USD842259S1 - Plasma chamber liner - Google Patents
Plasma chamber liner Download PDFInfo
- Publication number
- USD842259S1 USD842259S1 US29/602,207 US201729602207F USD842259S US D842259 S1 USD842259 S1 US D842259S1 US 201729602207 F US201729602207 F US 201729602207F US D842259 S USD842259 S US D842259S
- Authority
- US
- United States
- Prior art keywords
- plasma chamber
- chamber liner
- liner
- view
- plasma
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Active
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Description
Claims (1)
- The ornamental design for a plasma chamber liner, as shown and described.
Priority Applications (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US29/602,207 USD842259S1 (en) | 2017-04-28 | 2017-04-28 | Plasma chamber liner |
TW106306241F TWD192021S (en) | 2017-04-28 | 2017-10-25 | Plasma chamber liner |
JPD2017-24106F JP1615030S (en) | 2017-04-28 | 2017-10-30 |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US29/602,207 USD842259S1 (en) | 2017-04-28 | 2017-04-28 | Plasma chamber liner |
Publications (1)
Publication Number | Publication Date |
---|---|
USD842259S1 true USD842259S1 (en) | 2019-03-05 |
Family
ID=63682182
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
US29/602,207 Active USD842259S1 (en) | 2017-04-28 | 2017-04-28 | Plasma chamber liner |
Country Status (3)
Country | Link |
---|---|
US (1) | USD842259S1 (en) |
JP (1) | JP1615030S (en) |
TW (1) | TWD192021S (en) |
Cited By (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
USD875055S1 (en) * | 2017-04-28 | 2020-02-11 | Applied Materials, Inc. | Plasma connector liner |
USD875054S1 (en) * | 2017-04-28 | 2020-02-11 | Applied Materials, Inc. | Plasma connector liner |
USD875053S1 (en) * | 2017-04-28 | 2020-02-11 | Applied Materials, Inc. | Plasma connector liner |
USD882536S1 (en) * | 2017-04-28 | 2020-04-28 | Applied Materials, Inc. | Plasma source liner |
USD901405S1 (en) * | 2017-03-28 | 2020-11-10 | Rohm Co., Ltd. | Semiconductor device |
USD925481S1 (en) * | 2018-12-06 | 2021-07-20 | Kokusai Electric Corporation | Inlet liner for substrate processing apparatus |
USD941787S1 (en) * | 2020-03-03 | 2022-01-25 | Applied Materials, Inc. | Substrate transfer blade |
Citations (27)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US5964947A (en) * | 1996-07-12 | 1999-10-12 | Applied Materials, Inc. | Removable pumping channel liners within a chemical vapor deposition chamber |
US6277237B1 (en) * | 1998-09-30 | 2001-08-21 | Lam Research Corporation | Chamber liner for semiconductor process chambers |
US20010054381A1 (en) * | 1998-12-14 | 2001-12-27 | Salvador P Umotoy | High temperature chemical vapor deposition chamber |
US6374871B2 (en) * | 1999-05-25 | 2002-04-23 | Micron Technology, Inc. | Liner for use in processing chamber |
US20020069970A1 (en) * | 2000-03-07 | 2002-06-13 | Applied Materials, Inc. | Temperature controlled semiconductor processing chamber liner |
US20040033385A1 (en) * | 2001-06-25 | 2004-02-19 | Kaushal Tony S. | Erosion-resistant components for plasma process chambers |
US20040206309A1 (en) * | 2003-04-17 | 2004-10-21 | Applied Materials, Inc. | Apparatus and method to confine plasma and reduce flow resistance in a plasma reactor |
US20050224180A1 (en) * | 2004-04-08 | 2005-10-13 | Applied Materials, Inc. | Apparatus for controlling gas flow in a semiconductor substrate processing chamber |
