 2 carbon dioxide
- the organic binder it depends on the type of organic binder, for example, in the case of the above-mentioned HPC, it almost disappears at about 300 to 350 ° C.), so that it finally hardly remains in the metal oxide film.
- a large amount of organic binder remains until the initial stage of the heat treatment process (the stage where the temperature rises, for example, the stage where the heating is performed from room temperature to 300 ° C.), and the organic binder is between the amorphous metal oxides.
- the organic binder component gradually disappears and crystallization of the metal oxide occurs.
- an oxygen-containing atmosphere having a low dew point temperature that is, a low water vapor content (for reference, FIG. 1 shows a saturated water vapor content (volume%) in air and a dew point temperature ( ))
- a low water vapor content for reference, FIG. 1 shows a saturated water vapor content (volume%) in air and a dew point temperature ( )
- FIG. 1 shows a saturated water vapor content (volume%) in air and a dew point temperature ( )
- crystallization of metal oxide and crystal growth due to mineralization occurring in the initial stage of the heat treatment process are suppressed, and metal oxidation is performed.
- the mechanism by which the metal oxide fine particles are densely packed is not necessarily clear, but can be considered as follows, for example.
- the above amorphous metal A film structure in which an organic binder is uniformly interposed between oxides is maintained, and this film structure is flexible by the action of an organic binder, which is an organic substance, and contracts (densifies) the film in the direction perpendicular to the substrate.
- crystallization of metal oxides is suppressed to the limit of the heating temperature at which the organic binder disappears (up to about 300 to 350 ° C).
- the shrinkable film structure can be taken, and it is presumed that the film will be densified.
- the reason why the crystallization of the metal oxide and the crystal growth are suppressed in an air atmosphere having a low dew point temperature, that is, a low water vapor content is not clear, but for example, water vapor in the air atmosphere is (1) has an action of promoting thermal decomposition and combustion (oxidation) of the organic binder component interposed between the metal oxides, (2) It may be considered that the metal oxide itself has an action of promoting crystallization and crystal growth.
- the temperature is raised to a temperature at which crystallization of the metal oxide occurs or higher (usually 300 to 330 ° C. or higher), and heat treatment is performed.
- a dense transparent conductive film can be obtained by a simple heat treatment in an oxygen-containing atmosphere having a dew point temperature of ⁇ 10 ° C. or lower as described above, heating using energy beam irradiation described below in combination with the simple heat treatment described above.
- heating temperature of the heat treatment under an oxygen-containing atmosphere having a dew point temperature of ⁇ 10 ° C. or lower is greatly reduced (as described later, Heating temperature can be lowered to 100-200 ° C.).
- this is a method in which the dried coating film obtained in the drying step is irradiated with energy rays while being heated in an oxygen-containing atmosphere having a dew point temperature of ⁇ 10 ° C. or lower.
- the organic component of the dry coated film is gradually decomposed and burned (oxidized), the film becomes inorganic, the film thickness gradually decreases, and the densification is further promoted.
- a dry coating film having a thickness of about 300 to 500 nm is finally changed into a dense inorganic film having a thickness of about 80 to 100 nm by irradiation with a low-temperature heating energy beam of 150 to 200 ° C. in the above-mentioned oxygen-containing atmosphere. Can do.
- a simple heat treatment in an oxygen-containing atmosphere having a dew point temperature of ⁇ 10 ° C. or lower can be subsequently performed at 300 ° C. or higher.
- the densification of the film is further promoted by heating energy ray irradiation at a relatively low temperature (100 to 200 ° C.), and crystallization is promoted by a simple heat treatment at a relatively high temperature (300 ° C. or higher). Therefore, a higher quality metal oxide film can be obtained.
- the heating temperature in the heating energy ray irradiation is preferably less than 300 ° C., preferably 40 to 250 ° C., more preferably 100 to 200 ° C., and still more preferably 100 to 150 ° C.
- the temperature is 300 ° C. or higher, thermal decomposition of the dried coating film to which the energy beam irradiation is performed before the energy beam irradiation is started, so that densification of the film is hindered.
- the temperature below 40 ° C. is not practical at all, it is necessary to pay sufficient attention to the decrease in the rate of mineralization and densification of the dried coating film by heating energy ray irradiation.
- the energy beam irradiation used for the heating energy beam irradiation is desirably ultraviolet irradiation including at least a wavelength of 200 nm or less as one of the main components, and more specifically, a low-pressure mercury lamp, an amalgam lamp, Irradiation with ultraviolet rays emitted from any of the excimer lamps is preferred.
- the irradiation amount of ultraviolet rays is illuminance of light having a wavelength of 200 nm or less: 2 mW / cm 2 or more, preferably 4 mW / cm 2 or more.
- the irradiation time is 1 minute or longer, preferably 2 minutes or longer, preferably 4 minutes or longer.
- the irradiation time is too short, the effects of energy beam irradiation (mineralization and densification) will be insufficient, and conversely if it is too long (for example, a long time exceeding 60 minutes), the productivity (treatment efficiency) will be remarkable.
- the effect (inorganicization and densification) of energy beam irradiation is not preferable because it is almost saturated in the middle.
- the irradiation amount of the ultraviolet rays can be appropriately adjusted by the distance between the substrate and the lamp (irradiation distance), the irradiation time, or the output of the lamp.
- straight tube lamps may be arranged in parallel, or a surface light source of a grid type lamp may be used.
- the energy ray irradiation lamp usually emits heat rays in addition to energy rays such as ultraviolet rays, for example, when the heating temperature in heating energy ray irradiation is as low as about 40 to 50 ° C., it is not always necessary. It is not necessary to heat the substrate with a heating device (such as a hot plate). In other words, the substrate is heated to at least about 40 to 50 ° C. by the heat ray irradiation from the energy ray irradiation lamp without being heated by the heating device.
- a heating device such as a hot plate
- the energy beam irradiation in the heating energy beam irradiation may be performed on the entire surface of the dry coating film, or may be performed in a pattern shape only on a specific portion of the dry coating film.
- a metal oxide fine particle layer having a pattern shape can be formed.
- the portion is not mineralized. It can be removed by dissolving in a soluble organic solvent.
- the mineralized metal oxide fine particle layer portion is not dissolved at all in the organic solvent, only the metal oxide fine particle layer portion can be left on the substrate.
- the organic solvent excellent in solubility of the dry coating film include methyl ethyl ketone (MEK), methyl propyl ketone, methyl isobutyl ketone (MIBK), cyclohexanone, acetylacetone (2,4-pentanedione), dimethylformamide (DMF), Examples include dimethyl sulfoxide (DMSO), N-methyl-2-pyrrolidone (NMP), and ⁇ -butyrolactone.
- an amalgam lamp is a low-pressure mercury lamp that generally encloses argon gas and mercury in a quartz glass tube. The output can be increased by about 2 to 3 times, and the output wavelength characteristic is almost the same as that of the low-pressure mercury lamp, so that detailed description is omitted.
- an amalgam lamp is also preferable, as is the case with a low-pressure mercury lamp, because there are few restrictions on use in heating energy ray irradiation, and the influence of heating on the lamp can be reduced when used together with heat treatment.
- a special device that cools the lamp using nitrogen gas or the like that does not absorb ultraviolet rays as a cooling gas, and this is not the case.
- the low-pressure mercury lamp emits ultraviolet rays having wavelengths of 185 nm and 254 nm.
- the light of 185 nm decomposes oxygen to generate ozone as shown in the following reaction formulas (1) to (3).
- the ozone is decomposed by light of 254 nm at a speed of ms (milliseconds) to generate high energy active atomic oxygen O ( 1 D).
- 185 nm light photon energy: 647 kJ / mol
- 254 nm light break the chemical bond of the organic substance, and ozone and active atomic oxygen act on the organic substance whose chemical bond is cut, and finally It is thought that organic substances are oxidized and volatilized into water and carbon dioxide.
- the effective irradiation distance is 0 to 20 mm (the critical irradiation distance is 200 mm), and a relatively long irradiation distance can be secured.
- an excimer lamp (xenon excimer lamp) emits ultraviolet light having a wavelength of 172 nm, and, for example, in the air, unlike a low-pressure mercury lamp, high-energy active atomic oxygen O ( 1 D shown in the following reaction formula (4) ) Can be directly generated (the dissociation of reaction formula (4) requires a wavelength of 175 nm or less, so this dissociation does not occur with light of 185 nm from a low-pressure mercury lamp). Further, ozone can be generated by reaction formula (5), and active atomic oxygen can also be generated by reaction formula (6) (reaction formula (6) is a secondary reaction, and the main generation of active atomic oxygen is the reaction formula). (4).
- 172 nm light has an oxygen absorption coefficient about 100 times larger than that of 185 nm light from a low-pressure mercury lamp and is strongly absorbed by oxygen. Therefore, the ozone and high-energy active atomic oxygen are Oxidation reaction takes place only in the vicinity, and the effective irradiation distance in the atmosphere is 0 to 3 mm (critical irradiation distance is 8 mm), which is extremely short.
- a dense inorganic film can be obtained by densifying the organic component in the dry coating film while making it inorganic by thermal decomposition and combustion (oxidation).
- the oxygen-containing atmosphere gas used in the present invention includes air, oxygen gas, or a mixed gas of oxygen gas and neutral atmosphere gas (nitrogen) / inert gas (argon, helium, etc.), but is available at a low price. Air that is easy to do is preferred.
- the dew point temperature of the oxygen-containing atmosphere gas having a dew point temperature of ⁇ 10 ° C. or lower is preferably ⁇ 15 ° C. or lower, more preferably ⁇ 20 ° C. or lower, still more preferably ⁇ 30 ° C. or lower, and most preferably ⁇ 40 ° C. or lower.
- the dew point temperature is ⁇ 10 ° C.
- the film structure that can be contracted in the vertical direction of the film in which the organic binder is uniformly interposed between the above-described amorphous metal oxides is destroyed, and the metal oxide fine particles adhere to each other and cannot move. This is not preferable because the metal oxide film is hindered and the conductivity and film strength of the metal oxide film are lowered.
- the dew point temperature of the oxygen-containing atmosphere gas having a dew point temperature of 0 ° C. or higher is: Preferably it is 10 degreeC or more, More preferably, it is 20 degreeC or more.
- the dew point temperature is 0 ° C. or higher, the crystal growth of the metal oxide fine particles of the film in which water vapor is densified is promoted, so that both the densification of the film and the crystal growth can be achieved. This is because the film strength can be increased.
- the heat treatment that raises the temperature above the temperature at which crystallization of the metal oxide occurs in an oxygen-containing atmosphere with a dew point temperature of ⁇ 10 ° C. or lower (usually 300 to 330 ° C. or higher in the present invention) (Peak temperature) is 300 ° C. or higher, more preferably 350 ° C. or higher, and still more preferably 400 ° C. or higher for 5 to 120 minutes, more preferably 15 to 60 minutes.
- the thermal decomposition or combustion of organic components (organic components contained in organic metal compounds, organic binders, etc.) contained in the dried coating film is usually insufficient. Because these organic components remain in the metal oxide film and crystallization of the metal oxide does not occur, the film is not sufficiently densified, and the transparency and conductivity of the film may be deteriorated. It is not preferable. However, when the heat treatment time is increased to, for example, about 60 minutes or more, or when the final metal oxide film is as thin as about 130 nm or less, the organic component is thermally decomposed or burned even at about 270 ° C., for example.
- a heating temperature of 300 ° C. or higher is preferable, but a heating temperature of about 270 ° C. is applicable depending on the conditions (film thickness, heat treatment time, etc.) of each process.
- the upper limit of the heating temperature is not particularly limited, but it is affected by the type of heat treatment apparatus used in the heat treatment step and the heat resistance of the substrate, and a soda-lime glass substrate that is inexpensive and most commonly used has a strain point of about 510. Since it is 0 degreeC, it is preferable to heat-process at temperature lower than this temperature. However, if the soda lime glass substrate is heat-treated on a heat-resistant base material having higher heat resistance, the substrate can be relatively distorted, so that the heat treatment at about 600 ° C. is also possible. Of course, when a glass substrate having higher heat resistance such as a quartz glass substrate, an alkali-free glass substrate, or a high strain point glass substrate is used, a higher heating temperature can be applied. Note that when a polyimide (PI) film, which is a heat-resistant plastic, is used as the substrate, heat treatment up to about 400 ° C. is possible, depending on the type of polyimide.
- PI polyimide
- Examples of the heat treatment apparatus used in the heat treatment step include, but are not limited to, a hot plate, a hot air circulating heat treatment furnace, and a far infrared heating apparatus.
- the heat treatment apparatus is required to be able to control the heat treatment atmosphere.
- the rate of temperature increase up to a temperature at which crystallization of the metal oxide occurs in the temperature increase process of the heat treatment step but it is in the range of 5 to 40 ° C./min, more generally 10 to 30. ° C / min.
- the heat treatment conditions in the oxygen-containing atmosphere having a dew point temperature of 0 ° C. or higher are also raised to a temperature higher than the temperature at which crystallization of the metal oxide occurs in the oxygen-containing atmosphere having the dew point temperature of ⁇ 10 ° C. or lower.
- the heating temperature is 300 ° C. or higher, more preferably 350 ° C. or higher, more preferably 400 ° C. or higher, and more preferably 5 to 120 minutes. Is 15 to 60 minutes. At a heating temperature lower than 300 ° C.
- the heat treatment under the oxygen-containing atmosphere is followed by the heat treatment under a neutral atmosphere or a reducing atmosphere, depending on the type of the metal oxide. It is preferable because oxygen vacancies are formed in the metal oxide fine particles, the carrier concentration is increased, and the conductivity of the metal oxide film is improved. Note that the heat treatment in the neutral atmosphere or the reducing atmosphere is performed so that the oxygen vacancies formed in the film easily diffuse the constituent elements (metal element, oxygen, etc.) of the metal oxide fine particles. It has a stronger acceleration effect than the crystal growth promotion between metal oxide fine particles by heat treatment in an oxygen-containing atmosphere gas at a temperature of 0 ° C. or higher. It is also preferable from the viewpoint that it is also effective in stabilizing the properties (inhibiting changes over time).
- the neutral atmosphere is composed of at least one of nitrogen gas and inert gas (argon, helium, etc.), and the reducing atmosphere is hydrogen gas or hydrogen or an organic solvent vapor (organic such as methanol) in the neutral atmosphere.
- the atmosphere includes at least one kind of gas), but it is only necessary to remove oxygen atoms from the densely packed metal oxide fine particles to form oxygen vacancies to increase the conductive carrier concentration, and is limited to these. Not. If the heating temperature is about 250 to 600 ° C., a mixed gas of 1 to 2% hydrogen-99 to 98% nitrogen is a preferable atmosphere because there is no risk of explosion even if it leaks into the atmosphere.
