USD1026054S1 - Collimator for a physical vapor deposition (PVD) chamber - Google Patents
Collimator for a physical vapor deposition (PVD) chamber Download PDFInfo
- Publication number
- USD1026054S1 USD1026054S1 US29/835,991 US202229835991F USD1026054S US D1026054 S1 USD1026054 S1 US D1026054S1 US 202229835991 F US202229835991 F US 202229835991F US D1026054 S USD1026054 S US D1026054S
- Authority
- US
- United States
- Prior art keywords
- collimator
- pvd
- chamber
- vapor deposition
- physical vapor
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Active
Links
- 238000005240 physical vapour deposition Methods 0.000 title claims description 6
Images
Description
The broken lines in the drawings illustrate portions of the article that form no part of the claimed design.
Claims (1)
- We claim the ornamental design for a collimator for a physical vapor deposition (PVD) chamber, as shown and described.
Priority Applications (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US29/835,991 USD1026054S1 (en) | 2022-04-22 | 2022-04-22 | Collimator for a physical vapor deposition (PVD) chamber |
JP2022014277F JP1732968S (en) | 2022-04-22 | 2022-07-04 | Collimator for physical vapor deposition chamber |
TW111303316F TWD227585S (en) | 2022-04-22 | 2022-07-05 | Collimator for use in a physical vapor deposition (pvd) chamber |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US29/835,991 USD1026054S1 (en) | 2022-04-22 | 2022-04-22 | Collimator for a physical vapor deposition (PVD) chamber |
Publications (1)
Publication Number | Publication Date |
---|---|
USD1026054S1 true USD1026054S1 (en) | 2024-05-07 |
Family
ID=84533806
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
US29/835,991 Active USD1026054S1 (en) | 2022-04-22 | 2022-04-22 | Collimator for a physical vapor deposition (PVD) chamber |
Country Status (3)
Country | Link |
---|---|
US (1) | USD1026054S1 (en) |
JP (1) | JP1732968S (en) |
TW (1) | TWD227585S (en) |
Families Citing this family (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
USD1026054S1 (en) * | 2022-04-22 | 2024-05-07 | Applied Materials, Inc. | Collimator for a physical vapor deposition (PVD) chamber |
Citations (19)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US5544771A (en) * | 1994-02-23 | 1996-08-13 | Samsung Electronics Co., Ltd. | Method for manufacturing a collimator |
US5770026A (en) * | 1996-09-19 | 1998-06-23 | Lg Semicon Co., Ltd. | Semiconductor fabrication apparatus having improved sputtering collimator and wiring method for a semiconductor device using such apparatus |
US20090308739A1 (en) * | 2008-06-17 | 2009-12-17 | Applied Materials, Inc. | Wafer processing deposition shielding components |
US20150114823A1 (en) * | 2013-10-24 | 2015-04-30 | Applied Materials, Inc. | Bipolar collimator utilized in a physical vapor deposition chamber |
US20150354054A1 (en) * | 2014-06-06 | 2015-12-10 | Applied Materials, Inc. | Cooled process tool adapter for use in substrate processing chambers |
US20160145735A1 (en) * | 2014-11-26 | 2016-05-26 | Applied Materials, Inc. | Collimator for use in substrate processing chambers |
USD760180S1 (en) * | 2014-02-21 | 2016-06-28 | Hzo, Inc. | Hexcell channel arrangement for use in a boat for a deposition apparatus |
US20170117121A1 (en) * | 2015-10-27 | 2017-04-27 | Applied Materials, Inc. | Biasable flux optimizer / collimator for pvd sputter chamber |
US20170253959A1 (en) * | 2016-03-05 | 2017-09-07 | Applied Materials, Inc. | Methods and apparatus for controlling ion fraction in physical vapor deposition processes |
US20170301525A1 (en) * | 2014-11-05 | 2017-10-19 | Kabushiki Kaisha Toshiba | Processing apparatus and collimator |
US20180233335A1 (en) * | 2016-03-14 | 2018-08-16 | Kabushiki Kaisha Toshiba | Processing device and collimator |
US20180237903A1 (en) * | 2016-03-14 | 2018-08-23 | Kabushiki Kaisha Toshiba | Processing device, sputtering device, and collimator |
US20180265964A1 (en) * | 2017-03-17 | 2018-09-20 | Kabushiki Kaisha Toshiba | Collimator and processing apparatus |
US20190027346A1 (en) * | 2016-03-14 | 2019-01-24 | Kabushiki Kaisha Toshiba | Processing apparatus and collimator |
USD858468S1 (en) * | 2018-03-16 | 2019-09-03 | Applied Materials, Inc. | Collimator for a physical vapor deposition chamber |
USD859333S1 (en) * | 2018-03-16 | 2019-09-10 | Applied Materials, Inc. | Collimator for a physical vapor deposition chamber |
JP1719724S (en) | 2021-08-29 | 2022-07-13 | Collimator for physical vapor deposition chamber | |
JP1732968S (en) * | 2022-04-22 | 2022-12-22 | Collimator for physical vapor deposition chamber | |
USD998575S1 (en) * | 2020-04-07 | 2023-09-12 | Applied Materials, Inc. | Collimator for use in a physical vapor deposition (PVD) chamber |
-
2022
- 2022-04-22 US US29/835,991 patent/USD1026054S1/en active Active
- 2022-07-04 JP JP2022014277F patent/JP1732968S/en active Active
- 2022-07-05 TW TW111303316F patent/TWD227585S/en unknown