US20050229849A1 (en) * | 2004-02-13 | 2005-10-20 | Applied Materials, Inc. | High productivity plasma processing chamber |
US7011039B1 (en) * | 2000-07-07 | 2006-03-14 | Applied Materials, Inc. | Multi-purpose processing chamber with removable chamber liner |
USD583838S1 (en) | 2007-09-19 | 2008-12-30 | Riley Power, Inc. | Grinding chamber side liner |
US20090188625A1 (en) * | 2008-01-28 | 2009-07-30 | Carducci James D | Etching chamber having flow equalizer and lower liner |
USD658693S1 (en) * | 2011-03-30 | 2012-05-01 | Tokyo Electron Limited | Liner for plasma processing apparatus |
USD658691S1 (en) * | 2011-03-30 | 2012-05-01 | Tokyo Electron Limited | Liner for plasma processing apparatus |
USD658692S1 (en) * | 2011-03-30 | 2012-05-01 | Tokyo Electron Limited | Liner for plasma processing apparatus |
USD678228S1 (en) * | 2011-03-30 | 2013-03-19 | Tokyo Electron Limited | Chamber block |
USD699692S1 (en) * | 2012-01-19 | 2014-02-18 | Applied Materials, Inc. | Upper liner |
US20140116366A1 (en) | 2011-04-21 | 2014-05-01 | Eaton Corporation | Pivot foot for deactivating rocker arm |
US8858754B2 (en) * | 2010-05-25 | 2014-10-14 | Tokyo Electron Limited | Plasma processing apparatus |
USD716240S1 (en) * | 2013-11-07 | 2014-10-28 | Applied Materials, Inc. | Lower chamber liner |
USD716239S1 (en) * | 2013-11-06 | 2014-10-28 | Applied Materials, Inc. | Upper chamber liner |
US20140322897A1 (en) | 2013-04-30 | 2014-10-30 | Applied Materials, Inc. | Flow controlled liner having spatially distributed gas passages |
USD717746S1 (en) * | 2013-11-06 | 2014-11-18 | Applied Materials, Inc. | Lower chamber liner |
US8980005B2 (en) | 2011-03-22 | 2015-03-17 | Applied Materials, Inc. | Liner assembly for chemical vapor deposition chamber |
USD802545S1 (en) * | 2015-06-12 | 2017-11-14 | Hitachi High-Technologies Corporation | Lower chamber for a plasma processing apparatus |
USD804436S1 (en) * | 2015-06-12 | 2017-12-05 | Hitachi High-Technologies Corporation | Upper chamber for a plasma processing apparatus |
USD812578S1 (en) * | 2016-02-26 | 2018-03-13 | Hitachi High-Technologies Corporation | Upper chamber for a plasma processing apparatus |
-
2017
- 2017-04-28 US US29/602,207 patent/USD842259S1/en active Active
- 2017-10-25 TW TW106306241F patent/TWD192021S/en unknown
- 2017-10-30 JP JPD2017-24106F patent/JP1615030S/ja active Active
Patent Citations (27)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US5964947A (en) * | 1996-07-12 | 1999-10-12 | Applied Materials, Inc. | Removable pumping channel liners within a chemical vapor deposition chamber |
US6277237B1 (en) * | 1998-09-30 | 2001-08-21 | Lam Research Corporation | Chamber liner for semiconductor process chambers |
US20010054381A1 (en) * | 1998-12-14 | 2001-12-27 | Salvador P Umotoy | High temperature chemical vapor deposition chamber |
US6374871B2 (en) * | 1999-05-25 | 2002-04-23 | Micron Technology, Inc. | Liner for use in processing chamber |
US20020069970A1 (en) * | 2000-03-07 | 2002-06-13 | Applied Materials, Inc. | Temperature controlled semiconductor processing chamber liner |
US7011039B1 (en) * | 2000-07-07 | 2006-03-14 | Applied Materials, Inc. | Multi-purpose processing chamber with removable chamber liner |
US20040033385A1 (en) * | 2001-06-25 | 2004-02-19 | Kaushal Tony S. | Erosion-resistant components for plasma process chambers |
US20040206309A1 (en) * | 2003-04-17 | 2004-10-21 | Applied Materials, Inc. | Apparatus and method to confine plasma and reduce flow resistance in a plasma reactor |