- the treatment conditions for the heat treatment in a neutral atmosphere or a reducing atmosphere are a heating temperature of 250 ° C. or higher, more preferably a heating temperature of 350 ° C. or higher for 5 to 120 minutes, and more preferably 15 to 60 minutes.
- the heating temperature is preferably 350 ° C. or higher, more preferably 450 ° C. or higher.
- oxygen vacancies cannot be sufficiently formed in the metal oxide fine particles, and improvement in conductivity of the metal oxide film due to an increase in carrier concentration cannot be expected. When applied to, it is not preferable.
- the upper limit of the heating temperature is not particularly limited, but it is similar to the heat treatment in an oxygen-containing atmosphere in that it is affected by the type of heat treatment apparatus used in the heat treatment step and the heat resistance of the substrate. Furthermore, in the heat treatment under a reducing atmosphere, if the heating temperature becomes too high, the metal oxide constituting the metal oxide film may be excessively reduced, which requires attention. For example, in the case of a heating temperature exceeding 600 ° C., when a reducing atmosphere having strong reducing properties such as hydrogen gas is used, depending on the type of metal oxide, the metal oxide is reduced to the metal element in a short time. Therefore, it is necessary to select an appropriate reducing atmosphere and set a reduction time.
- a heat treatment that raises the temperature above the temperature at which crystallization of the metal oxide occurs a heat treatment in an oxygen-containing atmosphere having a dew point temperature of 0 ° C. or higher, and a neutral atmosphere
- the heat treatment under a reducing atmosphere can be performed continuously. That is, in the heat treatment of the substrate on which the dry coating film is formed, for example, after the temperature of the substrate is raised to a heating temperature of 300 ° C. or higher, only the atmosphere is kept at the dew point temperature of ⁇ 10 ° C. or lower while the temperature is maintained.
- the oxygen-containing atmosphere may be switched to an oxygen-containing atmosphere having a dew point temperature of 0 ° C. or higher, or a neutral atmosphere or a reducing atmosphere.
- the heat treatment in a neutral atmosphere or a reducing atmosphere is performed in the metal oxide due to the presence of oxygen vacancies in addition to the function of forming oxygen vacancies in the metal oxide and increasing the carrier concentration. It also has a function of facilitating crystal growth by making the constituent elements of the film easy to move, and contributes to further improvement in the strength and conductivity of the metal oxide film.
- the thin film transistor element includes, for example, a field effect transistor element having a coplanar structure or a staggered structure, and the details are omitted.
- the thin film transistor element is used as a driver element of a display or an image sensor such as an active matrix liquid crystal display or an electroluminescence display described later.
- the miniaturization of the element is progressing rapidly, Since the relative permittivity of silicon oxide is low, there is a limit to thinning the gate insulating film by miniaturizing the element (increase of gate leakage current due to tunneling current), and the element can be driven even if the gate insulating film is thickened.
- Attempts have been made to apply high dielectric constant metal oxides to gate insulating films.
- the metal oxide film having a high dielectric constant is generally formed by a metal-organic chemical vapor deposition (MOCVD) method, an atomic layer deposition (ALD) method, or the like. It is used. Since the metal oxide film obtained by the present invention is a metal oxide fine particle layer in which metal oxide fine particles mainly composed of metal oxide are packed very densely, for example, a good quality applicable to a gate insulating film of a thin film transistor.
- a high dielectric constant metal oxide film can be formed, for example, by low-temperature heating at less than 300 ° C.
- a device to which a metal oxide film and a substrate with a metal oxide film are applied when a metal oxide film is used as a transparent conductive film will be described.
- Examples of such devices include LED elements, electroluminescence lamps (electroluminescence elements), light emission devices such as field emission lamps, power generation devices such as solar cells, liquid crystal displays (liquid crystal elements), electroluminescence displays (electroluminescence elements), Examples include display devices such as plasma displays, electronic paper elements, and electrochromic elements, and input devices such as touch panels.
- the metal oxide film and the substrate with the metal oxide film of the present invention are suitable for these transparent electrodes.
- the electroluminescence element as a light emitting device includes an organic EL element using an organic light emitting material and an inorganic EL element using an inorganic light emitting material.
- the organic EL element has attracted attention.
- This organic EL element is a self-luminous element unlike a liquid crystal display element, and is expected to be used as a display device such as a display because it can be driven at a low voltage to obtain high luminance.
- the organic EL element also has a low molecular type and a high molecular type.
- the high molecular type structure has a hole injection layer made of a conductive polymer such as a polythiophene derivative on a metal oxide film as an anode electrode layer ( Hole injection layer), organic light emitting layer (polymer light emitting layer formed by coating), cathode electrode layer [magnesium (Mg), calcium (Ca), aluminum (having good electron injection into the light emitting layer, low work function) A metal layer such as Al)] and a gas barrier coating layer (or a sealing treatment with metal or glass) are sequentially formed.
- the gas barrier coating layer is required to prevent the deterioration of the organic EL element, and an oxygen barrier and a water vapor barrier are required.
- the water vapor transmission rate is about 10 ⁇ 5 g / m 2 / day. The following very high barrier performance is required, and the inside of the organic EL element (device) is completely sealed from the outside.
- the metal oxide film obtained in the present invention has a very flat liquid surface that the coating liquid for forming a metal oxide film applied to a substrate has a dry coating film. After passing through the surface of the film, it finally becomes the surface of the inorganic film, and heat treatment is performed in an air atmosphere with a low dew point temperature, that is, with a low water vapor content, thereby densifying the inorganic film and suppressing the formation of surface irregularities.
- the transparent conductive film which is the anode electrode layer of the organic EL element and the metal oxide film applied as the hole injection layer are used for the hole transport layer (in some cases).
- a high work function of about 5 eV or more is required.
- a metal oxide film suitable for a hole injection layer (hole injection layer)
- a high work function is also required to show good hole injection properties, and therefore the work function is 5 eV (electron volts).
- a large vanadium oxide film, niobium oxide film, molybdenum oxide film, ruthenium oxide film, and the like is given.
- Solar cells as power generation devices are power generation elements that convert sunlight into electrical energy
- solar cells are silicon solar cells (thin film type, microcrystal type, crystal type), CIS solar cells (copper-indium-selenium thin film).
- CIGS solar cells copper-indium-gallium-selenium thin film
- dye-sensitized solar cells etc., for example, silicon solar cells sequentially have a transparent electrode, a semiconductor power generation layer (silicon), and a metal electrode on a transparent substrate. Formed.
- Liquid crystal elements as display devices are non-light emitting electronic display elements widely used in displays such as mobile phones, PDAs (Personal Digital Assistants), and PCs (Personal Computers). Simple matrix system (passive matrix system) And an active matrix method.
- the active matrix method is superior in terms of image quality and response speed.
- the basic structure is a structure in which liquid crystal is sandwiched between transparent electrodes (corresponding to the metal oxide film of the present invention), and liquid crystal molecules are aligned by voltage drive for display. Color filters, retardation films, polarizing films and the like are further laminated.
- liquid crystal elements include polymer dispersed liquid crystal elements (hereinafter abbreviated as PDLC elements) and polymer network liquid crystal elements (hereinafter abbreviated as PNLC elements) used for optical shutters such as windows. .
- PDLC elements polymer dispersed liquid crystal elements
- PNLC elements polymer network liquid crystal elements
- the liquid crystal layer is sandwiched between electrodes (at least one is a transparent electrode, and the metal oxide film of the present invention corresponds), and the liquid crystal molecules are aligned by voltage driving.
- the structure of the device can be simplified without the need for a retardation film or a polarizing film. .
- the PDLC element has a structure in which liquid crystal microencapsulated in a polymer resin matrix is dispersed, while the PNLC element has a structure in which liquid crystal is filled in a mesh part of a resin network.
- the PDLC element has a high resin content in the liquid crystal layer, so an AC drive voltage of several tens V or more (for example, about 80 V) is required. It can be driven by AC voltage of
- it is necessary to prevent water vapor from being mixed into the liquid crystal. For example, a water vapor transmission rate of 0.01 g / m 2 / day or less is required, The inside of the liquid crystal element (device) is completely sealed from the outside.
- An electronic paper element as a display device is a non-light-emitting electronic display element that does not emit light by itself, has a memory effect that remains displayed even when the power is turned off, and is expected as a display for displaying characters.
- an electrophoresis method in which colored particles are moved in a liquid between electrodes by electrophoresis
- a twist ball method in which particles having dichroism are colored by rotating in an electric field, for example, a cholesteric liquid crystal is used as a transparent electrode.
- a liquid crystal system that displays images by sandwiching between them, a powder system that displays images by moving colored particles (toner) and electronic powder fluid (Quick Response Liquid Powder) in the air, and color development based on electrochemical oxidation / reduction action
- An electrochromic method, an electrodeposition method in which metal is deposited / dissolved by electrochemical oxidation / reduction, and display is performed by a color change accompanying this, have been developed.
- the display layer has a structure in which a metal oxide film (transparent electrode) and a counter electrode are sandwiched.
- An electrochromic element as a display device is a display element using an electrochromic material in which light absorption of a substance is reversibly changed by an electrochemical oxidation-reduction reaction.
- two opposing electrodes at least one electrode
- electrochromic material used examples include inorganic oxides such as tungsten oxide (WO 3 ), molybdenum oxide (MoO 3 ), and vanadium oxide (VO 2.5 ), and organic organic materials such as viologen derivatives. , Carbazole derivatives, styryl compounds, low molecular materials such as metal complexes (phthalocyanine, phenanthroline, Prussian blue, bipyridine complex), polymer materials into which the low molecular materials are introduced, and conductive polymers (polypyrrole, Polythiophene, polyaniline) and the like.
- inorganic oxides such as tungsten oxide (WO 3 ), molybdenum oxide (MoO 3 ), and vanadium oxide (VO 2.5 )
- organic organic materials such as viologen derivatives.
- a voltage is applied between the opposing electrodes, and the thin film of the electrochromic material in contact with the electrolytic solution (or solid electrolyte) is colored or decolored by an electrochemical redox reaction. Since image display is performed, the driving voltage is low, and there is a feature that a clear display having no viewing angle dependency can be obtained even under strong external light.
- the touch panel is a position input element, such as a resistance method or a capacitance method.
- a resistance touch panel has a structure in which two metal oxide film-attached substrates as coordinate detection resistance films for detecting coordinates are bonded together via a dot-shaped transparent spacer.
- a substrate with a metal oxide film is required to have hit point durability, and the metal oxide film is required to have flexibility so that cracks do not occur.
- further improvement in the conductivity of the metal oxide film is required due to an increase in resolution.
- the metal oxide film according to the present invention and the substrate with the metal oxide film are used as the transparent electrodes.
- the basic characteristics of the device can be further improved, so that it can greatly contribute to, for example, energy saving and downsizing of the device.
- a coating solution for forming a metal oxide film containing 10% by weight of hafnium-n-butoxide and 1% by weight of hydroxypropylcellulose.
- the viscosity (25 ° C.) of the coating solution for forming a metal oxide film was about 10 mPa ⁇ s.
- the surface resistance, haze value and visible light transmittance, film thickness, crystallite size, and pencil hardness of the produced metal oxide film were measured, and the results are shown in Table 1.
- the reflection profile of the obtained metal oxide film according to Example 1 is shown in FIG. 3 together with the reflection profile of the metal oxide film of Comparative Example 1.
- the transmission electron microscope photograph (TEM image) which observed the cross section of the metal oxide film of Example 1 with the transmission electron microscope is shown in FIG. From the result of the X-ray diffraction measurement, the metal oxide film is an amorphous film, and a metal oxide fine particle layer in which metal oxide fine particles (amorphous microcrystals) of 3 nm or less are mainly densely packed is observed.
- the surface resistance of the metal oxide film was measured using a surface resistance meter Loresta AP (MCP-T400) manufactured by Mitsubishi Chemical Corporation.
- the haze value and visible light transmittance were measured based on JIS K7136 (haze value) and JIS K7361-1 (transmittance) using a Nippon Denshoku Co., Ltd. haze meter (NDH5000).
- the film thickness was measured using a stylus type film thickness meter (Alpha-StepIQ) manufactured by KLA-Tencor Corporation.
- the crystallite size was determined by the Scherrer method after X-ray diffraction measurement.
- the pencil hardness was measured based on JIS K5400.
- the reflection profile of the metal oxide film was measured using a spectrophotometer (U-4000) manufactured by Hitachi, Ltd.
- the visible light transmittance and the haze value are values only for the metal oxide film, and were obtained by the following formulas 1 and 2, respectively.
- Niobium-n-butoxide liquid at room temperature
- NMP N-methyl-2-pyrrolidone
- ethyl carbitol diethylene glycol monoethyl ether
- HPC hydroxypropylcellulose
- IPA isopropyl alcohol
- Example 1 Various characteristics of the produced metal oxide film were measured in the same manner as in Example 1, and the results are shown in Table 1. Moreover, the reflection profile of the obtained metal oxide film according to Example 2 is shown in FIG. 5 together with the reflection profile of the metal oxide film of Comparative Example 2. Furthermore, the transmission electron microscope photograph (TEM image) which observed the cross section of the metal oxide film of Example 2 with the transmission electron microscope is shown in FIG. From the result of the X-ray diffraction measurement, the metal oxide film is an amorphous film, and a metal oxide fine particle layer in which metal oxide fine particles (amorphous microcrystals) of 3 nm or less are mainly densely packed is observed.
- TEM image transmission electron microscope photograph
- IPA isopropyl alcohol
- Example 3 Except for using this metal oxide film-forming coating solution, film formation was performed in the same manner as in Example 2 to produce a metal oxide film according to Example 3 containing zirconium oxide (ZrO 2 ) as a main component.
- ZrO 2 zirconium oxide
- Example 1 Various characteristics of the produced metal oxide film were measured in the same manner as in Example 1, and the results are shown in Table 1. Moreover, the reflection profile of the obtained metal oxide film according to Example 3 is shown in FIG. 7 together with the reflection profile of the metal oxide film of Comparative Example 3. Furthermore, the transmission electron micrograph (TEM image) which observed the cross section of the metal oxide film of Example 3 with the transmission electron microscope is shown in FIG. From the result of the X-ray diffraction measurement, the metal oxide film is an amorphous film, and a metal oxide fine particle layer in which metal oxide fine particles (amorphous microcrystals) of 3 nm or less are mainly densely packed is observed.
- TEM image transmission electron micrograph
- Titanium tetraisopropoxide liquid at room temperature
- 10 g, N-methyl-2-pyrrolidone (NMP) 14 g, diethylene glycol monoethyl ether (ethyl carbitol ) 75 g and 1 g of hydroxypropylcellulose (HPC; low molecular weight type) are mixed, heated to 120 ° C. and stirred for 60 minutes to dissolve, 10% by weight of titanium tetraisopropoxide and 1% by weight of hydroxypropylcellulose
- a coating solution for forming a metal oxide film was prepared.
