TWD211969S - A collimator for use in a physical vapor deposition (pvd) chamber - Google Patents
A collimator for use in a physical vapor deposition (pvd) chamber Download PDFInfo
- Publication number
- TWD211969S TWD211969S TW107305407D01F TW107305407D01F TWD211969S TW D211969 S TWD211969 S TW D211969S TW 107305407D01 F TW107305407D01 F TW 107305407D01F TW 107305407D01 F TW107305407D01 F TW 107305407D01F TW D211969 S TWD211969 S TW D211969S
- Authority
- TW
- Taiwan
- Prior art keywords
- pvd
- collimator
- chamber
- vapor deposition
- physical vapor
- Prior art date
Links
- 238000005240 physical vapour deposition Methods 0.000 title abstract description 5
- 238000010586 diagram Methods 0.000 description 1
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Abstract
【物品用途】;本設計所請求係用於物理氣相沉積(PVD)腔室中的準直器。;【設計說明】;圖式所揭露之虛線部分,為本案不主張設計之部分。[Use of article]; This design is requested to be used as a collimator in a physical vapor deposition (PVD) chamber. ;[Design Description];The dotted line portion disclosed in the drawing is the part of this case that does not require design.
Description
本設計所請求係用於物理氣相沉積(PVD)腔室中的準直器。The design requested is a collimator used in a physical vapor deposition (PVD) chamber.
圖式所揭露之虛線部分,為本案不主張設計之部分。The dotted line exposed in the diagram is the part that is not recommended for design in this case.
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US29/640,788 USD859333S1 (en) | 2018-03-16 | 2018-03-16 | Collimator for a physical vapor deposition chamber |
US29/640,788 | 2018-03-16 |
Publications (1)
Publication Number | Publication Date |
---|---|
TWD211969S true TWD211969S (en) | 2021-06-11 |
Family
ID=67809925
Family Applications (2)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
TW107305407D01F TWD211969S (en) | 2018-03-16 | 2018-09-13 | A collimator for use in a physical vapor deposition (pvd) chamber |
TW107305407F TWD210127S (en) | 2018-03-16 | 2018-09-13 | A collimator for use in a physical vapor deposition (pvd) chamber |
Family Applications After (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
TW107305407F TWD210127S (en) | 2018-03-16 | 2018-09-13 | A collimator for use in a physical vapor deposition (pvd) chamber |
Country Status (2)
Country | Link |
---|---|
US (1) | USD859333S1 (en) |
TW (2) | TWD211969S (en) |
Families Citing this family (10)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
USD937329S1 (en) | 2020-03-23 | 2021-11-30 | Applied Materials, Inc. | Sputter target for a physical vapor deposition chamber |
USD998575S1 (en) * | 2020-04-07 | 2023-09-12 | Applied Materials, Inc. | Collimator for use in a physical vapor deposition (PVD) chamber |
USD1009816S1 (en) * | 2021-08-29 | 2024-01-02 | Applied Materials, Inc. | Collimator for a physical vapor deposition chamber |
USD997111S1 (en) * | 2021-12-15 | 2023-08-29 | Applied Materials, Inc. | Collimator for use in a physical vapor deposition (PVD) chamber |
USD1038901S1 (en) * | 2022-01-12 | 2024-08-13 | Applied Materials, Inc. | Collimator for a physical vapor deposition chamber |
USD1026054S1 (en) * | 2022-04-22 | 2024-05-07 | Applied Materials, Inc. | Collimator for a physical vapor deposition (PVD) chamber |
