USD802790S1 - Cover ring for a plasma processing apparatus - Google Patents
Cover ring for a plasma processing apparatus Download PDFInfo
- Publication number
- USD802790S1 USD802790S1 US29/544,069 US201529544069F USD802790S US D802790 S1 USD802790 S1 US D802790S1 US 201529544069 F US201529544069 F US 201529544069F US D802790 S USD802790 S US D802790S
- Authority
- US
- United States
- Prior art keywords
- processing apparatus
- plasma processing
- cover ring
- view
- ring
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Active
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Description
Claims (1)
- The ornamental design for a cover ring for a plasma processing apparatus, as shown and described.
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JPD2015-13036F JP1551512S (en) | 2015-06-12 | 2015-06-12 | |
JP2015-013036 | 2015-06-12 |
Publications (1)
Publication Number | Publication Date |
---|---|
USD802790S1 true USD802790S1 (en) | 2017-11-14 |
Family
ID=56105200
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
US29/544,069 Active USD802790S1 (en) | 2015-06-12 | 2015-10-30 | Cover ring for a plasma processing apparatus |
Country Status (3)
Country | Link |
---|---|
US (1) | USD802790S1 (en) |
JP (1) | JP1551512S (en) |
TW (1) | TWD175853S (en) |
Cited By (17)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
USD840365S1 (en) * | 2017-01-31 | 2019-02-12 | Hitachi High-Technologies Corporation | Cover ring for a plasma processing apparatus |
USD872859S1 (en) * | 2017-03-09 | 2020-01-14 | Pieter Van Weenen & Co. Gmbh | Part of an apparatus for medical and laboratory diagnosis |
USD875053S1 (en) * | 2017-04-28 | 2020-02-11 | Applied Materials, Inc. | Plasma connector liner |
USD875055S1 (en) * | 2017-04-28 | 2020-02-11 | Applied Materials, Inc. | Plasma connector liner |
USD875054S1 (en) * | 2017-04-28 | 2020-02-11 | Applied Materials, Inc. | Plasma connector liner |
USD881767S1 (en) * | 2018-11-30 | 2020-04-21 | Warn Automotive, Llc | Latch ring |
USD882536S1 (en) * | 2017-04-28 | 2020-04-28 | Applied Materials, Inc. | Plasma source liner |
USD891636S1 (en) * | 2018-10-25 | 2020-07-28 | Hitachi High-Tech Corporation | Ring for a plasma processing apparatus |
USD907593S1 (en) * | 2017-01-20 | 2021-01-12 | Hitachi High-Tech Corporation | Discharge chamber for a plasma processing apparatus |
USD913979S1 (en) * | 2019-08-28 | 2021-03-23 | Applied Materials, Inc. | Inner shield for a substrate processing chamber |
USD918273S1 (en) * | 2019-05-14 | 2021-05-04 | Dana Gonzalez | Shoe and float collar device |
USD925481S1 (en) * | 2018-12-06 | 2021-07-20 | Kokusai Electric Corporation | Inlet liner for substrate processing apparatus |
USD931241S1 (en) * | 2019-08-28 | 2021-09-21 | Applied Materials, Inc. | Lower shield for a substrate processing chamber |
USD973609S1 (en) * | 2020-04-22 | 2022-12-27 | Applied Materials, Inc. | Upper shield with showerhead for a process chamber |
USD1008967S1 (en) * | 2022-05-16 | 2023-12-26 | Japan Aviation Electronics Industry, Limited | Collar for connector |
US12080522B2 (en) | 2020-04-22 | 2024-09-03 | Applied Materials, Inc. | Preclean chamber upper shield with showerhead |
US12100577B2 (en) | 2019-10-25 | 2024-09-24 | Applied Materials, Inc. | High conductance inner shield for process chamber |
Families Citing this family (8)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP1584784S (en) | 2017-01-31 | 2017-08-28 | ||
USD859333S1 (en) | 2018-03-16 | 2019-09-10 | Applied Materials, Inc. | Collimator for a physical vapor deposition chamber |