Patent Citations (23)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US5544771A (en) * | 1994-02-23 | 1996-08-13 | Samsung Electronics Co., Ltd. | Method for manufacturing a collimator |
US5770026A (en) * | 1996-09-19 | 1998-06-23 | Lg Semicon Co., Ltd. | Semiconductor fabrication apparatus having improved sputtering collimator and wiring method for a semiconductor device using such apparatus |
US20090308739A1 (en) * | 2008-06-17 | 2009-12-17 | Applied Materials, Inc. | Wafer processing deposition shielding components |
US20150114823A1 (en) * | 2013-10-24 | 2015-04-30 | Applied Materials, Inc. | Bipolar collimator utilized in a physical vapor deposition chamber |
USD760180S1 (en) * | 2014-02-21 | 2016-06-28 | Hzo, Inc. | Hexcell channel arrangement for use in a boat for a deposition apparatus |
US20150354054A1 (en) * | 2014-06-06 | 2015-12-10 | Applied Materials, Inc. | Cooled process tool adapter for use in substrate processing chambers |
US20170301525A1 (en) * | 2014-11-05 | 2017-10-19 | Kabushiki Kaisha Toshiba | Processing apparatus and collimator |
US20160145735A1 (en) * | 2014-11-26 | 2016-05-26 | Applied Materials, Inc. | Collimator for use in substrate processing chambers |
US9543126B2 (en) * | 2014-11-26 | 2017-01-10 | Applied Materials, Inc. | Collimator for use in substrate processing chambers |
US10347474B2 (en) | 2015-10-27 | 2019-07-09 | Applied Materials, Inc. | Biasable flux optimizer / collimator for PVD sputter chamber |
US9960024B2 (en) | 2015-10-27 | 2018-05-01 | Applied Materials, Inc. | Biasable flux optimizer / collimator for PVD sputter chamber |
US20170117121A1 (en) * | 2015-10-27 | 2017-04-27 | Applied Materials, Inc. | Biasable flux optimizer / collimator for pvd sputter chamber |
US20170253959A1 (en) * | 2016-03-05 | 2017-09-07 | Applied Materials, Inc. | Methods and apparatus for controlling ion fraction in physical vapor deposition processes |
US20180233335A1 (en) * | 2016-03-14 | 2018-08-16 | Kabushiki Kaisha Toshiba | Processing device and collimator |
US20180237903A1 (en) * | 2016-03-14 | 2018-08-23 | Kabushiki Kaisha Toshiba | Processing device, sputtering device, and collimator |
US20190027346A1 (en) * | 2016-03-14 | 2019-01-24 | Kabushiki Kaisha Toshiba | Processing apparatus and collimator |
US20180265964A1 (en) * | 2017-03-17 | 2018-09-20 | Kabushiki Kaisha Toshiba | Collimator and processing apparatus |
USD858468S1 (en) * | 2018-03-16 | 2019-09-03 | Applied Materials, Inc. | Collimator for a physical vapor deposition chamber |
USD859333S1 (en) * | 2018-03-16 | 2019-09-10 | Applied Materials, Inc. | Collimator for a physical vapor deposition chamber |
USD998575S1 (en) * | 2020-04-07 | 2023-09-12 | Applied Materials, Inc. | Collimator for use in a physical vapor deposition (PVD) chamber |
JP1719724S (en) | 2021-08-29 | 2022-07-13 | Collimator for physical vapor deposition chamber | |
TWD224691S (en) | 2021-08-29 | 2023-04-11 | 美商應用材料股份有限公司 | Collimator for use in a physical vapor deposition (pvd) chamber |
JP1732968S (en) * | 2022-04-22 | 2022-12-22 | Collimator for physical vapor deposition chamber |
Also Published As
Publication number | Publication date |
---|---|
TWD227585S (en) | 2023-09-21 |
JP1732968S (en) | 2022-12-22 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
USD908645S1 (en) | Sputtering target for a physical vapor deposition chamber | |
USD1009816S1 (en) | Collimator for a physical vapor deposition chamber | |
USD877101S1 (en) | Target profile for a physical vapor deposition chamber target | |
USD937329S1 (en) | Sputter target for a physical vapor deposition chamber | |
USD966357S1 (en) | Target profile for a physical vapor deposition chamber target | |
USD970257S1 (en) | Wedge-shaped pillow | |
USD997111S1 (en) | Collimator for use in a physical vapor deposition (PVD) chamber | |
USD998575S1 (en) | Collimator for use in a physical vapor deposition (PVD) chamber | |
USD858468S1 (en) | Collimator for a physical vapor deposition chamber | |
USD859333S1 (en) | Collimator for a physical vapor deposition chamber | |
USD977285S1 (en) | Lateral cabinet | |
USD943539S1 (en) | Confinement plate for a substrate processing chamber | |
USD971626S1 (en) | Loveseat | |
USD946941S1 (en) | Shelf set | |
USD984895S1 (en) | Packaging insert for a process chamber component | |
USD993684S1 (en) | Shoe cabinet | |
USD982377S1 (en) | Food processor | |
USD987222S1 (en) | Dish rack | |
USD1026054S1 (en) | Collimator for a physical vapor deposition (PVD) chamber | |
USD1028580S1 (en) | Nightstand | |
USD971167S1 (en) | Lower shield for a substrate processing chamber | |
USD1025935S1 (en) | Collimator for a physical vapor deposition (PVD) chamber | |
USD1024590S1 (en) | Chair | |
USD1025936S1 (en) | Collimator for a physical vapor deposition (PVD) chamber | |
USD1026839S1 (en) | Collimator for a physical vapor deposition (PVD) chamber |
Legal Events
Date | Code | Title | Description |
---|---|---|---|
FEPP | Fee payment procedure |
Free format text: ENTITY STATUS SET TO UNDISCOUNTED (ORIGINAL EVENT CODE: BIG.); ENTITY STATUS OF PATENT OWNER: LARGE ENTITY |