TWD211969S - A collimator for use in a physical vapor deposition (pvd) chamber - Google Patents

A collimator for use in a physical vapor deposition (pvd) chamber Download PDF

Info

Publication number
TWD211969S
TWD211969S TW107305407D01F TW107305407D01F TWD211969S TW D211969 S TWD211969 S TW D211969S TW 107305407D01 F TW107305407D01 F TW 107305407D01F TW 107305407D01 F TW107305407D01 F TW 107305407D01F TW D211969 S TWD211969 S TW D211969S
Authority
TW
Taiwan
Prior art keywords
pvd
collimator
chamber
vapor deposition
physical vapor
Prior art date
Application number
TW107305407D01F
Other languages
Chinese (zh)
Inventor
馬丁李 萊克
仲蘭蘭
張富宏
征 王
Original Assignee
美商應用材料股份有限公司
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 美商應用材料股份有限公司 filed Critical 美商應用材料股份有限公司
Publication of TWD211969S publication Critical patent/TWD211969S/en

Links

Images

Abstract

【物品用途】;本設計所請求係用於物理氣相沉積(PVD)腔室中的準直器。;【設計說明】;圖式所揭露之虛線部分,為本案不主張設計之部分。[Use of article]; This design is requested to be used as a collimator in a physical vapor deposition (PVD) chamber. ;[Design Description];The dotted line portion disclosed in the drawing is the part of this case that does not require design.

Description

用於物理氣相沉積(PVD)腔室中的準直器Collimator used in physical vapor deposition (PVD) chambers

本設計所請求係用於物理氣相沉積(PVD)腔室中的準直器。The design requested is a collimator used in a physical vapor deposition (PVD) chamber.

圖式所揭露之虛線部分,為本案不主張設計之部分。The dotted line exposed in the diagram is the part that is not recommended for design in this case.

TW107305407D01F 2018-03-16 2018-09-13 A collimator for use in a physical vapor deposition (pvd) chamber TWD211969S (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US29/640,788 USD859333S1 (en) 2018-03-16 2018-03-16 Collimator for a physical vapor deposition chamber
US29/640,788 2018-03-16

Publications (1)

Publication Number Publication Date
TWD211969S true TWD211969S (en) 2021-06-11

Family

ID=67809925

Family Applications (2)

Application Number Title Priority Date Filing Date
TW107305407D01F TWD211969S (en) 2018-03-16 2018-09-13 A collimator for use in a physical vapor deposition (pvd) chamber
TW107305407F TWD210127S (en) 2018-03-16 2018-09-13 A collimator for use in a physical vapor deposition (pvd) chamber

Family Applications After (1)

Application Number Title Priority Date Filing Date
TW107305407F TWD210127S (en) 2018-03-16 2018-09-13 A collimator for use in a physical vapor deposition (pvd) chamber

Country Status (2)

Country Link
US (1) USD859333S1 (en)
TW (2) TWD211969S (en)

Families Citing this family (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
USD937329S1 (en) 2020-03-23 2021-11-30 Applied Materials, Inc. Sputter target for a physical vapor deposition chamber
USD998575S1 (en) * 2020-04-07 2023-09-12 Applied Materials, Inc. Collimator for use in a physical vapor deposition (PVD) chamber
USD1009816S1 (en) * 2021-08-29 2024-01-02 Applied Materials, Inc. Collimator for a physical vapor deposition chamber
USD997111S1 (en) * 2021-12-15 2023-08-29 Applied Materials, Inc. Collimator for use in a physical vapor deposition (PVD) chamber
USD1038901S1 (en) * 2022-01-12 2024-08-13 Applied Materials, Inc. Collimator for a physical vapor deposition chamber
USD1026054S1 (en) * 2022-04-22 2024-05-07 Applied Materials, Inc. Collimator for a physical vapor deposition (PVD) chamber
USD1025935S1 (en) * 2022-11-03 2024-05-07 Applied Materials, Inc. Collimator for a physical vapor deposition (PVD) chamber
USD1024149S1 (en) * 2022-12-16 2024-04-23 Applied Materials, Inc. Collimator for a physical vapor deposition (PVD) chamber
USD1026839S1 (en) * 2022-12-16 2024-05-14 Applied Materials, Inc. Collimator for a physical vapor deposition (PVD) chamber
USD1025936S1 (en) * 2022-12-16 2024-05-07 Applied Materials, Inc. Collimator for a physical vapor deposition (PVD) chamber

Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TWM267462U (en) 2000-07-17 2005-06-11 Dura Tek Inc Collimator for sputtering apparatus
TWM346018U (en) 2008-03-14 2008-12-01 Everlight Electronics Co Ltd Alterable gear collimator
TW200938890A (en) 2008-03-14 2009-09-16 Everlight Electronics Co Ltd Alterable collimator and lightening module thereof
TW201724196A (en) 2015-10-27 2017-07-01 應用材料股份有限公司 Biasable flux optimizer/collimator for PVD sputter chamber

Family Cites Families (41)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CA2061119C (en) * 1991-04-19 1998-02-03 Pei-Ing P. Lee Method of depositing conductors in high aspect ratio apertures
US5958193A (en) * 1994-02-01 1999-09-28 Vlsi Technology, Inc. Sputter deposition with mobile collimator
JPH07335552A (en) * 1994-06-08 1995-12-22 Tel Varian Ltd Treatment device
US5643428A (en) * 1995-02-01 1997-07-01 Advanced Micro Devices, Inc. Multiple tier collimator system for enhanced step coverage and uniformity
US5705042A (en) * 1996-01-29 1998-01-06 Micron Technology, Inc. Electrically isolated collimator and method
US5702573A (en) * 1996-01-29 1997-12-30 Varian Associates, Inc. Method and apparatus for improved low pressure collimated magnetron sputter deposition of metal films
US6362097B1 (en) * 1998-07-14 2002-03-26 Applied Komatsu Technlology, Inc. Collimated sputtering of semiconductor and other films
US20030015421A1 (en) * 2001-07-20 2003-01-23 Applied Materials, Inc. Collimated sputtering of cobalt
JP2005504885A (en) * 2001-07-25 2005-02-17 アプライド マテリアルズ インコーポレイテッド Barrier formation using a novel sputter deposition method
US20030029715A1 (en) * 2001-07-25 2003-02-13 Applied Materials, Inc. An Apparatus For Annealing Substrates In Physical Vapor Deposition Systems
EP1710324B1 (en) * 2005-04-08 2008-12-03 STMicroelectronics S.r.l. PVD process and chamber for the pulsed deposition of a chalcogenide material layer of a phase change memory device
US7355192B2 (en) * 2006-03-30 2008-04-08 Intel Corporation Adjustable suspension assembly for a collimating lattice
US20080121620A1 (en) * 2006-11-24 2008-05-29 Guo G X Processing chamber
US20090308739A1 (en) * 2008-06-17 2009-12-17 Applied Materials, Inc. Wafer processing deposition shielding components
WO2009155208A2 (en) * 2008-06-17 2009-12-23 Applied Materials, Inc. Apparatus and method for uniform deposition
USD598717S1 (en) * 2008-09-19 2009-08-25 Dart Industries Inc. Can strainer
CA140095S (en) * 2010-10-29 2011-11-21 Unilever Plc Tea capsule
USD665071S1 (en) 2012-01-25 2012-08-07 Applied Materials, Inc. Deposition chamber liner
EP2841619A4 (en) * 2012-04-26 2015-06-03 Intevac Inc Narrow source for physical vapor deposition processing
TWD159675S (en) 2012-11-30 2014-04-01 日立國際電氣股份有限公司 Rotator for substrate processing device
TWD159676S (en) 2012-11-30 2014-04-01 日立國際電氣股份有限公司 Rotator for substrate processing device
TWD159673S (en) 2012-11-30 2014-04-01 日立國際電氣股份有限公司 Rotator for substrate processing device
TWD159674S (en) 2012-11-30 2014-04-01 日立國際電氣股份有限公司 Rotator for substrate processing device
TWD166552S (en) 2013-01-25 2015-03-11 日立國際電氣股份有限公司 Vaporizer for substrate processing equipment
TWD169790S (en) * 2013-07-10 2015-08-11 日立國際電氣股份有限公司 Part of the vaporizer for substrate processing equipment
TWD165428S (en) * 2013-07-17 2015-01-11 紐富來科技股份有限公司 Chamber of charged particle beam drawing apparatus
USD759603S1 (en) * 2013-07-17 2016-06-21 Nuflare Technology, Inc. Chamber of charged particle beam drawing apparatus
US9831074B2 (en) * 2013-10-24 2017-11-28 Applied Materials, Inc. Bipolar collimator utilized in a physical vapor deposition chamber
USD746647S1 (en) * 2014-03-13 2016-01-05 Vienar Roaks Strainer
US9543126B2 (en) 2014-11-26 2017-01-10 Applied Materials, Inc. Collimator for use in substrate processing chambers
JP1535123S (en) 2014-12-22 2015-10-13
JP1534914S (en) 2014-12-22 2015-10-13
JP1534915S (en) 2014-12-22 2015-10-13
USD753449S1 (en) * 2015-01-06 2016-04-12 WineStor, LLC Strainer for beverage shaker
JP1546799S (en) 2015-06-12 2016-03-28
JP1551512S (en) 2015-06-12 2016-06-13
JP1546801S (en) 2015-06-12 2016-03-28
TWD180286S (en) 2015-09-25 2016-12-21 鴻海精密工業股份有限公司 Smart socket
TWD178698S (en) 2016-01-08 2016-10-01 Asm Ip Holding Bv Outer wall of reactor for semiconductor manufacturing apparatus
USD805700S1 (en) * 2016-06-06 2017-12-19 Joe J. Owens, III Pet food bowl
USD821140S1 (en) * 2016-12-27 2018-06-26 Tristar Products, Inc. Steamer plate

