WO2007007602A1 - 放熱装置およびパワーモジュール - Google Patents
放熱装置およびパワーモジュール Download PDFInfo
- Publication number
- WO2007007602A1 WO2007007602A1 PCT/JP2006/313376 JP2006313376W WO2007007602A1 WO 2007007602 A1 WO2007007602 A1 WO 2007007602A1 JP 2006313376 W JP2006313376 W JP 2006313376W WO 2007007602 A1 WO2007007602 A1 WO 2007007602A1
- Authority
- WO
- WIPO (PCT)
- Prior art keywords
- heat
- protrusion
- stress relaxation
- plate
- insulating substrate
- Prior art date
Links
Classifications
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K3/00—Apparatus or processes for manufacturing printed circuits
- H05K3/0058—Laminating printed circuit boards onto other substrates, e.g. metallic substrates
- H05K3/0061—Laminating printed circuit boards onto other substrates, e.g. metallic substrates onto a metallic substrate, e.g. a heat sink
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L23/00—Details of semiconductor or other solid state devices
- H01L23/34—Arrangements for cooling, heating, ventilating or temperature compensation ; Temperature sensing arrangements
- H01L23/36—Selection of materials, or shaping, to facilitate cooling or heating, e.g. heatsinks
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L23/00—Details of semiconductor or other solid state devices
- H01L23/34—Arrangements for cooling, heating, ventilating or temperature compensation ; Temperature sensing arrangements
- H01L23/36—Selection of materials, or shaping, to facilitate cooling or heating, e.g. heatsinks
- H01L23/367—Cooling facilitated by shape of device
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L23/00—Details of semiconductor or other solid state devices
- H01L23/34—Arrangements for cooling, heating, ventilating or temperature compensation ; Temperature sensing arrangements
- H01L23/36—Selection of materials, or shaping, to facilitate cooling or heating, e.g. heatsinks
- H01L23/367—Cooling facilitated by shape of device
- H01L23/3677—Wire-like or pin-like cooling fins or heat sinks
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L23/00—Details of semiconductor or other solid state devices
- H01L23/34—Arrangements for cooling, heating, ventilating or temperature compensation ; Temperature sensing arrangements
- H01L23/36—Selection of materials, or shaping, to facilitate cooling or heating, e.g. heatsinks
- H01L23/373—Cooling facilitated by selection of materials for the device or materials for thermal expansion adaptation, e.g. carbon
- H01L23/3735—Laminates or multilayers, e.g. direct bond copper ceramic substrates
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K3/00—Apparatus or processes for manufacturing printed circuits
- H05K3/30—Assembling printed circuits with electric components, e.g. with resistor
- H05K3/32—Assembling printed circuits with electric components, e.g. with resistor electrically connecting electric components or wires to printed circuits
- H05K3/34—Assembling printed circuits with electric components, e.g. with resistor electrically connecting electric components or wires to printed circuits by soldering
- H05K3/341—Surface mounted components
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L23/00—Details of semiconductor or other solid state devices
- H01L23/34—Arrangements for cooling, heating, ventilating or temperature compensation ; Temperature sensing arrangements
- H01L23/46—Arrangements for cooling, heating, ventilating or temperature compensation ; Temperature sensing arrangements involving the transfer of heat by flowing fluids
- H01L23/473—Arrangements for cooling, heating, ventilating or temperature compensation ; Temperature sensing arrangements involving the transfer of heat by flowing fluids by flowing liquids
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
- H01L2924/0001—Technical content checked by a classifier
- H01L2924/0002—Not covered by any one of groups H01L24/00, H01L24/00 and H01L2224/00
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K1/00—Printed circuits
- H05K1/02—Details
- H05K1/03—Use of materials for the substrate
- H05K1/0306—Inorganic insulating substrates, e.g. ceramic, glass
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K2201/00—Indexing scheme relating to printed circuits covered by H05K1/00
- H05K2201/03—Conductive materials
- H05K2201/0332—Structure of the conductor
- H05K2201/0364—Conductor shape
- H05K2201/0373—Conductors having a fine structure, e.g. providing a plurality of contact points with a structured tool
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K2201/00—Indexing scheme relating to printed circuits covered by H05K1/00
- H05K2201/10—Details of components or other objects attached to or integrated in a printed circuit board
- H05K2201/10227—Other objects, e.g. metallic pieces
- H05K2201/1028—Thin metal strips as connectors or conductors
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K2203/00—Indexing scheme relating to apparatus or processes for manufacturing printed circuits covered by H05K3/00
- H05K2203/04—Soldering or other types of metallurgic bonding
- H05K2203/0405—Solder foil, tape or wire
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02P—CLIMATE CHANGE MITIGATION TECHNOLOGIES IN THE PRODUCTION OR PROCESSING OF GOODS
- Y02P70/00—Climate change mitigation technologies in the production process for final industrial or consumer products
- Y02P70/50—Manufacturing or production processes characterised by the final manufactured product
Definitions
- the present invention relates to a heat dissipation device, and more specifically, a semiconductor mounted on an insulating substrate, including an insulating substrate with one surface serving as a heating element mounting surface and a heat sink fixed on the other surface of the insulating substrate.
- the present invention relates to a heat dissipation device that dissipates heat generated from a heating element such as an element from a heat sink.
- aluminum includes an aluminum alloy in addition to pure aluminum, unless expressed as “pure aluminum”.
- the power module is configured by soldering a semiconductor element to the heating element mounting surface of the insulating substrate of the heat dissipation device.
- the heat dissipation performance of the heat dissipation device is required to be maintained over a long period of time.
- the thermal stress occurs due to the difference in the linear thermal expansion coefficient between the insulating substrate and the heat sink, causing cracks in the insulating substrate, cracks in the solder layer joining the insulating substrate and the heat sink, In some cases, the heat sink performance may be deteriorated due to warping of the heat sink's bonding surface to the insulating substrate.
- one side has been a heating element mounting surface. It has an insulating substrate, a heat sink soldered to the other surface of the insulating substrate, and a heat sink screwed to the heat sink, and the heat sink is made of a highly thermally conductive material such as aluminum or copper. And a low thermal expansion material such as an invar alloy interposed between the two radiator bodies (see Patent Document 1).
- the heat dissipating device described in Patent Document 1 has a problem that the material cost increases because it is necessary to use a heat dissipating body made of a high thermal conductivity material and a low thermal expansion material. Furthermore, since the heat dissipation body and the heat sink are only screwed together, sufficient heat dissipation performance cannot be obtained that the thermal conductivity between them is not sufficient!
- Patent Document 1 Japanese Unexamined Patent Application Publication No. 2004-153075
- An object of the present invention is to provide a heat dissipation device that solves the above-described problems, has low material cost, and has excellent heat dissipation performance.
- the present invention has the following aspect.
- a heat dissipating device including an insulating substrate, one surface of which is a heating element mounting surface, and a heat sink fixed to the other surface of the insulating substrate.
- a stress relief member made of a highly thermally conductive material and having a plurality of protruding forces formed on at least one surface of the plate-like body with an interval is interposed therebetween to relieve stress.
- a heat dissipation device whose members are metal-bonded to an insulating substrate and a heat sink.
- a plurality of protrusions are formed only on one surface of the plate-like main body of the stress relaxation member, and protrusions on the plate-like main body of the stress relaxation member are formed!
