USD837754S1 - Plasma chamber liner - Google Patents

Plasma chamber liner Download PDF

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Publication number
USD837754S1
USD837754S1 US29/602,217 US201729602217F USD837754S US D837754 S1 USD837754 S1 US D837754S1 US 201729602217 F US201729602217 F US 201729602217F US D837754 S USD837754 S US D837754S
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United States
Prior art keywords
plasma chamber
chamber liner
liner
view
plasma
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Active
Application number
US29/602,217
Inventor
Eric Kihara Shono
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Applied Materials Inc
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Applied Materials Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
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Publication date
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Priority to US29/602,217 priority Critical patent/USD837754S1/en
Assigned to APPLIED MATERIALS, INC. reassignment APPLIED MATERIALS, INC. ASSIGNMENT OF ASSIGNORS INTEREST (SEE DOCUMENT FOR DETAILS). Assignors: SHONO, ERIC KIHARA
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Publication of USD837754S1 publication Critical patent/USD837754S1/en
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Description

FIG. 1 is a top isometric view of a plasma chamber liner showing my new design;
FIG. 2 is a bottom isometric view thereof;
FIG. 3 is a top plan view thereof;
FIG. 4 is a bottom plan view thereof;
FIG. 5 is a side elevational view thereof;
FIG. 6 is an opposite side elevational view thereof; and,
FIG. 7 is a front elevational view thereof, a rear elevational view being identical.

Claims (1)

    CLAIM
  1. The ornamental design for a plasma chamber liner, as shown and described.
US29/602,217 2017-04-28 2017-04-28 Plasma chamber liner Active USD837754S1 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
US29/602,217 USD837754S1 (en) 2017-04-28 2017-04-28 Plasma chamber liner

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US29/602,217 USD837754S1 (en) 2017-04-28 2017-04-28 Plasma chamber liner

Publications (1)

Publication Number Publication Date
USD837754S1 true USD837754S1 (en) 2019-01-08

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US29/602,217 Active USD837754S1 (en) 2017-04-28 2017-04-28 Plasma chamber liner

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Cited By (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
USD875054S1 (en) * 2017-04-28 2020-02-11 Applied Materials, Inc. Plasma connector liner
USD875055S1 (en) * 2017-04-28 2020-02-11 Applied Materials, Inc. Plasma connector liner
USD875053S1 (en) * 2017-04-28 2020-02-11 Applied Materials, Inc. Plasma connector liner
USD882536S1 (en) * 2017-04-28 2020-04-28 Applied Materials, Inc. Plasma source liner
USD925481S1 (en) * 2018-12-06 2021-07-20 Kokusai Electric Corporation Inlet liner for substrate processing apparatus
USD1023987S1 (en) * 2018-01-24 2024-04-23 Applied Materials, Inc. Chamber inlet

Citations (19)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5964947A (en) * 1996-07-12 1999-10-12 Applied Materials, Inc. Removable pumping channel liners within a chemical vapor deposition chamber
US6277237B1 (en) * 1998-09-30 2001-08-21 Lam Research Corporation Chamber liner for semiconductor process chambers
US6374871B2 (en) * 1999-05-25 2002-04-23 Micron Technology, Inc. Liner for use in processing chamber
US7011039B1 (en) * 2000-07-07 2006-03-14 Applied Materials, Inc. Multi-purpose processing chamber with removable chamber liner
USD658692S1 (en) * 2011-03-30 2012-05-01 Tokyo Electron Limited Liner for plasma processing apparatus
USD658693S1 (en) * 2011-03-30 2012-05-01 Tokyo Electron Limited Liner for plasma processing apparatus
USD658691S1 (en) * 2011-03-30 2012-05-01 Tokyo Electron Limited Liner for plasma processing apparatus
USD678228S1 (en) * 2011-03-30 2013-03-19 Tokyo Electron Limited Chamber block
USD699692S1 (en) * 2012-01-19 2014-02-18 Applied Materials, Inc. Upper liner
US20140116366A1 (en) 2011-04-21 2014-05-01 Eaton Corporation Pivot foot for deactivating rocker arm
US8858754B2 (en) * 2010-05-25 2014-10-14 Tokyo Electron Limited Plasma processing apparatus
USD716239S1 (en) * 2013-11-06 2014-10-28 Applied Materials, Inc. Upper chamber liner
USD716240S1 (en) * 2013-11-07 2014-10-28 Applied Materials, Inc. Lower chamber liner
US20140322897A1 (en) 2013-04-30 2014-10-30 Applied Materials, Inc. Flow controlled liner having spatially distributed gas passages
USD717746S1 (en) * 2013-11-06 2014-11-18 Applied Materials, Inc. Lower chamber liner
US8980005B2 (en) 2011-03-22 2015-03-17 Applied Materials, Inc. Liner assembly for chemical vapor deposition chamber
USD802545S1 (en) * 2015-06-12 2017-11-14 Hitachi High-Technologies Corporation Lower chamber for a plasma processing apparatus
USD804436S1 (en) * 2015-06-12 2017-12-05 Hitachi High-Technologies Corporation Upper chamber for a plasma processing apparatus
USD812578S1 (en) * 2016-02-26 2018-03-13 Hitachi High-Technologies Corporation Upper chamber for a plasma processing apparatus

