USD882536S1 - Plasma source liner - Google Patents
Plasma source liner Download PDFInfo
- Publication number
- USD882536S1 USD882536S1 US29/602,230 US201729602230F USD882536S US D882536 S1 USD882536 S1 US D882536S1 US 201729602230 F US201729602230 F US 201729602230F US D882536 S USD882536 S US D882536S
- Authority
- US
- United States
- Prior art keywords
- plasma source
- source liner
- liner
- view
- plasma
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Active
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Description
The oblique hatching shown in FIGS. 7 and 8 represents a refractory material.
Claims (1)
- The ornamental design for a plasma source liner, as shown and described.
Priority Applications (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US29/602,230 USD882536S1 (en) | 2017-04-28 | 2017-04-28 | Plasma source liner |
TW106306308F TWD192022S (en) | 2017-04-28 | 2017-10-27 | Plasma source liner |
JPD2017-24109F JP1612650S (en) | 2017-04-28 | 2017-10-30 |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US29/602,230 USD882536S1 (en) | 2017-04-28 | 2017-04-28 | Plasma source liner |
Publications (1)
Publication Number | Publication Date |
---|---|
USD882536S1 true USD882536S1 (en) | 2020-04-28 |
Family
ID=63369443
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
US29/602,230 Active USD882536S1 (en) | 2017-04-28 | 2017-04-28 | Plasma source liner |
Country Status (3)
Country | Link |
---|---|
US (1) | USD882536S1 (en) |
JP (1) | JP1612650S (en) |
TW (1) | TWD192022S (en) |
Citations (11)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US20040166612A1 (en) * | 2002-06-05 | 2004-08-26 | Applied Materials, Inc. | Fabrication of silicon-on-insulator structure using plasma immersion ion implantation |
USD799439S1 (en) * | 2016-05-31 | 2017-10-10 | Rohm Co., Ltd. | Power converting semiconductor module |
USD802790S1 (en) * | 2015-06-12 | 2017-11-14 | Hitachi High-Technologies Corporation | Cover ring for a plasma processing apparatus |
USD804436S1 (en) * | 2015-06-12 | 2017-12-05 | Hitachi High-Technologies Corporation | Upper chamber for a plasma processing apparatus |
USD818447S1 (en) * | 2017-04-28 | 2018-05-22 | Applied Materials, Inc. | Plasma feedthrough flange |
USD818968S1 (en) * | 2016-06-16 | 2018-05-29 | Tridonic Gmbh & Co. Kg | Sensor |
US20180347045A1 (en) * | 2017-05-31 | 2018-12-06 | Applied Materials, Inc. | Remote plasma oxidation chamber |
USD837754S1 (en) * | 2017-04-28 | 2019-01-08 | Applied Materials, Inc. | Plasma chamber liner |
USD838681S1 (en) * | 2017-04-28 | 2019-01-22 | Applied Materials, Inc. | Plasma chamber liner |
USD840365S1 (en) * | 2017-01-31 | 2019-02-12 | Hitachi High-Technologies Corporation | Cover ring for a plasma processing apparatus |
USD842259S1 (en) * | 2017-04-28 | 2019-03-05 | Applied Materials, Inc. | Plasma chamber liner |
-
2017
- 2017-04-28 US US29/602,230 patent/USD882536S1/en active Active
- 2017-10-27 TW TW106306308F patent/TWD192022S/en unknown
- 2017-10-30 JP JPD2017-24109F patent/JP1612650S/ja active Active
Patent Citations (11)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US20040166612A1 (en) * | 2002-06-05 | 2004-08-26 | Applied Materials, Inc. | Fabrication of silicon-on-insulator structure using plasma immersion ion implantation |
USD802790S1 (en) * | 2015-06-12 | 2017-11-14 | Hitachi High-Technologies Corporation | Cover ring for a plasma processing apparatus |
USD804436S1 (en) * | 2015-06-12 | 2017-12-05 | Hitachi High-Technologies Corporation | Upper chamber for a plasma processing apparatus |
USD799439S1 (en) * | 2016-05-31 | 2017-10-10 | Rohm Co., Ltd. | Power converting semiconductor module |
USD818968S1 (en) * | 2016-06-16 | 2018-05-29 | Tridonic Gmbh & Co. Kg | Sensor |
USD840365S1 (en) * | 2017-01-31 | 2019-02-12 | Hitachi High-Technologies Corporation | Cover ring for a plasma processing apparatus |
USD818447S1 (en) * | 2017-04-28 | 2018-05-22 | Applied Materials, Inc. | Plasma feedthrough flange |
USD837754S1 (en) * | 2017-04-28 | 2019-01-08 | Applied Materials, Inc. | Plasma chamber liner |
USD838681S1 (en) * | 2017-04-28 | 2019-01-22 | Applied Materials, Inc. | Plasma chamber liner |
USD842259S1 (en) * | 2017-04-28 | 2019-03-05 | Applied Materials, Inc. | Plasma chamber liner |
US20180347045A1 (en) * | 2017-05-31 | 2018-12-06 | Applied Materials, Inc. | Remote plasma oxidation chamber |
Non-Patent Citations (1)
Title |
---|
Search Report for Taiwan Design Application No. 106306308 dated Jun. 6, 2018. |
Also Published As
Publication number | Publication date |
---|---|
TWD192022S (en) | 2018-08-01 |
JP1612650S (en) | 2018-09-03 |
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