USD794585S1 - Retainer ring for substrate - Google Patents

Retainer ring for substrate Download PDF

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Publication number
USD794585S1
USD794585S1 US29/560,291 US201629560291F USD794585S US D794585 S1 USD794585 S1 US D794585S1 US 201629560291 F US201629560291 F US 201629560291F US D794585 S USD794585 S US D794585S
Authority
US
United States
Prior art keywords
retainer ring
substrate
view
taken along
line
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Active
Application number
US29/560,291
Inventor
Osamu Nabeya
Hozumi Yasuda
Makoto Fukushima
Keisuke Namiki
Shingo Togashi
Satoru Yamaki
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Ebara Corp
Original Assignee
Ebara Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Ebara Corp filed Critical Ebara Corp
Assigned to EBARA CORPORATION reassignment EBARA CORPORATION ASSIGNMENT OF ASSIGNORS INTEREST (SEE DOCUMENT FOR DETAILS). Assignors: NAMIKI, KEISUKE, YAMAKI, SATORU, FUKUSHIMA, MAKOTO, NABEYA, OSAMU, TOGASHI, SHINGO, YASUDA, HOZUMI
Application granted granted Critical
Publication of USD794585S1 publication Critical patent/USD794585S1/en
Active legal-status Critical Current
Anticipated expiration legal-status Critical

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Description

FIG. 1 is a top perspective view of a retainer ring for substrate showing our new design;
FIG. 2 is a bottom perspective view thereof;
FIG. 3 is a top view thereof;
FIG. 4 is a bottom view thereof;
FIG. 5 is a front view thereof;
FIG. 6 is a rear view thereof;
FIG. 7 is a right side view thereof;
FIG. 8 is a left side view thereof;
FIG. 9 is an enlarged cross-section view thereof, taken along the line 9-9 of part 9 of FIG. 3;
FIG. 10 is an enlarged cross-section view thereof, taken along the line 10-10 of part 10 of FIG. 3;
FIG. 11 is an enlarged cross-section view thereof, taken along the line 11-11 of part 11 of FIG. 3;
FIG. 12 is an enlarged perspective view thereof, observed from an inside of the retainer ring and taken along the line 12,13-12,13 of FIG. 4; and,
FIG. 13 is an enlarged perspective view thereof, observed from an outside of the retainer ring and taken along the line 12,13-12,13 of FIG. 4.
The broken lines depict environmental subject matter only and form no part of the claimed design.

Claims (1)

    CLAIM
  1. The ornamental design for a retainer ring for substrate, as shown and described.
US29/560,291 2015-10-06 2016-04-05 Retainer ring for substrate Active USD794585S1 (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JPD2015-21985F JP1556433S (en) 2015-10-06 2015-10-06
JP2015-021985 2015-10-06

Publications (1)

Publication Number Publication Date
USD794585S1 true USD794585S1 (en) 2017-08-15

Family

ID=56612403

Family Applications (1)

Application Number Title Priority Date Filing Date
US29/560,291 Active USD794585S1 (en) 2015-10-06 2016-04-05 Retainer ring for substrate

Country Status (3)

Country Link
US (1) USD794585S1 (en)
JP (1) JP1556433S (en)
TW (1) TWD179672S (en)

Cited By (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
USD836573S1 (en) * 2017-01-31 2018-12-25 Hitachi High-Technologies Corporation Ring for a plasma processing apparatus
USD845568S1 (en) * 2015-05-14 2019-04-09 Ebara Corporation Pad holder for polishing apparatus
USD918848S1 (en) * 2019-07-18 2021-05-11 Kokusai Electric Corporation Retainer of ceiling heater for semiconductor fabrication apparatus
USD940670S1 (en) * 2019-09-26 2022-01-11 Willbe S&T Co., Ltd. Retainer ring for chemical mechanical polishing device
USD947789S1 (en) * 2020-05-22 2022-04-05 Hosiden Corporation Electric connection terminal
USD962183S1 (en) * 2019-07-11 2022-08-30 Kokusai Electric Corporation Retainer plate of top heater for wafer processing furnace
USD962184S1 (en) * 2019-07-11 2022-08-30 Kokusai Electric Corporation Retainer plate of top heater for wafer processing furnace
USD981459S1 (en) * 2021-06-16 2023-03-21 Ebara Corporation Retaining ring for substrate

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
USD931241S1 (en) 2019-08-28 2021-09-21 Applied Materials, Inc. Lower shield for a substrate processing chamber

