USD981459S1 - Retaining ring for substrate - Google Patents
Retaining ring for substrate Download PDFInfo
- Publication number
- USD981459S1 USD981459S1 US35/355,131 US35513172F USD981459S US D981459 S1 USD981459 S1 US D981459S1 US 35513172 F US35513172 F US 35513172F US D981459 S USD981459 S US D981459S
- Authority
- US
- United States
- Prior art keywords
- substrate
- retaining ring
- view
- ring
- cross sectional
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
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Description
1. Retaining ring for substrate
This article is used to hold a substrate in a ring and polish one side of the substrate during the polishing process of wafers and other substrates in the manufacture of semiconductors and other products; the rear view, right side view, and left side view are all represented identically to the front view.
Claims (1)
- The ornamental design for a retainer ring for substrate, as shown and described.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US35/355,131 USD981459S1 (en) | 2021-06-16 | 2021-06-16 | Retaining ring for substrate |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US35/355,131 USD981459S1 (en) | 2021-06-16 | 2021-06-16 | Retaining ring for substrate |
Publications (1)
Publication Number | Publication Date |
---|---|
USD981459S1 true USD981459S1 (en) | 2023-03-21 |
Family
ID=85557265
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
US35/355,131 Active USD981459S1 (en) | 2021-06-16 | 2021-06-16 | Retaining ring for substrate |
Country Status (1)
Country | Link |
---|---|
US (1) | USD981459S1 (en) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
USD1008268S1 (en) * | 2021-06-22 | 2023-12-19 | Wiretronic Ab | Scanning arrangement |
Citations (17)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
USD638951S1 (en) * | 2009-11-13 | 2011-05-31 | 3M Innovative Properties Company | Sample processing disk cover |
USD667561S1 (en) * | 2009-11-13 | 2012-09-18 | 3M Innovative Properties Company | Sample processing disk cover |
USD699200S1 (en) * | 2011-09-30 | 2014-02-11 | Tokyo Electron Limited | Electrode member for a plasma processing apparatus |
USD703160S1 (en) * | 2011-01-27 | 2014-04-22 | Hitachi High-Technologies Corporation | Grounded electrode for a plasma processing apparatus |
USD709536S1 (en) * | 2011-09-30 | 2014-07-22 | Tokyo Electron Limited | Focusing ring |
USD766849S1 (en) * | 2013-05-15 | 2016-09-20 | Ebara Corporation | Substrate retaining ring |
USD770992S1 (en) * | 2015-06-12 | 2016-11-08 | Hitachi High-Technologies Corporation | Electrode cover for a plasma processing apparatus |
JP1494712S (en) | 2013-05-15 | 2017-04-03 | ||
USD794585S1 (en) * | 2015-10-06 | 2017-08-15 | Ebara Corporation | Retainer ring for substrate |
USD799437S1 (en) * | 2015-08-25 | 2017-10-10 | Ebara Corporation | Substrate retaining ring |
USD845568S1 (en) * | 2015-05-14 | 2019-04-09 | Ebara Corporation | Pad holder for polishing apparatus |
USD876504S1 (en) * | 2017-04-03 | 2020-02-25 | Asm Ip Holding B.V. | Exhaust flow control ring for semiconductor deposition apparatus |
USD922229S1 (en) * | 2019-06-05 | 2021-06-15 | Asm Ip Holding B.V. | Device for controlling a temperature of a gas supply unit |
USD940670S1 (en) * | 2019-09-26 | 2022-01-11 | Willbe S&T Co., Ltd. | Retainer ring for chemical mechanical polishing device |
USD943539S1 (en) * | 2020-03-19 | 2022-02-15 | Applied Materials, Inc. | Confinement plate for a substrate processing chamber |
US11390945B2 (en) * | 2019-07-03 | 2022-07-19 | Asm Ip Holding B.V. | Temperature control assembly for substrate processing apparatus and method of using same |
US11396082B2 (en) * | 2017-11-13 | 2022-07-26 | Ebara Corporation | Substrate holding device and substrate processing apparatus including the same |
-
2021
- 2021-06-16 US US35/355,131 patent/USD981459S1/en active Active
Patent Citations (18)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
USD638951S1 (en) * | 2009-11-13 | 2011-05-31 | 3M Innovative Properties Company | Sample processing disk cover |
USD667561S1 (en) * | 2009-11-13 | 2012-09-18 | 3M Innovative Properties Company | Sample processing disk cover |
USD703160S1 (en) * | 2011-01-27 | 2014-04-22 | Hitachi High-Technologies Corporation | Grounded electrode for a plasma processing apparatus |
USD699200S1 (en) * | 2011-09-30 | 2014-02-11 | Tokyo Electron Limited | Electrode member for a plasma processing apparatus |
USD709536S1 (en) * | 2011-09-30 | 2014-07-22 | Tokyo Electron Limited | Focusing ring |
USD793976S1 (en) * | 2013-05-15 | 2017-08-08 | Ebara Corporation | Substrate retaining ring |
JP1494712S (en) | 2013-05-15 | 2017-04-03 | ||
USD766849S1 (en) * | 2013-05-15 | 2016-09-20 | Ebara Corporation | Substrate retaining ring |
USD845568S1 (en) * | 2015-05-14 | 2019-04-09 | Ebara Corporation | Pad holder for polishing apparatus |
USD770992S1 (en) * | 2015-06-12 | 2016-11-08 | Hitachi High-Technologies Corporation | Electrode cover for a plasma processing apparatus |
USD799437S1 (en) * | 2015-08-25 | 2017-10-10 | Ebara Corporation | Substrate retaining ring |
USD794585S1 (en) * | 2015-10-06 | 2017-08-15 | Ebara Corporation | Retainer ring for substrate |
USD876504S1 (en) * | 2017-04-03 | 2020-02-25 | Asm Ip Holding B.V. | Exhaust flow control ring for semiconductor deposition apparatus |
US11396082B2 (en) * | 2017-11-13 | 2022-07-26 | Ebara Corporation | Substrate holding device and substrate processing apparatus including the same |
USD922229S1 (en) * | 2019-06-05 | 2021-06-15 | Asm Ip Holding B.V. | Device for controlling a temperature of a gas supply unit |
US11390945B2 (en) * | 2019-07-03 | 2022-07-19 | Asm Ip Holding B.V. | Temperature control assembly for substrate processing apparatus and method of using same |
USD940670S1 (en) * | 2019-09-26 | 2022-01-11 | Willbe S&T Co., Ltd. | Retainer ring for chemical mechanical polishing device |
USD943539S1 (en) * | 2020-03-19 | 2022-02-15 | Applied Materials, Inc. | Confinement plate for a substrate processing chamber |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
USD1008268S1 (en) * | 2021-06-22 | 2023-12-19 | Wiretronic Ab | Scanning arrangement |
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