- the viscosity (25 ° C.) of the coating solution for forming a metal oxide film was about 10 mPa ⁇ s.
- Example 4 various characteristics of the produced metal oxide film were measured in the same manner as in Example 1, and the results are shown in Table 1.
- the reflection profile of the obtained metal oxide film according to Example 4 is shown in FIG. 9 together with the reflection profile of the metal oxide film of Comparative Example 4.
- the transmission electron microscope photograph (TEM image) which observed the cross section of the metal oxide film of Example 4 with the transmission electron microscope is shown in FIG. From the result of the X-ray diffraction measurement, the metal oxide film is an amorphous film, and a metal oxide fine particle layer in which metal oxide fine particles (amorphous microcrystals) of 3 nm or less are mainly densely packed is observed.
- a 4 ⁇ 5 cm size pattern was printed on the screen by screen printing (polyester, 200 mesh plate), and then dried at 180 ° C. for 20 minutes using a hot air dryer, as shown in the schematic diagram of FIG.
- a hot air dryer as shown in the schematic diagram of FIG.
- the metal oxide film according to Example 5 containing aluminum oxide (AlO 1.5 ) as a main component was manufactured by heating (heating rate: 10 ° C./min) and heat treatment at 500
- Example 5 various characteristics of the produced metal oxide film were measured in the same manner as in Example 1, and the results are shown in Table 1. Moreover, the obtained reflection profile of the metal oxide film according to Example 5 is shown in FIG. 11 together with the reflection profile of the metal oxide film of Comparative Example 5. From the results of X-ray diffraction measurement, the metal oxide film was an amorphous film. Further, when the cross section of the metal oxide film of Example 5 was observed with a transmission electron microscope, metal oxide fine particles (amorphous of 3 nm or less) were mainly used. A metal oxide fine particle layer densely packed with a fine crystallite is observed.
- MoO 3 molybdenum oxide
- a coating solution for forming a metal oxide film containing 10% by weight of tungsten (V) ethoxide was about 5 mPa ⁇ s.
- tungsten oxide WO 3
- the metal oxide film was an amorphous film. Further, when the cross section of the metal oxide film of Example 7 was observed with a transmission electron microscope, the metal oxide film was mainly 3 nm or less (amorphous). A metal oxide fine particle layer densely packed with a fine crystallite is observed.
- a coating solution for forming a metal oxide film containing 1% by weight of propylcellulose was prepared.
- the viscosity (25 ° C.) of the coating solution for forming a metal oxide film was about 10 mPa ⁇ s.
- Example 8 which contains titanium oxide (TiO 2 ) as a main component by performing heat treatment for irradiation to promote mineralization (decomposition or combustion of organic components) and densification of the dry coating film 3 A film (film thickness: 98 nm) was produced.
- the distance (irradiation distance) between the low-pressure mercury lamp 4 and the substrate 2 was 10.5 mm, the illuminance of 254 nm light: about 20 mW / cm 2 , and the estimated illuminance of 185 nm light: about 5 mW / cm 2 . Furthermore, the space
- Example 1 various characteristics of the produced metal oxide film were measured in the same manner as in Example 1, and the results are shown in Table 1. From the result of the X-ray diffraction measurement, the metal oxide film was an amorphous film. Further, when the cross section of the metal oxide film of Example 8 was observed with a transmission electron microscope, the metal oxide fine particles (amorphous mainly 3 nm or less) were observed. A metal oxide fine particle layer densely packed with a fine crystallite is observed.
- PGM propylene glycol monomethyl ether
- MEK methyl ethyl ketone
- the distance (irradiation distance) between the low-pressure mercury lamp 4 and the substrate 2 was 10.5 mm, the illuminance of 254 nm light: about 20 mW / cm 2 , and the estimated illuminance of 185 nm light: about 5 mW / cm 2 . Furthermore, the space
- Example 1 various characteristics of the produced metal oxide film were measured in the same manner as in Example 1, and the results are shown in Table 1. From the results of X-ray diffraction measurement, the metal oxide film was an amorphous film. Further, when the cross section of the metal oxide film of Example 9 was observed with a transmission electron microscope, metal oxide fine particles (amorphous) of 3 nm or less were mainly used. A metal oxide fine particle layer in which the fine crystallites) are densely packed is observed.
- Tantalum (V) -n-butoxide (liquid at room temperature) [Ta (C 4 H 9 O) 5 ] (molecular weight 543.53) 10 g, p-tert-butylphenol 35.0 g, dibasic acid ester (manufactured by DuPont Japan) ) 52.4 g and 2.6 g of hydroxypropylcellulose (HPC; high molecular weight type) are mixed, heated to 120 ° C. and stirred for 60 minutes to dissolve, then 10 g of cyclohexanone is added to 20 g of the resulting solution.
- HPC high molecular weight type
- the substrate 2 having the dry coating film 3 is supplied to a low-humidity air atmosphere (3 liters / minute supply; substrate) with a dew point temperature of ⁇ 55 ° C. using a hot plate (heating device 1).
- a hot plate heating device 1
- the temperature was increased to 400 ° C. over 40 minutes (temperature increase rate: 10 ° C./min), and heat treatment was performed at 400 ° C. for 15 minutes to tantalum oxide ( A metal oxide film (film thickness: 62 nm) according to Example 10 having TaO 2.5 ) as a main component was produced.
- Example 10 various characteristics of the produced metal oxide film were measured in the same manner as in Example 1, and the results are shown in Table 1. From the results of X-ray diffraction measurement, the metal oxide film was an amorphous film. Further, when the cross section of the metal oxide film of Example 10 was observed with a transmission electron microscope, metal oxide fine particles (amorphous) of 3 nm or less were mainly used. A metal oxide fine particle layer densely packed with a fine crystallite is observed.
- PGM propylene glycol monomethyl ether
- MEK methyl ethyl ketone
- the substrate 2 having the dry coating film 3 is supplied to a low-humidity air atmosphere (3 liters / minute supply; substrate) with a dew point temperature of ⁇ 55 ° C. using a hot plate (heating device 1).
- a low-humidity air atmosphere 3 liters / minute supply; substrate
- a dew point temperature ⁇ 55 ° C. using a hot plate (heating device 1).
- the temperature was raised to 400 ° C. over 40 minutes (temperature increase rate: 10 ° C./min), and heat treatment was performed at 400 ° C. for 15 minutes.
- Switching to 1% hydrogen-99% nitrogen (3 liters / minute supply; average flow rate of atmospheric gas on substrate about 0.045 m / second) and heat treatment at 400 ° C. for another 15 minutes, vanadium oxide (VO 2. 5 )
- a metal oxide film (film thickness: 42 nm) according to Example 11 having a main component was prepared.
- the metal oxide film was an amorphous film. Further, when the cross section of the metal oxide film of Example 11 was observed with a transmission electron microscope, the metal oxide fine particles (amorphous) of 3 nm or less were mainly used. A metal oxide fine particle layer densely packed with a fine crystallite is observed.
- the substrate 2 having the dry coating film 3 is supplied to a low-humidity air atmosphere (3 liters / minute supply; substrate) with a dew point temperature of ⁇ 55 ° C. using a hot plate (heating device 1).
- a hot plate heating device 1
- the temperature was raised to 400 ° C. over 40 minutes (temperature increase rate: 10 ° C./min), and heat treatment was performed at 400 ° C. for 15 minutes to obtain cerium oxide ( A metal oxide film (thickness: 41 nm) according to Example 12 containing CeO 2 ) as a main component was produced.
- the metal oxide film was an amorphous film. Further, when the cross section of the metal oxide film of Example 12 was observed with a transmission electron microscope, the metal oxide film was mainly 3 nm or less (amorphous). A metal oxide fine particle layer densely packed with a fine crystallite is observed.
- Example 1 A film was formed in the same manner as in Example 1 except that air having a dew point temperature of 18 ° C. was used instead of low-humidity air having a dew point temperature of ⁇ 50 ° C. in Example 1, and hafnium oxide (HfO 2 ) was mainly used. A metal oxide film according to Comparative Example 1 as a component was produced.
- FIG. 13 shows a transmission electron micrograph (TEM image) obtained by observing a cross section of the metal oxide film of Comparative Example 1 with a transmission electron microscope. From the result of X-ray diffraction measurement, the metal oxide film was an amorphous film, and a metal oxide fine particle layer mainly filled with metal oxide fine particles (amorphous microcrystals) of 3 nm or less was observed. However, the metal oxide fine particle layer had a lower density than the metal oxide fine particle layer obtained using air having a low dew point temperature in the heat treatment step.
- Example 2 A film was formed in the same manner as in Example 2 except that air having a dew point temperature of 18 ° C. was used instead of low humidity air having a dew point temperature of ⁇ 50 ° C. in Example 2, and niobium oxide (NbO 2.5 ). The metal oxide film which concerns on the comparative example 2 which has as a main component was produced.
- Example 1 Various characteristics of the produced metal oxide film were measured in the same manner as in Example 1, and the results are shown in Table 1. Moreover, the reflection profile of the obtained metal oxide film according to Comparative Example 2 is shown in FIG. 5 together with the reflection profile of the metal oxide film of Example 2. Furthermore, a transmission electron micrograph (TEM image) obtained by observing a cross section of the metal oxide film of Comparative Example 2 with a transmission electron microscope is shown in FIG. From the result of X-ray diffraction measurement, the metal oxide film was an amorphous film, and a metal oxide fine particle layer mainly filled with metal oxide fine particles (amorphous microcrystals) of 3 nm or less was observed. However, the metal oxide fine particle layer had a lower density than the metal oxide fine particle layer obtained using air having a low dew point temperature in the heat treatment step.
- TEM image transmission electron micrograph
- Example 3 A film was formed in the same manner as in Example 3 except that air having a dew point temperature of 18 ° C. was used instead of low humidity air having a dew point temperature of ⁇ 50 ° C. in Example 3, and zirconium oxide (ZrO 2 ) was mainly used. A metal oxide film according to Comparative Example 3 as a component was produced.
- Example 1 Various characteristics of the produced metal oxide film were measured in the same manner as in Example 1, and the results are shown in Table 1. Moreover, the reflection profile of the obtained metal oxide film according to Comparative Example 3 is shown in FIG. 7 together with the reflection profile of the metal oxide film of Example 3. Furthermore, the transmission electron microscope photograph (TEM image) which observed the cross section of the metal oxide film of the comparative example 3 with the transmission electron microscope is shown in FIG. From the result of X-ray diffraction measurement, the metal oxide film was an amorphous film, and a metal oxide fine particle layer mainly filled with metal oxide fine particles (amorphous microcrystals) of 3 nm or less was observed. However, the metal oxide fine particle layer had a lower density than the metal oxide fine particle layer obtained using air having a low dew point temperature in the heat treatment step.
- Example 4 A film was formed in the same manner as in Example 4 except that air having a dew point temperature of 18 ° C. was used instead of low humidity air having a dew point temperature of ⁇ 50 ° C. in Example 4, and titanium oxide (TiO 2 ) was mainly used. A metal oxide film according to Comparative Example 4 as a component was produced.
- Example 1 Various characteristics of the produced metal oxide film were measured in the same manner as in Example 1, and the results are shown in Table 1. Moreover, the reflection profile of the obtained metal oxide film according to Comparative Example 4 is shown in FIG. 9 together with the reflection profile of the metal oxide film of Example 4. Furthermore, the transmission electron microscope photograph (TEM image) which observed the cross section of the metal oxide film of the comparative example 4 with the transmission electron microscope is shown in FIG. From the result of X-ray diffraction measurement, the metal oxide film was an amorphous film, and a metal oxide fine particle layer mainly filled with metal oxide fine particles (amorphous microcrystals) of 3 nm or less was observed. However, the metal oxide fine particle layer had a lower density than the metal oxide fine particle layer obtained using air having a low dew point temperature in the heat treatment step.
- Example 5 A film was formed in the same manner as in Example 5 except that air having a dew point temperature of 18 ° C. was used instead of low humidity air having a dew point temperature of ⁇ 50 ° C. in Example 5, and aluminum oxide (AlO 1.5 ) was used. The metal oxide film which concerns on the comparative example 5 which has as a main component was produced.
- the metal oxide film was an amorphous film.
- the metal oxide fine particles mainly having a size of 3 nm or less A metal oxide fine particle layer filled with (amorphous microcrystals) was observed.
- the metal oxide fine particle layer had a lower density than the metal oxide fine particle layer obtained using air having a low dew point temperature in the heat treatment step.
- Example 6 A film was formed in the same manner as in Example 6 except that air having a dew point temperature of 13 ° C. was used instead of low-humidity air having a dew point temperature of ⁇ 55 ° C. in Example 6, and molybdenum oxide (MoO 3 ) was mainly used. A metal oxide film according to Comparative Example 6 as a component was produced.
- Example 7 A film was formed in the same manner as in Example 7 except that air having a dew point temperature of 13 ° C. was used instead of low-humidity air having a dew point temperature of ⁇ 55 ° C. in Example 7, and tungsten oxide (WO 3 ) was mainly used. A metal oxide film according to Comparative Example 7 as a component was produced.
- the metal oxide film was an amorphous film. Further, when the cross section of the metal oxide film of Comparative Example 7 was observed with a transmission electron microscope, the metal oxide fine particles (3 nm or less mainly ( A metal oxide fine particle layer filled with (amorphous microcrystals) was observed. However, the metal oxide fine particle layer had a lower density than the metal oxide fine particle layer obtained using air having a low dew point temperature in the heat treatment step.
- Example 8 Using the coating liquid for forming a transparent conductive film used in Example 8, the same dry coating film 3 as in Example 8 (film thickness: about 300 nm, surface resistance:> 1 ⁇ 10 13 ⁇ / ⁇ (insulation))
- high-humidity air normal atmosphere; dew-point temperature 7 ° C.
- low-humidity air having a dew point temperature of ⁇ 55 ° C.
- the metal oxide film according to Comparative Example 8 containing titanium oxide (TiO 2 ) as a main component was carried out in the same manner as in Example 8 except that the inorganicization (decomposition or combustion of organic components) of the dry coating film 3 was promoted. (Film thickness: 115 nm) was produced.
- the metal oxide film was an amorphous film. Further, when the cross section of the metal oxide film of Comparative Example 8 was observed with a transmission electron microscope, the metal oxide fine particles mainly having a size of 3 nm or less ( A metal oxide fine particle layer filled with (amorphous microcrystals) was observed. However, the metal oxide fine particle layer had a lower density than the metal oxide fine particle layer obtained using air having a low dew point temperature in the heat treatment step.
- Example 9 Dry coating film 3 (film thickness: about 470 nm, surface resistance:> 1 ⁇ 10 13 ⁇ / ⁇ (insulation)) similar to Example 9 using the coating liquid for forming a transparent conductive film used in Example 9
- high-humidity air normal atmosphere; dew-point temperature 7 ° C.