USD1025935S1 (en) * | 2022-11-03 | 2024-05-07 | Applied Materials, Inc. | Collimator for a physical vapor deposition (PVD) chamber |
USD1024149S1 (en) * | 2022-12-16 | 2024-04-23 | Applied Materials, Inc. | Collimator for a physical vapor deposition (PVD) chamber |
USD1026839S1 (en) * | 2022-12-16 | 2024-05-14 | Applied Materials, Inc. | Collimator for a physical vapor deposition (PVD) chamber |
USD1025936S1 (en) * | 2022-12-16 | 2024-05-07 | Applied Materials, Inc. | Collimator for a physical vapor deposition (PVD) chamber |
Citations (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
TWM267462U (en) | 2000-07-17 | 2005-06-11 | Dura Tek Inc | Collimator for sputtering apparatus |
TWM346018U (en) | 2008-03-14 | 2008-12-01 | Everlight Electronics Co Ltd | Alterable gear collimator |
TW200938890A (en) | 2008-03-14 | 2009-09-16 | Everlight Electronics Co Ltd | Alterable collimator and lightening module thereof |
TW201724196A (en) | 2015-10-27 | 2017-07-01 | 應用材料股份有限公司 | Biasable flux optimizer/collimator for PVD sputter chamber |
Family Cites Families (41)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CA2061119C (en) * | 1991-04-19 | 1998-02-03 | Pei-Ing P. Lee | Method of depositing conductors in high aspect ratio apertures |
US5958193A (en) * | 1994-02-01 | 1999-09-28 | Vlsi Technology, Inc. | Sputter deposition with mobile collimator |
JPH07335552A (en) * | 1994-06-08 | 1995-12-22 | Tel Varian Ltd | Treatment device |
US5643428A (en) * | 1995-02-01 | 1997-07-01 | Advanced Micro Devices, Inc. | Multiple tier collimator system for enhanced step coverage and uniformity |
US5705042A (en) * | 1996-01-29 | 1998-01-06 | Micron Technology, Inc. | Electrically isolated collimator and method |
US5702573A (en) * | 1996-01-29 | 1997-12-30 | Varian Associates, Inc. | Method and apparatus for improved low pressure collimated magnetron sputter deposition of metal films |
US6362097B1 (en) * | 1998-07-14 | 2002-03-26 | Applied Komatsu Technlology, Inc. | Collimated sputtering of semiconductor and other films |
US20030015421A1 (en) * | 2001-07-20 | 2003-01-23 | Applied Materials, Inc. | Collimated sputtering of cobalt |
JP2005504885A (en) * | 2001-07-25 | 2005-02-17 | アプライド マテリアルズ インコーポレイテッド | Barrier formation using a novel sputter deposition method |
US20030029715A1 (en) * | 2001-07-25 | 2003-02-13 | Applied Materials, Inc. | An Apparatus For Annealing Substrates In Physical Vapor Deposition Systems |
EP1710324B1 (en) * | 2005-04-08 | 2008-12-03 | STMicroelectronics S.r.l. | PVD process and chamber for the pulsed deposition of a chalcogenide material layer of a phase change memory device |
US7355192B2 (en) * | 2006-03-30 | 2008-04-08 | Intel Corporation | Adjustable suspension assembly for a collimating lattice |
US20080121620A1 (en) * | 2006-11-24 | 2008-05-29 | Guo G X | Processing chamber |
US20090308739A1 (en) * | 2008-06-17 | 2009-12-17 | Applied Materials, Inc. | Wafer processing deposition shielding components |
WO2009155208A2 (en) * | 2008-06-17 | 2009-12-23 | Applied Materials, Inc. | Apparatus and method for uniform deposition |
USD598717S1 (en) * | 2008-09-19 | 2009-08-25 | Dart Industries Inc. | Can strainer |
CA140095S (en) * | 2010-10-29 | 2011-11-21 | Unilever Plc | Tea capsule |
