TWD224691S - Collimator for use in a physical vapor deposition (pvd) chamber - Google Patents

Collimator for use in a physical vapor deposition (pvd) chamber Download PDF

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Publication number
TWD224691S
TWD224691S TW111300795F TW111300795F TWD224691S TW D224691 S TWD224691 S TW D224691S TW 111300795 F TW111300795 F TW 111300795F TW 111300795 F TW111300795 F TW 111300795F TW D224691 S TWD224691 S TW D224691S
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TW
Taiwan
Prior art keywords
pvd
collimator
chamber
vapor deposition
physical vapor
Prior art date
Application number
TW111300795F
Other languages
Chinese (zh)
Inventor
馬丁李 萊克
凱斯Ａ 米勒
富宏 張
路克菲安妮 法凱
奇索庫瑪 卡拉瑟帕蘭比爾
祥金 謝
Original Assignee
美商應用材料股份有限公司
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Application filed by 美商應用材料股份有限公司 filed Critical 美商應用材料股份有限公司
Publication of TWD224691S publication Critical patent/TWD224691S/en

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Abstract

【物品用途】;本設計所請求係用於物理氣相沉積(PVD)腔室中的準直器。;【設計說明】;圖式所揭露之虛線部分，為本案不主張設計之部分。【Use of article】;This design is requested to be used as a collimator in a physical vapor deposition (PVD) chamber. ;[Design Description];The dotted line portion disclosed in the drawing is the part of this case that does not require design.

Description

用於物理氣相沉積(PVD)腔室中的準直器 Collimators for Physical Vapor Deposition (PVD) Chambers

本設計所請求係用於物理氣相沉積(PVD)腔室中的準直器。 The design requested is for a collimator in a Physical Vapor Deposition (PVD) chamber.

圖式所揭露之虛線部分，為本案不主張設計之部分。 The dotted line part disclosed in the drawing is the part not claimed in this case.

TW111300795F 2021-08-29 2022-02-18 Collimator for use in a physical vapor deposition (pvd) chamber TWD224691S (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US29/805,681 USD1009816S1 (en) 2021-08-29 2021-08-29 Collimator for a physical vapor deposition chamber
US29/805,681 2021-08-29

Publications (1)

Publication Number Publication Date
TWD224691S true TWD224691S (en) 2023-04-11

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TW111300795F TWD224691S (en) 2021-08-29 2022-02-18 Collimator for use in a physical vapor deposition (pvd) chamber

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US (1) USD1009816S1 (en)
JP (1) JP1719724S (en)
TW (1) TWD224691S (en)

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USD1026839S1 (en) * 2022-12-16 2024-05-14 Applied Materials, Inc. Collimator for a physical vapor deposition (PVD) chamber

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* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
USD1026054S1 (en) 2022-04-22 2024-05-07 Applied Materials, Inc. Collimator for a physical vapor deposition (PVD) chamber
USD1024149S1 (en) * 2022-12-16 2024-04-23 Applied Materials, Inc. Collimator for a physical vapor deposition (PVD) chamber
USD1025936S1 (en) * 2022-12-16 2024-05-07 Applied Materials, Inc. Collimator for a physical vapor deposition (PVD) chamber
USD1026839S1 (en) * 2022-12-16 2024-05-14 Applied Materials, Inc. Collimator for a physical vapor deposition (PVD) chamber

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Publication number Publication date
USD1009816S1 (en) 2024-01-02
JP1719724S (en) 2022-07-13

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