- low-humidity air having a dew point temperature of ⁇ 55 ° C.
- the metal oxide film according to Comparative Example 9 containing hafnium oxide (HfO 2 ) as a main component was carried out in the same manner as in Example 9 except that the inorganicization (decomposition or combustion of organic components) of the dry coating film 3 was promoted. (Film thickness: 96 nm) was produced.
- the metal oxide film was an amorphous film. Further, when the cross section of the metal oxide film of Comparative Example 9 was observed with a transmission electron microscope, the metal oxide fine particles mainly having a size of 3 nm or less ( A metal oxide fine particle layer filled with (amorphous microcrystals) was observed. However, the metal oxide fine particle layer had a lower density than the metal oxide fine particle layer obtained using air having a low dew point temperature in the heat treatment step.
- Example 10 A film was formed in the same manner as in Example 10 except that air having a dew point temperature of 9 ° C. was used instead of low humidity air having a dew point temperature of ⁇ 55 ° C. in Example 10, and tantalum oxide (TaO 2.5 ). A metal oxide film (thickness: 69 nm) according to Comparative Example 10 containing as a main component was prepared.
- the metal oxide film was an amorphous film. Further, when the cross section of the metal oxide film of Comparative Example 10 was observed with a transmission electron microscope, metal oxide fine particles (3 nm or less mainly) A metal oxide fine particle layer filled with (amorphous microcrystals) was observed. However, the metal oxide fine particle layer had a lower density than the metal oxide fine particle layer obtained using air having a low dew point temperature in the heat treatment step.
- Example 11 A film was formed in the same manner as in Example 11 except that air having a dew point temperature of 9 ° C. was used instead of low humidity air having a dew point temperature of ⁇ 55 ° C. in Example 11, and vanadium oxide (VO 2.5 ). A metal oxide film (thickness: 47 nm) according to Comparative Example 11 containing as a main component was prepared.
- the metal oxide film was an amorphous film. Further, when the cross section of the metal oxide film of Comparative Example 11 was observed with a transmission electron microscope, metal oxide fine particles (3 nm or less mainly) A metal oxide fine particle layer filled with (amorphous microcrystals) was observed. However, the metal oxide fine particle layer had a lower density than the metal oxide fine particle layer obtained using air having a low dew point temperature in the heat treatment step.
- Example 12 A film was formed in the same manner as in Example 12 except that air having a dew point temperature of 9 ° C. was used instead of low humidity air having a dew point temperature of ⁇ 55 ° C. in Example 12, and cerium oxide (CeO 2 ) was mainly used. A metal oxide film (film thickness: 46 nm) according to Comparative Example 12 as a component was produced.
- the metal oxide film was an amorphous film. Further, when the cross section of the metal oxide film of Comparative Example 12 was observed with a transmission electron microscope, the metal oxide fine particles (3 nm or less mainly ( A metal oxide fine particle layer filled with (amorphous microcrystals) was observed. However, the metal oxide fine particle layer had a lower density than the metal oxide fine particle layer obtained using air having a low dew point temperature in the heat treatment step.
- Example 1 and Comparative Example 1 Comparison between Example 2 and Comparative Example 2, Comparison between Example 3 and Comparative Example 3, Comparison between Example 4 and Comparative Example 4, Comparison of Example 5 and Comparative Example 5, Comparison of Example 6 and Comparative Example 6, Comparison of Example 7 and Comparative Example 7, Comparison of Example 8 and Comparative Example 8, Comparison of Example 9 and Comparative Example 9, Comparison between Example 10 and Comparative Example 10, Comparison between Example 11 and Comparative Example 11, Comparison between Example 12 and Comparative Example 12), and Example 1 and Comparative Example 1 are both heated at 500 ° C. (air atmosphere) And 1 volume% hydrogen-99 volume% nitrogen atmosphere), Examples 2 to 5 and Comparative Examples 2 to 5 were all heated at 500 ° C.
- Example 6 and Comparative Example 6 were 350 ° C.
- Heat treatment (air atmosphere) Example 7 and Comparative Example 7 are both 300 ° C. heat treatment (air atmosphere)
- Examples 8 and 9 Comparative Examples 8 and 9 are both heat-treated at 150 ° C. (heating energy ray irradiation in an air atmosphere)
- Example 10 and Comparative Example 10 are both heat-treated at 400 ° C. (air atmosphere)
- Example 11 and Comparative Example 11 is a heat treatment at 400 ° C. (air atmosphere and 1% by volume hydrogen—99% by volume nitrogen atmosphere)
- both Example 12 and Comparative Example 12 are metals obtained by heat treatment at 400 ° C. (air atmosphere).
- each example a metal oxide film having a metal oxide fine particle layer densely filled with metal oxide fine particles and excellent in film strength (pencil hardness)
- each comparative example it is understood that the film strength (pencil hardness) is remarkably low in a metal oxide film having a metal oxide fine particle layer in which metal oxide fine particles are not sufficiently densified.
- Example and the comparative example are compared (comparison between the example 1 and the comparative example 1, comparison between the example 2 and the comparative example 2, comparison between the example 3 and the comparative example 3, comparison between the example 4 and the comparative example 4, implementation) Comparison between Example 5 and Comparative Example 5, Comparison between Example 6 and Comparative Example 6, Comparison between Example 7 and Comparative Example 7, Comparison between Example 8 and Comparative Example 8, Comparison between Example 9 and Comparative Example 9, Implementation Comparison between Example 10 and Comparative Example 10, Comparison between Example 11 and Comparative Example 11, Comparison between Example 12 and Comparative Example 12), and Example 1 and Comparative Example 1 were both heated at 500 ° C. (air atmosphere, And 1 volume% hydrogen-99 volume% nitrogen atmosphere), Examples 2 to 5 and Comparative Examples 2 to 5 were all heated at 500 ° C.
- Example 6 and Comparative Example 6 were 350 ° C.
- Heat treatment (air atmosphere) Example 7 and Comparative Example 7 are both 300 ° C. heat treatment (air atmosphere)
- Examples 8 and 9 Comparative Examples 8 and 9 are both heat-treated at 150 ° C. (heating energy ray irradiation in an air atmosphere)
- Example 10 and Comparative Example 10 are both heat-treated at 400 ° C. (air atmosphere)
- Example 11 and Comparative Example 11 is a heat treatment at 400 ° C. (air atmosphere and 1% by volume hydrogen—99% by volume nitrogen atmosphere)
- both Example 12 and Comparative Example 12 are metals obtained by heat treatment at 400 ° C. (air atmosphere).
- the metal oxide film of each comparative example is about 10-20% thicker than the metal oxide film of each example (117 nm for 103 nm, 133 nm for 133 nm).
