USD858468S1 - Collimator for a physical vapor deposition chamber - Google Patents

Collimator for a physical vapor deposition chamber Download PDF

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Publication number
USD858468S1
USD858468S1 US29/640,787 US201829640787F USD858468S US D858468 S1 USD858468 S1 US D858468S1 US 201829640787 F US201829640787 F US 201829640787F US D858468 S USD858468 S US D858468S
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collimator
vapor deposition
physical vapor
deposition chamber
view
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US29/640,787
Inventor
Martin Lee Riker
Lanlan Zhong
Fuhong Zhang
Zheng Wang
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Applied Materials Inc
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Applied Materials Inc
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Priority to US29/640,787 priority Critical patent/USD858468S1/en
Assigned to APPLIED MATERIALS, INC. reassignment APPLIED MATERIALS, INC. ASSIGNMENT OF ASSIGNORS INTEREST (SEE DOCUMENT FOR DETAILS). Assignors: WANG, ZHENG, RIKER, MARTIN, ZHANG, FUHONG, ZHONG, LANLAN
Priority to TW107305411D01F priority patent/TWD202102S/en
Priority to TW107305411F priority patent/TWD200242S/en
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FIG. 1 is a top perspective view of a first embodiment of a collimator for a physical vapor deposition chamber, showing our new design;
FIG. 2 is a bottom perspective view thereof;
FIG. 3 is a top plan view thereof;
FIG. 4 is a bottom plan view thereof;
FIG. 5 is a right side elevation view thereof;
FIG. 6 is a left side elevation view thereof;
FIG. 7 is a front elevation view thereof;
FIG. 8 is a back elevation view thereof;
FIG. 9 is a cross sectional view taken along line 9-9 in FIG. 3;
FIG. 10 is a cross sectional view taken along line 10-10 in FIG. 3;
FIG. 11 is a top perspective view of a second embodiment of a collimator for a physical vapor deposition chamber, showing our new design;
FIG. 12 is a bottom perspective view thereof;
FIG. 13 is a top plan view thereof;
FIG. 14 is a bottom plan view thereof;
FIG. 15 is a right side elevation view thereof;
FIG. 16 is a left side elevation view thereof;
FIG. 17 is a front elevation view thereof;
FIG. 18 is a back elevation view thereof;
FIG. 19 is a cross sectional view taken along line 19-19 in FIG. 13; and,
FIG. 20 is a cross sectional view taken along line 20-20 in FIG. 13.
The dashed lines in the drawings represent unclaimed environment and form no part of the claimed design.

Claims (1)

    CLAIM
  1. The ornamental design for a collimator for a physical vapor deposition chamber, as shown and described.
US29/640,787 2018-03-16 2018-03-16 Collimator for a physical vapor deposition chamber Active USD858468S1 (en)

Priority Applications (3)

Application Number Priority Date Filing Date Title
US29/640,787 USD858468S1 (en) 2018-03-16 2018-03-16 Collimator for a physical vapor deposition chamber
TW107305411D01F TWD202102S (en) 2018-03-16 2018-09-13 A collimator for use in a physical vapor deposition (pvd) chamber
TW107305411F TWD200242S (en) 2018-03-16 2018-09-13 A collimator for use in a physical vapor deposition (pvd) chamber

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Application Number Priority Date Filing Date Title
US29/640,787 USD858468S1 (en) 2018-03-16 2018-03-16 Collimator for a physical vapor deposition chamber

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USD858468S1 true USD858468S1 (en) 2019-09-03

