TWD217572S - Deposition ring for a semiconductor processing chamber - Google Patents

Deposition ring for a semiconductor processing chamber Download PDF

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Publication number
TWD217572S
TWD217572S TW110300413F TW110300413F TWD217572S TW D217572 S TWD217572 S TW D217572S TW 110300413 F TW110300413 F TW 110300413F TW 110300413 F TW110300413 F TW 110300413F TW D217572 S TWD217572 S TW D217572S
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TW
Taiwan
Prior art keywords
semiconductor processing
processing chamber
deposition ring
design
deposition
Prior art date
Application number
TW110300413F
Other languages
Chinese (zh)
Inventor
基倫古莫妮拉珊卓拉 沙芬戴亞
宋佼
大衛 鞏特爾
伊蓮娜Ｈ 維索卡
智東 詹
Original Assignee
美商應用材料股份有限公司
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
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Publication date
Application filed by 美商應用材料股份有限公司 filed Critical 美商應用材料股份有限公司
Publication of TWD217572S publication Critical patent/TWD217572S/en

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Abstract

【物品用途】;本設計所請求係用於半導體處理腔室的沉積環。;【設計說明】;無。【Use of article】;This design is requested to be used in a deposition ring for semiconductor processing chambers. ;[Design description];None.

Description

用於半導體處理腔室的沉積環 Deposition Rings for Semiconductor Processing Chambers

本設計所請求係用於半導體處理腔室的沉積環。 The design claims are for a deposition ring for a semiconductor processing chamber.

TW110300413F 2020-07-31 2021-01-25 Deposition ring for a semiconductor processing chamber TWD217572S (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US29/744,882 USD933726S1 (en) 2020-07-31 2020-07-31 Deposition ring for a semiconductor processing chamber
US29/744,882 2020-07-31

Publications (1)

Publication Number Publication Date
TWD217572S true TWD217572S (en) 2022-03-11

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ID=78069701

Family Applications (2)

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TW110304099F TWD217686S (en) 2020-07-31 2021-01-25 Deposition ring for a semiconductor processing chamber
TW110300413F TWD217572S (en) 2020-07-31 2021-01-25 Deposition ring for a semiconductor processing chamber

Family Applications Before (1)

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TW110304099F TWD217686S (en) 2020-07-31 2021-01-25 Deposition ring for a semiconductor processing chamber

Country Status (3)

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US (1) USD933726S1 (en)
JP (2) JP1704604S (en)
TW (2) TWD217686S (en)

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USD1006768S1 (en) * 2021-01-07 2023-12-05 Solaero Technologies Corp. Semiconductor wafer for mosaic solar cell fabrication
USD1007449S1 (en) 2021-05-07 2023-12-12 Applied Materials, Inc. Target profile for a physical vapor deposition chamber target
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Patent Citations (1)

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Publication number Priority date Publication date Assignee Title
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Also Published As

Publication number Publication date
JP1708687S (en) 2022-03-01
TWD217686S (en) 2022-03-11
JP1704604S (en) 2022-01-13
USD933726S1 (en) 2021-10-19

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