USD858468S1 (en) | 2018-03-16 | 2019-09-03 | Applied Materials, Inc. | Collimator for a physical vapor deposition chamber |
USD937329S1 (en) | 2020-03-23 | 2021-11-30 | Applied Materials, Inc. | Sputter target for a physical vapor deposition chamber |
USD998575S1 (en) | 2020-04-07 | 2023-09-12 | Applied Materials, Inc. | Collimator for use in a physical vapor deposition (PVD) chamber |
USD1009816S1 (en) | 2021-08-29 | 2024-01-02 | Applied Materials, Inc. | Collimator for a physical vapor deposition chamber |
USD997111S1 (en) | 2021-12-15 | 2023-08-29 | Applied Materials, Inc. | Collimator for use in a physical vapor deposition (PVD) chamber |
USD1038901S1 (en) | 2022-01-12 | 2024-08-13 | Applied Materials, Inc. | Collimator for a physical vapor deposition chamber |
Citations (29)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
USD404369S (en) * | 1997-08-20 | 1999-01-19 | Tokyo Electron Limited | Manifold cover for use in a semiconductor wafer heat processing apparatus |
USD404372S (en) * | 1997-08-20 | 1999-01-19 | Tokyo Electron Limited | Ring for use in a semiconductor wafer heat processing apparatus |
USD404370S (en) * | 1997-08-20 | 1999-01-19 | Tokyo Electron Limited | Cap for use in a semiconductor wafer heat processing apparatus |
US6423175B1 (en) * | 1999-10-06 | 2002-07-23 | Taiwan Semiconductor Manufacturing Co., Ltd | Apparatus and method for reducing particle contamination in an etcher |
US20030066484A1 (en) * | 2001-09-26 | 2003-04-10 | Kawasaki Microelectronics, Inc. | Electrode cover, plasma apparatus utilizing the cover, and method of fitting the cover onto the plasma electrode |
USD491963S1 (en) * | 2002-11-20 | 2004-06-22 | Tokyo Electron Limited | Inner wall shield for a process chamber for manufacturing semiconductors |
US20050150452A1 (en) * | 2004-01-14 | 2005-07-14 | Soovo Sen | Process kit design for deposition chamber |
US20050258280A1 (en) * | 2004-05-24 | 2005-11-24 | Shin-Etsu Chemical Co., Ltd. | Shower plate for plasma processing apparatus and plasma processing apparatus |
US7186171B2 (en) * | 2005-04-22 | 2007-03-06 | Applied Materials, Inc. | Composite retaining ring |
USD556704S1 (en) * | 2005-08-25 | 2007-12-04 | Hitachi High-Technologies Corporation | Grounded electrode for a plasma processing apparatus |
USD557226S1 (en) * | 2005-08-25 | 2007-12-11 | Hitachi High-Technologies Corporation | Electrode cover for a plasma processing apparatus |
USD557425S1 (en) * | 2005-08-25 | 2007-12-11 | Hitachi High-Technologies Corporation | Cover ring for a plasma processing apparatus |
USD559994S1 (en) * | 2005-03-30 | 2008-01-15 | Tokyo Electron Limited | Cover ring |
USD559993S1 (en) * | 2005-03-30 | 2008-01-15 | Tokyo Electron Limited | Cover ring |
US20080041820A1 (en) * | 2002-09-20 | 2008-02-21 | Lam Research Corporation | Apparatus for reducing polymer deposition on a substrate and substrate support |
US20080121620A1 (en) * | 2006-11-24 | 2008-05-29 | Guo G X | Processing chamber |
USD638550S1 (en) * | 2009-11-13 | 2011-05-24 | 3M Innovative Properties Company | Sample processing disk cover |
USD638951S1 (en) * | 2009-11-13 | 2011-05-31 | 3M Innovative Properties Company | Sample processing disk cover |
USD658693S1 (en) * | 2011-03-30 | 2012-05-01 | Tokyo Electron Limited | Liner for plasma processing apparatus |
USD658691S1 (en) * | 2011-03-30 | 2012-05-01 | Tokyo Electron Limited | Liner for plasma processing apparatus |