- Example 1 and Comparative Example 1 are compared (comparison between the example 1 and the comparative example 1, comparison between the example 2 and the comparative example 2, comparison between the example 3 and the comparative example 3, comparison between the example 4 and the comparative example 4, Comparison between Example 5 and Comparative Example 5),
- Example 1 and Comparative Example 1 were both heated at 500 ° C. (air atmosphere and 1% by volume hydrogen-99% by volume nitrogen atmosphere), and
- Examples 2-5 Comparative Examples 2 to 5 are all metal oxide films obtained by heat treatment (air atmosphere) at 500 ° C., as is apparent from the reflection profiles shown in FIGS. 3, 5, 7, 9, and 11.
- Examples 8 to 12 were compared with Comparative Examples 8 to 12 (Comparison between Example 8 and Comparative Example 8, Comparison between Example 9 and Comparative Example 9, Comparison with Example 10) Even in the case of comparison of Comparative Example 10, comparison of Example 11 and Comparative Example 11, comparison of Example 12 and Comparative Example 12, the reflectance of the metal oxide film of each Example is the metal oxide of each Comparative Example It has been confirmed that it has a value higher than the reflectance of the film.
- the refractive index of each metal oxide and glass substrate is as follows.
- the metal oxide film according to the present invention can be formed on various substrates using various inexpensive coating methods.
- a metal oxide having a high dielectric constant is used for the obtained metal oxide film, Since it has a high dielectric constant and is dense and excellent in film strength, this metal oxide film can be expected to be used for a gate insulating film of a thin film transistor.
- the metal oxide film when used as a transparent conductive film, the metal oxide film is formed on the substrate because it has excellent transparency and high conductivity, and has excellent film strength.
- Substrates with oxide films are LED elements, electroluminescence lamps (electroluminescence elements), light emitting devices such as field emission lamps, power generation devices such as solar cells, liquid crystal displays, electroluminescence displays (electroluminescence elements), plasma displays, electronic It can be expected to be used for transparent devices such as display devices such as paper elements and electrochromic elements, and input devices such as touch panels.
- the metal oxide film according to the present invention has a high work function, is dense and excellent in film strength, and has high film flatness. Therefore, this metal oxide film can be expected to be used for a transparent conductive film or a hole injection layer which is an anode electrode layer of an organic EL element.
- titanium oxide and cerium oxide can be used as UV-cut coating
- aluminum oxide, silicon oxide, titanium oxide, zirconium oxide, cerium oxide, hafnium oxide, niobium oxide, etc. are anti-reflective coatings that apply their refractive index and transparency. It can be used for various optical coatings such as highly reflective films.
- Aluminum oxide, silicon oxide, titanium oxide, zirconium oxide and cerium oxide are formed on (transparent) conductive films by applying their transparency and insulation properties.
- Tungsten oxide can be used as an electrochromic display material or cesium-doped tungsten oxide doped with cesium or the like as a near-infrared absorbing material (heat ray shielding material).
- Heating device hot plate, etc.
- Energy beam irradiation lamp ultraviolet irradiation lamp
- UV irradiation window synthetic quartz plate, etc.
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Abstract
Description
詳しくは、ガラスやプラスチック等の基板上に形成された、高い緻密性を有し、かつ膜強度に優れる金属酸化物膜の製造方法、及び、その金属酸化物膜の製造方法によって得られた金属酸化物膜に関し、更にその金属酸化物膜を用いた素子や金属酸化物膜付き基板、並びにその金属酸化物膜付き基板を用いたデバイスに関するものである。
しかしながら、これに使用する膜形成装置は真空容器をベースとするため非常に高価であり、また基板成膜毎に製造装置内の成分ガス圧を精密に制御しなければならないため、製造コストと量産性に問題があった。
この塗布方法では、透明導電膜形成用塗布液の基板上への塗布、乾燥、加熱処理という簡素な製造工程でITO膜(透明導電膜)を形成するもので、その塗布液の基板上への塗布法には、インクジェット印刷法、スクリーン印刷法、グラビア印刷法、オフセット印刷法、フレキソ印刷法、ディスペンサ印刷法、スリットコート法、ダイコート法、ドクターブレードコート法、ワイヤーバーコート法、スピンコート法、ディップコート法、スプレーコート法等が知られている。
これらの従来知られている塗布液の多くはインジウムや錫の硝酸塩、ハロゲン化物からなる有機または無機化合物、あるいは金属アルコキシドなどの有機金属化合物等が用いられている。
この塗布液は、低粘度であり、スピンコートのほかスプレーコート、ディップコートにも使用可能である。
このような高誘電率の金属酸化物膜の成膜では、一般に、有機金属気相成長法(Metal−Organic Chemical Vapor Deposition:MOCVD法)や、原子層成長法(Atomic Layer Deposition:ALD法)等の蒸着法(気相法)が用いられており、塗布法は使用されていない。
具体的には、特許文献11に参照されるように、高い仕事関数を有する酸化ルテニウム(RuO2)、酸化バナジウム(VO2.5)、酸化モリブデン(MoO3)等の金属酸化物膜単体、あるいはそれらを上記ITO膜上に積層し、アノード電極としてのITO膜側からホール(正孔)輸送層への(場合によっては直接発光層への)ホール(正孔)注入を容易とし、有機EL素子の低電圧駆動、発光効率改善、長寿命化を図る試みが提案されている。ただし、特許文献11において、上記高い仕事関数を有する金属酸化物膜の成膜には、電子ビーム蒸着、直流スパッタリング法、RFマグネトロンスパッタ法、ICB蒸着法等の物理気相成長法を用いることが記載されているが、塗布法は使用されていない。
本発明の金属酸化物膜の製造方法は、有機金属化合物を主成分とする金属酸化物膜形成用塗布液を、基板上に塗布、乾燥、加熱処理して形成される金属酸化物膜の製造方法であって、金属酸化物を主成分とする金属酸化物微粒子の結晶成長が進み、かつ緻密に充填した金属酸化物微粒子層を形成するため、金属酸化物膜の膜強度の向上を図ることが可能で、さらに得られる金属酸化物膜を透明導電膜として用いた場合では導電性の向上、高屈折率膜に用いた場合では屈折率の向上を図ることができる。
すなわち各種機能性膜として用いた場合には、その膜が有する機能の向上が達成可能である。
先ず、金属酸化物膜構造を説明する。
例えば、スパッタリング法等の気相成長法を用いて金属酸化物膜を形成した場合、通常、金属酸化物の結晶粒が粒界を介して配列した膜構造である多結晶の金属酸化物膜構造が形成され、膜構造において金属酸化物微粒子はほとんど観察されない。
一方、本発明の金属酸化物膜においては、水蒸気含有量の少ない、すなわち露点温度が低い酸素含有雰囲気を適用しており、金属酸化物の種類にもよるが、例えば、金属酸化物膜における金属酸化物微粒子の充填密度は金属酸化物の真比重の約90%程度まで高めることが可能であり、水蒸気を含む酸素含有雰囲気を適用した場合には、真比重の60~70%程度に留まる。
次に、本発明で用いられる金属酸化物膜形成用塗布液について詳細する。
本発明では、有機アルミニウム化合物、有機ケイ素化合物、有機スカンジウム化合物、有機チタン化合物、有機バナジウム化合物、有機クロム化合物、有機マンガン化合物、有機鉄化合物、有機コバルト化合物、有機ニッケル化合物、有機銅化合物、有機ガリウム化合物、有機ゲルマニウム化合物、有機イットリウム化合物、有機ジルコニウム化合物、有機ニオブ化合物、有機モリブデン化合物、有機ルテニウム化合物、有機アンチモン化合物、有機ランタン化合物、有機ハフニウム化合物、有機タンタル化合物、有機タングステン化合物、有機ビスマス化合物、有機セリウム化合物、有機ネオジム化合物、有機サマリウム化合物、有機ガドリニウム化合物、有機マグネシウム化合物、有機カルシウム化合物、有機ストロンチウム化合物、有機バリウム化合物のいずれか一つ以上からなる有機金属化合物を主成分とする金属酸化物膜形成用塗布液を用いて、酸化アルミニウム、酸化ケイ素、酸化スカンジウム、酸化チタン、酸化バナジウム、酸化クロム、酸化マンガン、酸化鉄、酸化コバルト、酸化ニッケル、酸化銅、酸化ガリウム、酸化ゲルマニウム、酸化イットリウム、酸化ジルコニウム、酸化ニオブ、酸化モリブデン、酸化ルテニウム、酸化アンチモン、酸化ランタン、酸化ハフニウム、酸化タンタル、酸化タングステン、酸化ビスマス、酸化セリウム、酸化ネオジム、酸化サマリウム、酸化ガドリニウム、酸化マグネシウム、酸化カルシウム、酸化ストロンチウム、酸化バリウムのいずれか一つ以上の金属酸化物を形成している。
本発明で用いる有機金属化合物には、有機アルミニウム化合物、有機ケイ素化合物、有機スカンジウム化合物、有機チタン化合物、有機バナジウム化合物、有機クロム化合物、有機マンガン化合物、有機鉄化合物、有機コバルト化合物、有機ニッケル化合物、有機銅化合物、有機ガリウム化合物、有機ゲルマニウム化合物、有機イットリウム化合物、有機ジルコニウム化合物、有機ニオブ化合物、有機モリブデン化合物、有機ルテニウム化合物、有機アンチモン化合物、有機ランタン化合物、有機ハフニウム化合物、有機タンタル化合物、有機タングステン化合物、有機ビスマス化合物、有機セリウム化合物、有機ネオジム化合物、有機サマリウム化合物、有機ガドリニウム化合物、有機マグネシウム化合物、有機カルシウム化合物、有機ストロンチウム化合物、有機バリウム化合物のいずれか一つ以上からなり、前記金属酸化物が、酸化アルミニウム、酸化ケイ素、酸化スカンジウム、酸化チタン、酸化バナジウム、酸化クロム、酸化マンガン、酸化鉄、酸化コバルト、酸化ニッケル、酸化銅、酸化ガリウム、酸化ゲルマニウム、酸化イットリウム、酸化ジルコニウム、酸化ニオブ、酸化モリブデン、酸化ルテニウム、酸化アンチモン、酸化ランタン、酸化ハフニウム、酸化タンタル、酸化タングステン、酸化ビスマス、酸化セリウム、酸化ネオジム、酸化サマリウム、酸化ガドリニウム、酸化マグネシウム、酸化カルシウム、酸化ストロンチウム、酸化バリウム等のいずれか一種以上が好ましい。
例えば、有機インジウム化合物としては、アセチルアセトンインジウム(正式名称:トリス(アセチルアセトナト)インジウム(III))[In(C5H7O2)3]、2−エチルヘキサン酸インジウム(III)[In(C7H15COO2)3]、蟻酸インジウム(III)[In(HCOO)3]、酢酸インジウム(III)[In(CH3COO)3]、インジウムアルコキシドとしてのインジウム(III)メトキシエトキシド[In(CH3OC2H4O)3]等が挙げられるが、基本的には、溶剤に溶解し、加熱処理時において塩素ガスや窒素酸化物ガスなどの有害ガスが発生せずに酸化物に分解する有機インジウム化合物であれば良い。これらの中でもアセチルアセトンインジウムは有機溶剤への溶解性が高く、200~250℃程度の温度で熱分解・燃焼(酸化)して酸化物となるため好ましい。
なお、上記各種セルロース誘導体やアクリル樹脂では、分子量が異なる多くの種類が市販されており、例えば、HPCでは、その分子量の大きさに応じて、高分子量タイプ、中分子量タイプ、低分子量タイプがあり、分子量が大きいほど、バインダーとして配合した金属酸化物膜形成用塗布液の粘度を高めることができる。分子量タイプの選定、および、配合量の決定は、金属酸化物膜形成用塗布液の塗布性、および金属酸化物膜形成用塗布液の塗布方法や塗布膜厚に応じ、随時最適化する必要がある。
ここで、セルロース誘導体として、例えばHPCの代わりにエチルセルロースを用いた場合には、通常、HPCを用いた場合よりも塗布液の粘度が低く設定できるが、高粘度塗布液が好適であるスクリーン印刷法等ではパターン印刷性が若干低下する。
また、アクリル樹脂としては、比較的低温で燃焼するアクリル樹脂が好ましい。
更に、別の好ましい溶剤として、アルキルフェノール、アルケニルフェノールのいずれか或いは両者と二塩基酸エステル、もしくはアルキルフェノール、アルケニルフェノールのいずれか或いは両者と酢酸ベンジル、またはこれらの混合溶液が挙げられる。
