USD804436S1 - Upper chamber for a plasma processing apparatus - Google Patents

Upper chamber for a plasma processing apparatus Download PDF

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Publication number
USD804436S1
USD804436S1 US29/544,068 US201529544068F USD804436S US D804436 S1 USD804436 S1 US D804436S1 US 201529544068 F US201529544068 F US 201529544068F US D804436 S USD804436 S US D804436S
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United States
Prior art keywords
processing apparatus
plasma processing
upper chamber
view
elevational view
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US29/544,068
Inventor
Susumu Tauchi
Takashi Uemura
Kohei Sato
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Hitachi High Tech Corp
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Hitachi High Technologies Corp
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Assigned to HITACHI HIGH-TECHNOLOGIES CORPORATION reassignment HITACHI HIGH-TECHNOLOGIES CORPORATION ASSIGNMENT OF ASSIGNORS INTEREST (SEE DOCUMENT FOR DETAILS). Assignors: TAUCHI, SUSUMU, UEMURA, TAKASHI, SATO, KOHEI
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Publication of USD804436S1 publication Critical patent/USD804436S1/en
Assigned to HITACHI HIGH-TECH CORPORATION reassignment HITACHI HIGH-TECH CORPORATION CHANGE OF NAME AND ADDRESS Assignors: HITACHI HIGH-TECHNOLOGIES CORPORATION
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FIG. 1 is a front and top perspective view of an upper chamber for a plasma processing apparatus according to the design;
FIG. 2 is a front elevational view thereof;
FIG. 3 is a rear elevational view thereof;
FIG. 4 is a left side elevational view thereof;
FIG. 5 is a right side elevational view thereof;
FIG. 6 is a top plan view thereof;
FIG. 7 is a bottom plan view thereof;
FIG. 8 is a cross-sectional view taken along line 8-8 of FIG. 6; and,
FIG. 9 is a partially enlarged view taken along line 9-9 of FIG. 8.

Claims (1)

    CLAIM
  1. The ornamental design for an upper chamber for a plasma processing apparatus, as shown and described.
US29/544,068 2015-06-12 2015-10-30 Upper chamber for a plasma processing apparatus Active USD804436S1 (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2015-013035 2015-06-12
JPD2015-13035F JP1546799S (en) 2015-06-12 2015-06-12

Publications (1)

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USD804436S1 true USD804436S1 (en) 2017-12-05

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US29/544,068 Active USD804436S1 (en) 2015-06-12 2015-10-30 Upper chamber for a plasma processing apparatus

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US (1) USD804436S1 (en)
JP (1) JP1546799S (en)
TW (1) TWD175852S (en)

Cited By (27)

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USD826300S1 (en) * 2016-09-30 2018-08-21 Oerlikon Metco Ag, Wohlen Rotably mounted thermal plasma burner for thermalspraying
USD837754S1 (en) * 2017-04-28 2019-01-08 Applied Materials, Inc. Plasma chamber liner
USD838681S1 (en) * 2017-04-28 2019-01-22 Applied Materials, Inc. Plasma chamber liner
USD842259S1 (en) * 2017-04-28 2019-03-05 Applied Materials, Inc. Plasma chamber liner
USD844768S1 (en) * 2017-09-06 2019-04-02 Rheem Manufacturing Company Water heater top cap assembly
USD847224S1 (en) * 2016-06-29 2019-04-30 Superior Industries, Inc. Vertical shaft impact crusher crushing chamber
USD849072S1 (en) * 2017-04-05 2019-05-21 Sundyne, Llc Bearing box frame
USD849228S1 (en) * 2017-12-19 2019-05-21 Systems Spray-Cooled, Inc Burner bump out
USD849227S1 (en) * 2017-12-12 2019-05-21 Systems Spray-Cooled, Inc. Burner bump out
USD851237S1 (en) * 2017-11-01 2019-06-11 Systems Spray-Cooled, Inc Watertight sidewall dustcover
USD851743S1 (en) * 2017-12-19 2019-06-18 Systems Spray-Cooled, Inc Burner bump out
USD869376S1 (en) * 2018-04-13 2019-12-10 Protective Enclosures Company, Llc Venting device
USD875054S1 (en) * 2017-04-28 2020-02-11 Applied Materials, Inc. Plasma connector liner
USD875053S1 (en) * 2017-04-28 2020-02-11 Applied Materials, Inc. Plasma connector liner
USD875055S1 (en) * 2017-04-28 2020-02-11 Applied Materials, Inc. Plasma connector liner
USD882536S1 (en) * 2017-04-28 2020-04-28 Applied Materials, Inc. Plasma source liner
USD892883S1 (en) * 2018-03-29 2020-08-11 Daihen Corporation Power transmission unit of an industrial robot arm
USD892884S1 (en) * 2018-03-29 2020-08-11 Daihen Corporation Power receiving unit of an industrial robot arm
USD892880S1 (en) * 2018-03-29 2020-08-11 Daihen Corporation Power transmission unit and power receiving unit of an industrial robot arm
USD892881S1 (en) * 2018-03-29 2020-08-11 Daihen Corporation Power transmission unit and power receiving unit of an industrial robot arm
USD892882S1 (en) * 2018-03-29 2020-08-11 Daihen Corporation Power transmission unit of an industrial robot arm
USD907593S1 (en) * 2017-01-20 2021-01-12 Hitachi High-Tech Corporation Discharge chamber for a plasma processing apparatus
USD913979S1 (en) * 2019-08-28 2021-03-23 Applied Materials, Inc. Inner shield for a substrate processing chamber
USD925481S1 (en) * 2018-12-06 2021-07-20 Kokusai Electric Corporation Inlet liner for substrate processing apparatus
USD931241S1 (en) * 2019-08-28 2021-09-21 Applied Materials, Inc. Lower shield for a substrate processing chamber
USD973609S1 (en) * 2020-04-22 2022-12-27 Applied Materials, Inc. Upper shield with showerhead for a process chamber
USD1008967S1 (en) * 2022-05-16 2023-12-26 Japan Aviation Electronics Industry, Limited Collar for connector

