USD858468S1 - Collimator for a physical vapor deposition chamber - Google Patents
Collimator for a physical vapor deposition chamber Download PDFInfo
- Publication number
- USD858468S1 USD858468S1 US29/640,787 US201829640787F USD858468S US D858468 S1 USD858468 S1 US D858468S1 US 201829640787 F US201829640787 F US 201829640787F US D858468 S USD858468 S US D858468S
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- US
- United States
- Prior art keywords
- collimator
- vapor deposition
- physical vapor
- deposition chamber
- view
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
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Description
The dashed lines in the drawings represent unclaimed environment and form no part of the claimed design.
Claims (1)
- The ornamental design for a collimator for a physical vapor deposition chamber, as shown and described.
Priority Applications (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US29/640,787 USD858468S1 (en) | 2018-03-16 | 2018-03-16 | Collimator for a physical vapor deposition chamber |
TW107305411D01F TWD202102S (en) | 2018-03-16 | 2018-09-13 | A collimator for use in a physical vapor deposition (pvd) chamber |
TW107305411F TWD200242S (en) | 2018-03-16 | 2018-09-13 | A collimator for use in a physical vapor deposition (pvd) chamber |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US29/640,787 USD858468S1 (en) | 2018-03-16 | 2018-03-16 | Collimator for a physical vapor deposition chamber |
Publications (1)
Publication Number | Publication Date |
---|---|
USD858468S1 true USD858468S1 (en) | 2019-09-03 |
Family
ID=67735531
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
US29/640,787 Active USD858468S1 (en) | 2018-03-16 | 2018-03-16 | Collimator for a physical vapor deposition chamber |
Country Status (2)
Country | Link |
---|---|
US (1) | USD858468S1 (en) |
TW (2) | TWD200242S (en) |
Cited By (10)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
USD937329S1 (en) | 2020-03-23 | 2021-11-30 | Applied Materials, Inc. | Sputter target for a physical vapor deposition chamber |
USD997111S1 (en) | 2021-12-15 | 2023-08-29 | Applied Materials, Inc. | Collimator for use in a physical vapor deposition (PVD) chamber |
USD998575S1 (en) | 2020-04-07 | 2023-09-12 | Applied Materials, Inc. | Collimator for use in a physical vapor deposition (PVD) chamber |
USD1009816S1 (en) * | 2021-08-29 | 2024-01-02 | Applied Materials, Inc. | Collimator for a physical vapor deposition chamber |
USD1024149S1 (en) * | 2022-12-16 | 2024-04-23 | Applied Materials, Inc. | Collimator for a physical vapor deposition (PVD) chamber |
USD1026054S1 (en) * | 2022-04-22 | 2024-05-07 | Applied Materials, Inc. | Collimator for a physical vapor deposition (PVD) chamber |
USD1025936S1 (en) * | 2022-12-16 | 2024-05-07 | Applied Materials, Inc. | Collimator for a physical vapor deposition (PVD) chamber |
USD1025935S1 (en) * | 2022-11-03 | 2024-05-07 | Applied Materials, Inc. | Collimator for a physical vapor deposition (PVD) chamber |
USD1026839S1 (en) * | 2022-12-16 | 2024-05-14 | Applied Materials, Inc. | Collimator for a physical vapor deposition (PVD) chamber |
USD1038901S1 (en) * | 2022-01-12 | 2024-08-13 | Applied Materials, Inc. | Collimator for a physical vapor deposition chamber |