このアルキルフェノールあるいはアルケニルフェノールとしては、クレゾール類、キシレノール、エチルフェノール、p−tert−ブチルフェノール、オクチルフェノール、ノニルフェノール、カシューナット殻液[3ペンタデカデシールフェノール]等が挙げられ、二塩基酸エステル(例えば二塩基酸ジメチル、二塩基酸ジエチル等)としては、コハク酸エステル、グルタル酸エステル、アジピン酸エステル、マロン酸エステル、フタル酸エステル等が用いられる。
本発明の金属酸化物膜の製造方法について詳細する。
本発明の金属酸化物膜は、金属酸化物膜形成用塗布液を基板上に塗布して塗布膜を形成する塗布工程、その塗布膜を乾燥して乾燥塗布膜を形成する乾燥工程、その乾燥塗布膜を露点温度の低い酸素含有雰囲気下で加熱処理して無機膜を形成する加熱処理工程の各工程を経て形成される。
基板上への金属酸化物膜形成用塗布液の塗布は、インクジェット印刷法、スクリーン印刷法、グラビア印刷法、オフセット印刷法、フレキソ印刷法、ディスペンサ印刷法、スリットコート法、ダイコート法、ドクターブレードコート法、ワイヤーバーコート法、スピンコート法、スプレーコート法等の各種塗布法を用いて塗布される。
これらの塗布は、クリーンルーム等のように清浄でかつ温度や湿度が管理された雰囲気下で行うことが好ましい。温度は室温(25℃程度)、湿度は40~60%RHが一般的である。
次の乾燥工程では、金属酸化物膜形成用塗布液を塗布した基板を、通常大気中80~180℃で1~30分間、好ましくは2~10分間保持して塗布膜の乾燥を行い、乾燥塗布膜を作製する。
その乾燥条件(乾燥温度、乾燥時間)は、用いる基板の種類や金属酸化物膜形成用塗布液の塗布厚み等によって、適宜選択すればよく、上記乾燥条件に限定される訳ではない。ただし、生産性を考慮すれば、乾燥時間は、得られる乾燥塗布膜の膜質が悪化しない必要最低限度に短縮することが望ましい。
この作製した乾燥塗布膜は、金属酸化物膜形成用塗布液から前述の有機溶剤が揮発除去されたものであって、上記有機金属化合物、(必要に応じて少量添加される、有機インジウム化合物、有機錫化合物、有機亜鉛化合物)、有機バインダー等の有機系成分で構成されている。
加熱処理工程では、乾燥工程で作製した乾燥塗布膜を露点温度の低い酸素含有雰囲気下で加熱処理して乾燥塗布膜中の上記有機金属化合物、あるいは少量添加の有機金属化合物を含んだ上記有機金属化合物、および有機バインダー等の有機系成分を熱分解・燃焼(酸化)により無機化させて無機成分(金属酸化物が主成分)からなる緻密な無機膜(金属酸化物微粒子が緻密に充填した金属酸化物微粒子層としての金属酸化物膜)を形成するものである。
なお、この300~330℃の温度は、上記無機化や結晶化が生じやすい一般的な温度範囲を示すものであって、例えば、加熱時間が長い場合には、270℃程度でも上記記金属酸化物の無機化、結晶化、結晶成長が生じる場合もあるため、本発明の加熱処理工程の加熱温度が300℃以上に限定されるものではない。
本発明の乾燥塗布膜の加熱処理工程において、先ず露点温度の低い、即ち水蒸気含有量の少ない酸素含有雰囲気(参考として、図1に、空気中の飽和水蒸気含有量(体積%)と露点温度(℃)の関係を示す)を昇温過程の雰囲気に適用することで、上記の通り加熱処理工程の初期段階に生じる無機化による金属酸化物の結晶化、並びに結晶成長が抑制されて、金属酸化物微粒子が緻密に充填した本発明の金属酸化物微粒子層の膜構造を得ることができる。なお、金属酸化物微粒子が緻密に充填するメカニズムに関しては、必ずしも明らかではないが、例えば、以下のように考えることができる。
なお、上述した露点温度の低い、即ち水蒸気含有量の少ない空気雰囲気下において金属酸化物の結晶化、並びに結晶成長が抑制される理由は明らかではないが、例えば、空気雰囲気中の水蒸気が、
(1)金属酸化物間に介在している有機バインダー成分の熱分解・燃焼(酸化)の促進作用を有する、
(2)金属酸化物自体の結晶化、並びに結晶成長を促進する作用を有する、等が考えられる。
以上のような露点温度−10℃以下の酸素含有雰囲気下での単純な加熱処理でも緻密な透明導電膜を得ることはできるが、以下に述べるエネルギー線照射を上記単純な加熱処理と併用する加熱処理(以後、「加熱エネルギー線照射」と表記する場合がある)であれば、上記露点温度−10℃以下の酸素含有雰囲気下での加熱処理の加熱温度を大幅に低下(後述のように、加熱温度100~200℃まで低下)させることができる。
ここで、例えば、100~200℃での上記加熱エネルギー線照射を行った後、引き続き、露点温度−10℃以下の酸素含有雰囲気下での単純な加熱処理を300℃以上で行うこともできる。この場合、比較的低温(100~200℃)での加熱エネルギー線照射により膜の緻密化がより促進され、かつ、比較的高温(300℃以上)での単純な加熱処理により結晶化が促進されるため、より良質な金属酸化物膜をえることが可能となる。
照射時間は、1分間以上、好ましくは2分間以上、好ましくは4分間以上が良い。照射時間が短すぎると、エネルギー線照射の効果(無機化、緻密化)が不十分となり、また、逆に長くなり過ぎると(例えば60分間を超える長時間)、生産性(処理効率)が著しく低下する一方で、エネルギー線照射の効果(無機化、緻密化)は、途中でほぼ飽和してしまうため好ましいとは言えない。
この紫外線の照射量は、基板とランプとの距離(照射距離)、照射時間、またはランプの出力によって適宜調整できる。このランプを用いた基板全面へのエネルギー線照射では、例えば直管状のランプを並行に配列させて照射しても良いし、グリッド型ランプの面光源を用いても良い。
なお、金属酸化物微粒子層が形成されなかった乾燥塗布膜部分(エネルギー線が照射されなかった乾燥塗布膜部分)の除去が必要な場合は、その部分は無機化していないため、乾燥塗布膜を溶解可能な有機溶剤で溶解して除去することができる。一方で、無機化した金属酸化物微粒子層部分は有機溶剤に全く溶解しないため、金属酸化物微粒子層部分だけを基板上に残すことが可能となる。
上記乾燥塗布膜の溶解性に優れる有機溶剤としては、例えば、メチルエチルケトン(MEK)、メチルプロピルケトン、メチルイソブチルケトン(MIBK)、シクロヘキサノン、アセチルアセトン(2、4−ペンタンジオン)、ジメチルホルムアミド(DMF)、ジメチルスルフォキシド(DMSO)、N−メチル−2−ピロリドン(NMP)、γ−ブチロラクトン等が挙げられる。
なお、アマルガムランプは、低圧水銀ランプが一般に石英ガラス管内にアルゴンガスと水銀を封入するのに対し、水銀と特殊希少金属の合金であるアマルガム合金を封入することで、低圧水銀ランプと比べて、2~3倍程度の高出力化を可能としたもので、出力波長特性はほぼ低圧水銀ランプと同じであるため、詳細説明は省略する。当然のことながら、アマルガムランプも、低圧水銀ランプと同様に、加熱エネルギー線照射では、使用上の制約が少なく、加熱処理と併用した場合にランプへの加熱の影響を小さくできるため好ましい。
ただし、紫外線の吸収を伴わない窒素ガス等を冷却ガスとしてランプを冷却する特殊な装置を用いる事も可能で、そのような場合はこの限りでない。
以上のようにして、乾燥塗布膜中の有機成分を熱分解・燃焼(酸化)により無機化させながら緻密化させて、緻密な無機膜を得ることができる。
更には、膜の緻密化(露点温度−10℃以下の酸素含有雰囲気ガス中での加熱処理)を図った後、あるいは上記緻密化後の結晶成長の促進化(露点温度0℃以上の酸素含有雰囲気ガス中での加熱処理)を図った後に、特に、金属酸化物膜を透明導電膜として適用する場合は、中性雰囲気または還元性雰囲気ガスを供給しながら加熱処理を行うことが好ましい。
なお、基板として耐熱性プラスチックであるポリイミド(PI)フィルムを用いた場合は、ポリイミドの種類にもよるが、400℃程度までの加熱処理が可能である。
なお、加熱処理工程の昇温過程における金属酸化物の結晶化が起こる温度以上までの昇温速度については特に制約はないが、5~40℃/分の範囲、より一般的には10~30℃/分である。5℃/分より昇温速度が遅いと昇温に時間がかかりすぎて効率が悪くなり、一方40℃/分を越える昇温速度を上記加熱処理装置で実現しようとすると、ヒーター容量が大きくなりすぎて現実的でない。
300℃よりも低い加熱温度(特に270℃未満の加熱温度)では、前述と同様に、通常、金属酸化物微粒子同士の結晶化促進効果が不十分となり易く、導電性や膜強度の大幅な向上が期待しにくいため好ましいとは言えない。
なお、この中性雰囲気または還元性雰囲気下での加熱処理は、膜中に形成された酸素空孔が金属酸化物微粒子の成分元素(金属元素、酸素等)を拡散しやすくするため、上記露点温度0℃以上の酸素含有雰囲気ガス中の加熱処理による金属酸化物微粒子同士の結晶成長促進よりも、より強い促進効果を有しており、上記金属酸化物膜の導電性向上だけでなく、導電性の安定化(経時変化抑制)にも有効である点からも好ましい。
加熱温度が250~600℃程度であれば、1~2%水素−99~98%窒素の混合ガスは、大気に漏洩しても爆発の恐れがないため好ましい雰囲気である。
250℃よりも低い加熱温度では、金属酸化物微粒子に酸素空孔が十分に形成できず、キャリア濃度の増加による金属酸化物膜の導電性向上が期待できないため、金属酸化物膜を透明導電膜に適用した場合には、好ましくない。
薄膜トランジスタ素子(TFT素子)には、例えば、コプレナー型構造やスタガード型構造の電界効果トランジスタ素子が挙げられ、詳細は割愛するが、いずれの構造においても、基板上にソース/ドレイン電極、ゲート絶縁膜、チャネル活性層、ゲート電極を備えた素子である。
薄膜トランジスタ素子は、後述するアクティブマトリクス方式の液晶ディスプレイやエレクトロルミネッセンスディスプレイ等のディスプレイやイメージセンサーのドライバ素子として使用されている。
本発明で得られる金属酸化物膜は、金属酸化物を主成分とする金属酸化物微粒子が極めて緻密に充填した金属酸化物微粒子層となるため、例えば薄膜トランジスタのゲート絶縁膜に適用可能な良質の高誘電率の金属酸化物膜を、例えば300℃未満の低温加熱で形成することができる。
このようなデバイスとしては、LED素子、エレクトロルミネッセンスランプ(エレクトロルミネッセンス素子)、フィールドエミッションランプ等の発光デバイス、太陽電池等の発電デバイス、液晶ディスプレイ(液晶素子)、エレクトロルミネッセンスディスプレイ(エレクトロルミネッセンス素子)、プラズマディスプレイ、電子ペーパー素子、エレクトロクロミック素子等の表示デバイス、及びタッチパネル等の入力デバイス等が挙げられ、本発明の金属酸化物膜、金属酸化物膜付き基板はこれらの透明電極に好適である。
以下、幾つかのデバイスについて説明する。
この有機EL素子は、液晶表示素子と違って自発光素子であり、低電圧駆動で高輝度が得られるためディスプレイ等の表示装置として期待されている。有機EL素子にも低分子型と高分子型があり、例えば高分子型の構造は、アノード電極層としての金属酸化物膜上に、ポリチオフェン誘導体等の導電性高分子から成る正孔注入層(ホール注入層)、有機発光層(塗布により形成される高分子発光層)、カソード電極層[発光層への電子注入性の良い、仕事関数の低いマグネシウム(Mg)、カルシウム(Ca)、アルミニウム(Al)等の金属層]、ガスバリアコーティング層(あるいは金属やガラスでの封止処理)を順次形成したものである。上記ガスバリアコーティング層は、有機EL素子の劣化を防止するために必要とされ、酸素バリア及び水蒸気バリアが求められるが、例えば、水蒸気に関しては、水蒸気透過率=10−5g/m2/day程度以下の非常に高いバリア性能が要求されており、有機EL素子(デバイス)内部は外部から完全に封止された構造となっている。
なお、上記液晶素子の表示安定性を確保するためには、液晶への水蒸気の混入を防止する必要があり、例えば、水蒸気透過率=0.01g/m2/day以下が要求されており、液晶素子(デバイス)内部は外部から完全に封止された構造となっている。
この表示方式には、電気泳動法により着色粒子を電極間の液体中を移動させる電気泳動方式、二色性を有する粒子を電場で回転させることにより着色させるツイストボール方式、例えばコレステリック液晶を透明電極で挟み込んで表示を行う液晶方式、着色粒子(トナー)や電子粉流体(Quick Response Liquid Powder)を空気中を移動させて表示を行う粉体系方式、電気化学的な酸化・還元作用に基づき発色を行うエレクトロクロミック方式、電気化学的な酸化・還元により金属を析出・溶解させ、これに伴う色の変化で表示を行うエレクトロデポジション方式等が開発されている。これらいずれの方式においても、表示層が金属酸化物膜(透明電極)と対向電極とではさみ込まれた構造を有している。
例えば、抵抗方式タッチパネルでは、座標を検出するための座標検出用抵抗膜としての2枚の金属酸化物膜付き基板がドット状の透明スペーサーを介して貼り合わされている構造を有している。金属酸化物膜付き基板には打点耐久性が必要とされ、金属酸化物膜はクラックが生じないようなフレキシビリティが求められる。また、静電容量方式では解像度のアップにより、金属酸化物膜の一層の導電性向上が求められている。
ハフニウム−n−ブトキシド(室温で液体)[Hf(OC4H9)4](分子量=470.95)10g、N−メチル−2−ピロリドン(NMP)14g、ジエチレングリコールモノエチルエーテル(エチルカルビトール)25g、ヒドロキシプロピルセルロース(HPC;低分子量タイプ)1gを混合し、120℃に加温して60分間攪拌して溶解させ、次に、得られた溶解液50gに、エチルアルコール(EA)43g、イソプロピルアルコール(IPA)7gを混合して均一になるまで良く攪拌し、ハフニウム−n−ブトキシドを10重量%、ヒドロキシプロピルセルロースを1重量%含有する金属酸化物膜形成用塗布液を作製した。この金属酸化物膜形成用塗布液の粘度(25℃)は、10mPa・s程度であった。
作製した金属酸化物膜形成用塗布液を、25℃のソーダライムガラス基板(10cm×10cm×厚み3mm;ヘイズ値=0.26%、可視光透過率=91.1%、屈折率=1.53)上の全面にスピンコーティング(500rpm×30sec)した後、熱風乾燥機を用いて150℃で10分間乾燥し、図2の模式図に示すように、更にホットプレートを用いて露点温度が−50℃の低湿度空気雰囲気(3リッター/分供給;基板上の雰囲気ガスの平均流速=約0.045m/秒)において、500℃まで50分かけて昇温(昇温速度:10℃/分)し、500℃で15分間加熱処理し、そのまま雰囲気を1%水素−99%窒素(3リッター/分供給;基板上の雰囲気ガスの平均流速=約0.045m/秒)に切替えて500℃で更に15分間加熱処理して酸化ハフニウム(HfO2)を主成分とする実施例1に係る金属酸化物膜を作製した。
次に作製した金属酸化物膜の表面抵抗、ヘイズ値及び可視光透過率、膜厚、結晶子サイズ、鉛筆硬度の諸特性を測定し、その結果を表1に示す。また、得られた実施例1に係る金属酸化物膜の反射プロファイルを、比較例1の金属酸化物膜の反射プロファイルと共に図3に示す。
更に、実施例1の金属酸化物膜の断面を透過電子顕微鏡で観察した透過電子顕微鏡写真(TEM像)を図4に示す。X線回折測定の結果から上記金属酸化物膜はアモルファス膜であり、主に3nm以下の金属酸化物微粒子(アモルファス状微結晶)が緻密に充填した金属酸化物微粒子層が観察されている。
ヘイズ値と可視光透過率は、日本電色株式会社製のヘイズメーター(NDH5000)を用いJIS K7136(ヘイズ値)、JISK7361−1(透過率)に基づいて測定した。
膜厚は、KLA−TencorCorporation製触針式膜厚計(Alpha−StepIQ)を用いて測定した。
結晶子サイズは、X線回折測定を行い、Scherrer法により求めた。
鉛筆硬度は、JIS K5400に基づいて測定した。
金属酸化物膜の反射プロファイルは、日立製作所株式会社製分光光度計(U−4000)を用いて測定した。
ニオブ−n−ブトキシド(室温で液体)[Nb(C4H9O)5](分子量=458.12)10g、N−メチル−2−ピロリドン(NMP)14g、ジエチレングリコールモノエチルエーテル(エチルカルビトール)25g、ヒドロキシプロピルセルロース(HPC;低分子量タイプ)1gを混合し、120℃に加温して60分間攪拌して溶解させ、次に、得られた溶解液50gに、エチルアルコール(EA)43g、イソプロピルアルコール(IPA)7gを混合して均一になるまで良く攪拌し、ニオブ−n−ブトキシドを10重量%、ヒドロキシプロピルセルロースを1重量%含有する金属酸化物膜形成用塗布液を作製した。この金属酸化物膜形成用塗布液の粘度(25℃)は、10mPa・s程度であった。
さらに、実施例2の金属酸化物膜の断面を透過電子顕微鏡で観察した透過電子顕微鏡写真(TEM像)を図6に示す。X線回折測定の結果から上記金属酸化物膜はアモルファス膜であり、主に3nm以下の金属酸化物微粒子(アモルファス状微結晶)が緻密に充填した金属酸化物微粒子層が観察されている。
