USD759603S1 - Chamber of charged particle beam drawing apparatus - Google Patents
Chamber of charged particle beam drawing apparatus Download PDFInfo
- Publication number
- USD759603S1 USD759603S1 US29/514,862 US201529514862F USD759603S US D759603 S1 USD759603 S1 US D759603S1 US 201529514862 F US201529514862 F US 201529514862F US D759603 S USD759603 S US D759603S
- Authority
- US
- United States
- Prior art keywords
- chamber
- charged particle
- particle beam
- drawing apparatus
- beam drawing
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
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Description
The dot-dash lines indicate the boundary between the claimed portion and unclaimed portion.
Claims (1)
- The ornamental design for a chamber of charged particle beam drawing apparatus, as shown and described.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US29/514,862 USD759603S1 (en) | 2013-07-17 | 2015-01-16 | Chamber of charged particle beam drawing apparatus |
Applications Claiming Priority (4)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2013-016242 | 2013-01-30 | ||
JP2013016242 | 2013-07-17 | ||
US29/479,498 USD722298S1 (en) | 2013-07-17 | 2014-01-16 | Chamber of charged particle beam drawing apparatus |
US29/514,862 USD759603S1 (en) | 2013-07-17 | 2015-01-16 | Chamber of charged particle beam drawing apparatus |
Related Parent Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
US29/479,498 Continuation-In-Part USD722298S1 (en) | 2013-07-17 | 2014-01-16 | Chamber of charged particle beam drawing apparatus |
Publications (1)
Publication Number | Publication Date |
---|---|
USD759603S1 true USD759603S1 (en) | 2016-06-21 |
Family
ID=56118650
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
US29/514,862 Active USD759603S1 (en) | 2013-07-17 | 2015-01-16 | Chamber of charged particle beam drawing apparatus |
Country Status (1)
Country | Link |
---|---|
US (1) | USD759603S1 (en) |
Cited By (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
USD825500S1 (en) * | 2016-03-24 | 2018-08-14 | Hamamatsu Photonics K.K. | Optical semiconductor element |
USD858468S1 (en) * | 2018-03-16 | 2019-09-03 | Applied Materials, Inc. | Collimator for a physical vapor deposition chamber |
USD859333S1 (en) * | 2018-03-16 | 2019-09-10 | Applied Materials, Inc. | Collimator for a physical vapor deposition chamber |
USD937329S1 (en) | 2020-03-23 | 2021-11-30 | Applied Materials, Inc. | Sputter target for a physical vapor deposition chamber |
USD997111S1 (en) | 2021-12-15 | 2023-08-29 | Applied Materials, Inc. | Collimator for use in a physical vapor deposition (PVD) chamber |
USD998575S1 (en) | 2020-04-07 | 2023-09-12 | Applied Materials, Inc. | Collimator for use in a physical vapor deposition (PVD) chamber |
USD1009816S1 (en) | 2021-08-29 | 2024-01-02 | Applied Materials, Inc. | Collimator for a physical vapor deposition chamber |
Citations (28)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US5391886A (en) * | 1991-08-09 | 1995-02-21 | Fujitsu Limited | Charged particle beam exposure system and method of exposing a pattern on an object by such a charged particle beam exposure system |
USD395638S (en) | 1997-01-30 | 1998-06-30 | Sony Corporation | Semiconductor package |
USD396846S (en) | 1997-04-16 | 1998-08-11 | Matsushita Electronics Corporation | Semiconductor device |
USD471166S1 (en) | 2001-04-06 | 2003-03-04 | Kabushiki Kaisha Toshiba | Light emitting semiconductor device |
USD505397S1 (en) | 2003-09-15 | 2005-05-24 | Nichia Corporation | Light emitting diode |
USD510912S1 (en) | 2003-09-15 | 2005-10-25 | Nichia Corporation | Light emitting diode |
US20060068301A1 (en) | 2003-04-16 | 2006-03-30 | Nikon Corporation | Pattern decision method and system, mask manufacturing method, image-forming performance adjusting method, exposure method and apparatus, program, and information recording medium |
