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Asm Ip Holding B.V. |
Susceptor for semiconductor substrate processing apparatus
|
US10811232B2
(en)
|
2017-08-08 |
2020-10-20 |
Applied Materials, Inc. |
Multi-plate faceplate for a processing chamber
|
USD851613S1
(en)
|
2017-10-05 |
2019-06-18 |
Applied Materials, Inc. |
Target profile for a physical vapor deposition chamber target
|
USD868124S1
(en)
*
|
2017-12-11 |
2019-11-26 |
Applied Materials, Inc. |
Target profile for a physical vapor deposition chamber target
|
TWD197827S
(zh)
|
2017-12-19 |
2019-06-01 |
日商荏原製作所股份有限公 |
半導體晶圓研磨用彈性膜
|
USD880437S1
(en)
*
|
2018-02-01 |
2020-04-07 |
Asm Ip Holding B.V. |
Gas supply plate for semiconductor manufacturing apparatus
|
USD877101S1
(en)
|
2018-03-09 |
2020-03-03 |
Applied Materials, Inc. |
Target profile for a physical vapor deposition chamber target
|
USD859333S1
(en)
|
2018-03-16 |
2019-09-10 |
Applied Materials, Inc. |
Collimator for a physical vapor deposition chamber
|
USD858468S1
(en)
|
2018-03-16 |
2019-09-03 |
Applied Materials, Inc. |
Collimator for a physical vapor deposition chamber
|
USD846514S1
(en)
|
2018-05-03 |
2019-04-23 |
Kokusai Electric Corporation |
Boat of substrate processing apparatus
|
USD888903S1
(en)
|
2018-12-17 |
2020-06-30 |
Applied Materials, Inc. |
Deposition ring for physical vapor deposition chamber
|
USD891382S1
(en)
|
2019-02-08 |
2020-07-28 |
Applied Materials, Inc. |
Process shield for a substrate processing chamber
|
USD933725S1
(en)
*
|
2019-02-08 |
2021-10-19 |
Applied Materials, Inc. |
Deposition ring for a substrate processing chamber
|
USD893441S1
(en)
|
2019-06-28 |
2020-08-18 |
Applied Materials, Inc. |
Base plate for a processing chamber substrate support
|
USD908645S1
(en)
|
2019-08-26 |
2021-01-26 |
Applied Materials, Inc. |
Sputtering target for a physical vapor deposition chamber
|
USD913979S1
(en)
*
|
2019-08-28 |
2021-03-23 |
Applied Materials, Inc. |
Inner shield for a substrate processing chamber
|
USD941371S1
(en)
*
|
2020-03-20 |
2022-01-18 |
Applied Materials, Inc. |
Process shield for a substrate processing chamber
|
USD937329S1
(en)
*
|
2020-03-23 |
2021-11-30 |
Applied Materials, Inc. |
Sputter target for a physical vapor deposition chamber
|
USD933726S1
(en)
*
|
2020-07-31 |
2021-10-19 |
Applied Materials, Inc. |
Deposition ring for a semiconductor processing chamber
|
USD940765S1
(en)
*
|
2020-12-02 |
2022-01-11 |
Applied Materials, Inc. |
Target profile for a physical vapor deposition chamber target
|