US20050229849A1 (en) * | 2004-02-13 | 2005-10-20 | Applied Materials, Inc. | High productivity plasma processing chamber |
US20050224180A1 (en) * | 2004-04-08 | 2005-10-13 | Applied Materials, Inc. | Apparatus for controlling gas flow in a semiconductor substrate processing chamber |
USD583838S1 (en) | 2007-09-19 | 2008-12-30 | Riley Power, Inc. | Grinding chamber side liner |
US20090188625A1 (en) * | 2008-01-28 | 2009-07-30 | Carducci James D | Etching chamber having flow equalizer and lower liner |
US8858754B2 (en) * | 2010-05-25 | 2014-10-14 | Tokyo Electron Limited | Plasma processing apparatus |
US8980005B2 (en) | 2011-03-22 | 2015-03-17 | Applied Materials, Inc. | Liner assembly for chemical vapor deposition chamber |
USD658692S1 (en) * | 2011-03-30 | 2012-05-01 | Tokyo Electron Limited | Liner for plasma processing apparatus |
USD678228S1 (en) * | 2011-03-30 | 2013-03-19 | Tokyo Electron Limited | Chamber block |
USD658693S1 (en) * | 2011-03-30 | 2012-05-01 | Tokyo Electron Limited | Liner for plasma processing apparatus |
USD658691S1 (en) * | 2011-03-30 | 2012-05-01 | Tokyo Electron Limited | Liner for plasma processing apparatus |
US20140116366A1 (en) | 2011-04-21 | 2014-05-01 | Eaton Corporation | Pivot foot for deactivating rocker arm |
USD699692S1 (en) * | 2012-01-19 | 2014-02-18 | Applied Materials, Inc. | Upper liner |
US20140322897A1 (en) | 2013-04-30 | 2014-10-30 | Applied Materials, Inc. | Flow controlled liner having spatially distributed gas passages |
USD717746S1 (en) * | 2013-11-06 | 2014-11-18 | Applied Materials, Inc. | Lower chamber liner |
USD716239S1 (en) * | 2013-11-06 | 2014-10-28 | Applied Materials, Inc. | Upper chamber liner |
USD716240S1 (en) * | 2013-11-07 | 2014-10-28 | Applied Materials, Inc. | Lower chamber liner |
USD802545S1 (en) * | 2015-06-12 | 2017-11-14 | Hitachi High-Technologies Corporation | Lower chamber for a plasma processing apparatus |
USD804436S1 (en) * | 2015-06-12 | 2017-12-05 | Hitachi High-Technologies Corporation | Upper chamber for a plasma processing apparatus |
USD812578S1 (en) * | 2016-02-26 | 2018-03-13 | Hitachi High-Technologies Corporation | Upper chamber for a plasma processing apparatus |
Non-Patent Citations (3)
Title |
---|
Japanese Office Action for Application No. JP 2017-024106 dated Apr. 10, 2018. |
Japanese Office Action for Application No. JP 2017-024107 dated Apr. 10, 2018. |
Search Report for Taiwan Design Application No. 106306241 dated Jun. 6, 2018. |
Cited By (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
USD901405S1 (en) * | 2017-03-28 | 2020-11-10 | Rohm Co., Ltd. | Semiconductor device |
USD875055S1 (en) * | 2017-04-28 | 2020-02-11 | Applied Materials, Inc. | Plasma connector liner |
USD875054S1 (en) * | 2017-04-28 | 2020-02-11 | Applied Materials, Inc. | Plasma connector liner |
USD875053S1 (en) * | 2017-04-28 | 2020-02-11 | Applied Materials, Inc. | Plasma connector liner |
USD882536S1 (en) * | 2017-04-28 | 2020-04-28 | Applied Materials, Inc. | Plasma source liner |
USD925481S1 (en) * | 2018-12-06 | 2021-07-20 | Kokusai Electric Corporation | Inlet liner for substrate processing apparatus |
USD941787S1 (en) * | 2020-03-03 | 2022-01-25 | Applied Materials, Inc. | Substrate transfer blade |
Also Published As
Publication number | Publication date |
---|---|
JP1615030S (en) | 2018-10-01 |
TWD192021S (en) | 2018-08-01 |
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