ジルコニウム−n−ブトキシド(室温で液体)[Zr(C4H9O)4](分子量=383.68)10g、N−メチル−2−ピロリドン(NMP)14g、ジエチレングリコールモノエチルエーテル(エチルカルビトール)25g、ヒドロキシプロピルセルロース(HPC;低分子量タイプ)1gを混合し、120℃に加温して60分間攪拌して溶解させ、次に、得られた溶解液50gに、エチルアルコール(EA)43g、イソプロピルアルコール(IPA)7gを混合して均一になるまで良く攪拌し、ジルコニウム−n−ブトキシドを10重量%、ヒドロキシプロピルセルロースを1重量%含有する金属酸化物膜形成用塗布液を作製した。この金属酸化物膜形成用塗布液の粘度(25℃)は、10mPa・s程度であった。
さらに、実施例3の金属酸化物膜の断面を透過電子顕微鏡で観察した透過電子顕微鏡写真(TEM像)を図8に示す。X線回折測定の結果から上記金属酸化物膜はアモルファス膜であり、主に3nm以下の金属酸化物微粒子(アモルファス状微結晶)が緻密に充填した金属酸化物微粒子層が観察されている。
チタンテトライソプロポキシド(室温で液体)[Ti(C3H7O)4](分子量=284.25)10g、N−メチル−2−ピロリドン(NMP)14g、ジエチレングリコールモノエチルエーテル(エチルカルビトール)75g、ヒドロキシプロピルセルロース(HPC;低分子量タイプ)1gを混合し、120℃に加温して60分間攪拌して溶解させ、チタンテトライソプロポキシドを10重量%、ヒドロキシプロピルセルロースを1重量%含有する金属酸化物膜形成用塗布液を作製した。この金属酸化物膜形成用塗布液の粘度(25℃)は、10mPa・s程度であった。
また、得られた実施例4に係る金属酸化物膜の反射プロファイルを、比較例4の金属酸化物膜の反射プロファイルと共に図9に示す。
更に、実施例4の金属酸化物膜の断面を透過電子顕微鏡で観察した透過電子顕微鏡写真(TEM像)を図10に示す。X線回折測定の結果から上記金属酸化物膜はアモルファス膜であり、主に3nm以下の金属酸化物微粒子(アモルファス状微結晶)が緻密に充填した金属酸化物微粒子層が観察されている。
アセチルアセトンアルミニウム(室温で固体)(正式名称:アルミニウム−2,4−ペンタンジオネート)[Al(C5H7O2)3](分子量=324.31)10g、p−tert−ブチルフェノール34.6g、二塩基酸エステル(デュポンジャパン製)51.8g、ヒドロキシプロピルセルロース(HPC;高分子量タイプ)3.6gを混合し、120℃に加温して60分間攪拌して均一になるまで良く溶解させ、アセチルアセトンアルミニウムを10重量%、ヒドロキシプロピルセルロースを3.6重量%含有する金属酸化物膜形成用塗布液を作製した。この金属酸化物膜形成用塗布液の粘度(25℃)は、約15000mPa・sであった。
作製した金属酸化物膜形成用塗布液を、25℃のソーダライムガラス基板(10cm×10cm×厚み3mm;ヘイズ値=0.26%、可視光透過率=91.1%、屈折率=1.53)上に4×5cmの大きさのパターンをスクリーン印刷(ポリエステル、200メッシュ版)で印刷した後、熱風乾燥機を用いて180℃で20分間乾燥し、図2の模式図に示すように、更にホットプレートを用いて露点温度が−50℃の低湿度空気雰囲気(3リッター/分供給;基板上の雰囲気ガスの平均流速=約0.045m/秒)において、500℃まで50分かけて昇温(昇温速度:10℃/分)し、500℃で15分間加熱処理して酸化アルミニウム(AlO1.5)を主成分とする実施例5に係る金属酸化物膜を作製した。
X線回折測定の結果から上記金属酸化物膜はアモルファス膜であり、更に、実施例5の金属酸化物膜の断面を透過電子顕微鏡で観察したところ、主に3nm以下の金属酸化物微粒子(アモルファス状微結晶)が緻密に充填した金属酸化物微粒子層が観察されている。
アセチルアセトンモリブデン(室温で固体)(正式名称:モリブデン(VI)オキサイドビス−2,4−ペンタンジオネート[MoO2(C5H7O2)2](分子量=326.17)10g、N−メチル−2−ピロリドン(NMP)22.3g、ヒドロキシプロピルセルロース(HPC;低分子量タイプ)1gを混合し、120℃に加温して60分間攪拌して溶解させ、次に、得られた溶解液50gに、シクロヘキサノン25g、プロピレングリコールモノメチルエーテル(PGM)10g、メチルエチルケトン(MEK)31.7gを混合して均一になるまで良く攪拌し、アセチルアセトンモリブデンを10重量%、ヒドロキシプロピルセルロースを1重量%含有する金属酸化物膜形成用塗布液を作製した。この金属酸化物膜形成用塗布液の粘度(25℃)は、10mPa・s程度であった。
作製した金属酸化物膜形成用塗布液を、25℃の無アルカリガラス基板(10cm×10cm×0.7mm厚さ;ヘイズ値=0.26%、可視光線透過率=91.2%、屈折率=1.52)上の全面にスピンコーティング(1000rpm×60sec)した後、熱風乾燥機を用いて150℃で10分間乾燥し、図2の模式図に示すように、更にホットプレートを用いて露点温度が−55℃の低湿度空気雰囲気(3リッター/分供給;基板上の雰囲気ガスの平均流速=約0.045m/秒)において、350℃まで35分かけて昇温(昇温速度:10℃/分)し、350℃で30分間加熱処理して酸化モリブデン(MoO3)を主成分とする実施例6に係る金属酸化物膜を作製した。
なお、この金属酸化物膜の膜表面の平坦性は、中心線平均粗(Ra)=2.6nm、最大高さ(Rmax)=28nmと良好であった。また、その仕事関数は5.4eVであった。
X線回折測定の結果から上記金属酸化物膜はアモルファス膜であり、更に、実施例6の金属酸化物膜の断面を透過電子顕微鏡で観察したところ、主に3nm以下の金属酸化物微粒子(アモルファス状微結晶)が緻密に充填した金属酸化物微粒子層が観察されている。
タングステン(V)エトキシド(室温で液体)[W(C2H5O)5](分子量=409.15)10g、p−tert−ブチルフェノール16g、二塩基酸エステル(デュポンジャパン製)24gを混合し、120℃に加温して60分間攪拌して溶解させ、次に、得られた溶解液50gに、ジエチレングリコールモノエチルエーテル(エチルカルビトール)12g、エチルアルコール(EA)32.3g、イソプロピルアルコール(IPA)5.7gを混合して均一になるまで良く攪拌し、タングステン(V)エトキシドを10重量%含有する金属酸化物膜形成用塗布液を作製した。この金属酸化物膜形成用塗布液の粘度(25℃)は、5mPa・s程度であった。
作製した金属酸化物膜形成用塗布液を、25℃の無アルカリガラス基板(10cm×10cm×0.7mm厚さ;ヘイズ値=0.26%、可視光線透過率=91.2%、屈折率=1.52)上の全面にスピンコーティング(1000rpm×60sec)した後、熱風乾燥機を用いて150℃で10分間乾燥し、図2の模式図に示すように、更にホットプレートを用いて露点温度が−55℃の低湿度空気雰囲気(3リッター/分供給;基板上の雰囲気ガスの平均流速=約0.045m/秒)において、300℃まで30分かけて昇温(昇温速度:10℃/分)し、300℃で60分間加熱処理して酸化タングステン(WO3)を主成分とする実施例7に係る金属酸化物膜を作製した。
X線回折測定の結果から上記金属酸化物膜はアモルファス膜であり、更に、実施例7の金属酸化物膜の断面を透過電子顕微鏡で観察したところ、主に3nm以下の金属酸化物微粒子(アモルファス状微結晶)が緻密に充填した金属酸化物微粒子層が観察されている。
アセチルアセトンチタン(室温で液体)(正式名称:チタン(IV)ジ−n−ブトキシド ビス(2,4−ペンタンジオネート)[Ti(C4H9O)2(C5H7O2)2])(分子量=392.32)40g、N−メチル−2−ピロリドン(NMP)59g、ヒドロキシプロピルセルロース(HPC;低分子量タイプ)1gを混合し、120℃に加温して120分間攪拌して溶解させ、次に、得られた溶解液25gに、シクロヘキサノン25g、プロピレングリコールモノメチルエーテル(PGM)10g、メチルエチルケトン(MEK)40gを混合して均一になるまで良く攪拌し、アセチルアセトンチタンを10重量%、ヒドロキシプロピルセルロースを1重量%含有する金属酸化物膜形成用塗布液を作製した。この金属酸化物膜形成用塗布液の粘度(25℃)は、10mPa・s程度であった。
作製した金属酸化物膜形成用塗布液を、25℃の無アルカリガラス基板(10cm×10cm×0.7mm厚さ;ヘイズ値=0.26%、可視光線透過率=91.2%、屈折率=1.52)上の全面にスピンコーティング(1000rpm×60sec)した後、大気中150℃で10分間乾燥して乾燥塗布膜(膜厚:約300nm、表面抵抗値:>1×1013Ω/□(絶縁))を得た。図12の模式図に示すように、この乾燥塗布膜3を有する基板2を、露点温度−55℃の低湿度空気中150℃に昇温(昇温速度:30℃/分)し、露点温度−55℃の低湿度空気を紫外線照射窓5(合成石英板;厚さ2mm)と基板2との間に供給しながら150℃に加熱したままで低圧水銀ランプ4を20分間照射する加熱エネルギー線照射を施す加熱処理を行い、乾燥塗布膜3の無機化(有機成分の分解または燃焼)と緻密化を促進して、酸化チタン(TiO2)を主成分とする実施例8に係る金属酸化物膜(膜厚:98nm)を作製した。
なお、低圧水銀ランプ4と基板2との距離(照射距離)は10.5mmで、254nmの光の照度:約20mW/cm2、185nmの光の推定照度:約5mW/cm2であった。更に、基板2と紫外線照射窓5の間隔は3.5mmでその間を流れる雰囲気ガス(露点温度−55℃の低湿度空気)の平均流速は約0.29m/秒)であった。
X線回折測定の結果から上記金属酸化物膜はアモルファス膜であり、更に、実施例8の金属酸化物膜の断面を透過電子顕微鏡で観察したところ、主に3nm以下の金属酸化物微粒子(アモルファス状微結晶)が緻密に充填した金属酸化物微粒子層が観察されている。
アセチルアセトンハフニウム(室温で固体)(正式名称:ハフニウム(IV)−2,4−ペンタンジオネート)[Hf(C5H7O2)4])(分子量=574.91)40g、N−メチル−2−ピロリドン(NMP)59g、ヒドロキシプロピルセルロース(HPC;低分子量タイプ)1gを混合し、120℃に加温して120分間攪拌して溶解させ、次に、得られた溶解液25gに、シクロヘキサノン25g、プロピレングリコールモノメチルエーテル(PGM)10g、メチルエチルケトン(MEK)40gを混合して均一になるまで良く攪拌し、アセチルアセトンハフニウムを10重量%、ヒドロキシプロピルセルロースを1重量%含有する金属酸化物膜形成用塗布液を作製した。この金属酸化物膜形成用塗布液の粘度(25℃)は、10mPa・s程度であった。
作製した金属酸化物膜形成用塗布液を、25℃の無アルカリガラス基板(10cm×10cm×0.7mm厚さ;ヘイズ値=0.26%、可視光線透過率=91.2%、屈折率=1.52)上の全面にスピンコーティング(500rpm×60sec)した後、大気中150℃で10分間乾燥して乾燥塗布膜(膜厚:約470nm、表面抵抗値:>1×1013Ω/□(絶縁))を得た。図12の模式図に示すように、この乾燥塗布膜3を有する基板2を、露点温度−55℃の低湿度空気中150℃に昇温(昇温速度:30℃/分)し、露点温度−55℃の低湿度空気を紫外線照射窓5(合成石英板;厚さ2mm)と基板2との間に供給しながら150℃に加熱したままで低圧水銀ランプ4を20分間照射する加熱エネルギー線照射を施す加熱処理を行い、乾燥塗布膜3の無機化(有機成分の分解または燃焼)と緻密化を促進して、酸化ハフニウム(HfO2)を主成分とする実施例9に係る金属酸化物膜(膜厚:87nm)を作製した。
なお、低圧水銀ランプ4と基板2との距離(照射距離)は10.5mmで、254nmの光の照度:約20mW/cm2、185nmの光の推定照度:約5mW/cm2であった。更に、基板2と紫外線照射窓5の間隔は3.5mmでその間を流れる雰囲気ガス(露点温度−55℃の低湿度空気)の平均流速は約0.29m/秒)であった。
X線回折測定の結果から上記金属酸化物膜はアモルファス膜であり、更に、実施例9の金属酸化物膜の断面を透過電子顕微鏡で観察したところ、主に3nm以下の金属酸化物微粒子(アモルファス状微結晶)が緻密に充填した金属酸化物微粒子層が観察されている。
タンタル(V)−n−ブトキシド(室温で液体)[Ta(C4H9O)5](分子量=543.53)10g、p−tert−ブチルフェノール35.0g、二塩基酸エステル(デュポンジャパン製)52.4g、ヒドロキシプロピルセルロース(HPC;高分子量タイプ)2.6gを混合し、120℃に加温して60分間攪拌して溶解させ、次に、得られた溶解液20gに、シクロヘキサノン10g、プロピレングリコールモノメチルエーテル(PGM)4g、メチルエチルケトン(MEK)16gを混合して均一になるまで良く攪拌し、タンタル(V)−n−ブトキシドを4重量%、ヒドロキシプロピルセルロースを1.04重量%含有する金属酸化物膜形成用塗布液を作製した。この金属酸化物膜形成用塗布液の粘度(25℃)は、23mPa・s程度であった。
作製した金属酸化物膜形成用塗布液を、25℃の無アルカリガラス基板(10cm×10cm×0.7mm厚さ;ヘイズ値=0.26%、可視光線透過率=91.2%、屈折率=1.52)上の全面にスピンコーティング(1000rpm×60sec)した後、熱風乾燥機を用いて150℃で10分間乾燥して乾燥塗布膜(膜厚:約370nm、表面抵抗値:>1×1013Ω/□(絶縁))を得た。
図12の模式図に示すように、この乾燥塗布膜3を有する基板2を、ホットプレート(加熱装置1)を用いて露点温度が−55℃の低湿度空気雰囲気(3リッター/分供給;基板上の雰囲気ガスの平均流速=約0.045m/秒)において、400℃まで40分かけて昇温(昇温速度:10℃/分)し、400℃で15分間加熱処理して酸化タンタル(TaO2.5)を主成分とする実施例10に係る金属酸化物膜(膜厚:62nm)を作製した。
X線回折測定の結果から上記金属酸化物膜はアモルファス膜であり、更に、実施例10の金属酸化物膜の断面を透過電子顕微鏡で観察したところ、主に3nm以下の金属酸化物微粒子(アモルファス状微結晶)が緻密に充填した金属酸化物微粒子層が観察されている。
アセチルアセトンバナジウム(正式名称:バナジウム(III)−2,4−ペンタンジオネート)(室温で固体)[V(C5H7O2)3](分子量=348.26)20g、N−メチル−2−ピロリドン(NMP)78g、ヒドロキシプロピルセルロース(HPC;低分子量タイプ)2gを混合し、120℃に加温して120分間攪拌して溶解させ、次に、得られた溶解液25gに、シクロヘキサノン25g、プロピレングリコールモノメチルエーテル(PGM)10g、メチルエチルケトン(MEK)40gを混合して均一になるまで良く攪拌し、アセチルアセトンバナジウムを5重量%、ヒドロキシプロピルセルロースを0.5重量%含有する金属酸化物膜形成用塗布液を作製した。この金属酸化物膜形成用塗布液の粘度(25℃)は、5mPa・s程度であった。
作製した金属酸化物膜形成用塗布液を、25℃の無アルカリガラス基板(10cm×10cm×0.7mm厚さ;ヘイズ値=0.26%、可視光線透過率=91.2%、屈折率=1.52)上の全面にスピンコーティング(1000rpm×60sec)した後、熱風乾燥機を用いて150℃で10分間乾燥して乾燥塗布膜(膜厚:約110nm、表面抵抗値:>1×1013Ω/□(絶縁))を得た。図12の模式図に示すように、この乾燥塗布膜3を有する基板2を、ホットプレート(加熱装置1)を用いて露点温度が−55℃の低湿度空気雰囲気(3リッター/分供給;基板上の雰囲気ガスの平均流速=約0.045m/秒)において、400℃まで40分かけて昇温(昇温速度:10℃/分)し、400℃で15分間加熱処理し、そのまま雰囲気を1%水素−99%窒素(3リッター/分供給;基板上の雰囲気ガスの平均流速=約0.045m/秒)に切替えて400℃で更に15分間加熱処理して、酸化バナジウム(VO2.5)を主成分とする実施例11に係る金属酸化物膜(膜厚:42nm)を作製した。
X線回折測定の結果から上記金属酸化物膜はアモルファス膜であり、更に、実施例11の金属酸化物膜の断面を透過電子顕微鏡で観察したところ、主に3nm以下の金属酸化物微粒子(アモルファス状微結晶)が緻密に充填した金属酸化物微粒子層が観察されている。
アセチルアセトンセリウム(正式名称:セリウム(III)−2,4−ペンタンジオネート)(室温で固体)[Ce(C5H7O2)3](分子量=437.45)20g、N−メチル−2−ピロリドン(NMP)78g、ヒドロキシプロピルセルロース(HPC;低分子量タイプ)2gを混合し、120℃に加温して120分間攪拌して溶解させ、次に、得られた溶解液25gに、シクロヘキサノン25g、プロピレングリコールモノメチルエーテル(PGM)10g、メチルエチルケトン(MEK)40gを混合して均一になるまで良く攪拌し、アセチルアセトンセリウムを5重量%、ヒドロキシプロピルセルロースを0.5重量%含有する金属酸化物膜形成用塗布液を作製した。この金属酸化物膜形成用塗布液の粘度(25℃)は、5mPa・s程度であった。
作製した金属酸化物膜形成用塗布液を、25℃の無アルカリガラス基板(10cm×10cm×0.7mm厚さ;ヘイズ値=0.26%、可視光線透過率=91.2%、屈折率=1.52)上の全面にスピンコーティング(1000rpm×60sec)した後、熱風乾燥機を用いて150℃で10分間乾燥して乾燥塗布膜(膜厚:約100nm、表面抵抗値:>1×1013Ω/□(絶縁))を得た。