US20060163705A1 (en) * | 2005-01-21 | 2006-07-27 | Toshimi Kamikawa | Surface mount semiconductor device |
US20070145403A1 (en) * | 2005-12-27 | 2007-06-28 | Kabushiki Kaisha Toshiba | Luminescent device and method for manufacturing the same |
US20070187624A1 (en) | 2006-02-14 | 2007-08-16 | Nuflare Technology, Inc. | Multiple irradiation effect-corrected dose determination technique for charged particle beam lithography |
US20080011965A1 (en) | 2006-07-14 | 2008-01-17 | Nuflare Technology, Inc. | Charged-particle beam pattern writing method and apparatus and software program for use therein |
US20080121620A1 (en) | 2006-11-24 | 2008-05-29 | Guo G X | Processing chamber |
US20090032739A1 (en) | 2007-07-30 | 2009-02-05 | Jeol Ltd. | Method and System for Charged-Particle Beam Lithography |
US7511290B2 (en) | 2006-02-21 | 2009-03-31 | Nuflare Technology, Inc. | Charged particle beam writing method and apparatus |
USD591697S1 (en) | 2006-08-09 | 2009-05-05 | Cree, Inc. | Lamp package |
USD592617S1 (en) | 2005-12-09 | 2009-05-19 | Nichia Corporation | Light emitting diode |
USD593969S1 (en) | 2006-10-10 | 2009-06-09 | Tokyo Electron Limited | Processing chamber for manufacturing semiconductors |
US20090242788A1 (en) | 2008-03-26 | 2009-10-01 | Fujifilm Corporation | Electron beam writing method, fine pattern writing system, method for manufacturing uneven pattern carrying substrate, and method for manufacturing magnetic disk medium |
USD602451S1 (en) | 2008-05-20 | 2009-10-20 | Koninklijke Philips Electronics N.V. | LED module |
US20100015537A1 (en) | 2005-10-25 | 2010-01-21 | Nuflare Technology, Inc. | Beam dose computing method and writing method and record carrier body and writing apparatus |
USD651184S1 (en) | 2009-10-26 | 2011-12-27 | Foxsemicon Integrated Technology, Inc | Light emitting diode |
US8481964B2 (en) | 2009-08-04 | 2013-07-09 | Nuflare Technology, Inc. | Charged particle beam drawing apparatus and method |
USD690443S1 (en) | 2011-06-06 | 2013-09-24 | Citizen Electronics Co., Ltd. | Light-emitting diode |
USD710809S1 (en) * | 2012-01-12 | 2014-08-12 | Dominant Opto Technologies Sdn. Bhd. | Light emitting diode |
USD715233S1 (en) * | 2009-10-26 | 2014-10-14 | Nichia Corporation | Light emitting diode |
USD722298S1 (en) * | 2013-07-17 | 2015-02-10 | Nuflare Technology, Inc. | Chamber of charged particle beam drawing apparatus |
US9018602B2 (en) * | 2012-09-14 | 2015-04-28 | Nuflare Technology, Inc. | Charged particle beam writing apparatus and charged particle beam writing method |
US9236223B2 (en) * | 2013-01-18 | 2016-01-12 | Nuflare Technology, Inc. | Charged particle beam writing apparatus, method of adjusting beam incident angle to target object surface, and charged particle beam writing method |
-
2015
- 2015-01-16 US US29/514,862 patent/USD759603S1/en active Active
Patent Citations (30)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US5391886A (en) * | 1991-08-09 | 1995-02-21 | Fujitsu Limited | Charged particle beam exposure system and method of exposing a pattern on an object by such a charged particle beam exposure system |
USD395638S (en) | 1997-01-30 | 1998-06-30 | Sony Corporation | Semiconductor package |
USD396846S (en) | 1997-04-16 | 1998-08-11 | Matsushita Electronics Corporation | Semiconductor device |
USD471166S1 (en) | 2001-04-06 | 2003-03-04 | Kabushiki Kaisha Toshiba | Light emitting semiconductor device |
US20060068301A1 (en) | 2003-04-16 | 2006-03-30 | Nikon Corporation | Pattern decision method and system, mask manufacturing method, image-forming performance adjusting method, exposure method and apparatus, program, and information recording medium |
USD510912S1 (en) | 2003-09-15 | 2005-10-25 | Nichia Corporation | Light emitting diode |
USD505397S1 (en) | 2003-09-15 | 2005-05-24 | Nichia Corporation | Light emitting diode |
US20060163705A1 (en) * | 2005-01-21 | 2006-07-27 | Toshimi Kamikawa | Surface mount semiconductor device |