- a heat conduction plate made of a highly heat-conductive material and having a through hole through which the protrusion passes is laminated on the surface of the stress relief member on which the protrusion is formed.
- the insulation board and heat sink are metal-bonded to the side where the tip end surface of the protrusion is metal-bonded.
- the outer diameter of the cross section of the protrusion is 0.8 mm or more and less than 1.5 mm, and the protrusion height exceeds 0.8 mm.
- a power module comprising the heat radiating device according to any one of 1) to 14) above and a semiconductor element mounted on a heat generator mounting surface of an insulating substrate of the heat radiating device.
- the plate-shaped main body and at least one surface of the plate-shaped main body are formed with a space between the insulating substrate and the heat sink. Since the stress relaxation member having a plurality of protrusions is interposed and the stress relaxation member is metal-bonded to the insulating substrate and the heat sink, the thermal conductivity between the insulating substrate and the heat sink is excellent, and insulation is achieved. The heat dissipation performance of the heat generated from the semiconductor element mounted on the heating element mounting surface of the substrate is improved.
- the stress relieving member has a plurality of protruding forces formed on the plate-like main body and at least one surface of the plate-like main body, the stress relieving member costs are relatively low, and as a result, the material of the heat dissipation device Cost is reduced.
- a plurality of protrusions are formed only on one surface of the plate-like body of the stress relaxation member, and the protrusions on the plate-like body of the stress relaxation member are formed.
- One of the tip surface of the projection and the protrusion is metal-bonded to the insulating substrate, and the other is metal-bonded to the heat sink, so that the heat conductivity between the insulating substrate and the heat sink is excellent. Therefore, the heat dissipation performance of the heat generated from the semiconductor element mounted on the heating element mounting surface of the insulating substrate is improved.
- the stress relaxation member has a plurality of protrusions formed on only one surface of the plate-like main body and the plate-like main body, the cost of the stress relaxation member is relatively low, and as a result, the material cost of the heat dissipation device is low. Become.
- the insulating substrate and the heat sink are separated by the action of the heat conducting plate. Since the heat transfer area increases, the thermal conductivity between the insulating substrate and the heat sink becomes even better, and the heat dissipation performance of the heat generated from the semiconductor elements mounted on the heating element mounting surface of the insulating substrate Will improve. However, due to the difference in the coefficient of linear thermal expansion between the insulating substrate and the heat sink, even when thermal stress is generated in the heat dissipation device, the heat conduction plate is deformed by the function of the through-holes. Also the thermal stress is relaxed.
- the heat transfer area between the insulating substrate and the heat sink is increased by the action of the two stress relaxation members, so that the thermal conductivity between the insulating substrate and the heat sink is increased.
- the layer is superior, and the heat dissipation performance of the heat generated by the power of the semiconductor element mounted on the heating element mounting surface of the insulating substrate is improved.
- the protrusions of both stress relaxation members are deformed, which causes the thermal stress to be reduced. Since it is mitigated, it is possible to prevent cracks in the insulating substrate, cracks in the joint between the insulating substrate and the stress relaxation member, and warpage of the surface of the heat sink on the insulating substrate side.
- the degree of deformation of the protrusions is small when thermal stress is generated in the radiator, but it is sufficient if the thermal stress generated in the radiator is relatively small. Thermal stress can be relaxed.
- the thermal conductivity between the insulating substrate and the heat sink is caused by the action of the high thermal conductive grease or the thermal conductive grease filled in the gap between the protrusions of the stress relaxation member. Therefore, the heat dissipation performance of the heat generated by the semiconductor element mounted on the heating element mounting surface of the insulating substrate is improved.
- FIGS. 1, 3, and 5 are referred to as top and bottom, and left and right.
- the same portions and the same parts are denoted by the same reference numerals, and redundant description is omitted.
- FIG. 1 This embodiment is shown in FIG. 1 and FIG.
- FIG. 1 shows a part of a power module using the heat dissipation device of Embodiment 1
- FIG. 2 shows a stress relaxation member of the heat dissipation device of Embodiment 1.
- the power module includes a heat dissipation device (1) and a semiconductor element (2) such as an IGBT mounted on the heat dissipation device (1).
- the heat dissipation device (1) includes an insulating substrate (3) whose upper surface is a heating element mounting surface, a stress relaxation member (4) bonded to the lower surface of the insulating substrate (3), and a stress relaxation member ( And a heat sink (5) joined to the lower surface of 4).
- the insulating substrate (3) may be formed with any insulating material force as long as it satisfies the required insulating properties, thermal conductivity, and mechanical strength.
- a ceramic force is also formed.
- aluminum oxide is used.
- a circuit layer (6) is formed on the heating element mounting surface on the upper surface of the insulating substrate (3), and the semiconductor element (2) is bonded on the circuit layer (6). This joining is performed by soldering, for example. Illustration of the solder layer is omitted.
- the circuit layer (6) is made of a metal such as aluminum or copper with excellent electrical conductivity, but its electrical conductivity is high, its deformability is high, and its squeezing force is also excellent in solderability with semiconductor elements.
- metal layer (7) is formed on the lower surface of the insulating substrate (3), and the stress relaxation member (4) is brazed to the metal layer (7).
- the illustration of the brazing material layer is omitted.
- Metal layer (7) is a force formed by a metal such as aluminum or copper with excellent thermal conductivity. High thermal conductivity. High deformability. Excellent wettability with molten brazing material. High purity. It is preferably formed of pure aluminum.
- the insulating substrate (3), the circuit layer (6), and the metal layer (7) constitute a power module substrate (8).
- the stress relaxation member (4) is formed from a high thermal conductivity material, here aluminum, for example by cold forging, and includes a plate-like body (10) and a plate-like body ( 10) Top view And a plurality of solid cylindrical protrusions (11) formed at intervals in a staggered arrangement.
- the tip end surface of the protrusion (11) is brazed to the metal layer (7), and the lower surface of the plate-like body (10) is brazed to the heat sink (5).
- the stress relieving member (4) has a high thermal conductivity and the strength is reduced by heating during brazing, the deformability is high, and the wettability with the molten brazing material is excellent. 99. It should be formed of 5% or more pure aluminum.
- the thickness of the plate-like main body (10) is preferably 0.5 to 3 mm. If the thickness of the plate-shaped body (10) is too thin, stress relaxation when thermal stress occurs in the heat dissipation device (1) due to the difference in thermal expansion coefficient between the insulating substrate (3) and the heat sink (5) There is a risk that the deformation of the member (4) becomes insufficient and the stress relaxation performance by the stress relaxation member (4) may not be sufficient. If this thickness is too thick, the thermal conductivity will decrease and the heat dissipation performance will decrease. It is because there is a possibility of doing.
- the protrusion height of the protrusion (11) is larger than the outer diameter of the cross section (11) More preferably, the height of the protrusion is more than 0.8 mm and not more than 1.5 mm, and the outer diameter of the cross section is not less than 0.8 mm and less than 1.5 mm. If the protrusion height of the protrusion (11) is too low and the outer diameter of the cross section of the protrusion (11) is too large, heat dissipation will occur due to the difference in thermal expansion coefficient between the insulating substrate (3) and the heat sink (5).
- the deformation of the stress relaxation member (4) becomes insufficient, and the stress relaxation performance by the stress relaxation member (4) may not be sufficient. If the protrusion height of the protrusion is too high and the outer diameter of the cross section of the protrusion (11) is too small, there is a possibility that the heat conductivity is lowered and the heat dissipation performance is lowered.
