TWD192021S - Plasma chamber liner - Google Patents

Plasma chamber liner

Info

Publication number
TWD192021S
TWD192021S TW106306241F TW106306241F TWD192021S TW D192021 S TWD192021 S TW D192021S TW 106306241 F TW106306241 F TW 106306241F TW 106306241 F TW106306241 F TW 106306241F TW D192021 S TWD192021 S TW D192021S
Authority
TW
Taiwan
Prior art keywords
view
plasma chamber
section
chamber liner
drawn based
Prior art date
Application number
TW106306241F
Other languages
Chinese (zh)
Inventor
艾瑞克木原 生野
Original Assignee
美商應用材料股份有限公司
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 美商應用材料股份有限公司 filed Critical 美商應用材料股份有限公司
Publication of TWD192021S publication Critical patent/TWD192021S/en

Links

Abstract

【物品用途】;本設計所請求具有視覺效果之電漿腔室襯墊係用於電漿腔室之中。;【設計說明】;左側視圖與右側視圖呈左右對稱因而省略。;左側剖面圖是根據前視圖中8-8之剖面線而繪製。;第一前剖面圖是根據仰視圖中9-9之剖面線而繪製。;第二前剖面圖是根據仰視圖中10-10之剖面線而繪製。;第三前剖面圖是根據仰視圖中11-11之剖面線而繪製。[Use of article]; The plasma chamber liner with visual effects requested by this design is used in the plasma chamber. ;[Design Description];The left side view and the right side view are symmetrical so they are omitted. ;The left section is drawn based on the section line 8-8 in the front view. ;The first front section view is drawn based on the section line 9-9 in the bottom view. ; The second front section view is drawn based on the section line 10-10 in the bottom view. ;The third front section view is drawn based on the section line 11-11 in the bottom view.

Description

電漿腔室襯墊Plasma chamber liner

本設計所請求具有視覺效果之電漿腔室襯墊係用於電漿腔室之中。The plasma chamber liners that are required for visual design in this design are used in the plasma chamber.

左側視圖與右側視圖呈左右對稱因而省略。The left side view is bilaterally symmetrical with the right side view and is therefore omitted.

左側剖面圖是根據前視圖中8-8之剖面線而繪製。The left section is drawn according to the section line 8-8 in the front view.

第一前剖面圖是根據仰視圖中9-9之剖面線而繪製。The first front section is drawn according to the section line 9-9 in the bottom view.

第二前剖面圖是根據仰視圖中10-10之剖面線而繪製。The second front section is drawn according to the section line 10-10 in the bottom view.

第三前剖面圖是根據仰視圖中11-11之剖面線而繪製。The third front section is drawn according to the section line 11-11 in the bottom view.

TW106306241F 2017-04-28 2017-10-25 Plasma chamber liner TWD192021S (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US29/602,207 2017-04-28
US29/602,207 USD842259S1 (en) 2017-04-28 2017-04-28 Plasma chamber liner

Publications (1)

Publication Number Publication Date
TWD192021S true TWD192021S (en) 2018-08-01

Family

ID=63682182

Family Applications (1)

Application Number Title Priority Date Filing Date
TW106306241F TWD192021S (en) 2017-04-28 2017-10-25 Plasma chamber liner

Country Status (3)

Country Link
US (1) USD842259S1 (en)
JP (1) JP1615030S (en)
TW (1) TWD192021S (en)

Families Citing this family (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP1593817S (en) * 2017-03-28 2017-12-25
USD882536S1 (en) * 2017-04-28 2020-04-28 Applied Materials, Inc. Plasma source liner
USD875053S1 (en) * 2017-04-28 2020-02-11 Applied Materials, Inc. Plasma connector liner
USD875054S1 (en) * 2017-04-28 2020-02-11 Applied Materials, Inc. Plasma connector liner
USD875055S1 (en) * 2017-04-28 2020-02-11 Applied Materials, Inc. Plasma connector liner
JP1638504S (en) * 2018-12-06 2019-08-05
USD941787S1 (en) * 2020-03-03 2022-01-25 Applied Materials, Inc. Substrate transfer blade

