USD845568S1 - Pad holder for polishing apparatus - Google Patents

Pad holder for polishing apparatus Download PDF

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Publication number
USD845568S1
USD845568S1 US29/545,532 US201529545532F USD845568S US D845568 S1 USD845568 S1 US D845568S1 US 201529545532 F US201529545532 F US 201529545532F US D845568 S USD845568 S US D845568S
Authority
US
United States
Prior art keywords
polishing apparatus
pad holder
view
holder
pad
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Active
Application number
US29/545,532
Inventor
Yu Ishii
Kenya Ito
Hirohiko Ueda
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Ebara Corp
Original Assignee
Ebara Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority to JPD2015-10517F priority Critical patent/JP1544543S/ja
Priority to JP2015-010517 priority
Application filed by Ebara Corp filed Critical Ebara Corp
Assigned to EBARA CORPORATION reassignment EBARA CORPORATION ASSIGNMENT OF ASSIGNORS INTEREST (SEE DOCUMENT FOR DETAILS). Assignors: ISHII, YU, UEDA, HIROHIKO, ITO, KENYA
Application granted granted Critical
Publication of USD845568S1 publication Critical patent/USD845568S1/en
Application status is Active legal-status Critical
Anticipated expiration legal-status Critical

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Description

FIG. 1 is a first perspective view, observed from top of a pad holder for polishing apparatus showing our new design;

FIG. 2 is a second perspective view, observed from bottom thereof;

FIG. 3 is a top view thereof;

FIG. 4 is a bottom view thereof;

FIG. 5 is a front view thereof;

FIG. 6 is a rear view thereof;

FIG. 7 is a right side view thereof; and,

FIG. 8 is a left side view thereof.

Claims (1)

    CLAIM
  1. The ornamental design for a pad holder for polishing apparatus, as shown and described.
US29/545,532 2015-05-14 2015-11-13 Pad holder for polishing apparatus Active USD845568S1 (en)

Priority Applications (2)

Application Number Priority Date Filing Date Title
JPD2015-10517F JP1544543S (en) 2015-05-14 2015-05-14
JP2015-010517 2015-05-14

Publications (1)

Publication Number Publication Date
USD845568S1 true USD845568S1 (en) 2019-04-09

Family

ID=55411950

Family Applications (1)

Application Number Title Priority Date Filing Date
US29/545,532 Active USD845568S1 (en) 2015-05-14 2015-11-13 Pad holder for polishing apparatus

Country Status (2)

Country Link
US (1) USD845568S1 (en)
JP (1) JP1544543S (en)

Citations (13)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4809385A (en) * 1987-12-14 1989-03-07 Bogue Larry D Floor polishing apparatus
USD583603S1 (en) * 2007-11-20 2008-12-30 Turnils Ab Core for slat material for venetian blinds
US8506363B2 (en) * 2008-12-25 2013-08-13 Ebara Corporation Substrate holder and substrate holding method
USD766849S1 (en) * 2013-05-15 2016-09-20 Ebara Corporation Substrate retaining ring
USD789478S1 (en) * 2015-10-13 2017-06-13 Mcp Ip, Llc Archery bow rotatable member
US9708724B2 (en) * 2014-02-25 2017-07-18 Ebara Corporation Anode unit and plating apparatus having such anode unit
USD794089S1 (en) * 2015-06-05 2017-08-08 Mtd Products Inc Wheel
USD794585S1 (en) * 2015-10-06 2017-08-15 Ebara Corporation Retainer ring for substrate
US20170245721A1 (en) * 2017-05-14 2017-08-31 Gary Rudolph System, apparatus and method for delivering fluid to and from the bottom center of a floor-operation pad on a rotary-motion flooring machine during operation
USD799037S1 (en) * 2015-10-27 2017-10-03 OrthoGrid Systems, Inc Grid positioning device
USD799437S1 (en) * 2015-08-25 2017-10-10 Ebara Corporation Substrate retaining ring
US9842783B2 (en) * 2011-10-26 2017-12-12 Ebara Corporation Polishing method and polishing apparatus
US9919403B2 (en) * 2013-07-01 2018-03-20 Ebara Corporation Polishing apparatus, polishing pad positioning method, and polishing pad

Patent Citations (14)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4809385A (en) * 1987-12-14 1989-03-07 Bogue Larry D Floor polishing apparatus
USD583603S1 (en) * 2007-11-20 2008-12-30 Turnils Ab Core for slat material for venetian blinds
US8506363B2 (en) * 2008-12-25 2013-08-13 Ebara Corporation Substrate holder and substrate holding method
US9842783B2 (en) * 2011-10-26 2017-12-12 Ebara Corporation Polishing method and polishing apparatus
USD793976S1 (en) * 2013-05-15 2017-08-08 Ebara Corporation Substrate retaining ring
USD766849S1 (en) * 2013-05-15 2016-09-20 Ebara Corporation Substrate retaining ring
US9919403B2 (en) * 2013-07-01 2018-03-20 Ebara Corporation Polishing apparatus, polishing pad positioning method, and polishing pad
US9708724B2 (en) * 2014-02-25 2017-07-18 Ebara Corporation Anode unit and plating apparatus having such anode unit
USD794089S1 (en) * 2015-06-05 2017-08-08 Mtd Products Inc Wheel
USD799437S1 (en) * 2015-08-25 2017-10-10 Ebara Corporation Substrate retaining ring
USD794585S1 (en) * 2015-10-06 2017-08-15 Ebara Corporation Retainer ring for substrate
USD789478S1 (en) * 2015-10-13 2017-06-13 Mcp Ip, Llc Archery bow rotatable member
USD799037S1 (en) * 2015-10-27 2017-10-03 OrthoGrid Systems, Inc Grid positioning device
US20170245721A1 (en) * 2017-05-14 2017-08-31 Gary Rudolph System, apparatus and method for delivering fluid to and from the bottom center of a floor-operation pad on a rotary-motion flooring machine during operation

Also Published As

Publication number Publication date
JP1544543S (en) 2019-02-18

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