Citations (45)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US5401675A (en) * | 1991-04-19 | 1995-03-28 | Lee; Pei-Ing P. | Method of depositing conductors in high aspect ratio apertures using a collimator |
US5624536A (en) * | 1994-06-08 | 1997-04-29 | Tel Varian Limited | Processing apparatus with collimator exchange device |
US5643428A (en) * | 1995-02-01 | 1997-07-01 | Advanced Micro Devices, Inc. | Multiple tier collimator system for enhanced step coverage and uniformity |
US5702573A (en) * | 1996-01-29 | 1997-12-30 | Varian Associates, Inc. | Method and apparatus for improved low pressure collimated magnetron sputter deposition of metal films |
US5705042A (en) * | 1996-01-29 | 1998-01-06 | Micron Technology, Inc. | Electrically isolated collimator and method |
US5958193A (en) * | 1994-02-01 | 1999-09-28 | Vlsi Technology, Inc. | Sputter deposition with mobile collimator |
US6362097B1 (en) * | 1998-07-14 | 2002-03-26 | Applied Komatsu Technlology, Inc. | Collimated sputtering of semiconductor and other films |
US20030015421A1 (en) * | 2001-07-20 | 2003-01-23 | Applied Materials, Inc. | Collimated sputtering of cobalt |
US20030029715A1 (en) * | 2001-07-25 | 2003-02-13 | Applied Materials, Inc. | An Apparatus For Annealing Substrates In Physical Vapor Deposition Systems |
US20040211665A1 (en) * | 2001-07-25 | 2004-10-28 | Yoon Ki Hwan | Barrier formation using novel sputter-deposition method |
TWM267462U (en) | 2000-07-17 | 2005-06-11 | Dura Tek Inc | Collimator for sputtering apparatus |
US20060249369A1 (en) * | 2005-04-08 | 2006-11-09 | Stmicroelectronics S.R.L. | Process for physical vapor deposition of a chalcogenide material layer and chamber for physical vapor deposition of a chalcogenide material layer of a phase change memory device |
US20070228302A1 (en) * | 2006-03-30 | 2007-10-04 | Norman Robert L Jr | Adjustable suspension assembly for a collimating lattice |
US20080121620A1 (en) * | 2006-11-24 | 2008-05-29 | Guo G X | Processing chamber |
TWM346018U (en) | 2008-03-14 | 2008-12-01 | Everlight Electronics Co Ltd | Alterable gear collimator |
USD598717S1 (en) * | 2008-09-19 | 2009-08-25 | Dart Industries Inc. | Can strainer |
TW200938890A (en) | 2008-03-14 | 2009-09-16 | Everlight Electronics Co Ltd | Alterable collimator and lightening module thereof |
US20090308739A1 (en) * | 2008-06-17 | 2009-12-17 | Applied Materials, Inc. | Wafer processing deposition shielding components |
US20090308732A1 (en) * | 2008-06-17 | 2009-12-17 | Applied Materials, Inc. | Apparatus and method for uniform deposition |
USD660645S1 (en) * | 2010-10-29 | 2012-05-29 | Conopco, Inc. | Tea capsule |
TWD153743S (en) | 2012-01-25 | 2013-05-21 | 應用材料股份有限公司 | Deposition chamber liner |
TWD159674S (en) | 2012-11-30 | 2014-04-01 | 日立國際電氣股份有限公司 | Rotator for substrate processing device |
TWD159673S (en) | 2012-11-30 | 2014-04-01 | 日立國際電氣股份有限公司 | Rotator for substrate processing device |
TWD159676S (en) | 2012-11-30 | 2014-04-01 | 日立國際電氣股份有限公司 | Rotator for substrate processing device |
TWD159675S (en) | 2012-11-30 | 2014-04-01 | 日立國際電氣股份有限公司 | Rotator for substrate processing device |