USD667561S1 (en) * | 2009-11-13 | 2012-09-18 | 3M Innovative Properties Company | Sample processing disk cover |
US8298046B2 (en) * | 2009-10-21 | 2012-10-30 | SPM Technology, Inc. | Retaining rings |
USD699200S1 (en) * | 2011-09-30 | 2014-02-11 | Tokyo Electron Limited | Electrode member for a plasma processing apparatus |
USD703160S1 (en) * | 2011-01-27 | 2014-04-22 | Hitachi High-Technologies Corporation | Grounded electrode for a plasma processing apparatus |
USD716240S1 (en) * | 2013-11-07 | 2014-10-28 | Applied Materials, Inc. | Lower chamber liner |
USD716239S1 (en) * | 2013-11-06 | 2014-10-28 | Applied Materials, Inc. | Upper chamber liner |
USD717746S1 (en) * | 2013-11-06 | 2014-11-18 | Applied Materials, Inc. | Lower chamber liner |
USD766849S1 (en) * | 2013-05-15 | 2016-09-20 | Ebara Corporation | Substrate retaining ring |
USD770992S1 (en) * | 2015-06-12 | 2016-11-08 | Hitachi High-Technologies Corporation | Electrode cover for a plasma processing apparatus |
-
2015
- 2015-06-12 JP JPD2015-13036F patent/JP1551512S/ja active Active
- 2015-10-06 TW TW104305549F patent/TWD175853S/en unknown
- 2015-10-30 US US29/544,069 patent/USD802790S1/en active Active
Patent Citations (29)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
USD404372S (en) * | 1997-08-20 | 1999-01-19 | Tokyo Electron Limited | Ring for use in a semiconductor wafer heat processing apparatus |
USD404370S (en) * | 1997-08-20 | 1999-01-19 | Tokyo Electron Limited | Cap for use in a semiconductor wafer heat processing apparatus |
USD404369S (en) * | 1997-08-20 | 1999-01-19 | Tokyo Electron Limited | Manifold cover for use in a semiconductor wafer heat processing apparatus |
US6423175B1 (en) * | 1999-10-06 | 2002-07-23 | Taiwan Semiconductor Manufacturing Co., Ltd | Apparatus and method for reducing particle contamination in an etcher |
US20030066484A1 (en) * | 2001-09-26 | 2003-04-10 | Kawasaki Microelectronics, Inc. | Electrode cover, plasma apparatus utilizing the cover, and method of fitting the cover onto the plasma electrode |
US20080041820A1 (en) * | 2002-09-20 | 2008-02-21 | Lam Research Corporation | Apparatus for reducing polymer deposition on a substrate and substrate support |
USD491963S1 (en) * | 2002-11-20 | 2004-06-22 | Tokyo Electron Limited | Inner wall shield for a process chamber for manufacturing semiconductors |
US20050150452A1 (en) * | 2004-01-14 | 2005-07-14 | Soovo Sen | Process kit design for deposition chamber |
US20050258280A1 (en) * | 2004-05-24 | 2005-11-24 | Shin-Etsu Chemical Co., Ltd. | Shower plate for plasma processing apparatus and plasma processing apparatus |
USD559994S1 (en) * | 2005-03-30 | 2008-01-15 | Tokyo Electron Limited | Cover ring |
USD559993S1 (en) * | 2005-03-30 | 2008-01-15 | Tokyo Electron Limited | Cover ring |
US7186171B2 (en) * | 2005-04-22 | 2007-03-06 | Applied Materials, Inc. | Composite retaining ring |
USD557226S1 (en) * | 2005-08-25 | 2007-12-11 | Hitachi High-Technologies Corporation | Electrode cover for a plasma processing apparatus |
USD557425S1 (en) * | 2005-08-25 | 2007-12-11 | Hitachi High-Technologies Corporation | Cover ring for a plasma processing apparatus |
USD556704S1 (en) * | 2005-08-25 | 2007-12-04 | Hitachi High-Technologies Corporation | Grounded electrode for a plasma processing apparatus |
US20080121620A1 (en) * | 2006-11-24 | 2008-05-29 | Guo G X | Processing chamber |
US8298046B2 (en) * | 2009-10-21 | 2012-10-30 | SPM Technology, Inc. | Retaining rings |