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USD858468S1 (en) 2018-03-16 2019-09-03 Applied Materials, Inc. Collimator for a physical vapor deposition chamber
USD859333S1 (en) 2018-03-16 2019-09-10 Applied Materials, Inc. Collimator for a physical vapor deposition chamber
USD937329S1 (en) 2020-03-23 2021-11-30 Applied Materials, Inc. Sputter target for a physical vapor deposition chamber
USD998575S1 (en) 2020-04-07 2023-09-12 Applied Materials, Inc. Collimator for use in a physical vapor deposition (PVD) chamber
USD1009816S1 (en) 2021-08-29 2024-01-02 Applied Materials, Inc. Collimator for a physical vapor deposition chamber
USD997111S1 (en) 2021-12-15 2023-08-29 Applied Materials, Inc. Collimator for use in a physical vapor deposition (PVD) chamber

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US4153907A (en) * 1977-05-17 1979-05-08 Vactec, Incorporated Photovoltaic cell with junction-free essentially-linear connections to its contacts
USD274836S (en) * 1982-12-02 1984-07-24 Smith Edward J Space heater assembly
US5641375A (en) * 1994-08-15 1997-06-24 Applied Materials, Inc. Plasma etching reactor with surface protection means against erosion of walls
USD404369S (en) * 1997-08-20 1999-01-19 Tokyo Electron Limited Manifold cover for use in a semiconductor wafer heat processing apparatus
US20010023821A1 (en) * 1999-07-12 2001-09-27 Randy Harris Lift and rotate assembly for use in a workpiece processing station and a method of attaching the same
USD448729S1 (en) * 1999-12-14 2001-10-02 Mitsubishi Denki Kabushiki Kaisha Stator of AC generator for vehicles
US20010035131A1 (en) * 2000-04-26 2001-11-01 Takeshi Sakuma Single-substrate-heat-processing apparatus for semiconductor process
US20040069223A1 (en) * 2002-10-10 2004-04-15 Taiwan Semiconductor Manufacturing Co., Ltd. Wall liner and slot liner for process chamber
USD491963S1 (en) * 2002-11-20 2004-06-22 Tokyo Electron Limited Inner wall shield for a process chamber for manufacturing semiconductors
US20120018402A1 (en) * 2010-07-21 2012-01-26 Applied Materials, Inc. Plasma processing apparatus and liner assembly for tuning electrical skews
US20130292254A1 (en) * 2012-03-28 2013-11-07 Santosh Kumar Methods and apparatuses for cleaning electroplating substrate holders
US20140097088A1 (en) * 2009-06-17 2014-04-10 Novellus Systems, Inc. Electrofill vacuum plating cell
USD716240S1 (en) * 2013-11-07 2014-10-28 Applied Materials, Inc. Lower chamber liner
US20160307743A1 (en) * 2015-04-17 2016-10-20 Lam Research Corporation Chamber with vertical support stem for symmetric conductance and rf delivery

Patent Citations (14)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4153907A (en) * 1977-05-17 1979-05-08 Vactec, Incorporated Photovoltaic cell with junction-free essentially-linear connections to its contacts
USD274836S (en) * 1982-12-02 1984-07-24 Smith Edward J Space heater assembly
US5641375A (en) * 1994-08-15 1997-06-24 Applied Materials, Inc. Plasma etching reactor with surface protection means against erosion of walls
USD404369S (en) * 1997-08-20 1999-01-19 Tokyo Electron Limited Manifold cover for use in a semiconductor wafer heat processing apparatus
US20010023821A1 (en) * 1999-07-12 2001-09-27 Randy Harris Lift and rotate assembly for use in a workpiece processing station and a method of attaching the same
USD448729S1 (en) * 1999-12-14 2001-10-02 Mitsubishi Denki Kabushiki Kaisha Stator of AC generator for vehicles
US20010035131A1 (en) * 2000-04-26 2001-11-01 Takeshi Sakuma Single-substrate-heat-processing apparatus for semiconductor process
US20040069223A1 (en) * 2002-10-10 2004-04-15 Taiwan Semiconductor Manufacturing Co., Ltd. Wall liner and slot liner for process chamber
USD491963S1 (en) * 2002-11-20 2004-06-22 Tokyo Electron Limited Inner wall shield for a process chamber for manufacturing semiconductors
US20140097088A1 (en) * 2009-06-17 2014-04-10 Novellus Systems, Inc. Electrofill vacuum plating cell
US20120018402A1 (en) * 2010-07-21 2012-01-26 Applied Materials, Inc. Plasma processing apparatus and liner assembly for tuning electrical skews
US20130292254A1 (en) * 2012-03-28 2013-11-07 Santosh Kumar Methods and apparatuses for cleaning electroplating substrate holders
USD716240S1 (en) * 2013-11-07 2014-10-28 Applied Materials, Inc. Lower chamber liner
US20160307743A1 (en) * 2015-04-17 2016-10-20 Lam Research Corporation Chamber with vertical support stem for symmetric conductance and rf delivery