- the protrusion height of the protrusion (11) is smaller than the outer diameter of the cross section (
- the protrusion height of 11) is more preferably 0.5 to 0.8 mm, and the outer diameter of the cross section is more preferably 1.5 to 3 mm. If the protrusion height of the protrusion (11) is too low and the outer diameter of the cross section of the protrusion (11) is too large, the insulation substrate (3) and the heat sink (5) will have different thermal expansion coefficients. When thermal stress occurs in the heat dissipation device (1), deformation of the stress relaxation member (4) becomes insufficient, and the stress relaxation performance by the stress relaxation member (4) may not be sufficient.
- the heat sink (5) has a flat hollow shape in which a plurality of cooling fluid passages (12) are provided in parallel, and is preferably formed of aluminum that is excellent in thermal conductivity and lightweight. Either a liquid or a gas may be used as the cooling fluid.
- the stress relaxation member (4) is brazed to the metal layer (7) and the heat sink (5) of the power module substrate (8), for example, as follows. That is, the stress relaxation member (4) is formed of the bare aluminum material. Next, the power module substrate (8), the stress relieving member (4), and the heat sink (5) are arranged in a laminated form. At this time, between the stress relaxation member (4) and the metal layer (7) and heat sink (5) of the power module substrate (8), respectively, an A 1-Si alloy, an Al-Si-Mg alloy, etc. A sheet-like aluminum brazing material is also interposed. The thickness of the sheet-like aluminum brazing material is preferably about 10 to 200 ⁇ m. If this thickness is too thin, there is a risk of brazing failure due to insufficient supply of brazing material, and if this thickness is too thick, there is an excess of brazing material, which may cause voids and decrease in thermal conductivity. .
- the power module substrate (8), the stress relaxation member (4), and the heat sink (5) are restrained by an appropriate jig, and an appropriate load is applied to the joint surface. Heat to 570-600 ° C in an inert gas atmosphere.
- the stress relaxation member (4), the metal layer (7) of the power module substrate (8) and the heat sink (5) are brazed simultaneously.
- the power module described above is applied to a vehicle such as a hybrid car having an electric motor as a part of a drive source, for example, thereby controlling the electric power supplied to the electric motor according to the driving situation of the vehicle. Then, the heat generated from the semiconductor element (2) is transferred to the heat sink (5) through the power module substrate (8) and the stress relaxation member (4), and the cooling fluid flowing in the cooling fluid path (12). Heat is released to the fluid.
- the protrusion (11) of the stress relaxation member (4) is deformed so that the outer diameter of the cross section expands and contracts, and the thermal stress is thereby relaxed, so that the insulating substrate (3) It is possible to prevent cracks from occurring, cracks at the joint between the insulating substrate (3) and the stress relaxation member (4), and warpage of the upper surface of the heat sink (5). Therefore, the heat dissipation performance is maintained for a long time.
- the protrusion (11) of the stress relaxation member (4) is a solid columnar force. If the solid columnar shape is not limited to this, The outer shape can be changed as appropriate, and may be, for example, a prismatic shape.
- a gap between the protrusions (11) has a high thermal conductive grease or thermal conductivity. It is preferred to be filled with oil.
- silicon grease, silver paste, conductive paste or the like is used as the high thermal conductive grease, and epoxy resin is used as the thermal conductive grease, for example. In this case, thermal conductivity to the power module substrate (8) force heat sink (5) is improved, and heat dissipation performance is improved.
- FIG. 3 This embodiment is shown in FIG. 3 and FIG.
- FIG. 3 shows a part of a power module using the heat dissipation device of the second embodiment
- FIG. 4 shows a stress relaxation member of the heat dissipation device of the second embodiment.
- a stress relaxation member (4) having the same configuration as that of Embodiment 1;
- a highly heat-conductive material here a heat-conducting plate (16) which also has aluminum force and has a plurality of through holes (17) through which the protrusions (11) of the stress relaxation member (4) pass.
- the protrusions (11) of the stress relaxation member (4) are not formed in a staggered arrangement, but are formed side by side in the vertical and horizontal directions.
- the heat conduction plate (16) is disposed on the upper surface of the plate body (10) in the stress relaxation member (4) with the protrusion (11) passed through the through hole (17).
- the clearance between the upper surface of the plate-like body (10) of the stress relaxation member (4) and the lower surface of the heat conduction plate (16) is not necessarily required, and the heat conduction plate (16) and the stress relaxation member (4)
- the plate-like body (10) can be brazed.
- the heat conductive plate (16) has a high thermal conductivity, a strength lowering due to heating during brazing, a high deformability, a high deformability, and excellent wettability with a molten brazing material. It should be made of pure aluminum with a purity of 99.5% or more! /.
- the heat conductive plate (16) and the metal layer (7) are brazed using a sheet-like aluminum brazing material that brazes the tip surface of the protrusion (11) in Embodiment 1 to the metal layer. .
- this brazing also has a force such as Al—S engagement gold, Al—Si—Mg alloy, and projections (11). This is performed by interposing a sheet-like aluminum brazing material having a plurality of through-holes between the heat conducting plate (16) and the plate-like main body (10).
- the gap between the outer peripheral surface of the protrusion (11) and the inner peripheral surface of the through hole (17), and the plate-like main body of the stress relaxation member (4) ( It is preferable that the gap between the upper surface of 10) and the lower surface of the heat conductive plate (16) is filled with the same high heat conductive grease or heat conductive grease as in the first embodiment.
- the heat conductive plate (16) includes a core material made of pure aluminum having a purity of 99% or more, and preferably a purity of 99.5% or more, and a core material.
- An aluminum brazing sheet made of an aluminum brazing material covering both surfaces of the brazing sheet is used to braze the heat conductive plate (16) and the metal layer (7). May be used.
- the skin material of the above aluminum brazing sheet for example, an Al—Si alloy, an Al—Si—Mg alloy, or the like is used.
- the thickness of the skin material is preferably about 10 to 200 / ⁇ ⁇ . If this thickness is too thin, there is a risk of brazing failure due to insufficient supply of brazing material, and if this thickness is too thick, excessive brazing material may result, resulting in voids and reduced thermal conductivity. .
- FIG. 5 shows a part of a power module using the heat dissipation device of the third embodiment
- FIG. 6 shows a stress relaxation member of the heat dissipation device of the third embodiment.
- FIG. 5 and FIG. 6 there are two stress relaxation members (4) having the same configuration as in the first embodiment between the power module substrate (8) and the heat sink (5) in the heat dissipation device (20). Are arranged.
- the upper stress relaxation member (4) is disposed so that the protrusion (11) faces downward, and the lower stress relaxation member (4) is disposed such that the protrusion (11) faces upward.
- the protrusions (11) of the two stress relaxation members (4) are not formed in a staggered arrangement, but are formed side by side in the vertical and horizontal directions.
- the upper surface of the plate-like body (10) of the upper stress relaxation member (4) is brazed to the metal layer (7) of the power module substrate (8), and the plate-like body of the lower stress relaxation member (4).
- the lower surface of the main body (10) is brazed to the heat sink (5).
- These brazings are performed using a sheet-like aluminum brazing material.