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Cited By (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
USD937329S1 (en) 2020-03-23 2021-11-30 Applied Materials, Inc. Sputter target for a physical vapor deposition chamber
USD997111S1 (en) 2021-12-15 2023-08-29 Applied Materials, Inc. Collimator for use in a physical vapor deposition (PVD) chamber
USD998575S1 (en) 2020-04-07 2023-09-12 Applied Materials, Inc. Collimator for use in a physical vapor deposition (PVD) chamber
USD1009816S1 (en) * 2021-08-29 2024-01-02 Applied Materials, Inc. Collimator for a physical vapor deposition chamber
USD1024149S1 (en) * 2022-12-16 2024-04-23 Applied Materials, Inc. Collimator for a physical vapor deposition (PVD) chamber
USD1026054S1 (en) * 2022-04-22 2024-05-07 Applied Materials, Inc. Collimator for a physical vapor deposition (PVD) chamber
USD1025936S1 (en) * 2022-12-16 2024-05-07 Applied Materials, Inc. Collimator for a physical vapor deposition (PVD) chamber
USD1025935S1 (en) * 2022-11-03 2024-05-07 Applied Materials, Inc. Collimator for a physical vapor deposition (PVD) chamber
USD1026839S1 (en) * 2022-12-16 2024-05-14 Applied Materials, Inc. Collimator for a physical vapor deposition (PVD) chamber
USD1038901S1 (en) * 2022-01-12 2024-08-13 Applied Materials, Inc. Collimator for a physical vapor deposition chamber