US20100015537A1 (en) | 2005-10-25 | 2010-01-21 | Nuflare Technology, Inc. | Beam dose computing method and writing method and record carrier body and writing apparatus |
USD592617S1 (en) | 2005-12-09 | 2009-05-19 | Nichia Corporation | Light emitting diode |
USD598400S1 (en) | 2005-12-09 | 2009-08-18 | Nichia Corporation | Light emitting diode |
US20070145403A1 (en) * | 2005-12-27 | 2007-06-28 | Kabushiki Kaisha Toshiba | Luminescent device and method for manufacturing the same |
US20070187624A1 (en) | 2006-02-14 | 2007-08-16 | Nuflare Technology, Inc. | Multiple irradiation effect-corrected dose determination technique for charged particle beam lithography |
US7511290B2 (en) | 2006-02-21 | 2009-03-31 | Nuflare Technology, Inc. | Charged particle beam writing method and apparatus |
US20080011965A1 (en) | 2006-07-14 | 2008-01-17 | Nuflare Technology, Inc. | Charged-particle beam pattern writing method and apparatus and software program for use therein |
USD591697S1 (en) | 2006-08-09 | 2009-05-05 | Cree, Inc. | Lamp package |
USD593969S1 (en) | 2006-10-10 | 2009-06-09 | Tokyo Electron Limited | Processing chamber for manufacturing semiconductors |
US20080121620A1 (en) | 2006-11-24 | 2008-05-29 | Guo G X | Processing chamber |
US20090032739A1 (en) | 2007-07-30 | 2009-02-05 | Jeol Ltd. | Method and System for Charged-Particle Beam Lithography |
US20090242788A1 (en) | 2008-03-26 | 2009-10-01 | Fujifilm Corporation | Electron beam writing method, fine pattern writing system, method for manufacturing uneven pattern carrying substrate, and method for manufacturing magnetic disk medium |
US8049190B2 (en) | 2008-03-26 | 2011-11-01 | Fujifilm Corporation | Electron beam writing method, fine pattern writing system, method for manufacturing uneven pattern carrying substrate, and method for manufacturing magnetic disk medium |
USD602451S1 (en) | 2008-05-20 | 2009-10-20 | Koninklijke Philips Electronics N.V. | LED module |
US8481964B2 (en) | 2009-08-04 | 2013-07-09 | Nuflare Technology, Inc. | Charged particle beam drawing apparatus and method |
USD651184S1 (en) | 2009-10-26 | 2011-12-27 | Foxsemicon Integrated Technology, Inc | Light emitting diode |
USD715233S1 (en) * | 2009-10-26 | 2014-10-14 | Nichia Corporation | Light emitting diode |
USD690443S1 (en) | 2011-06-06 | 2013-09-24 | Citizen Electronics Co., Ltd. | Light-emitting diode |
USD710809S1 (en) * | 2012-01-12 | 2014-08-12 | Dominant Opto Technologies Sdn. Bhd. | Light emitting diode |
US9018602B2 (en) * | 2012-09-14 | 2015-04-28 | Nuflare Technology, Inc. | Charged particle beam writing apparatus and charged particle beam writing method |
US9236223B2 (en) * | 2013-01-18 | 2016-01-12 | Nuflare Technology, Inc. | Charged particle beam writing apparatus, method of adjusting beam incident angle to target object surface, and charged particle beam writing method |
USD722298S1 (en) * | 2013-07-17 | 2015-02-10 | Nuflare Technology, Inc. | Chamber of charged particle beam drawing apparatus |
Cited By (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
USD825500S1 (en) * | 2016-03-24 | 2018-08-14 | Hamamatsu Photonics K.K. | Optical semiconductor element |
USD858468S1 (en) * | 2018-03-16 | 2019-09-03 | Applied Materials, Inc. | Collimator for a physical vapor deposition chamber |
USD859333S1 (en) * | 2018-03-16 | 2019-09-10 | Applied Materials, Inc. | Collimator for a physical vapor deposition chamber |
USD937329S1 (en) | 2020-03-23 | 2021-11-30 | Applied Materials, Inc. | Sputter target for a physical vapor deposition chamber |
USD998575S1 (en) | 2020-04-07 | 2023-09-12 | Applied Materials, Inc. | Collimator for use in a physical vapor deposition (PVD) chamber |
USD1009816S1 (en) | 2021-08-29 | 2024-01-02 | Applied Materials, Inc. | Collimator for a physical vapor deposition chamber |
USD997111S1 (en) | 2021-12-15 | 2023-08-29 | Applied Materials, Inc. | Collimator for use in a physical vapor deposition (PVD) chamber |
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