Patent Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TWM267462U (en) 2000-07-17 2005-06-11 Dura Tek Inc Collimator for sputtering apparatus
TWM346018U (en) 2008-03-14 2008-12-01 Everlight Electronics Co Ltd Alterable gear collimator
TW200938890A (en) 2008-03-14 2009-09-16 Everlight Electronics Co Ltd Alterable collimator and lightening module thereof
TWI356916B (en) 2008-03-14 2012-01-21 Everlight Electronics Co Ltd Alterable collimator and lightening module thereof
TW201724196A (en) 2015-10-27 2017-07-01 應用材料股份有限公司 Biasable flux optimizer/collimator for PVD sputter chamber

Also Published As

Publication number Publication date
TWD210127S (en) 2021-03-01
USD859333S1 (en) 2019-09-10

Similar Documents

Publication Publication Date Title
TWD211969S (en) A collimator for use in a physical vapor deposition (pvd) chamber
TWD202102S (en) A collimator for use in a physical vapor deposition (pvd) chamber
TWD203691S (en) Target profile for a physical vapor deposition chamber target
TWD214766S (en) Sputtering target for a physical vapor deposition chamber
TWD207532S (en) Deposition ring for pvd chamber
TWD207742S (en) Process shield for a substrate processing chamber
TWD224691S (en) Collimator for use in a physical vapor deposition (pvd) chamber
TWD203780S (en) Vaporizer device
TWD232372S (en) Target for a physical vapor deposition chamber
TWD217686S (en) Deposition ring for a semiconductor processing chamber
TWD215707S (en) Sputter target for a physical vapor deposition chamber
TWD214905S (en) Susceptor shaft
TWD211387S (en) Lower shield for a substrate processing chamber
TWD217045S (en) Susceptor support
TWD227585S (en) Collimator for use in a physical vapor deposition (pvd) chamber
TWD206011S (en) Packaging film
TWD204940S (en) Watch case
TWD226530S (en) Target for a physical vapor deposition chamber
TWD224361S (en) Refrigerator
TWD225923S (en) Valve assembly
TWD205280S (en) Tumbler
TWD232373S (en) Target for a physical vapor deposition chamber
TWD222669S (en) Cover ring for use in semiconductor processing chamber
TWD233052S (en) Physical vapor deposition chamber target
TWD211820S (en) Handgun