図12の模式図に示すように、この乾燥塗布膜3を有する基板2を、ホットプレート(加熱装置1)を用いて露点温度が−55℃の低湿度空気雰囲気(3リッター/分供給;基板上の雰囲気ガスの平均流速=約0.045m/秒)において、400℃まで40分かけて昇温(昇温速度:10℃/分)し、400℃で15分間加熱処理して酸化セリウム(CeO2)を主成分とする実施例12に係る金属酸化物膜(膜厚:41nm)を作製した。
X線回折測定の結果から上記金属酸化物膜はアモルファス膜であり、更に、実施例12の金属酸化物膜の断面を透過電子顕微鏡で観察したところ、主に3nm以下の金属酸化物微粒子(アモルファス状微結晶)が緻密に充填した金属酸化物微粒子層が観察されている。
実施例1で露点温度が−50℃の低湿度空気の代わりに、露点温度が18℃の空気を用いた以外は実施例1と同様にして成膜を行い、酸化ハフニウム(HfO2)を主成分とする比較例1に係る金属酸化物膜を作製した。
さらに、比較例1の金属酸化物膜の断面を透過電子顕微鏡で観察した透過電子顕微鏡写真(TEM像)を図13に示す。X線回折測定の結果から上記金属酸化物膜はアモルファス膜であり、主に3nm以下の金属酸化物微粒子(アモルファス状微結晶)が充填した金属酸化物微粒子層が観察された。ただし、その金属酸化物微粒子層は、加熱処理工程で露点温度の低い空気を用いて得られた金属酸化物微粒子層に比べ、緻密度合いが低いものであった。
実施例2で露点温度が−50℃の低湿度空気の代わりに、露点温度が18℃の空気を用いた以外は実施例2と同様にして成膜を行い、酸化ニオブ(NbO2.5)を主成分とする比較例2に係る金属酸化物膜を作製した。
さらに、比較例2の金属酸化物膜の断面を透過電子顕微鏡で観察した透過電子顕微鏡写真(TEM像)を図14に示す。X線回折測定の結果から上記金属酸化物膜はアモルファス膜であり、主に3nm以下の金属酸化物微粒子(アモルファス状微結晶)が充填した金属酸化物微粒子層が観察された。ただし、その金属酸化物微粒子層は、加熱処理工程で露点温度の低い空気を用いて得られた金属酸化物微粒子層に比べ、緻密度合いが低いものであった。
実施例3で露点温度が−50℃の低湿度空気の代わりに、露点温度が18℃の空気を用いた以外は実施例3と同様にして成膜を行い、酸化ジルコニウム(ZrO2)を主成分とする比較例3に係る金属酸化物膜を作製した。
さらに、比較例3の金属酸化物膜の断面を透過電子顕微鏡で観察した透過電子顕微鏡写真(TEM像)を図15に示す。X線回折測定の結果から上記金属酸化物膜はアモルファス膜であり、主に3nm以下の金属酸化物微粒子(アモルファス状微結晶)が充填した金属酸化物微粒子層が観察された。ただし、その金属酸化物微粒子層は、加熱処理工程で露点温度の低い空気を用いて得られた金属酸化物微粒子層に比べ、緻密度合いが低いものであった。
実施例4で露点温度が−50℃の低湿度空気の代わりに、露点温度が18℃の空気を用いた以外は実施例4と同様にして成膜を行い、酸化チタン(TiO2)を主成分とする比較例4に係る金属酸化物膜を作製した。
さらに、比較例4の金属酸化物膜の断面を透過電子顕微鏡で観察した透過電子顕微鏡写真(TEM像)を図16に示す。X線回折測定の結果から上記金属酸化物膜はアモルファス膜であり、主に3nm以下の金属酸化物微粒子(アモルファス状微結晶)が充填した金属酸化物微粒子層が観察された。ただし、その金属酸化物微粒子層は、加熱処理工程で露点温度の低い空気を用いて得られた金属酸化物微粒子層に比べ、緻密度合いが低いものであった。
実施例5で露点温度が−50℃の低湿度空気の代わりに、露点温度が18℃の空気を用いた以外は実施例5と同様にして成膜を行い、酸化アルミニウム(AlO1.5)を主成分とする比較例5に係る金属酸化物膜を作製した。
X線回折測定の結果から、その金属酸化物膜はアモルファス膜であり、さらに、比較例5の金属酸化物膜の断面を透過電子顕微鏡で観察したところ、主に3nm以下の金属酸化物微粒子(アモルファス状微結晶)が充填した金属酸化物微粒子層が観察された。ただし、その金属酸化物微粒子層は、加熱処理工程で露点温度の低い空気を用いて得られた金属酸化物微粒子層に比べ、緻密度合いが低いものであった。
実施例6で露点温度が−55℃の低湿度空気の代わりに、露点温度が13℃の空気を用いた以外は実施例6と同様にして成膜を行い、酸化モリブデン(MoO3)を主成分とする比較例6に係る金属酸化物膜を作製した。
なお、その金属酸化物膜の膜表面の平坦性は、中心線平均粗(Ra)=10.6nm、最大高さ(Rmax)=118nmと、加熱処理工程で露点温度の低い空気を用いて得られた金属酸化物膜に比べ、平坦性が低いものであった。また、その仕事関数は5.2eVであった。
X線回折測定の結果から上記金属酸化物膜はアモルファス膜であり、さらに、比較例6の金属酸化物膜の断面を透過電子顕微鏡で観察したところ、主に3nm以下の金属酸化物微粒子(アモルファス状微結晶)が充填した金属酸化物微粒子層が観察された。ただし、その金属酸化物微粒子層は、加熱処理工程で露点温度の低い空気を用いて得られた金属酸化物微粒子層に比べ、緻密度合いが低いものであった。
実施例7で露点温度が−55℃の低湿度空気の代わりに、露点温度が13℃の空気を用いた以外は実施例7と同様にして成膜を行い、酸化タングステン(WO3)を主成分とする比較例7に係る金属酸化物膜を作製した。
実施例8で用いた透明導電膜形成用塗布液を用い、実施例8と同様の、乾燥塗布膜3(膜厚:約300nm、表面抵抗値:>1×1013Ω/□(絶縁))を得た後、図12の模式図に示す加熱エネルギー線照射を施す加熱処理において、露点温度−55℃の低湿度空気の代わりに高湿度の空気[通常の大気;露点温度7℃]を用い、乾燥塗布膜3の無機化(有機成分の分解または燃焼)を促進した以外は、実施例8と同様に行なって酸化チタン(TiO2)を主成分とする比較例8に係る金属酸化物膜(膜厚:115nm)を作製した。
X線回折測定の結果から、その金属酸化物膜はアモルファス膜であり、さらに、比較例8の金属酸化物膜の断面を透過電子顕微鏡で観察したところ、主に3nm以下の金属酸化物微粒子(アモルファス状微結晶)が充填した金属酸化物微粒子層が観察された。ただし、その金属酸化物微粒子層は、加熱処理工程で露点温度の低い空気を用いて得られた金属酸化物微粒子層に比べ、緻密度合いが低いものであった。
実施例9で用いた透明導電膜形成用塗布液を用い、実施例9と同様の、乾燥塗布膜3(膜厚:約470nm、表面抵抗値:>1×1013Ω/□(絶縁))を得た後、図12の模式図に示す加熱エネルギー線照射を施す加熱処理において、露点温度−55℃の低湿度空気の代わりに高湿度の空気[通常の大気;露点温度7℃]を用い、乾燥塗布膜3の無機化(有機成分の分解または燃焼)を促進した以外は、実施例9と同様に行なって酸化ハフニウム(HfO2)を主成分とする比較例9に係る金属酸化物膜(膜厚:96nm)を作製した。
X線回折測定の結果から、その金属酸化物膜はアモルファス膜であり、さらに、比較例9の金属酸化物膜の断面を透過電子顕微鏡で観察したところ、主に3nm以下の金属酸化物微粒子(アモルファス状微結晶)が充填した金属酸化物微粒子層が観察された。ただし、その金属酸化物微粒子層は、加熱処理工程で露点温度の低い空気を用いて得られた金属酸化物微粒子層に比べ、緻密度合いが低いものであった。
実施例10で露点温度が−55℃の低湿度空気の代わりに、露点温度が9℃の空気を用いた以外は実施例10と同様にして成膜を行い、酸化タンタル(TaO2.5)を主成分とする比較例10に係る金属酸化物膜(膜厚:69nm)を作製した。
X線回折測定の結果から、その金属酸化物膜はアモルファス膜であり、さらに、比較例10の金属酸化物膜の断面を透過電子顕微鏡で観察したところ、主に3nm以下の金属酸化物微粒子(アモルファス状微結晶)が充填した金属酸化物微粒子層が観察された。ただし、その金属酸化物微粒子層は、加熱処理工程で露点温度の低い空気を用いて得られた金属酸化物微粒子層に比べ、緻密度合いが低いものであった。
実施例11で露点温度が−55℃の低湿度空気の代わりに、露点温度が9℃の空気を用いた以外は実施例11と同様にして成膜を行い、酸化バナジウム(VO2.5)を主成分とする比較例11に係る金属酸化物膜(膜厚:47nm)を作製した。
X線回折測定の結果から、その金属酸化物膜はアモルファス膜であり、さらに、比較例11の金属酸化物膜の断面を透過電子顕微鏡で観察したところ、主に3nm以下の金属酸化物微粒子(アモルファス状微結晶)が充填した金属酸化物微粒子層が観察された。ただし、その金属酸化物微粒子層は、加熱処理工程で露点温度の低い空気を用いて得られた金属酸化物微粒子層に比べ、緻密度合いが低いものであった。
実施例12で露点温度が−55℃の低湿度空気の代わりに、露点温度が9℃の空気を用いた以外は実施例12と同様にして成膜を行い、酸化セリウム(CeO2)を主成分とする比較例12に係る金属酸化物膜(膜厚:46nm)を作製した。
X線回折測定の結果から、その金属酸化物膜はアモルファス膜であり、さらに、比較例12の金属酸化物膜の断面を透過電子顕微鏡で観察したところ、主に3nm以下の金属酸化物微粒子(アモルファス状微結晶)が充填した金属酸化物微粒子層が観察された。ただし、その金属酸化物微粒子層は、加熱処理工程で露点温度の低い空気を用いて得られた金属酸化物微粒子層に比べ、緻密度合いが低いものであった。
なお、反射プロファイルは記載していないが、実施例8~12と比較例8~12を比べた(実施例8と比較例8の比較、実施例9と比較例9の比較、実施例10と比較例10の比較、実施例11と比較例11の比較、実施例12と比較例12の比較)場合においても、各実施例の金属酸化物膜の反射率が、各比較例の金属酸化物膜の反射率よりも高い値を有していることが確認されている。
(参考までに、各金属酸化物、ガラス基板の屈折率は以下の通り。酸化ハフニウム:1.91~2.15、酸化ニオブ:2.2~2.3、酸化ジルコニウム:2.15、酸化チタン:2.5~2.7、酸化アルミニウム:1.62、酸化タングステン:2.2、酸化タンタル:2.16、酸化バナジウム:2.2~2.5、酸化セリウム:2.1~2.5、ソーダライムガラス:1.53、無アルカリガラス:1.52)
2 基板
3 塗布法により形成された金属酸化物膜形成用塗布液の乾燥塗布膜
4 エネルギー線照射ランプ(紫外線照射ランプ)
5 紫外線照射窓(合成石英板等)
Claims (17)
- 主成分として有機金属化合物を含有する金属酸化物膜形成用塗布液を、基板上に塗布して塗布膜を形成する塗布工程、前記塗布膜を乾燥して乾燥塗布膜を形成する乾燥工程、前記乾燥塗布膜を無機化して、金属酸化物である無機成分を主成分とする無機膜を形成する加熱処理工程の各工程を経て形成される、金属酸化物膜の製造方法であって、
前記加熱処理工程が、前記乾燥工程で形成された有機金属化合物を主成分とする前記乾燥塗布膜を、露点温度−10℃以下の酸素含有雰囲気下で、少なくとも前記有機金属化合物成分の無機化が起こる温度以上まで昇温する加熱処理を行い、前記乾燥塗布膜に含まれる有機成分を熱分解または燃焼、或いは熱分解並びに燃焼により除去することで金属酸化物を主成分とする金属酸化物微粒子が緻密に充填した金属酸化物微粒子層を形成する工程であり、
前記有機金属化合物が、有機アルミニウム化合物、有機ケイ素化合物、有機スカンジウム化合物、有機チタン化合物、有機バナジウム化合物、有機クロム化合物、有機マンガン化合物、有機鉄化合物、有機コバルト化合物、有機ニッケル化合物、有機銅化合物、有機ガリウム化合物、有機ゲルマニウム化合物、有機イットリウム化合物、有機ジルコニウム化合物、有機ニオブ化合物、有機モリブデン化合物、有機ルテニウム化合物、有機アンチモン化合物、有機ランタン化合物、有機ハフニウム化合物、有機タンタル化合物、有機タングステン化合物、有機ビスマス化合物、有機セリウム化合物、有機ネオジム化合物、有機サマリウム化合物、有機ガドリニウム化合物、有機マグネシウム化合物、有機カルシウム化合物、有機ストロンチウム化合物、有機バリウム化合物のいずれか一つ以上からなり、前記金属酸化物が、酸化アルミニウム、酸化ケイ素、酸化スカンジウム、酸化チタン、酸化バナジウム、酸化クロム、酸化マンガン、酸化鉄、酸化コバルト、酸化ニッケル、酸化銅、酸化ガリウム、酸化ゲルマニウム、酸化イットリウム、酸化ジルコニウム、酸化ニオブ、酸化モリブデン、酸化ルテニウム、酸化アンチモン、酸化ランタン、酸化ハフニウム、酸化タンタル、酸化タングステン、酸化ビスマス、酸化セリウム、酸化ネオジム、酸化サマリウム、酸化ガドリニウム、酸化マグネシウム、酸化カルシウム、酸化ストロンチウム、酸化バリウムのいずれか一つ以上であることを特徴とする金属酸化物膜の製造方法。 - 前記露点温度−10℃以下の酸素含有雰囲気下で、少なくとも前記有機金属化合物の無機化が起こる加熱温度以上まで昇温する加熱処理に続いて、露点温度0℃以上の酸素含有雰囲気下で加熱処理することを特徴とする請求項1記載の金属酸化物膜の製造方法。
- 前記露点温度−10℃以下の酸素含有雰囲気下で、少なくとも前記有機金属化合物の無機化が起こる加熱温度以上まで昇温する加熱処理に続いて、中性雰囲気または還元性雰囲気下で加熱処理することを特徴とする請求項1記載の金属酸化物膜の製造方法。
- 前記露点温度0℃以上の酸素含有雰囲気下での加熱処理に続いて、中性雰囲気または還元性雰囲気下で加熱処理することを特徴とする請求項2記載の金属酸化物膜の製造方法。
- 前記中性雰囲気が、窒素ガス、不活性ガスのいずれか一種以上、または前記還元性雰囲気が、水素ガス若しくは前記中性雰囲気に水素ガス或いは有機溶剤蒸気の少なくとも一種以上が含まれた雰囲気であることを特徴とする請求項3または4記載の金属酸化物膜の製造方法。
- 前記露点温度−10℃以下の酸素含有雰囲気下での加熱処理における前記酸素含有雰囲気の露点温度が、−20℃以下であることを特徴とする請求項1~5のいずれか1項に記載の金属酸化物膜の製造方法。
- 前記露点温度−10℃以下の酸素含有雰囲気下での加熱処理を施す際に、エネルギー線照射を行うことを特徴とする請求項1~6のいずれか1項に記載の金属酸化物膜の製造方法。
- 前記エネルギー線照射が、少なくとも200nm以下の波長を主要成分の一つとして含む紫外線の照射であることを特徴とする請求項7に記載の金属酸化物膜の製造方法。
- 前記少なくとも200nm以下の波長を主要成分の一つとして含む紫外線の照射が、低圧水銀ランプ、アマルガムランプ、エキシマランプのいずれかから放射される紫外線の照射であることを特徴とする請求項8に記載の金属酸化物膜の製造方法。
- 前記有機金属化合物が、アセチルアセトン金属錯体化合物または金属アルコキシド化合物、あるいはアセチルアセトン金属錯体化合物と金属アルコキシド化合物からなることを特徴とする請求項1~9のいずれか1項に記載の金属酸化物膜の製造方法。
- 前記塗布工程における金属酸化物膜形成用塗布液の基板上への塗布方法が、インクジェット印刷法、スクリーン印刷法、グラビア印刷法、オフセット印刷法、フレキソ印刷法、ディスペンサ印刷法、スリットコート法、ダイコート法、ドクターブレードコート法、ワイヤーバーコート法、スピンコート法、ディップコート法、スプレーコート法のいずれかであることを特徴とする請求項1記載の金属酸化物膜の製造方法。
- 請求項1~11のいずれか1項に記載の金属酸化物膜の製造方法で得られたことを特徴とする金属酸化物膜。
- 金属酸化物微粒子層を備える素子において、
前記金属酸化物微粒子層が、請求項12記載の金属酸化物膜であることを特徴とする素子。 - 前記素子が、前記金属酸化物微粒子層を、薄膜トランジスタのゲート絶縁膜として用いる薄膜トランジスタであることを特徴とする請求項13記載の素子。
- 基板上に金属酸化物膜を備える金属酸化物膜付き基板において、
前記金属酸化物膜が、請求項12記載の金属酸化物膜であることを特徴とする金属酸化物膜付き基板。 - 透明電極を備えるデバイスにおいて、
前記透明電極が、請求項15記載の金属酸化物膜付き基板であることを特徴とするデバイス。 - 前記デバイスが、発光デバイス、発電デバイス、表示デバイス、入力デバイスから選ばれた1種であることを特徴とする請求項16記載のデバイス。
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JPWO2011155635A1 (ja) | 2013-08-15 |
US8753987B2 (en) | 2014-06-17 |
US20130101867A1 (en) | 2013-04-25 |
CN102933496B (zh) | 2014-10-22 |
CN102933496A (zh) | 2013-02-13 |
JP5240532B2 (ja) | 2013-07-17 |
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