- the protrusions (11) of both stress relaxation members (4) are formed so as not to interfere with each other, and the protrusion (11) tip surface of the upper stress relaxation member (4) is formed on the lower stress relaxation member (4).
- the protrusion (11) tip surface of the lower stress relaxation member (4) is brazed to the lower surface of the plate body (10) of the upper stress relaxation member (4) on the upper surface of the plate body (10).
- These brazings are made of Al-Si-based alloy, Al-Si-Mg-based alloy such as a sheet-like aluminum brazing material having a plurality of through-holes through which the projections (11) are passed. This is done by interposing between the plate-like body (10) of 4) and the tip surface of the protrusion (11).
- the high thermal conductivity grease or heat conduction similar to that of the first embodiment is provided in the gap between the protrusions (11) between the upper and lower stress relaxation members (4). It is preferable to be filled with rosin.
- the force that the metal layer (7) is formed on the lower surface of the insulating substrate (3) of the power module substrate (8) The metal layer is not limited to this. Not necessarily required.
- the stress relaxation member (4) is directly brazed to the insulating substrate (3), and in the case of the heat dissipation device (20) of Embodiment 2.
- the stress relaxation member (4) and the heat conduction plate (16) are brazed directly to the insulating substrate.
- FIG. 7 shows a modification of the stress relaxation member used in the heat radiating devices (1), (15), and (20) of the first to third embodiments.
- the stress relaxation member (25) shown in FIG. 7 is a high thermal conductivity material, here an aluminum force.
- the thickness of the plate-like main body (26) is preferably 0.5 to 3 mm. If the plate-shaped body (26) is too thin, stress relaxation when thermal stress occurs in the heat dissipation device (1X15X20) due to the difference in thermal expansion coefficient between the insulating substrate (3) and the heat sink (5) The deformation of the member (25) may be insufficient, and the stress relaxation performance by the stress relaxation member (25) may not be sufficient. If this thickness is too thick, the thermal conductivity will decrease and the heat dissipation performance will decrease. It is because there is a possibility of doing.
- the protrusion height of the protrusion (28) is larger than the outer diameter of the cross section (28) It is more preferable that the protruding height is more than 0.8 mm and not more than 1.5 mm, and the outer diameter of the cross section is not less than 0.8 mm and less than 1.5 mm. If the protrusion height of the protrusion (28) is too low and the outer diameter of the cross section of the protrusion (28) is too large, heat is dissipated due to the difference in thermal expansion coefficient between the insulating substrate (3) and the heat sink (5).
- the stress relaxation member (25) is not sufficiently deformed when thermal stress is generated in the device (1X15X20), the stress relaxation performance by the stress relaxation member (25) may not be sufficient. This is because if the protrusion height of) is too high and the outer diameter of the cross section of the protrusion (28) is too small, the thermal conductivity may be reduced and the heat dissipation performance may be reduced.
- the protrusion height of the protrusion (28) is smaller than the outer diameter of the cross section (
- the protrusion height of 28) is more preferably 0.5 to 0.8 mm, and the outer diameter of the cross section is more preferably 1.5 to 3 mm. If the protrusion height of the protrusion (28) is too low and the outer diameter of the cross section of the protrusion (28) is too large, it is caused by the difference in thermal expansion coefficient between the insulating substrate (3) and the heat sink (5).
- the stress relaxation member (25) may not be sufficiently deformed, and the stress relaxation performance by the stress relaxation member (25) may not be sufficient. If the protrusion height of) is too high and the outer diameter force S of the cross section of the protrusion (28) is too small, the heat conductivity is lowered and the heat radiation performance may be lowered.
- the stress relieving member (25) is preferably made of pure aluminum having a purity of 99% or more, desirably 99.5% or more. [0065] When this stress relaxation member (25) is used, as described in the embodiments 1 to 3, in addition to being filled with the high thermal conductive grease or the thermal conductive grease, the protrusion (28) It is preferable to be filled with high thermal conductivity grease or thermal conductive grease.
- the stress relaxation member (25) shown in FIG. 7 is made of a core material made of pure aluminum having a purity of 99% or more, desirably 99.5% or more, and an aluminum brazing material covering both surfaces of the core material. It may be formed of an aluminum brazing sheet that also has strength and strength, and the stress relaxation member (25) may be brazed using a skin material of the aluminum brazing sheet.
- the skin material for example, an Al—Si alloy, an Al—Si—Mg alloy, or the like is used.
- the thickness of the skin material is preferably about 10 to 200 ⁇ m. If this thickness is too thin, there is a risk of brazing failure due to insufficient supply of the brazing material, and if this thickness is too thick, excessive brazing material may result, resulting in voids and a decrease in thermal conductivity.
- FIG. 8 shows a modification of the stress relaxation member and the heat conduction plate used in the heat dissipation device (15) of the second embodiment.
- the protrusion (31) formed on the upper surface of the plate-like body (10) of the stress relaxation member (30) has a solid prismatic shape, and the protrusion (31 A plurality of rectangular through holes (33) are formed.
- FIG. 1 is a vertical sectional view showing a part of a power module using a heat dissipation device according to Embodiment 1 of the heat dissipation device according to the present invention.
- FIG. 2 is a perspective view showing a stress relaxation member used in the heat dissipation device of FIG.
- FIG. 3 is a view corresponding to FIG. 1 and showing a second embodiment of the heat dissipation device according to the present invention.
- FIG. 4 is a perspective view showing a stress relaxation member and a heat conduction plate used in the heat dissipation device of FIG.
- FIG. 5 is a view corresponding to FIG. 1, showing Embodiment 3 of the heat dissipation device according to the present invention.
- FIG. 6 is a perspective view showing a stress relaxation member used in the heat radiating device of FIG. 5.
- FIG. 7 is a partially cutaway perspective view showing a modification of the stress relaxation member used in the heat radiating device of Embodiments 1 to 3.
- FIG. 8 shows a modification of the stress relaxation member and the heat conduction plate used in the heat dissipation device of Embodiment 2. It is a perspective view shown.
