USD818447S1 - Plasma feedthrough flange - Google Patents

Plasma feedthrough flange Download PDF

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Publication number
USD818447S1
USD818447S1 US29/602,206 US201729602206F USD818447S US D818447 S1 USD818447 S1 US D818447S1 US 201729602206 F US201729602206 F US 201729602206F US D818447 S USD818447 S US D818447S
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US
United States
Prior art keywords
plasma
feedthrough flange
feedthrough
flange
view
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Active
Application number
US29/602,206
Inventor
Eric Kihara Shono
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Applied Materials Inc
Original Assignee
Applied Materials Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Applied Materials Inc filed Critical Applied Materials Inc
Priority to US29/602,206 priority Critical patent/USD818447S1/en
Assigned to APPLIED MATERIALS, INC. reassignment APPLIED MATERIALS, INC. ASSIGNMENT OF ASSIGNORS INTEREST (SEE DOCUMENT FOR DETAILS). Assignors: SHONO, ERIC KIHARA
Priority to TW106306299F priority patent/TWD191653S/en
Priority to JPD2017-24102F priority patent/JP1612649S/ja
Application granted granted Critical
Publication of USD818447S1 publication Critical patent/USD818447S1/en
Active legal-status Critical Current
Anticipated expiration legal-status Critical

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Description

FIG. 1 is an isometric top view of a plasma feedthrough flange, showing my new design;
FIG. 2 is an isometric bottom view thereof;
FIG. 3 is a top plan view thereof;
FIG. 4 is a side view thereof;
FIG. 5 is a bottom plan view thereof;
FIG. 6 is another side view thereof;
FIG. 7 is another side view thereof;
FIG. 8 is another side view thereof;
FIG. 9 is a cross sectional view taken along lines 9-9 of FIG. 5;
FIG. 10 is a cross sectional view taken along lines 10-10 of FIG. 5; and,
FIG. 11 is a cross sectional view taken along lines 11-11 of FIG. 3.

Claims (1)

    CLAIM
  1. The ornamental design for a plasma feedthrough flange, as shown and described.
US29/602,206 2017-04-28 2017-04-28 Plasma feedthrough flange Active USD818447S1 (en)

Priority Applications (3)

Application Number Priority Date Filing Date Title
US29/602,206 USD818447S1 (en) 2017-04-28 2017-04-28 Plasma feedthrough flange
TW106306299F TWD191653S (en) 2017-04-28 2017-10-27 Plasma feedthrough flange
JPD2017-24102F JP1612649S (en) 2017-04-28 2017-10-30

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US29/602,206 USD818447S1 (en) 2017-04-28 2017-04-28 Plasma feedthrough flange

Publications (1)

Publication Number Publication Date
USD818447S1 true USD818447S1 (en) 2018-05-22

Family

ID=62118263

Family Applications (1)

Application Number Title Priority Date Filing Date
US29/602,206 Active USD818447S1 (en) 2017-04-28 2017-04-28 Plasma feedthrough flange

Country Status (3)

Country Link
US (1) USD818447S1 (en)
JP (1) JP1612649S (en)
TW (1) TWD191653S (en)

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
USD875053S1 (en) * 2017-04-28 2020-02-11 Applied Materials, Inc. Plasma connector liner
USD875054S1 (en) * 2017-04-28 2020-02-11 Applied Materials, Inc. Plasma connector liner
USD875055S1 (en) * 2017-04-28 2020-02-11 Applied Materials, Inc. Plasma connector liner
USD882536S1 (en) * 2017-04-28 2020-04-28 Applied Materials, Inc. Plasma source liner