Patent Citations (19)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5964947A (en) * 1996-07-12 1999-10-12 Applied Materials, Inc. Removable pumping channel liners within a chemical vapor deposition chamber
US6277237B1 (en) * 1998-09-30 2001-08-21 Lam Research Corporation Chamber liner for semiconductor process chambers
US6374871B2 (en) * 1999-05-25 2002-04-23 Micron Technology, Inc. Liner for use in processing chamber
US7011039B1 (en) * 2000-07-07 2006-03-14 Applied Materials, Inc. Multi-purpose processing chamber with removable chamber liner
US8858754B2 (en) * 2010-05-25 2014-10-14 Tokyo Electron Limited Plasma processing apparatus
US8980005B2 (en) 2011-03-22 2015-03-17 Applied Materials, Inc. Liner assembly for chemical vapor deposition chamber
USD658692S1 (en) * 2011-03-30 2012-05-01 Tokyo Electron Limited Liner for plasma processing apparatus
USD658693S1 (en) * 2011-03-30 2012-05-01 Tokyo Electron Limited Liner for plasma processing apparatus
USD658691S1 (en) * 2011-03-30 2012-05-01 Tokyo Electron Limited Liner for plasma processing apparatus
USD678228S1 (en) * 2011-03-30 2013-03-19 Tokyo Electron Limited Chamber block
US20140116366A1 (en) 2011-04-21 2014-05-01 Eaton Corporation Pivot foot for deactivating rocker arm
USD699692S1 (en) * 2012-01-19 2014-02-18 Applied Materials, Inc. Upper liner
US20140322897A1 (en) 2013-04-30 2014-10-30 Applied Materials, Inc. Flow controlled liner having spatially distributed gas passages
USD717746S1 (en) * 2013-11-06 2014-11-18 Applied Materials, Inc. Lower chamber liner
USD716239S1 (en) * 2013-11-06 2014-10-28 Applied Materials, Inc. Upper chamber liner
USD716240S1 (en) * 2013-11-07 2014-10-28 Applied Materials, Inc. Lower chamber liner
USD802545S1 (en) * 2015-06-12 2017-11-14 Hitachi High-Technologies Corporation Lower chamber for a plasma processing apparatus
USD804436S1 (en) * 2015-06-12 2017-12-05 Hitachi High-Technologies Corporation Upper chamber for a plasma processing apparatus
USD812578S1 (en) * 2016-02-26 2018-03-13 Hitachi High-Technologies Corporation Upper chamber for a plasma processing apparatus

Cited By (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
USD875054S1 (en) * 2017-04-28 2020-02-11 Applied Materials, Inc. Plasma connector liner
USD875055S1 (en) * 2017-04-28 2020-02-11 Applied Materials, Inc. Plasma connector liner
USD875053S1 (en) * 2017-04-28 2020-02-11 Applied Materials, Inc. Plasma connector liner
USD882536S1 (en) * 2017-04-28 2020-04-28 Applied Materials, Inc. Plasma source liner
USD1023987S1 (en) * 2018-01-24 2024-04-23 Applied Materials, Inc. Chamber inlet
USD925481S1 (en) * 2018-12-06 2021-07-20 Kokusai Electric Corporation Inlet liner for substrate processing apparatus

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