Landscapes
- Engineering & Computer Science (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Chemical & Material Sciences (AREA)
- Materials Engineering (AREA)
- Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Computer Hardware Design (AREA)
- Power Engineering (AREA)
- Manufacturing & Machinery (AREA)
- Ceramic Engineering (AREA)
- Cooling Or The Like Of Semiconductors Or Solid State Devices (AREA)
Abstract
Description
Claims
Priority Applications (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
EP20060767882 EP1901350A4 (en) | 2005-07-07 | 2006-07-05 | HEAT DISSIPATING DEVICE AND POWER MODULE |
US11/994,896 US8198539B2 (en) | 2005-07-07 | 2006-07-05 | Heat radiator and power module |
KR1020087003036A KR101215695B1 (ko) | 2005-07-07 | 2008-02-05 | 방열 장치 및 파워 모듈 |
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2005-198288 | 2005-07-07 | ||
JP2005198288A JP4617209B2 (ja) | 2005-07-07 | 2005-07-07 | 放熱装置 |
Publications (1)
Publication Number | Publication Date |
---|---|
WO2007007602A1 true WO2007007602A1 (ja) | 2007-01-18 |
Family
ID=37636996
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
PCT/JP2006/313376 WO2007007602A1 (ja) | 2005-07-07 | 2006-07-05 | 放熱装置およびパワーモジュール |
Country Status (6)
Country | Link |
---|---|
US (1) | US8198539B2 (ja) |
EP (2) | EP1901350A4 (ja) |
JP (1) | JP4617209B2 (ja) |
KR (1) | KR101215695B1 (ja) |
CN (1) | CN100578768C (ja) |
WO (1) | WO2007007602A1 (ja) |
Cited By (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2008294047A (ja) * | 2007-05-22 | 2008-12-04 | T Rad Co Ltd | セラミック回路基板構造 |
EP2065934A3 (en) * | 2007-11-21 | 2010-02-17 | Kabushiki Kaisha Toyoda Jidoshokki | Heat dissipation apparatus |
EP2065933A3 (en) * | 2007-11-21 | 2010-02-17 | Kabushiki Kaisha Toyoda Jidoshokki | Heat dissipation apparatus |
US7813135B2 (en) * | 2007-05-25 | 2010-10-12 | Kabushiki Kaisha Toyota Jidoshokki | Semiconductor device |
EP2251902A1 (en) * | 2008-03-05 | 2010-11-17 | Kabushiki Kaisha Toshiba | Structure for attaching component having heating body mounted thereon |
JP2012244147A (ja) * | 2011-12-22 | 2012-12-10 | Showa Denko Kk | 放熱装置用ろう材箔 |
EP2040293A4 (en) * | 2007-05-21 | 2016-05-04 | Toyota Motor Co Ltd | COOLER FOR A POWER MODULE AND POWER MODULE |
Families Citing this family (75)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP4621531B2 (ja) * | 2005-04-06 | 2011-01-26 | 株式会社豊田自動織機 | 放熱装置 |
JP5064111B2 (ja) * | 2006-06-28 | 2012-10-31 | 株式会社ティラド | 複合放熱板およびその製造方法並びに、それに用いる熱応力緩和プレート |
JP2008053693A (ja) * | 2006-07-28 | 2008-03-06 | Sanyo Electric Co Ltd | 半導体モジュール、携帯機器、および半導体モジュールの製造方法 |
EP1936683A1 (en) * | 2006-12-22 | 2008-06-25 | ABB Technology AG | Base plate for a heat sink and electronic device with a base plate |
JP4694514B2 (ja) * | 2007-02-08 | 2011-06-08 | トヨタ自動車株式会社 | 半導体素子の冷却構造 |
JP4945319B2 (ja) | 2007-05-25 | 2012-06-06 | 昭和電工株式会社 | 半導体装置 |
US7915727B2 (en) | 2007-07-20 | 2011-03-29 | Samsung Electronics Co., Ltd. | Tape for heat dissipating member, chip on film type semiconductor package including heat dissipating member, and electronic apparatus including the same |
JP5022916B2 (ja) * | 2008-01-08 | 2012-09-12 | 株式会社東芝 | 発熱体搭載可能部品、金属体及び発熱体搭載可能部品の取付構造 |
JP4471023B2 (ja) * | 2008-06-12 | 2010-06-02 | ダイキン工業株式会社 | 空気調和機 |
US8963323B2 (en) | 2008-06-20 | 2015-02-24 | Alcatel Lucent | Heat-transfer structure |
US8472193B2 (en) * | 2008-07-04 | 2013-06-25 | Kabushiki Kaisha Toyota Jidoshokki | Semiconductor device |
EP2166569A1 (de) * | 2008-09-22 | 2010-03-24 | ABB Schweiz AG | Kühlvorrichtung für ein Leistungsbauelement |
EP2178117A1 (en) * | 2008-10-17 | 2010-04-21 | Abb Research Ltd. | Power semiconductor module with double side cooling |
DE102009000514A1 (de) * | 2009-01-30 | 2010-08-26 | Robert Bosch Gmbh | Verbundbauteil sowie Verfahren zum Herstellen eines Verbundbauteil |
JP5120284B2 (ja) * | 2009-02-04 | 2013-01-16 | 株式会社豊田自動織機 | 半導体装置 |
JP5292556B2 (ja) * | 2009-03-17 | 2013-09-18 | 株式会社Welcon | 熱伝導複合材及びその製造方法 |
JP5481961B2 (ja) * | 2009-06-24 | 2014-04-23 | トヨタ自動車株式会社 | 半導体装置 |
JP5515947B2 (ja) * | 2010-03-29 | 2014-06-11 | 株式会社豊田自動織機 | 冷却装置 |
JP5382049B2 (ja) * | 2010-06-30 | 2014-01-08 | 株式会社デンソー | 半導体装置 |
WO2012026418A1 (ja) * | 2010-08-27 | 2012-03-01 | 株式会社村田製作所 | 半導体装置 |
US8587116B2 (en) | 2010-09-30 | 2013-11-19 | Infineon Technologies Ag | Semiconductor module comprising an insert |
JP5392272B2 (ja) * | 2011-01-13 | 2014-01-22 | 株式会社豊田自動織機 | 両面基板、半導体装置、半導体装置の製造方法 |
KR101184508B1 (ko) * | 2011-02-08 | 2012-09-19 | 삼성전기주식회사 | 인쇄회로기판 |
CN102655126B (zh) * | 2011-03-01 | 2016-08-03 | 三菱综合材料株式会社 | 功率模块用基板及制法、自带散热器的该基板及功率模块 |
JP5349572B2 (ja) * | 2011-04-18 | 2013-11-20 | 株式会社豊田自動織機 | 放熱装置及び放熱装置の製造方法 |
KR101255935B1 (ko) * | 2011-07-08 | 2013-04-23 | 삼성전기주식회사 | 전력 모듈 패키지 및 그 제조방법 |
JP6216964B2 (ja) * | 2011-08-09 | 2017-10-25 | 三菱アルミニウム株式会社 | 冷却器用クラッド材および発熱素子用冷却器 |
CN102427070A (zh) * | 2011-12-14 | 2012-04-25 | 深圳市威怡电气有限公司 | 功率模块 |
JP5831273B2 (ja) * | 2012-02-09 | 2015-12-09 | 三菱電機株式会社 | 半導体装置およびその製造方法 |
JP2013229579A (ja) | 2012-03-30 | 2013-11-07 | Mitsubishi Materials Corp | パワーモジュール用基板、ヒートシンク付パワーモジュール用基板及びパワーモジュール |
JP6189015B2 (ja) * | 2012-04-19 | 2017-08-30 | 昭和電工株式会社 | 放熱装置および放熱装置の製造方法 |
US8872332B2 (en) * | 2012-04-30 | 2014-10-28 | Infineon Technologies Ag | Power module with directly attached thermally conductive structures |
JP2014017318A (ja) * | 2012-07-06 | 2014-01-30 | Toyota Industries Corp | 半導体装置 |