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US5401675A (en) * 1991-04-19 1995-03-28 Lee; Pei-Ing P. Method of depositing conductors in high aspect ratio apertures using a collimator
US5624536A (en) * 1994-06-08 1997-04-29 Tel Varian Limited Processing apparatus with collimator exchange device
US5643428A (en) * 1995-02-01 1997-07-01 Advanced Micro Devices, Inc. Multiple tier collimator system for enhanced step coverage and uniformity
US5702573A (en) * 1996-01-29 1997-12-30 Varian Associates, Inc. Method and apparatus for improved low pressure collimated magnetron sputter deposition of metal films
US5705042A (en) * 1996-01-29 1998-01-06 Micron Technology, Inc. Electrically isolated collimator and method
US5958193A (en) * 1994-02-01 1999-09-28 Vlsi Technology, Inc. Sputter deposition with mobile collimator
US6362097B1 (en) * 1998-07-14 2002-03-26 Applied Komatsu Technlology, Inc. Collimated sputtering of semiconductor and other films
US20030015421A1 (en) * 2001-07-20 2003-01-23 Applied Materials, Inc. Collimated sputtering of cobalt
US20030029715A1 (en) * 2001-07-25 2003-02-13 Applied Materials, Inc. An Apparatus For Annealing Substrates In Physical Vapor Deposition Systems
US20040211665A1 (en) * 2001-07-25 2004-10-28 Yoon Ki Hwan Barrier formation using novel sputter-deposition method
TWM267462U (en) 2000-07-17 2005-06-11 Dura Tek Inc Collimator for sputtering apparatus
US20060249369A1 (en) * 2005-04-08 2006-11-09 Stmicroelectronics S.R.L. Process for physical vapor deposition of a chalcogenide material layer and chamber for physical vapor deposition of a chalcogenide material layer of a phase change memory device
US20070228302A1 (en) * 2006-03-30 2007-10-04 Norman Robert L Jr Adjustable suspension assembly for a collimating lattice
US20080121620A1 (en) * 2006-11-24 2008-05-29 Guo G X Processing chamber
TWM346018U (en) 2008-03-14 2008-12-01 Everlight Electronics Co Ltd Alterable gear collimator
USD598717S1 (en) * 2008-09-19 2009-08-25 Dart Industries Inc. Can strainer
TW200938890A (en) 2008-03-14 2009-09-16 Everlight Electronics Co Ltd Alterable collimator and lightening module thereof
US20090308739A1 (en) * 2008-06-17 2009-12-17 Applied Materials, Inc. Wafer processing deposition shielding components
US20090308732A1 (en) * 2008-06-17 2009-12-17 Applied Materials, Inc. Apparatus and method for uniform deposition
USD660645S1 (en) * 2010-10-29 2012-05-29 Conopco, Inc. Tea capsule
TWD153743S (en) 2012-01-25 2013-05-21 應用材料股份有限公司 Deposition chamber liner
TWD159674S (en) 2012-11-30 2014-04-01 日立國際電氣股份有限公司 Rotator for substrate processing device
TWD159673S (en) 2012-11-30 2014-04-01 日立國際電氣股份有限公司 Rotator for substrate processing device
TWD159676S (en) 2012-11-30 2014-04-01 日立國際電氣股份有限公司 Rotator for substrate processing device
TWD159675S (en) 2012-11-30 2014-04-01 日立國際電氣股份有限公司 Rotator for substrate processing device
USD722298S1 (en) * 2013-07-17 2015-02-10 Nuflare Technology, Inc. Chamber of charged particle beam drawing apparatus
TWD166552S (en) 2013-01-25 2015-03-11 日立國際電氣股份有限公司 Vaporizer for substrate processing equipment
US20150114823A1 (en) * 2013-10-24 2015-04-30 Applied Materials, Inc. Bipolar collimator utilized in a physical vapor deposition chamber
TWD169790S (en) 2013-07-10 2015-08-11 日立國際電氣股份有限公司 Part of the vaporizer for substrate processing equipment
USD746647S1 (en) * 2014-03-13 2016-01-05 Vienar Roaks Strainer
TWD174341S (en) 2014-12-22 2016-03-11 荏原製作所股份有限公司 Inner cylinder for exhaust gas treatment device
TWD174342S (en) 2014-12-22 2016-03-11 荏原製作所股份有限公司 Part of the inner cylinder of the exhaust gas treatment device
USD753449S1 (en) * 2015-01-06 2016-04-12 WineStor, LLC Strainer for beverage shaker
TWD175852S (en) 2015-06-12 2016-05-21 日立全球先端科技股份有限公司 Upper chamber for plasma treatment device
TWD175853S (en) 2015-06-12 2016-05-21 日立全球先端科技股份有限公司 Cover rings for plasma processing equipment
TWD175855S (en) 2015-06-12 2016-05-21 日立全球先端科技股份有限公司 Lower chamber for plasma treatment device
TWD176440S (en) 2014-12-22 2016-06-11 荏原製作所股份有限公司 Inner cylinder for exhaust gas treatment device
USD759603S1 (en) * 2013-07-17 2016-06-21 Nuflare Technology, Inc. Chamber of charged particle beam drawing apparatus
TWD178898S (en) 2014-11-01 2016-10-11 米歇爾維尼希股份公司 Kehlmaschine/slotting machine
TWD180288S (en) 2016-02-26 2016-12-21 日立全球先端科技股份有限公司 Upper chamber for plasma treatment device
US9543126B2 (en) 2014-11-26 2017-01-10 Applied Materials, Inc. Collimator for use in substrate processing chambers
US20170117121A1 (en) 2015-10-27 2017-04-27 Applied Materials, Inc. Biasable flux optimizer / collimator for pvd sputter chamber
US9892890B2 (en) * 2012-04-26 2018-02-13 Intevac, Inc. Narrow source for physical vapor deposition processing
USD821039S1 (en) * 2016-06-06 2018-06-19 Joe J. Owens, III Pet food bowl
USD821140S1 (en) * 2016-12-27 2018-06-26 Tristar Products, Inc. Steamer plate