USD722298S1 (en) * | 2013-07-17 | 2015-02-10 | Nuflare Technology, Inc. | Chamber of charged particle beam drawing apparatus |
TWD166552S (en) | 2013-01-25 | 2015-03-11 | 日立國際電氣股份有限公司 | Vaporizer for substrate processing equipment |
US20150114823A1 (en) * | 2013-10-24 | 2015-04-30 | Applied Materials, Inc. | Bipolar collimator utilized in a physical vapor deposition chamber |
TWD169790S (en) | 2013-07-10 | 2015-08-11 | 日立國際電氣股份有限公司 | Part of the vaporizer for substrate processing equipment |
USD746647S1 (en) * | 2014-03-13 | 2016-01-05 | Vienar Roaks | Strainer |
TWD174341S (en) | 2014-12-22 | 2016-03-11 | 荏原製作所股份有限公司 | Inner cylinder for exhaust gas treatment device |
TWD174342S (en) | 2014-12-22 | 2016-03-11 | 荏原製作所股份有限公司 | Part of the inner cylinder of the exhaust gas treatment device |
USD753449S1 (en) * | 2015-01-06 | 2016-04-12 | WineStor, LLC | Strainer for beverage shaker |
TWD175852S (en) | 2015-06-12 | 2016-05-21 | 日立全球先端科技股份有限公司 | Upper chamber for plasma treatment device |
TWD175853S (en) | 2015-06-12 | 2016-05-21 | 日立全球先端科技股份有限公司 | Cover rings for plasma processing equipment |
TWD175855S (en) | 2015-06-12 | 2016-05-21 | 日立全球先端科技股份有限公司 | Lower chamber for plasma treatment device |
TWD176440S (en) | 2014-12-22 | 2016-06-11 | 荏原製作所股份有限公司 | Inner cylinder for exhaust gas treatment device |
USD759603S1 (en) * | 2013-07-17 | 2016-06-21 | Nuflare Technology, Inc. | Chamber of charged particle beam drawing apparatus |
TWD178898S (en) | 2014-11-01 | 2016-10-11 | 米歇爾維尼希股份公司 | Kehlmaschine/slotting machine |
TWD180288S (en) | 2016-02-26 | 2016-12-21 | 日立全球先端科技股份有限公司 | Upper chamber for plasma treatment device |
US9543126B2 (en) | 2014-11-26 | 2017-01-10 | Applied Materials, Inc. | Collimator for use in substrate processing chambers |
US20170117121A1 (en) | 2015-10-27 | 2017-04-27 | Applied Materials, Inc. | Biasable flux optimizer / collimator for pvd sputter chamber |
US9892890B2 (en) * | 2012-04-26 | 2018-02-13 | Intevac, Inc. | Narrow source for physical vapor deposition processing |
USD821039S1 (en) * | 2016-06-06 | 2018-06-19 | Joe J. Owens, III | Pet food bowl |
USD821140S1 (en) * | 2016-12-27 | 2018-06-26 | Tristar Products, Inc. | Steamer plate |
-
2018
- 2018-03-16 US US29/640,787 patent/USD858468S1/en active Active
- 2018-09-13 TW TW107305411F patent/TWD200242S/en unknown
- 2018-09-13 TW TW107305411D01F patent/TWD202102S/en unknown
Patent Citations (47)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US5401675A (en) * | 1991-04-19 | 1995-03-28 | Lee; Pei-Ing P. | Method of depositing conductors in high aspect ratio apertures using a collimator |
US5958193A (en) * | 1994-02-01 | 1999-09-28 | Vlsi Technology, Inc. | Sputter deposition with mobile collimator |
US5624536A (en) * | 1994-06-08 | 1997-04-29 | Tel Varian Limited | Processing apparatus with collimator exchange device |
US5643428A (en) * | 1995-02-01 | 1997-07-01 | Advanced Micro Devices, Inc. | Multiple tier collimator system for enhanced step coverage and uniformity |
US5702573A (en) * | 1996-01-29 | 1997-12-30 | Varian Associates, Inc. | Method and apparatus for improved low pressure collimated magnetron sputter deposition of metal films |
US5705042A (en) * | 1996-01-29 | 1998-01-06 | Micron Technology, Inc. | Electrically isolated collimator and method |