USD665071S1 (en) | 2012-01-25 | 2012-08-07 | Applied Materials, Inc. | Deposition chamber liner |
EP2841619A4 (en) * | 2012-04-26 | 2015-06-03 | Intevac Inc | Narrow source for physical vapor deposition processing |
TWD159675S (en) | 2012-11-30 | 2014-04-01 | 日立國際電氣股份有限公司 | Rotator for substrate processing device |
TWD159676S (en) | 2012-11-30 | 2014-04-01 | 日立國際電氣股份有限公司 | Rotator for substrate processing device |
TWD159673S (en) | 2012-11-30 | 2014-04-01 | 日立國際電氣股份有限公司 | Rotator for substrate processing device |
TWD159674S (en) | 2012-11-30 | 2014-04-01 | 日立國際電氣股份有限公司 | Rotator for substrate processing device |
TWD166552S (en) | 2013-01-25 | 2015-03-11 | 日立國際電氣股份有限公司 | Vaporizer for substrate processing equipment |
TWD169790S (en) * | 2013-07-10 | 2015-08-11 | 日立國際電氣股份有限公司 | Part of the vaporizer for substrate processing equipment |
TWD165428S (en) * | 2013-07-17 | 2015-01-11 | 紐富來科技股份有限公司 | Chamber of charged particle beam drawing apparatus |
USD759603S1 (en) * | 2013-07-17 | 2016-06-21 | Nuflare Technology, Inc. | Chamber of charged particle beam drawing apparatus |
US9831074B2 (en) * | 2013-10-24 | 2017-11-28 | Applied Materials, Inc. | Bipolar collimator utilized in a physical vapor deposition chamber |
USD746647S1 (en) * | 2014-03-13 | 2016-01-05 | Vienar Roaks | Strainer |
US9543126B2 (en) | 2014-11-26 | 2017-01-10 | Applied Materials, Inc. | Collimator for use in substrate processing chambers |
JP1535123S (en) | 2014-12-22 | 2015-10-13 | ||
JP1534914S (en) | 2014-12-22 | 2015-10-13 | ||
JP1534915S (en) | 2014-12-22 | 2015-10-13 | ||
USD753449S1 (en) * | 2015-01-06 | 2016-04-12 | WineStor, LLC | Strainer for beverage shaker |
JP1546799S (en) | 2015-06-12 | 2016-03-28 | ||
JP1551512S (en) | 2015-06-12 | 2016-06-13 | ||
JP1546801S (en) | 2015-06-12 | 2016-03-28 | ||
TWD180286S (en) | 2015-09-25 | 2016-12-21 | 鴻海精密工業股份有限公司 | Smart socket |
TWD178698S (en) | 2016-01-08 | 2016-10-01 | Asm Ip Holding Bv | Outer wall of reactor for semiconductor manufacturing apparatus |
USD805700S1 (en) * | 2016-06-06 | 2017-12-19 | Joe J. Owens, III | Pet food bowl |
USD821140S1 (en) * | 2016-12-27 | 2018-06-26 | Tristar Products, Inc. | Steamer plate |
-
2018
- 2018-03-16 US US29/640,788 patent/USD859333S1/en active Active
- 2018-09-13 TW TW107305407D01F patent/TWD211969S/en unknown
- 2018-09-13 TW TW107305407F patent/TWD210127S/en unknown
Patent Citations (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
TWM267462U (en) | 2000-07-17 | 2005-06-11 | Dura Tek Inc | Collimator for sputtering apparatus |
TWM346018U (en) | 2008-03-14 | 2008-12-01 | Everlight Electronics Co Ltd | Alterable gear collimator |
TW200938890A (en) | 2008-03-14 | 2009-09-16 | Everlight Electronics Co Ltd | Alterable collimator and lightening module thereof |
TWI356916B (en) | 2008-03-14 | 2012-01-21 | Everlight Electronics Co Ltd | Alterable collimator and lightening module thereof |
TW201724196A (en) | 2015-10-27 | 2017-07-01 | 應用材料股份有限公司 | Biasable flux optimizer/collimator for PVD sputter chamber |
Also Published As
Publication number | Publication date |
---|---|
TWD210127S (en) | 2021-03-01 |
USD859333S1 (en) | 2019-09-10 |
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