Patent Citations (47)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5401675A (en) * 1991-04-19 1995-03-28 Lee; Pei-Ing P. Method of depositing conductors in high aspect ratio apertures using a collimator
US5958193A (en) * 1994-02-01 1999-09-28 Vlsi Technology, Inc. Sputter deposition with mobile collimator
US5624536A (en) * 1994-06-08 1997-04-29 Tel Varian Limited Processing apparatus with collimator exchange device
US5643428A (en) * 1995-02-01 1997-07-01 Advanced Micro Devices, Inc. Multiple tier collimator system for enhanced step coverage and uniformity
US5702573A (en) * 1996-01-29 1997-12-30 Varian Associates, Inc. Method and apparatus for improved low pressure collimated magnetron sputter deposition of metal films
US5705042A (en) * 1996-01-29 1998-01-06 Micron Technology, Inc. Electrically isolated collimator and method
US6362097B1 (en) * 1998-07-14 2002-03-26 Applied Komatsu Technlology, Inc. Collimated sputtering of semiconductor and other films
TWM267462U (en) 2000-07-17 2005-06-11 Dura Tek Inc Collimator for sputtering apparatus
US20030015421A1 (en) * 2001-07-20 2003-01-23 Applied Materials, Inc. Collimated sputtering of cobalt
US20030029715A1 (en) * 2001-07-25 2003-02-13 Applied Materials, Inc. An Apparatus For Annealing Substrates In Physical Vapor Deposition Systems
US20040211665A1 (en) * 2001-07-25 2004-10-28 Yoon Ki Hwan Barrier formation using novel sputter-deposition method
US20060249369A1 (en) * 2005-04-08 2006-11-09 Stmicroelectronics S.R.L. Process for physical vapor deposition of a chalcogenide material layer and chamber for physical vapor deposition of a chalcogenide material layer of a phase change memory device
US20070228302A1 (en) * 2006-03-30 2007-10-04 Norman Robert L Jr Adjustable suspension assembly for a collimating lattice
US20080121620A1 (en) * 2006-11-24 2008-05-29 Guo G X Processing chamber
TWM346018U (en) 2008-03-14 2008-12-01 Everlight Electronics Co Ltd Alterable gear collimator
TW200938890A (en) 2008-03-14 2009-09-16 Everlight Electronics Co Ltd Alterable collimator and lightening module thereof
US20090308739A1 (en) * 2008-06-17 2009-12-17 Applied Materials, Inc. Wafer processing deposition shielding components
US20090308732A1 (en) * 2008-06-17 2009-12-17 Applied Materials, Inc. Apparatus and method for uniform deposition
USD598717S1 (en) * 2008-09-19 2009-08-25 Dart Industries Inc. Can strainer
USD660645S1 (en) * 2010-10-29 2012-05-29 Conopco, Inc. Tea capsule
TWD153743S (en) 2012-01-25 2013-05-21 應用材料股份有限公司 Deposition chamber liner
US9892890B2 (en) * 2012-04-26 2018-02-13 Intevac, Inc. Narrow source for physical vapor deposition processing
TWD159673S (en) 2012-11-30 2014-04-01 日立國際電氣股份有限公司 Rotator for substrate processing device
TWD159675S (en) 2012-11-30 2014-04-01 日立國際電氣股份有限公司 Rotator for substrate processing device
TWD159674S (en) 2012-11-30 2014-04-01 日立國際電氣股份有限公司 Rotator for substrate processing device
TWD159676S (en) 2012-11-30 2014-04-01 日立國際電氣股份有限公司 Rotator for substrate processing device
TWD166552S (en) 2013-01-25 2015-03-11 日立國際電氣股份有限公司 Vaporizer for substrate processing equipment
TWD169790S (en) 2013-07-10 2015-08-11 日立國際電氣股份有限公司 Part of the vaporizer for substrate processing equipment
USD741823S1 (en) * 2013-07-10 2015-10-27 Hitachi Kokusai Electric Inc. Vaporizer for substrate processing apparatus
USD759603S1 (en) * 2013-07-17 2016-06-21 Nuflare Technology, Inc. Chamber of charged particle beam drawing apparatus
USD722298S1 (en) * 2013-07-17 2015-02-10 Nuflare Technology, Inc. Chamber of charged particle beam drawing apparatus
US20150114823A1 (en) * 2013-10-24 2015-04-30 Applied Materials, Inc. Bipolar collimator utilized in a physical vapor deposition chamber
USD746647S1 (en) * 2014-03-13 2016-01-05 Vienar Roaks Strainer
TWD178898S (en) 2014-11-01 2016-10-11 米歇爾維尼希股份公司 Kehlmaschine/slotting machine
US9543126B2 (en) 2014-11-26 2017-01-10 Applied Materials, Inc. Collimator for use in substrate processing chambers
TWD176440S (en) 2014-12-22 2016-06-11 荏原製作所股份有限公司 Inner cylinder for exhaust gas treatment device
TWD174342S (en) 2014-12-22 2016-03-11 荏原製作所股份有限公司 Part of the inner cylinder of the exhaust gas treatment device
TWD174341S (en) 2014-12-22 2016-03-11 荏原製作所股份有限公司 Inner cylinder for exhaust gas treatment device
USD753449S1 (en) * 2015-01-06 2016-04-12 WineStor, LLC Strainer for beverage shaker
TWD175853S (en) 2015-06-12 2016-05-21 日立全球先端科技股份有限公司 Cover rings for plasma processing equipment
TWD175855S (en) 2015-06-12 2016-05-21 日立全球先端科技股份有限公司 Lower chamber for plasma treatment device
TWD175852S (en) 2015-06-12 2016-05-21 日立全球先端科技股份有限公司 Upper chamber for plasma treatment device
US20170117121A1 (en) 2015-10-27 2017-04-27 Applied Materials, Inc. Biasable flux optimizer / collimator for pvd sputter chamber
US9960024B2 (en) * 2015-10-27 2018-05-01 Applied Materials, Inc. Biasable flux optimizer / collimator for PVD sputter chamber
TWD180288S (en) 2016-02-26 2016-12-21 日立全球先端科技股份有限公司 Upper chamber for plasma treatment device
USD821039S1 (en) * 2016-06-06 2018-06-19 Joe J. Owens, III Pet food bowl
USD821140S1 (en) * 2016-12-27 2018-06-26 Tristar Products, Inc. Steamer plate