DE102012213573B3 (de) | 2012-08-01 | 2013-09-26 | Infineon Technologies Ag | Halbleitermodulanordnung und verfahren zur herstellung und zum betrieb einer halbleitermodulanordnung |
CN103002722B (zh) * | 2012-12-18 | 2015-03-25 | 武汉光迅科技股份有限公司 | 一种功率设备的热控制装置 |
US8872328B2 (en) * | 2012-12-19 | 2014-10-28 | General Electric Company | Integrated power module package |
JP6064886B2 (ja) * | 2012-12-26 | 2017-01-25 | 株式会社豊田中央研究所 | 熱伝導性応力緩和構造体 |
WO2014132524A1 (ja) * | 2013-02-28 | 2014-09-04 | 三菱電機株式会社 | 放熱構造及び光送受信器 |
US9470720B2 (en) * | 2013-03-08 | 2016-10-18 | Sandisk Technologies Llc | Test system with localized heating and method of manufacture thereof |
JP6197329B2 (ja) * | 2013-03-28 | 2017-09-20 | 三菱マテリアル株式会社 | パワーモジュール、及び熱インターフェース板の製造方法 |
JP6197365B2 (ja) * | 2013-05-21 | 2017-09-20 | 三菱マテリアル株式会社 | パワーモジュール、及び熱インターフェース板の製造方法 |
US9898056B2 (en) | 2013-06-19 | 2018-02-20 | Sandisk Technologies Llc | Electronic assembly with thermal channel and method of manufacture thereof |
US10013033B2 (en) | 2013-06-19 | 2018-07-03 | Sandisk Technologies Llc | Electronic assembly with thermal channel and method of manufacture thereof |
JP5999041B2 (ja) * | 2013-07-23 | 2016-09-28 | 株式会社デンソー | 電子装置 |
CN103413794A (zh) * | 2013-08-16 | 2013-11-27 | 中国科学院深圳先进技术研究院 | 一种半导体功率器件的散热封装结构 |
EP2854170B1 (en) * | 2013-09-27 | 2022-01-26 | Alcatel Lucent | A structure for a heat transfer interface and method of manufacturing the same |
CN103579131A (zh) * | 2013-11-04 | 2014-02-12 | 株洲南车时代电气股份有限公司 | 用于功率igbt模块封装的无曲度基板 |
US9543227B2 (en) * | 2013-12-27 | 2017-01-10 | Mitsubishi Electric Corporation | Semiconductor device |
JP6308780B2 (ja) * | 2013-12-27 | 2018-04-11 | 三菱電機株式会社 | パワーモジュール |
US9549457B2 (en) | 2014-02-12 | 2017-01-17 | Sandisk Technologies Llc | System and method for redirecting airflow across an electronic assembly |
US9497889B2 (en) | 2014-02-27 | 2016-11-15 | Sandisk Technologies Llc | Heat dissipation for substrate assemblies |
US9485851B2 (en) | 2014-03-14 | 2016-11-01 | Sandisk Technologies Llc | Thermal tube assembly structures |
US9348377B2 (en) | 2014-03-14 | 2016-05-24 | Sandisk Enterprise Ip Llc | Thermal isolation techniques |
US9519319B2 (en) | 2014-03-14 | 2016-12-13 | Sandisk Technologies Llc | Self-supporting thermal tube structure for electronic assemblies |
DE102015202300A1 (de) * | 2015-02-10 | 2016-08-11 | Robert Bosch Gmbh | Wärmetransferblech |
US9559026B2 (en) * | 2015-02-26 | 2017-01-31 | Infineon Technologies Americas Corp. | Semiconductor package having a multi-layered base |
US10287161B2 (en) * | 2015-07-23 | 2019-05-14 | Analog Devices, Inc. | Stress isolation features for stacked dies |
US10418295B2 (en) * | 2016-01-28 | 2019-09-17 | Mitsubishi Electric Corporation | Power module |
DE102016218522B3 (de) * | 2016-09-27 | 2017-06-22 | Jenoptik Laser Gmbh | Optische oder optoelektronische Baugruppe und Verfahren zur Herstellung dafür |
JP6745904B2 (ja) * | 2016-11-24 | 2020-08-26 | 三菱電機株式会社 | 半導体装置およびその製造方法 |
JP6595531B2 (ja) * | 2017-05-30 | 2019-10-23 | ファナック株式会社 | ヒートシンクアッセンブリ |
US11127716B2 (en) | 2018-04-12 | 2021-09-21 | Analog Devices International Unlimited Company | Mounting structures for integrated device packages |
US10490482B1 (en) * | 2018-12-05 | 2019-11-26 | Toyota Motor Engineering & Manufacturing North America, Inc. | Cooling devices including jet cooling with an intermediate mesh and methods for using the same |
CN109769341B (zh) * | 2019-01-28 | 2022-01-21 | 晶晨半导体(深圳)有限公司 | 一种用于解决金属散热片的天线效应的方法 |
TWI743557B (zh) | 2019-09-05 | 2021-10-21 | 朋程科技股份有限公司 | 功率元件封裝結構 |
CN112490202A (zh) * | 2019-09-12 | 2021-03-12 | 朋程科技股份有限公司 | 功率器件封装结构 |
DE102020108808A1 (de) | 2020-03-31 | 2021-09-30 | Audi Aktiengesellschaft | Batteriezellenanordnung und Kraftfahrzeug mit einer Batteriezellenanordnung |
JP6849137B1 (ja) * | 2020-07-06 | 2021-03-24 | 富士電機株式会社 | 半導体装置 |
US11664340B2 (en) | 2020-07-13 | 2023-05-30 | Analog Devices, Inc. | Negative fillet for mounting an integrated device die to a carrier |
DE102020128453A1 (de) * | 2020-10-29 | 2022-05-05 | Erwin Quarder Systemtechnik Gmbh | Kompensationsbauteil |
DE102021109666B3 (de) | 2021-04-16 | 2022-10-20 | Danfoss Silicon Power Gmbh | Elektronisches Gerät und Verfahren zu dessen Herstellung |
DE102021109658B3 (de) | 2021-04-16 | 2022-10-20 | Danfoss Silicon Power Gmbh | Verfahren zur Herstellung eines Halbleiter-Leistungsgeräts und damit hergestelltes Halbleiter-Leistungsgerät sowie ein Werkzeugteil für eine Sinterpresse und Verwendung einer Sinterpresse |
KR20230016833A (ko) * | 2021-07-27 | 2023-02-03 | 주식회사 아모센스 | 히트싱크 일체형 세라믹 기판 및 그 제조방법 |
KR20230126876A (ko) * | 2022-02-24 | 2023-08-31 | 주식회사 아모그린텍 | 세라믹 기판 유닛 및 그 제조방법 |
DE102022123868A1 (de) * | 2022-08-22 | 2024-02-22 | Elringklinger Ag | Entwärmungsvorrichtung |
Citations (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH02102565A (ja) * | 1988-10-11 | 1990-04-16 | Nec Corp | 半導体装置 |
JPH03253063A (ja) * | 1990-03-02 | 1991-11-12 | Hitachi Ltd | 電子デバイスの冷却装置 |
JPH0471256A (ja) * | 1990-07-11 | 1992-03-05 | Kyocera Corp | 放熱体の製造方法 |
JPH04123441A (ja) * | 1990-09-14 | 1992-04-23 | Hitachi Ltd | 半導体集積回路装置 |
JP2000082887A (ja) * | 1998-09-07 | 2000-03-21 | Sony Corp | ヒートシンク用の伝熱シート |
JP2004087612A (ja) * | 2002-08-23 | 2004-03-18 | Toyota Industries Corp | 放熱部材及びこの放熱部材を用いた半導体装置 |
JP2004153075A (ja) | 2002-10-31 | 2004-05-27 | Mitsubishi Materials Corp | パワーモジュール用基板及びパワーモジュール |