US6362097B1 (en) * | 1998-07-14 | 2002-03-26 | Applied Komatsu Technlology, Inc. | Collimated sputtering of semiconductor and other films |
TWM267462U (en) | 2000-07-17 | 2005-06-11 | Dura Tek Inc | Collimator for sputtering apparatus |
US20030015421A1 (en) * | 2001-07-20 | 2003-01-23 | Applied Materials, Inc. | Collimated sputtering of cobalt |
US20030029715A1 (en) * | 2001-07-25 | 2003-02-13 | Applied Materials, Inc. | An Apparatus For Annealing Substrates In Physical Vapor Deposition Systems |
US20040211665A1 (en) * | 2001-07-25 | 2004-10-28 | Yoon Ki Hwan | Barrier formation using novel sputter-deposition method |
US20060249369A1 (en) * | 2005-04-08 | 2006-11-09 | Stmicroelectronics S.R.L. | Process for physical vapor deposition of a chalcogenide material layer and chamber for physical vapor deposition of a chalcogenide material layer of a phase change memory device |
US20070228302A1 (en) * | 2006-03-30 | 2007-10-04 | Norman Robert L Jr | Adjustable suspension assembly for a collimating lattice |
US20080121620A1 (en) * | 2006-11-24 | 2008-05-29 | Guo G X | Processing chamber |
TWM346018U (en) | 2008-03-14 | 2008-12-01 | Everlight Electronics Co Ltd | Alterable gear collimator |
TW200938890A (en) | 2008-03-14 | 2009-09-16 | Everlight Electronics Co Ltd | Alterable collimator and lightening module thereof |
US20090308739A1 (en) * | 2008-06-17 | 2009-12-17 | Applied Materials, Inc. | Wafer processing deposition shielding components |
US20090308732A1 (en) * | 2008-06-17 | 2009-12-17 | Applied Materials, Inc. | Apparatus and method for uniform deposition |
USD598717S1 (en) * | 2008-09-19 | 2009-08-25 | Dart Industries Inc. | Can strainer |
USD660645S1 (en) * | 2010-10-29 | 2012-05-29 | Conopco, Inc. | Tea capsule |
TWD153743S (en) | 2012-01-25 | 2013-05-21 | 應用材料股份有限公司 | Deposition chamber liner |
US9892890B2 (en) * | 2012-04-26 | 2018-02-13 | Intevac, Inc. | Narrow source for physical vapor deposition processing |
TWD159673S (en) | 2012-11-30 | 2014-04-01 | 日立國際電氣股份有限公司 | Rotator for substrate processing device |
TWD159675S (en) | 2012-11-30 | 2014-04-01 | 日立國際電氣股份有限公司 | Rotator for substrate processing device |
TWD159674S (en) | 2012-11-30 | 2014-04-01 | 日立國際電氣股份有限公司 | Rotator for substrate processing device |
TWD159676S (en) | 2012-11-30 | 2014-04-01 | 日立國際電氣股份有限公司 | Rotator for substrate processing device |
TWD166552S (en) | 2013-01-25 | 2015-03-11 | 日立國際電氣股份有限公司 | Vaporizer for substrate processing equipment |
TWD169790S (en) | 2013-07-10 | 2015-08-11 | 日立國際電氣股份有限公司 | Part of the vaporizer for substrate processing equipment |
USD741823S1 (en) * | 2013-07-10 | 2015-10-27 | Hitachi Kokusai Electric Inc. | Vaporizer for substrate processing apparatus |
USD759603S1 (en) * | 2013-07-17 | 2016-06-21 | Nuflare Technology, Inc. | Chamber of charged particle beam drawing apparatus |
USD722298S1 (en) * | 2013-07-17 | 2015-02-10 | Nuflare Technology, Inc. | Chamber of charged particle beam drawing apparatus |
US20150114823A1 (en) * | 2013-10-24 | 2015-04-30 | Applied Materials, Inc. | Bipolar collimator utilized in a physical vapor deposition chamber |
USD746647S1 (en) * | 2014-03-13 | 2016-01-05 | Vienar Roaks | Strainer |
TWD178898S (en) | 2014-11-01 | 2016-10-11 | 米歇爾維尼希股份公司 | Kehlmaschine/slotting machine |