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* Cited by examiner, † Cited by third party
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Search Report for Taiwan Design Application No. 107305411, dated Feb. 21, 2019, 2 pages.
U.S. Appl. No. 29/640,788, filed Mar. 16, 2018, Riker et al.

Cited By (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
USD937329S1 (en) 2020-03-23 2021-11-30 Applied Materials, Inc. Sputter target for a physical vapor deposition chamber
USD998575S1 (en) 2020-04-07 2023-09-12 Applied Materials, Inc. Collimator for use in a physical vapor deposition (PVD) chamber
USD1009816S1 (en) * 2021-08-29 2024-01-02 Applied Materials, Inc. Collimator for a physical vapor deposition chamber
USD997111S1 (en) 2021-12-15 2023-08-29 Applied Materials, Inc. Collimator for use in a physical vapor deposition (PVD) chamber
USD1038901S1 (en) * 2022-01-12 2024-08-13 Applied Materials, Inc. Collimator for a physical vapor deposition chamber
USD1026054S1 (en) * 2022-04-22 2024-05-07 Applied Materials, Inc. Collimator for a physical vapor deposition (PVD) chamber
USD1025935S1 (en) * 2022-11-03 2024-05-07 Applied Materials, Inc. Collimator for a physical vapor deposition (PVD) chamber
USD1024149S1 (en) * 2022-12-16 2024-04-23 Applied Materials, Inc. Collimator for a physical vapor deposition (PVD) chamber
USD1025936S1 (en) * 2022-12-16 2024-05-07 Applied Materials, Inc. Collimator for a physical vapor deposition (PVD) chamber
USD1026839S1 (en) * 2022-12-16 2024-05-14 Applied Materials, Inc. Collimator for a physical vapor deposition (PVD) chamber

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Publication number Publication date
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TWD200242S (en) 2019-10-11

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