USD882536S1 - Plasma source liner - Google Patents

Plasma source liner Download PDF

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Publication number
USD882536S1
USD882536S1 US29/602,230 US201729602230F USD882536S US D882536 S1 USD882536 S1 US D882536S1 US 201729602230 F US201729602230 F US 201729602230F US D882536 S USD882536 S US D882536S
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US
United States
Prior art keywords
plasma source
source liner
liner
view
plasma
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Active
Application number
US29/602,230
Inventor
Eric Kihara Shono
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Applied Materials Inc
Original Assignee
Applied Materials Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Applied Materials Inc filed Critical Applied Materials Inc
Priority to US29/602,230 priority Critical patent/USD882536S1/en
Assigned to APPLIED MATERIALS, INC. reassignment APPLIED MATERIALS, INC. ASSIGNMENT OF ASSIGNORS INTEREST (SEE DOCUMENT FOR DETAILS). Assignors: SHONO, ERIC KIHARA
Priority to TW106306308F priority patent/TWD192022S/en
Priority to JPD2017-24109F priority patent/JP1612650S/ja
Application granted granted Critical
Publication of USD882536S1 publication Critical patent/USD882536S1/en
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Description

FIG. 1 is an isometric top view of a plasma source liner.
FIG. 2 is an isometric bottom view thereof.
FIG. 3 is a top plan view thereof.
FIG. 4 is a bottom plan view thereof.
FIG. 5 is a side elevational view thereof, the other side elevational view being identical.
FIG. 6 is an end elevational view thereof, the other side elevational view being identical.
FIG. 7 is a cross-sectional view thereof taken along lines 7-7 of FIG. 3; and,
FIG. 8 is a cross-sectional view thereof taken along lines 8-8 of FIG. 5.
The oblique hatching shown in FIGS. 7 and 8 represents a refractory material.

Claims (1)

    CLAIM
  1. The ornamental design for a plasma source liner, as shown and described.
US29/602,230 2017-04-28 2017-04-28 Plasma source liner Active USD882536S1 (en)

Priority Applications (3)

Application Number Priority Date Filing Date Title
US29/602,230 USD882536S1 (en) 2017-04-28 2017-04-28 Plasma source liner
TW106306308F TWD192022S (en) 2017-04-28 2017-10-27 Plasma source liner
JPD2017-24109F JP1612650S (en) 2017-04-28 2017-10-30

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US29/602,230 USD882536S1 (en) 2017-04-28 2017-04-28 Plasma source liner

Publications (1)

Publication Number Publication Date
USD882536S1 true USD882536S1 (en) 2020-04-28

Family

ID=63369443

Family Applications (1)

Application Number Title Priority Date Filing Date
US29/602,230 Active USD882536S1 (en) 2017-04-28 2017-04-28 Plasma source liner

Country Status (3)

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US (1) USD882536S1 (en)
JP (1) JP1612650S (en)
TW (1) TWD192022S (en)

Citations (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20040166612A1 (en) * 2002-06-05 2004-08-26 Applied Materials, Inc. Fabrication of silicon-on-insulator structure using plasma immersion ion implantation
USD799439S1 (en) * 2016-05-31 2017-10-10 Rohm Co., Ltd. Power converting semiconductor module
USD802790S1 (en) * 2015-06-12 2017-11-14 Hitachi High-Technologies Corporation Cover ring for a plasma processing apparatus
USD804436S1 (en) * 2015-06-12 2017-12-05 Hitachi High-Technologies Corporation Upper chamber for a plasma processing apparatus
USD818447S1 (en) * 2017-04-28 2018-05-22 Applied Materials, Inc. Plasma feedthrough flange
USD818968S1 (en) * 2016-06-16 2018-05-29 Tridonic Gmbh & Co. Kg Sensor
US20180347045A1 (en) * 2017-05-31 2018-12-06 Applied Materials, Inc. Remote plasma oxidation chamber
USD837754S1 (en) * 2017-04-28 2019-01-08 Applied Materials, Inc. Plasma chamber liner
USD838681S1 (en) * 2017-04-28 2019-01-22 Applied Materials, Inc. Plasma chamber liner
USD840365S1 (en) * 2017-01-31 2019-02-12 Hitachi High-Technologies Corporation Cover ring for a plasma processing apparatus
USD842259S1 (en) * 2017-04-28 2019-03-05 Applied Materials, Inc. Plasma chamber liner

Patent Citations (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20040166612A1 (en) * 2002-06-05 2004-08-26 Applied Materials, Inc. Fabrication of silicon-on-insulator structure using plasma immersion ion implantation
USD802790S1 (en) * 2015-06-12 2017-11-14 Hitachi High-Technologies Corporation Cover ring for a plasma processing apparatus
USD804436S1 (en) * 2015-06-12 2017-12-05 Hitachi High-Technologies Corporation Upper chamber for a plasma processing apparatus
USD799439S1 (en) * 2016-05-31 2017-10-10 Rohm Co., Ltd. Power converting semiconductor module
USD818968S1 (en) * 2016-06-16 2018-05-29 Tridonic Gmbh & Co. Kg Sensor
USD840365S1 (en) * 2017-01-31 2019-02-12 Hitachi High-Technologies Corporation Cover ring for a plasma processing apparatus
USD818447S1 (en) * 2017-04-28 2018-05-22 Applied Materials, Inc. Plasma feedthrough flange
USD837754S1 (en) * 2017-04-28 2019-01-08 Applied Materials, Inc. Plasma chamber liner
USD838681S1 (en) * 2017-04-28 2019-01-22 Applied Materials, Inc. Plasma chamber liner
USD842259S1 (en) * 2017-04-28 2019-03-05 Applied Materials, Inc. Plasma chamber liner
US20180347045A1 (en) * 2017-05-31 2018-12-06 Applied Materials, Inc. Remote plasma oxidation chamber

Non-Patent Citations (1)

* Cited by examiner, † Cited by third party
Title
Search Report for Taiwan Design Application No. 106306308 dated Jun. 6, 2018.

Also Published As

Publication number Publication date
TWD192022S (en) 2018-08-01
JP1612650S (en) 2018-09-03

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