Cited By (30)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
USD910725S1 (en) 2016-06-29 2021-02-16 Superior Industries, Inc. Vertical shaft impact crusher rotor floor
US11192116B2 (en) 2016-06-29 2021-12-07 Superior Industries, Inc. Vertical shaft impact crusher
USD875795S1 (en) * 2016-06-29 2020-02-18 Superior Industries, Inc. Vertical shaft impact crusher rotor
USD847224S1 (en) * 2016-06-29 2019-04-30 Superior Industries, Inc. Vertical shaft impact crusher crushing chamber
USD826300S1 (en) * 2016-09-30 2018-08-21 Oerlikon Metco Ag, Wohlen Rotably mounted thermal plasma burner for thermalspraying
USD907593S1 (en) * 2017-01-20 2021-01-12 Hitachi High-Tech Corporation Discharge chamber for a plasma processing apparatus
USD849072S1 (en) * 2017-04-05 2019-05-21 Sundyne, Llc Bearing box frame
USD875055S1 (en) * 2017-04-28 2020-02-11 Applied Materials, Inc. Plasma connector liner
USD882536S1 (en) * 2017-04-28 2020-04-28 Applied Materials, Inc. Plasma source liner
USD842259S1 (en) * 2017-04-28 2019-03-05 Applied Materials, Inc. Plasma chamber liner
USD838681S1 (en) * 2017-04-28 2019-01-22 Applied Materials, Inc. Plasma chamber liner
USD837754S1 (en) * 2017-04-28 2019-01-08 Applied Materials, Inc. Plasma chamber liner
USD875054S1 (en) * 2017-04-28 2020-02-11 Applied Materials, Inc. Plasma connector liner
USD875053S1 (en) * 2017-04-28 2020-02-11 Applied Materials, Inc. Plasma connector liner
USD844768S1 (en) * 2017-09-06 2019-04-02 Rheem Manufacturing Company Water heater top cap assembly
USD851237S1 (en) * 2017-11-01 2019-06-11 Systems Spray-Cooled, Inc Watertight sidewall dustcover
USD849227S1 (en) * 2017-12-12 2019-05-21 Systems Spray-Cooled, Inc. Burner bump out
USD849228S1 (en) * 2017-12-19 2019-05-21 Systems Spray-Cooled, Inc Burner bump out
USD851743S1 (en) * 2017-12-19 2019-06-18 Systems Spray-Cooled, Inc Burner bump out
USD892884S1 (en) * 2018-03-29 2020-08-11 Daihen Corporation Power receiving unit of an industrial robot arm
USD892880S1 (en) * 2018-03-29 2020-08-11 Daihen Corporation Power transmission unit and power receiving unit of an industrial robot arm
USD892881S1 (en) * 2018-03-29 2020-08-11 Daihen Corporation Power transmission unit and power receiving unit of an industrial robot arm
USD892882S1 (en) * 2018-03-29 2020-08-11 Daihen Corporation Power transmission unit of an industrial robot arm
USD892883S1 (en) * 2018-03-29 2020-08-11 Daihen Corporation Power transmission unit of an industrial robot arm
USD869376S1 (en) * 2018-04-13 2019-12-10 Protective Enclosures Company, Llc Venting device
USD925481S1 (en) * 2018-12-06 2021-07-20 Kokusai Electric Corporation Inlet liner for substrate processing apparatus
USD913979S1 (en) * 2019-08-28 2021-03-23 Applied Materials, Inc. Inner shield for a substrate processing chamber
USD931241S1 (en) * 2019-08-28 2021-09-21 Applied Materials, Inc. Lower shield for a substrate processing chamber
USD973609S1 (en) * 2020-04-22 2022-12-27 Applied Materials, Inc. Upper shield with showerhead for a process chamber
USD1008967S1 (en) * 2022-05-16 2023-12-26 Japan Aviation Electronics Industry, Limited Collar for connector

Also Published As

Publication number Publication date
TWD175852S (en) 2016-05-21
JP1546799S (en) 2016-03-28

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