JP1546800S - - Google Patents

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Publication number
JP1546800S
JP1546800S JPD2015-13037F JP2015013037F JP1546800S JP 1546800 S JP1546800 S JP 1546800S JP 2015013037 F JP2015013037 F JP 2015013037F JP 1546800 S JP1546800 S JP 1546800S
Authority
JP
Japan
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Active
Application number
JPD2015-13037F
Other languages
Japanese (ja)
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Priority to JPD2015-13037F priority Critical patent/JP1546800S/ja
Priority to TW104305550F priority patent/TWD175854S/en
Priority to US29/544,070 priority patent/USD770992S1/en
Application granted granted Critical
Publication of JP1546800S publication Critical patent/JP1546800S/ja
Active legal-status Critical Current
Anticipated expiration legal-status Critical

Links

JPD2015-13037F 2015-06-12 2015-06-12 Active JP1546800S (en)

Priority Applications (3)

Application Number Priority Date Filing Date Title
JPD2015-13037F JP1546800S (en) 2015-06-12 2015-06-12
TW104305550F TWD175854S (en) 2015-06-12 2015-10-06 Protective rings for plasma processing equipment
US29/544,070 USD770992S1 (en) 2015-06-12 2015-10-30 Electrode cover for a plasma processing apparatus

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JPD2015-13037F JP1546800S (en) 2015-06-12 2015-06-12

Publications (1)

Publication Number Publication Date
JP1546800S true JP1546800S (en) 2016-03-28

Family

ID=55539624

Family Applications (1)

Application Number Title Priority Date Filing Date
JPD2015-13037F Active JP1546800S (en) 2015-06-12 2015-06-12

Country Status (3)

Country Link
US (1) USD770992S1 (en)
JP (1) JP1546800S (en)
TW (1) TWD175854S (en)

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USD877101S1 (en) 2018-03-09 2020-03-03 Applied Materials, Inc. Target profile for a physical vapor deposition chamber target
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JP1642983S (en) 2018-07-25 2019-10-07
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USD891382S1 (en) * 2019-02-08 2020-07-28 Applied Materials, Inc. Process shield for a substrate processing chamber
USD904305S1 (en) * 2019-02-25 2020-12-08 Petram Technologies, Inc. Electrode cage for a plasma blasting probe
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USD920521S1 (en) 2019-05-08 2021-05-25 Reza Jalinous Double coil
USD970020S1 (en) 2019-05-09 2022-11-15 Reza Jalinous Double coil
USD926996S1 (en) 2019-05-14 2021-08-03 Reza Jalinous Coil
USD1010135S1 (en) 2019-05-20 2024-01-02 Reza Jalinous Coil
USD979080S1 (en) 2019-06-27 2023-02-21 Reza Jalinous MRI tower coil stand
USD908645S1 (en) 2019-08-26 2021-01-26 Applied Materials, Inc. Sputtering target for a physical vapor deposition chamber
USD931241S1 (en) * 2019-08-28 2021-09-21 Applied Materials, Inc. Lower shield for a substrate processing chamber
JP1659287S (en) * 2019-10-18 2020-05-11
USD979524S1 (en) * 2020-03-19 2023-02-28 Applied Materials, Inc. Confinement liner for a substrate processing chamber
USD943539S1 (en) * 2020-03-19 2022-02-15 Applied Materials, Inc. Confinement plate for a substrate processing chamber
USD934315S1 (en) * 2020-03-20 2021-10-26 Applied Materials, Inc. Deposition ring for a substrate processing chamber
USD937329S1 (en) 2020-03-23 2021-11-30 Applied Materials, Inc. Sputter target for a physical vapor deposition chamber
USD980394S1 (en) * 2020-04-01 2023-03-07 Watermann Polyworks Gmbh Sealing apparatus
USD933726S1 (en) * 2020-07-31 2021-10-19 Applied Materials, Inc. Deposition ring for a semiconductor processing chamber
US11581166B2 (en) 2020-07-31 2023-02-14 Applied Materials, Inc. Low profile deposition ring for enhanced life
USD922589S1 (en) 2020-09-08 2021-06-15 Reza Jalinous Coil
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USD940765S1 (en) 2020-12-02 2022-01-11 Applied Materials, Inc. Target profile for a physical vapor deposition chamber target
USD1006768S1 (en) * 2021-01-07 2023-12-05 Solaero Technologies Corp. Semiconductor wafer for mosaic solar cell fabrication
USD1007449S1 (en) 2021-05-07 2023-12-12 Applied Materials, Inc. Target profile for a physical vapor deposition chamber target
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USD559994S1 (en) 2005-03-30 2008-01-15 Tokyo Electron Limited Cover ring
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USD709538S1 (en) 2011-09-30 2014-07-22 Tokyo Electron Limited Focusing ring
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USD709536S1 (en) 2011-09-30 2014-07-22 Tokyo Electron Limited Focusing ring
USD709539S1 (en) 2011-09-30 2014-07-22 Tokyo Electron Limited Focusing ring

Also Published As

Publication number Publication date
USD770992S1 (en) 2016-11-08
TWD175854S (en) 2016-05-21

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