TWD165428S - Chamber of charged particle beam drawing apparatus - Google Patents

Abstract

[Use of article]; The article of this design is a chamber for a charged particle beam drawing device. This article is used in a charged particle beam drawing device (such as an electron beam drawing device) for manufacturing semiconductor masks (also including reticles). A chamber used as a drawing chamber. ;[Design Description];The chamber is a workbench that accommodates drawing objects such as blank masks. When the charged particle beam drawing device performs drawing, the inside of the chamber will be decompressed and become a vacuum state; the chamber The chamber is composed of a box with an upper opening and a lid that closes the opening. The lid has an opening as shown in a "top view" or a "three-dimensional view viewed from the top." The opening is a fitting The part of the optical tube, which contains the charged particle optical system for irradiating the charged particle beam onto the drawing object on the workbench; and the bottom plate of the box, as shown in the "C-C partial cross-sectional perspective view" , has: four support parts located at the four corners of the box to support the workbench, and a convex curved part that is bent outward and protrudes. ;The rear view is the same as the front view, and the rear view is omitted. ;The left view is the same as the right view, and the left view is omitted.