JP1546799S - - Google Patents

Info

Publication number
JP1546799S
JP1546799S JPD2015-13035F JP2015013035F JP1546799S JP 1546799 S JP1546799 S JP 1546799S JP 2015013035 F JP2015013035 F JP 2015013035F JP 1546799 S JP1546799 S JP 1546799S
Authority
JP
Japan
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Active
Application number
JPD2015-13035F
Other languages
Japanese (ja)
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Priority to JPD2015-13035F priority Critical patent/JP1546799S/ja
Priority to TW104305548F priority patent/TWD175852S/en
Priority to US29/544,068 priority patent/USD804436S1/en
Application granted granted Critical
Publication of JP1546799S publication Critical patent/JP1546799S/ja
Active legal-status Critical Current
Anticipated expiration legal-status Critical

Links

JPD2015-13035F 2015-06-12 2015-06-12 Active JP1546799S (en)

Priority Applications (3)

Application Number Priority Date Filing Date Title
JPD2015-13035F JP1546799S (en) 2015-06-12 2015-06-12
TW104305548F TWD175852S (en) 2015-06-12 2015-10-06 Upper chamber for plasma treatment device
US29/544,068 USD804436S1 (en) 2015-06-12 2015-10-30 Upper chamber for a plasma processing apparatus

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JPD2015-13035F JP1546799S (en) 2015-06-12 2015-06-12

Publications (1)

Publication Number Publication Date
JP1546799S true JP1546799S (en) 2016-03-28

Family

ID=55539623

Family Applications (1)

Application Number Title Priority Date Filing Date
JPD2015-13035F Active JP1546799S (en) 2015-06-12 2015-06-12

Country Status (3)

Country Link
US (1) USD804436S1 (en)
JP (1) JP1546799S (en)
TW (1) TWD175852S (en)

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USD875055S1 (en) * 2017-04-28 2020-02-11 Applied Materials, Inc. Plasma connector liner
USD837754S1 (en) * 2017-04-28 2019-01-08 Applied Materials, Inc. Plasma chamber liner
USD882536S1 (en) * 2017-04-28 2020-04-28 Applied Materials, Inc. Plasma source liner
USD842259S1 (en) * 2017-04-28 2019-03-05 Applied Materials, Inc. Plasma chamber liner
USD875053S1 (en) * 2017-04-28 2020-02-11 Applied Materials, Inc. Plasma connector liner
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USD838681S1 (en) * 2017-04-28 2019-01-22 Applied Materials, Inc. Plasma chamber liner
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USD858468S1 (en) 2018-03-16 2019-09-03 Applied Materials, Inc. Collimator for a physical vapor deposition chamber
USD859333S1 (en) 2018-03-16 2019-09-10 Applied Materials, Inc. Collimator for a physical vapor deposition chamber
JP1612912S (en) * 2018-03-29 2018-09-03
USD892881S1 (en) * 2018-03-29 2020-08-11 Daihen Corporation Power transmission unit and power receiving unit of an industrial robot arm
JP1612766S (en) * 2018-03-29 2018-09-03
JP1612908S (en) * 2018-03-29 2018-09-03
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USD869376S1 (en) * 2018-04-13 2019-12-10 Protective Enclosures Company, Llc Venting device
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USD931241S1 (en) * 2019-08-28 2021-09-21 Applied Materials, Inc. Lower shield for a substrate processing chamber
US12100577B2 (en) 2019-08-28 2024-09-24 Applied Materials, Inc. High conductance inner shield for process chamber
USD913979S1 (en) * 2019-08-28 2021-03-23 Applied Materials, Inc. Inner shield for a substrate processing chamber
USD937329S1 (en) 2020-03-23 2021-11-30 Applied Materials, Inc. Sputter target for a physical vapor deposition chamber
USD998575S1 (en) 2020-04-07 2023-09-12 Applied Materials, Inc. Collimator for use in a physical vapor deposition (PVD) chamber
USD973609S1 (en) * 2020-04-22 2022-12-27 Applied Materials, Inc. Upper shield with showerhead for a process chamber
US12080522B2 (en) 2020-04-22 2024-09-03 Applied Materials, Inc. Preclean chamber upper shield with showerhead
USD1009816S1 (en) 2021-08-29 2024-01-02 Applied Materials, Inc. Collimator for a physical vapor deposition chamber
USD997111S1 (en) 2021-12-15 2023-08-29 Applied Materials, Inc. Collimator for use in a physical vapor deposition (PVD) chamber
USD1038901S1 (en) 2022-01-12 2024-08-13 Applied Materials, Inc. Collimator for a physical vapor deposition chamber
USD1042374S1 (en) * 2022-03-18 2024-09-17 Applied Materials, Inc. Support pipe for an interlocking process kit for a substrate processing chamber
USD1042373S1 (en) * 2022-03-18 2024-09-17 Applied Materials, Inc. Sliding ring for an interlocking process kit for a substrate processing chamber
USD1008967S1 (en) * 2022-05-16 2023-12-26 Japan Aviation Electronics Industry, Limited Collar for connector

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Also Published As

Publication number Publication date
TWD175852S (en) 2016-05-21
USD804436S1 (en) 2017-12-05

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