USD638550S1 (en) * | 2009-11-13 | 2011-05-24 | 3M Innovative Properties Company | Sample processing disk cover |
USD638951S1 (en) * | 2009-11-13 | 2011-05-31 | 3M Innovative Properties Company | Sample processing disk cover |
USD667561S1 (en) * | 2009-11-13 | 2012-09-18 | 3M Innovative Properties Company | Sample processing disk cover |
USD703160S1 (en) * | 2011-01-27 | 2014-04-22 | Hitachi High-Technologies Corporation | Grounded electrode for a plasma processing apparatus |
USD658691S1 (en) * | 2011-03-30 | 2012-05-01 | Tokyo Electron Limited | Liner for plasma processing apparatus |
USD658693S1 (en) * | 2011-03-30 | 2012-05-01 | Tokyo Electron Limited | Liner for plasma processing apparatus |
USD699200S1 (en) * | 2011-09-30 | 2014-02-11 | Tokyo Electron Limited | Electrode member for a plasma processing apparatus |
USD766849S1 (en) * | 2013-05-15 | 2016-09-20 | Ebara Corporation | Substrate retaining ring |
USD716239S1 (en) * | 2013-11-06 | 2014-10-28 | Applied Materials, Inc. | Upper chamber liner |
USD717746S1 (en) * | 2013-11-06 | 2014-11-18 | Applied Materials, Inc. | Lower chamber liner |
USD716240S1 (en) * | 2013-11-07 | 2014-10-28 | Applied Materials, Inc. | Lower chamber liner |
USD770992S1 (en) * | 2015-06-12 | 2016-11-08 | Hitachi High-Technologies Corporation | Electrode cover for a plasma processing apparatus |
Cited By (17)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
USD907593S1 (en) * | 2017-01-20 | 2021-01-12 | Hitachi High-Tech Corporation | Discharge chamber for a plasma processing apparatus |
USD840365S1 (en) * | 2017-01-31 | 2019-02-12 | Hitachi High-Technologies Corporation | Cover ring for a plasma processing apparatus |
USD872859S1 (en) * | 2017-03-09 | 2020-01-14 | Pieter Van Weenen & Co. Gmbh | Part of an apparatus for medical and laboratory diagnosis |
USD875054S1 (en) * | 2017-04-28 | 2020-02-11 | Applied Materials, Inc. | Plasma connector liner |
USD875055S1 (en) * | 2017-04-28 | 2020-02-11 | Applied Materials, Inc. | Plasma connector liner |
USD882536S1 (en) * | 2017-04-28 | 2020-04-28 | Applied Materials, Inc. | Plasma source liner |
USD875053S1 (en) * | 2017-04-28 | 2020-02-11 | Applied Materials, Inc. | Plasma connector liner |
USD891636S1 (en) * | 2018-10-25 | 2020-07-28 | Hitachi High-Tech Corporation | Ring for a plasma processing apparatus |
USD881767S1 (en) * | 2018-11-30 | 2020-04-21 | Warn Automotive, Llc | Latch ring |
USD925481S1 (en) * | 2018-12-06 | 2021-07-20 | Kokusai Electric Corporation | Inlet liner for substrate processing apparatus |
USD918273S1 (en) * | 2019-05-14 | 2021-05-04 | Dana Gonzalez | Shoe and float collar device |
USD913979S1 (en) * | 2019-08-28 | 2021-03-23 | Applied Materials, Inc. | Inner shield for a substrate processing chamber |
USD931241S1 (en) * | 2019-08-28 | 2021-09-21 | Applied Materials, Inc. | Lower shield for a substrate processing chamber |
US12100577B2 (en) | 2019-10-25 | 2024-09-24 | Applied Materials, Inc. | High conductance inner shield for process chamber |
USD973609S1 (en) * | 2020-04-22 | 2022-12-27 | Applied Materials, Inc. | Upper shield with showerhead for a process chamber |
US12080522B2 (en) | 2020-04-22 | 2024-09-03 | Applied Materials, Inc. | Preclean chamber upper shield with showerhead |
USD1008967S1 (en) * | 2022-05-16 | 2023-12-26 | Japan Aviation Electronics Industry, Limited | Collar for connector |
Also Published As
Publication number | Publication date |
---|---|
JP1551512S (en) | 2016-06-13 |
TWD175853S (en) | 2016-05-21 |
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