US9543126B2 (en) | 2014-11-26 | 2017-01-10 | Applied Materials, Inc. | Collimator for use in substrate processing chambers |
TWD176440S (en) | 2014-12-22 | 2016-06-11 | 荏原製作所股份有限公司 | Inner cylinder for exhaust gas treatment device |
TWD174342S (en) | 2014-12-22 | 2016-03-11 | 荏原製作所股份有限公司 | Part of the inner cylinder of the exhaust gas treatment device |
TWD174341S (en) | 2014-12-22 | 2016-03-11 | 荏原製作所股份有限公司 | Inner cylinder for exhaust gas treatment device |
USD753449S1 (en) * | 2015-01-06 | 2016-04-12 | WineStor, LLC | Strainer for beverage shaker |
TWD175853S (en) | 2015-06-12 | 2016-05-21 | 日立全球先端科技股份有限公司 | Cover rings for plasma processing equipment |
TWD175855S (en) | 2015-06-12 | 2016-05-21 | 日立全球先端科技股份有限公司 | Lower chamber for plasma treatment device |
TWD175852S (en) | 2015-06-12 | 2016-05-21 | 日立全球先端科技股份有限公司 | Upper chamber for plasma treatment device |
US20170117121A1 (en) | 2015-10-27 | 2017-04-27 | Applied Materials, Inc. | Biasable flux optimizer / collimator for pvd sputter chamber |
US9960024B2 (en) * | 2015-10-27 | 2018-05-01 | Applied Materials, Inc. | Biasable flux optimizer / collimator for PVD sputter chamber |
TWD180288S (en) | 2016-02-26 | 2016-12-21 | 日立全球先端科技股份有限公司 | Upper chamber for plasma treatment device |
USD821039S1 (en) * | 2016-06-06 | 2018-06-19 | Joe J. Owens, III | Pet food bowl |
USD821140S1 (en) * | 2016-12-27 | 2018-06-26 | Tristar Products, Inc. | Steamer plate |
Non-Patent Citations (2)
Title |
---|
Search Report for Taiwan Design Application No. 107305411, dated Feb. 21, 2019, 2 pages. |
U.S. Appl. No. 29/640,788, filed Mar. 16, 2018, Riker et al. |
Cited By (10)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
USD937329S1 (en) | 2020-03-23 | 2021-11-30 | Applied Materials, Inc. | Sputter target for a physical vapor deposition chamber |
USD998575S1 (en) | 2020-04-07 | 2023-09-12 | Applied Materials, Inc. | Collimator for use in a physical vapor deposition (PVD) chamber |
USD1009816S1 (en) * | 2021-08-29 | 2024-01-02 | Applied Materials, Inc. | Collimator for a physical vapor deposition chamber |
USD997111S1 (en) | 2021-12-15 | 2023-08-29 | Applied Materials, Inc. | Collimator for use in a physical vapor deposition (PVD) chamber |
USD1038901S1 (en) * | 2022-01-12 | 2024-08-13 | Applied Materials, Inc. | Collimator for a physical vapor deposition chamber |
USD1026054S1 (en) * | 2022-04-22 | 2024-05-07 | Applied Materials, Inc. | Collimator for a physical vapor deposition (PVD) chamber |
USD1025935S1 (en) * | 2022-11-03 | 2024-05-07 | Applied Materials, Inc. | Collimator for a physical vapor deposition (PVD) chamber |
USD1024149S1 (en) * | 2022-12-16 | 2024-04-23 | Applied Materials, Inc. | Collimator for a physical vapor deposition (PVD) chamber |
USD1025936S1 (en) * | 2022-12-16 | 2024-05-07 | Applied Materials, Inc. | Collimator for a physical vapor deposition (PVD) chamber |
USD1026839S1 (en) * | 2022-12-16 | 2024-05-14 | Applied Materials, Inc. | Collimator for a physical vapor deposition (PVD) chamber |
Also Published As
Publication number | Publication date |
---|---|
TWD202102S (en) | 2020-01-11 |
TWD200242S (en) | 2019-10-11 |
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