Family Cites Families (48)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4069498A (en) * | 1976-11-03 | 1978-01-17 | International Business Machines Corporation | Studded heat exchanger for integrated circuit package |
DE3031912A1 (de) * | 1980-08-23 | 1982-04-01 | Brown, Boveri & Cie Ag, 6800 Mannheim | Anordnung zur potentialunabhaengigen waermeabfuehrung |
US5631447A (en) * | 1988-02-05 | 1997-05-20 | Raychem Limited | Uses of uniaxially electrically conductive articles |
US5111278A (en) * | 1991-03-27 | 1992-05-05 | Eichelberger Charles W | Three-dimensional multichip module systems |
US5760333A (en) * | 1992-08-06 | 1998-06-02 | Pfu Limited | Heat-generating element cooling device |
EP0620702B1 (de) * | 1993-04-16 | 1999-01-20 | Dyconex Patente Ag | Kern für elektrische Verbindungssubstrate und elektrische Verbindungssubstrate mit Kern, sowie Verfahren zu deren Herstellung |
US5510650A (en) * | 1994-09-02 | 1996-04-23 | General Motors Corporation | Low mechanical stress, high electrical and thermal conductance semiconductor die mount |
US5707756A (en) * | 1994-11-29 | 1998-01-13 | Fuji Photo Film Co., Ltd. | Non-aqueous secondary battery |
US5623160A (en) * | 1995-09-14 | 1997-04-22 | Liberkowski; Janusz B. | Signal-routing or interconnect substrate, structure and apparatus |
US5981085A (en) * | 1996-03-21 | 1999-11-09 | The Furukawa Electric Co., Inc. | Composite substrate for heat-generating semiconductor device and semiconductor apparatus using the same |
US5787976A (en) * | 1996-07-01 | 1998-08-04 | Digital Equipment Corporation | Interleaved-fin thermal connector |
US5930115A (en) * | 1996-08-26 | 1999-07-27 | Compaq Computer Corp. | Apparatus, method and system for thermal management of a semiconductor device |
US5737187A (en) * | 1996-08-26 | 1998-04-07 | Compaq Computer Corporation | Apparatus, method and system for thermal management of an unpackaged semiconductor device |
US6058012A (en) * | 1996-08-26 | 2000-05-02 | Compaq Computer Corporation | Apparatus, method and system for thermal management of an electronic system having semiconductor devices |
WO1998020549A1 (en) * | 1996-11-08 | 1998-05-14 | W.L. Gore & Associates, Inc. | Use of variable perforation density in copper layer to control cte |
JPH10189845A (ja) * | 1996-12-25 | 1998-07-21 | Denso Corp | 半導体素子の放熱装置 |
US5952840A (en) * | 1996-12-31 | 1999-09-14 | Micron Technology, Inc. | Apparatus for testing semiconductor wafers |
US6245442B1 (en) * | 1997-05-28 | 2001-06-12 | Kabushiki Kaisha Toyota Chuo | Metal matrix composite casting and manufacturing method thereof |
US6374490B1 (en) * | 1998-08-12 | 2002-04-23 | Nakamura Seisakusho Kabushikigaisha | Method of forming a hollow pole projecting on a plate and a method of manufacturing a heat sink using said method |
US6423596B1 (en) * | 1998-09-29 | 2002-07-23 | Texas Instruments Incorporated | Method for two-sided fabrication of a memory array |
US6906292B2 (en) * | 1998-10-29 | 2005-06-14 | Applera Corporation | Sample tray heater module |
JP2000150736A (ja) * | 1998-11-13 | 2000-05-30 | Shinko Electric Ind Co Ltd | 半導体モジュール用放熱板および半導体モジュール |
US7584780B1 (en) * | 1998-12-09 | 2009-09-08 | Lemont Aircraft Corporation | Active heat sink structure with flow augmenting rings and method for removing heat |
US6896039B2 (en) * | 1999-05-12 | 2005-05-24 | Thermal Corp. | Integrated circuit heat pipe heat spreader with through mounting holes |
US6239972B1 (en) * | 1999-12-13 | 2001-05-29 | Honeywell International Inc. | Integrated convection and conduction heat sink for multiple mounting positions |
JP4386522B2 (ja) * | 2000-01-26 | 2009-12-16 | 株式会社ルネサステクノロジ | 半導体装置の製造方法 |
US6956757B2 (en) * | 2000-06-22 | 2005-10-18 | Contour Semiconductor, Inc. | Low cost high density rectifier matrix memory |
WO2002084750A1 (en) * | 2001-04-12 | 2002-10-24 | Matsushita Electric Works, Ltd. | Light source device using led, and method of producing same |
JP4969738B2 (ja) * | 2001-06-28 | 2012-07-04 | 株式会社東芝 | セラミックス回路基板およびそれを用いた半導体モジュール |
JP2003051144A (ja) * | 2001-08-03 | 2003-02-21 | Fujitsu Ltd | 磁気ヘッド |
EP1369931A1 (en) * | 2002-06-03 | 2003-12-10 | Hitachi, Ltd. | Solar cell and its manufacturing method, metal plate for the same |
WO2004008142A1 (ja) * | 2002-07-12 | 2004-01-22 | Mitsubishi Chemical Corporation | 分析用チップ、分析用チップユニット、分析装置及びそれを用いた分析方法並びに分析用チップの作製方法 |
US6994151B2 (en) * | 2002-10-22 | 2006-02-07 | Cooligy, Inc. | Vapor escape microchannel heat exchanger |
US7836597B2 (en) * | 2002-11-01 | 2010-11-23 | Cooligy Inc. | Method of fabricating high surface to volume ratio structures and their integration in microheat exchangers for liquid cooling system |
TWI295726B (en) * | 2002-11-01 | 2008-04-11 | Cooligy Inc | Method and apparatus for achieving temperature uniformity and hot spot cooling in a heat producing device |
US7000684B2 (en) * | 2002-11-01 | 2006-02-21 | Cooligy, Inc. | Method and apparatus for efficient vertical fluid delivery for cooling a heat producing device |
JPWO2004053984A1 (ja) * | 2002-12-09 | 2006-04-13 | 株式会社豊田中央研究所 | 半導体素子放熱部材およびそれを用いた半導体装置ならびにその製造方法 |
JP2004205159A (ja) * | 2002-12-26 | 2004-07-22 | Denso Corp | 熱交換器 |
EP1582501A4 (en) * | 2003-01-09 | 2009-01-28 | Sony Corp | PROCESS FOR TUBE-LIKE CARBON MOLECULAR AND TUBE SHAPED CARBON MOLECULE, METHOD FOR RECORDING DEVICE AND RECORDING DEVICE, METHOD FOR FIELD ELECTRON EMISSION ELEMENT AND FIELD ELECTRON EMISSION ELEMENT AND METHOD FOR DISPLAY UNIT AND DISPLAY UNIT |