Citations (22)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US1462698A (en) * 1922-09-25 1923-07-24 Rodger F Haughey Pipe coupling
US2282552A (en) * 1940-11-15 1942-05-12 B & H Mfg Co Inc Nongasket flange
US2513178A (en) * 1945-02-22 1950-06-27 Pittsburgh Des Moines Company Bolted flange connection
US2532891A (en) * 1948-09-23 1950-12-05 Warren W Chupp Flanged joint sealing gasket
US3302953A (en) * 1963-02-25 1967-02-07 Clarence O Glasgow Gasket ring and conduit coupling
US3368818A (en) * 1964-02-02 1968-02-13 Nippon Electric Co Vacuum flange
US3747963A (en) * 1972-05-17 1973-07-24 Cajon Co High vacuum flange assembly with o-ring gasket
US3988698A (en) 1975-02-07 1976-10-26 Spectra-Physics, Inc. Plasma tube and method of manufacture
US4988130A (en) * 1988-07-19 1991-01-29 Japan Atomic Energy Research Institute Metal seal flange assembly
US5119395A (en) * 1990-11-09 1992-06-02 Gas Research Institute Interlock feed-through and insulator arrangement for plasma arc industrial heat treat furnaces
US5228587A (en) * 1992-11-23 1993-07-20 Worthington James N Flange cap for high vacuum system
US5593123A (en) * 1995-03-07 1997-01-14 Kimball Physics, Inc. Vacuum system components
US5814818A (en) * 1996-06-11 1998-09-29 Ngk Insulators, Ltd. Gas tube for passing plasma generating gases
US5961916A (en) 1997-03-27 1999-10-05 Ngk Insulators, Ltd. Method of manufacturing a passage tube for passing plasma producing gas
US6325390B1 (en) * 1997-08-08 2001-12-04 Itt Manufacturing Enterprises, Inc. Vacuum flange O-ring center ring
US6326574B1 (en) 1999-09-21 2001-12-04 Mosel Vitelic Inc. Sleeve for an adapter flange of the gasonics L3510 etcher
US20020050689A1 (en) * 2000-10-26 2002-05-02 Kimball Physics, Inc. Minimal thickness, double-sided flanges for ultra-high vacuum components
US20080308230A1 (en) * 2007-03-30 2008-12-18 Tokyo Electron Limited Plasma processing apparatus
USD606952S1 (en) * 2009-01-16 2009-12-29 Asm Genitech Korea Ltd. Plasma inducing plate for semiconductor deposition apparatus
US8191901B2 (en) * 2000-10-26 2012-06-05 Kimball Physics, Inc. Minimal thickness, double-sided flanges for ultra-high vacuum components
USD702654S1 (en) * 2012-05-29 2014-04-15 Asm Ip Holding B.V. Plasma power transfer rod for a semiconductor deposition apparatus
USD812578S1 (en) * 2016-02-26 2018-03-13 Hitachi High-Technologies Corporation Upper chamber for a plasma processing apparatus

Patent Citations (22)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US1462698A (en) * 1922-09-25 1923-07-24 Rodger F Haughey Pipe coupling
US2282552A (en) * 1940-11-15 1942-05-12 B & H Mfg Co Inc Nongasket flange
US2513178A (en) * 1945-02-22 1950-06-27 Pittsburgh Des Moines Company Bolted flange connection
US2532891A (en) * 1948-09-23 1950-12-05 Warren W Chupp Flanged joint sealing gasket
US3302953A (en) * 1963-02-25 1967-02-07 Clarence O Glasgow Gasket ring and conduit coupling
US3368818A (en) * 1964-02-02 1968-02-13 Nippon Electric Co Vacuum flange
US3747963A (en) * 1972-05-17 1973-07-24 Cajon Co High vacuum flange assembly with o-ring gasket
US3988698A (en) 1975-02-07 1976-10-26 Spectra-Physics, Inc. Plasma tube and method of manufacture
US4988130A (en) * 1988-07-19 1991-01-29 Japan Atomic Energy Research Institute Metal seal flange assembly
US5119395A (en) * 1990-11-09 1992-06-02 Gas Research Institute Interlock feed-through and insulator arrangement for plasma arc industrial heat treat furnaces
US5228587A (en) * 1992-11-23 1993-07-20 Worthington James N Flange cap for high vacuum system
US5593123A (en) * 1995-03-07 1997-01-14 Kimball Physics, Inc. Vacuum system components
US5814818A (en) * 1996-06-11 1998-09-29 Ngk Insulators, Ltd. Gas tube for passing plasma generating gases
US5961916A (en) 1997-03-27 1999-10-05 Ngk Insulators, Ltd. Method of manufacturing a passage tube for passing plasma producing gas
US6325390B1 (en) * 1997-08-08 2001-12-04 Itt Manufacturing Enterprises, Inc. Vacuum flange O-ring center ring
US6326574B1 (en) 1999-09-21 2001-12-04 Mosel Vitelic Inc. Sleeve for an adapter flange of the gasonics L3510 etcher
US20020050689A1 (en) * 2000-10-26 2002-05-02 Kimball Physics, Inc. Minimal thickness, double-sided flanges for ultra-high vacuum components
US8191901B2 (en) * 2000-10-26 2012-06-05 Kimball Physics, Inc. Minimal thickness, double-sided flanges for ultra-high vacuum components
US20080308230A1 (en) * 2007-03-30 2008-12-18 Tokyo Electron Limited Plasma processing apparatus
USD606952S1 (en) * 2009-01-16 2009-12-29 Asm Genitech Korea Ltd. Plasma inducing plate for semiconductor deposition apparatus
USD702654S1 (en) * 2012-05-29 2014-04-15 Asm Ip Holding B.V. Plasma power transfer rod for a semiconductor deposition apparatus
USD812578S1 (en) * 2016-02-26 2018-03-13 Hitachi High-Technologies Corporation Upper chamber for a plasma processing apparatus

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
USD875053S1 (en) * 2017-04-28 2020-02-11 Applied Materials, Inc. Plasma connector liner
USD875054S1 (en) * 2017-04-28 2020-02-11 Applied Materials, Inc. Plasma connector liner
USD875055S1 (en) * 2017-04-28 2020-02-11 Applied Materials, Inc. Plasma connector liner
USD882536S1 (en) * 2017-04-28 2020-04-28 Applied Materials, Inc. Plasma source liner

Also Published As

Publication number Publication date
TWD191653S (en) 2018-07-11
JP1612649S (en) 2018-09-03

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