TWD210127S - A collimator for use in a physical vapor deposition (pvd) chamber - Google Patents

A collimator for use in a physical vapor deposition (pvd) chamber Download PDF

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Publication number
TWD210127S
TWD210127S TW107305407F TW107305407F TWD210127S TW D210127 S TWD210127 S TW D210127S TW 107305407 F TW107305407 F TW 107305407F TW 107305407 F TW107305407 F TW 107305407F TW D210127 S TWD210127 S TW D210127S
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TW
Taiwan
Prior art keywords
pvd
collimator
chamber
vapor deposition
physical vapor
Prior art date
Application number
TW107305407F
Other languages
Chinese (zh)
Inventor
馬丁李 萊克
仲蘭蘭
張富宏
征 王
Original Assignee
美商應用材料股份有限公司
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Application filed by 美商應用材料股份有限公司 filed Critical 美商應用材料股份有限公司
Publication of TWD210127S publication Critical patent/TWD210127S/en

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Abstract

【物品用途】;本設計所請求係用於物理氣相沉積(PVD)腔室中的準直器。;【設計說明】;無。[Use of article]; This design is requested to be used as a collimator in a physical vapor deposition (PVD) chamber. ;[Design description];None.

Description

用於物理氣相沉積(PVD)腔室中的準直器 Collimator used in physical vapor deposition (PVD) chambers

本設計所請求係用於物理氣相沉積(PVD)腔室中的準直器。 The design requested is a collimator used in a physical vapor deposition (PVD) chamber.

TW107305407F 2018-03-16 2018-09-13 A collimator for use in a physical vapor deposition (pvd) chamber TWD210127S (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US29/640,788 USD859333S1 (en) 2018-03-16 2018-03-16 Collimator for a physical vapor deposition chamber
US29/640,788 2018-03-16

Publications (1)

Publication Number Publication Date
TWD210127S true TWD210127S (en) 2021-03-01

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TW107305407D01F TWD211969S (en) 2018-03-16 2018-09-13 A collimator for use in a physical vapor deposition (pvd) chamber
TW107305407F TWD210127S (en) 2018-03-16 2018-09-13 A collimator for use in a physical vapor deposition (pvd) chamber

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TW107305407D01F TWD211969S (en) 2018-03-16 2018-09-13 A collimator for use in a physical vapor deposition (pvd) chamber

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US (1) USD859333S1 (en)
TW (2) TWD211969S (en)

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USD1038901S1 (en) * 2022-01-12 2024-08-13 Applied Materials, Inc. Collimator for a physical vapor deposition chamber
USD1026054S1 (en) * 2022-04-22 2024-05-07 Applied Materials, Inc. Collimator for a physical vapor deposition (PVD) chamber
USD1025935S1 (en) * 2022-11-03 2024-05-07 Applied Materials, Inc. Collimator for a physical vapor deposition (PVD) chamber
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TWM267462U (en) 2000-07-17 2005-06-11 Dura Tek Inc Collimator for sputtering apparatus
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Publication number Publication date
USD859333S1 (en) 2019-09-10
TWD211969S (en) 2021-06-11

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