JP3934565B2 (ja) * | 2003-02-21 | 2007-06-20 | 富士通株式会社 | 半導体装置 |
DE10337640A1 (de) * | 2003-08-16 | 2005-03-17 | Semikron Elektronik Gmbh | Leistungshalbleitermodul mit verbessertem thermischen Kontakt |
KR100542188B1 (ko) * | 2003-08-26 | 2006-01-10 | 삼성에스디아이 주식회사 | 플라즈마 디스플레이 장치 |
JP2006156711A (ja) * | 2004-11-30 | 2006-06-15 | Mitsubishi Electric Corp | パワー半導体モジュールの冷却システム |
JP4688526B2 (ja) * | 2005-03-03 | 2011-05-25 | Okiセミコンダクタ株式会社 | 半導体装置及びその製造方法 |
US7388329B2 (en) * | 2005-04-06 | 2008-06-17 | Lg Display Co., Ltd. | Light emitting display |
JP4439441B2 (ja) * | 2005-07-01 | 2010-03-24 | 富士通株式会社 | 熱交換器 |
US20070077349A1 (en) * | 2005-09-30 | 2007-04-05 | Eastman Kodak Company | Patterning OLED device electrodes and optical material |
JP5103731B2 (ja) * | 2005-12-12 | 2012-12-19 | 三菱電機株式会社 | モールドパッケージ |
-
2005
- 2005-07-07 JP JP2005198288A patent/JP4617209B2/ja not_active Expired - Fee Related
-
2006
- 2006-07-05 EP EP20060767882 patent/EP1901350A4/en not_active Withdrawn
- 2006-07-05 EP EP11150797.6A patent/EP2306512B1/en not_active Not-in-force
- 2006-07-05 CN CN200680024815A patent/CN100578768C/zh not_active Expired - Fee Related
- 2006-07-05 US US11/994,896 patent/US8198539B2/en not_active Expired - Fee Related
- 2006-07-05 WO PCT/JP2006/313376 patent/WO2007007602A1/ja active Application Filing
-
2008
- 2008-02-05 KR KR1020087003036A patent/KR101215695B1/ko not_active IP Right Cessation
Patent Citations (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH02102565A (ja) * | 1988-10-11 | 1990-04-16 | Nec Corp | 半導体装置 |
JPH03253063A (ja) * | 1990-03-02 | 1991-11-12 | Hitachi Ltd | 電子デバイスの冷却装置 |
JPH0471256A (ja) * | 1990-07-11 | 1992-03-05 | Kyocera Corp | 放熱体の製造方法 |
JPH04123441A (ja) * | 1990-09-14 | 1992-04-23 | Hitachi Ltd | 半導体集積回路装置 |
JP2000082887A (ja) * | 1998-09-07 | 2000-03-21 | Sony Corp | ヒートシンク用の伝熱シート |
JP2004087612A (ja) * | 2002-08-23 | 2004-03-18 | Toyota Industries Corp | 放熱部材及びこの放熱部材を用いた半導体装置 |
JP2004153075A (ja) | 2002-10-31 | 2004-05-27 | Mitsubishi Materials Corp | パワーモジュール用基板及びパワーモジュール |
Non-Patent Citations (1)
Title |
---|
See also references of EP1901350A4 |
Cited By (9)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
EP2040293A4 (en) * | 2007-05-21 | 2016-05-04 | Toyota Motor Co Ltd | COOLER FOR A POWER MODULE AND POWER MODULE |
JP2008294047A (ja) * | 2007-05-22 | 2008-12-04 | T Rad Co Ltd | セラミック回路基板構造 |
US7813135B2 (en) * | 2007-05-25 | 2010-10-12 | Kabushiki Kaisha Toyota Jidoshokki | Semiconductor device |
EP2065934A3 (en) * | 2007-11-21 | 2010-02-17 | Kabushiki Kaisha Toyoda Jidoshokki | Heat dissipation apparatus |
EP2065933A3 (en) * | 2007-11-21 | 2010-02-17 | Kabushiki Kaisha Toyoda Jidoshokki | Heat dissipation apparatus |
KR101030939B1 (ko) | 2007-11-21 | 2011-04-28 | 쇼와 덴코 가부시키가이샤 | 방열장치 |
EP2251902A1 (en) * | 2008-03-05 | 2010-11-17 | Kabushiki Kaisha Toshiba | Structure for attaching component having heating body mounted thereon |
EP2251902A4 (en) * | 2008-03-05 | 2014-10-08 | Toshiba Kk | STRUCTURE FOR FIXING A COMPONENT WITH A HEATING ELEMENT INSTALLED THEREFOR |
JP2012244147A (ja) * | 2011-12-22 | 2012-12-10 | Showa Denko Kk | 放熱装置用ろう材箔 |
Also Published As
Publication number | Publication date |
---|---|
EP1901350A1 (en) | 2008-03-19 |
CN101218671A (zh) | 2008-07-09 |
EP2306512B1 (en) | 2014-09-03 |
JP2007019203A (ja) | 2007-01-25 |
EP1901350A4 (en) | 2010-03-10 |
EP2306512A2 (en) | 2011-04-06 |
EP2306512A3 (en) | 2012-08-08 |
JP4617209B2 (ja) | 2011-01-19 |
CN100578768C (zh) | 2010-01-06 |
KR101215695B1 (ko) | 2012-12-26 |
US8198539B2 (en) | 2012-06-12 |
US20090200065A1 (en) | 2009-08-13 |
KR20080031381A (ko) | 2008-04-08 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
JP4617209B2 (ja) | 放熱装置 | |
JP5007296B2 (ja) | パワーモジュール用ベース | |
JP4867793B2 (ja) | 半導体装置 | |
JP4621531B2 (ja) | 放熱装置 | |
JP5120284B2 (ja) | 半導体装置 | |
JP6409690B2 (ja) | 冷却モジュール | |
WO2015029511A1 (ja) | 半導体装置およびその製造方法 | |
WO2007072700A1 (ja) | 半導体モジュール | |
JP2009016621A (ja) | 半導体パッケージ用放熱プレート及び半導体装置 | |
JP4935220B2 (ja) | パワーモジュール装置 | |
JP2006100640A (ja) | セラミックス回路基板及びこれを用いたパワー半導体モジュール | |
WO2019026836A1 (ja) | パワーモジュール | |
JP2019134018A (ja) | 半導体装置 | |
JP5282075B2 (ja) | 放熱装置 | |
JP2004253531A (ja) | パワー半導体モジュールおよびその固定方法 | |
JP2009158715A (ja) | 放熱装置及びパワーモジュール | |
JP4737436B2 (ja) | 熱電変換モジュールの接合体 | |
JP5320354B2 (ja) | 放熱装置 | |
JP6320347B2 (ja) | 半導体装置 | |
JP2008277317A (ja) | パワーモジュール及び車両用インバータ | |
WO2016079970A1 (ja) | 冷却モジュール | |
JP7205214B2 (ja) | ヒートシンク付絶縁回路基板 | |
JP2006013420A (ja) | 電子部品収納用パッケージおよび電子装置 | |
JP4786302B2 (ja) | パワーモジュール用ベースの製造方法 | |
JP7063559B2 (ja) | ベース板及びパワーモジュール |
Legal Events
Date | Code | Title | Description |
---|---|---|---|
WWE | Wipo information: entry into national phase |
Ref document number: 200680024815.7 Country of ref document: CN |
|
121 | Ep: the epo has been informed by wipo that ep was designated in this application | ||
WWE | Wipo information: entry into national phase |
Ref document number: 11994896 Country of ref document: US |
|
NENP | Non-entry into the national phase |
Ref country code: DE |
|
WWE | Wipo information: entry into national phase |
Ref document number: 2006767882 Country of ref document: EP |
|
WWE | Wipo information: entry into national phase |
Ref document number: 1020087003036 Country of ref document: KR |
|
WWE | Wipo information: entry into national phase |
Ref document number: 11994896 Country of ref document: US |