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
USD583838S1 (en) 2007-09-19 2008-12-30 Riley Power, Inc. Grinding chamber side liner

Family Cites Families (26)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5846332A (en) * 1996-07-12 1998-12-08 Applied Materials, Inc. Thermally floating pedestal collar in a chemical vapor deposition chamber
US6170429B1 (en) * 1998-09-30 2001-01-09 Lam Research Corporation Chamber liner for semiconductor process chambers
US6364954B2 (en) * 1998-12-14 2002-04-02 Applied Materials, Inc. High temperature chemical vapor deposition chamber
US6234219B1 (en) * 1999-05-25 2001-05-22 Micron Technology, Inc. Liner for use in processing chamber
US20020069970A1 (en) * 2000-03-07 2002-06-13 Applied Materials, Inc. Temperature controlled semiconductor processing chamber liner
US7011039B1 (en) * 2000-07-07 2006-03-14 Applied Materials, Inc. Multi-purpose processing chamber with removable chamber liner
US7670688B2 (en) * 2001-06-25 2010-03-02 Applied Materials, Inc. Erosion-resistant components for plasma process chambers
US7972467B2 (en) * 2003-04-17 2011-07-05 Applied Materials Inc. Apparatus and method to confine plasma and reduce flow resistance in a plasma reactor
US20050229849A1 (en) * 2004-02-13 2005-10-20 Applied Materials, Inc. High productivity plasma processing chamber
US8236105B2 (en) * 2004-04-08 2012-08-07 Applied Materials, Inc. Apparatus for controlling gas flow in a semiconductor substrate processing chamber
US20090188625A1 (en) * 2008-01-28 2009-07-30 Carducci James D Etching chamber having flow equalizer and lower liner
JP5567392B2 (en) * 2010-05-25 2014-08-06 東京エレクトロン株式会社 Plasma processing equipment
KR101884003B1 (en) 2011-03-22 2018-07-31 어플라이드 머티어리얼스, 인코포레이티드 Liner assembly for chemical vapor deposition chamber
USD678228S1 (en) * 2011-03-30 2013-03-19 Tokyo Electron Limited Chamber block
USD658691S1 (en) * 2011-03-30 2012-05-01 Tokyo Electron Limited Liner for plasma processing apparatus
USD658692S1 (en) * 2011-03-30 2012-05-01 Tokyo Electron Limited Liner for plasma processing apparatus
USD658693S1 (en) * 2011-03-30 2012-05-01 Tokyo Electron Limited Liner for plasma processing apparatus
US8627796B2 (en) 2011-04-21 2014-01-14 Eaton Corporation Pivot foot for deactivating rocker arm
USD699692S1 (en) * 2012-01-19 2014-02-18 Applied Materials, Inc. Upper liner
JP6368773B2 (en) 2013-04-30 2018-08-01 アプライド マテリアルズ インコーポレイテッドApplied Materials,Incorporated Flow control liner with spatially dispersed gas flow paths
USD717746S1 (en) * 2013-11-06 2014-11-18 Applied Materials, Inc. Lower chamber liner
USD716239S1 (en) * 2013-11-06 2014-10-28 Applied Materials, Inc. Upper chamber liner
USD716240S1 (en) * 2013-11-07 2014-10-28 Applied Materials, Inc. Lower chamber liner
JP1546801S (en) * 2015-06-12 2016-03-28
JP1546799S (en) * 2015-06-12 2016-03-28
JP1564934S (en) * 2016-02-26 2016-12-05

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
USD583838S1 (en) 2007-09-19 2008-12-30 Riley Power, Inc. Grinding chamber side liner

Also Published As

Publication number Publication date
USD842259S1 (en) 2019-03-05
JP1615030S (en) 2018-10-01

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