USD802545S1 - Lower chamber for a plasma processing apparatus - Google Patents

Description

FIG. 1 is a front, top and right side perspective view of a lower chamber for a plasma processing apparatus according to the design;

FIG. 2 is a front elevational view thereof;

FIG. 3 is a rear elevational view thereof;

FIG. 4 is a left side elevational view thereof;

FIG. 5 is a right side elevational view thereof;

FIG. 6 is a top plan view thereof;

FIG. 7 is a bottom plan view thereof;

FIG. 8 is a cross-sectional view taken along line 8-8 of FIG. 6;

FIG. 9 is a cross-sectional view taken along line 9-9 of FIG. 6; and,

FIG. 10 is a partially enlarged view taken along line 10-10 of FIG. 8.

Claims (1)

CLAIM
1. The ornamental design for a lower chamber for a plasma processing apparatus, as shown and described.

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