Citations (22)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5944593A (en) * 1997-09-01 1999-08-31 United Microelectronics Corp. Retainer ring for polishing head of chemical-mechanical polish machines
US6186880B1 (en) * 1999-09-29 2001-02-13 Semiconductor Equipment Technology Recyclable retaining ring assembly for a chemical mechanical polishing apparatus
US6224472B1 (en) * 1999-06-24 2001-05-01 Samsung Austin Semiconductor, L.P. Retaining ring for chemical mechanical polishing
US6602116B1 (en) * 1997-12-30 2003-08-05 Applied Materials Inc. Substrate retaining ring
US6869335B2 (en) * 2002-07-08 2005-03-22 Micron Technology, Inc. Retaining rings, planarizing apparatuses including retaining rings, and methods for planarizing micro-device workpieces
US7029386B2 (en) * 2004-06-10 2006-04-18 R & B Plastics, Inc. Retaining ring assembly for use in chemical mechanical polishing
US7029375B2 (en) * 2004-08-31 2006-04-18 Tech Semiconductor Pte. Ltd. Retaining ring structure for edge control during chemical-mechanical polishing
US7186171B2 (en) * 2005-04-22 2007-03-06 Applied Materials, Inc. Composite retaining ring
USD557226S1 (en) * 2005-08-25 2007-12-11 Hitachi High-Technologies Corporation Electrode cover for a plasma processing apparatus
USD559993S1 (en) * 2005-03-30 2008-01-15 Tokyo Electron Limited Cover ring
US7326105B2 (en) * 2005-08-31 2008-02-05 Micron Technology, Inc. Retaining rings, and associated planarizing apparatuses, and related methods for planarizing micro-device workpieces
US7344434B2 (en) * 2003-11-13 2008-03-18 Applied Materials, Inc. Retaining ring with shaped surface
US7459057B2 (en) * 1998-05-15 2008-12-02 Applied Materials, Inc. Substrate retainer
US7819723B2 (en) * 2007-03-22 2010-10-26 Nec Electronics Corporation Retainer ring and polishing machine
US8298046B2 (en) * 2009-10-21 2012-10-30 SPM Technology, Inc. Retaining rings
US8517803B2 (en) * 2009-09-16 2013-08-27 SPM Technology, Inc. Retaining ring for chemical mechanical polishing
USD697038S1 (en) * 2011-09-20 2014-01-07 Tokyo Electron Limited Baffle plate
USD699200S1 (en) * 2011-09-30 2014-02-11 Tokyo Electron Limited Electrode member for a plasma processing apparatus
CN302820523S (en) 2014-05-14
USD729730S1 (en) * 2013-06-06 2015-05-19 Jon Simon Gillespie-Brown Power charging ring
USD734377S1 (en) * 2013-03-28 2015-07-14 Hirata Corporation Top cover of a load lock chamber
USD766849S1 (en) * 2013-05-15 2016-09-20 Ebara Corporation Substrate retaining ring

Patent Citations (22)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN302820523S (en) 2014-05-14
US5944593A (en) * 1997-09-01 1999-08-31 United Microelectronics Corp. Retainer ring for polishing head of chemical-mechanical polish machines
US6602116B1 (en) * 1997-12-30 2003-08-05 Applied Materials Inc. Substrate retaining ring
US7459057B2 (en) * 1998-05-15 2008-12-02 Applied Materials, Inc. Substrate retainer
US6224472B1 (en) * 1999-06-24 2001-05-01 Samsung Austin Semiconductor, L.P. Retaining ring for chemical mechanical polishing
US6186880B1 (en) * 1999-09-29 2001-02-13 Semiconductor Equipment Technology Recyclable retaining ring assembly for a chemical mechanical polishing apparatus
US6869335B2 (en) * 2002-07-08 2005-03-22 Micron Technology, Inc. Retaining rings, planarizing apparatuses including retaining rings, and methods for planarizing micro-device workpieces
US7344434B2 (en) * 2003-11-13 2008-03-18 Applied Materials, Inc. Retaining ring with shaped surface
US7029386B2 (en) * 2004-06-10 2006-04-18 R & B Plastics, Inc. Retaining ring assembly for use in chemical mechanical polishing
US7029375B2 (en) * 2004-08-31 2006-04-18 Tech Semiconductor Pte. Ltd. Retaining ring structure for edge control during chemical-mechanical polishing
USD559993S1 (en) * 2005-03-30 2008-01-15 Tokyo Electron Limited Cover ring
US7186171B2 (en) * 2005-04-22 2007-03-06 Applied Materials, Inc. Composite retaining ring
USD557226S1 (en) * 2005-08-25 2007-12-11 Hitachi High-Technologies Corporation Electrode cover for a plasma processing apparatus
US7326105B2 (en) * 2005-08-31 2008-02-05 Micron Technology, Inc. Retaining rings, and associated planarizing apparatuses, and related methods for planarizing micro-device workpieces
US7819723B2 (en) * 2007-03-22 2010-10-26 Nec Electronics Corporation Retainer ring and polishing machine
US8517803B2 (en) * 2009-09-16 2013-08-27 SPM Technology, Inc. Retaining ring for chemical mechanical polishing
US8298046B2 (en) * 2009-10-21 2012-10-30 SPM Technology, Inc. Retaining rings
USD697038S1 (en) * 2011-09-20 2014-01-07 Tokyo Electron Limited Baffle plate
USD699200S1 (en) * 2011-09-30 2014-02-11 Tokyo Electron Limited Electrode member for a plasma processing apparatus
USD734377S1 (en) * 2013-03-28 2015-07-14 Hirata Corporation Top cover of a load lock chamber
USD766849S1 (en) * 2013-05-15 2016-09-20 Ebara Corporation Substrate retaining ring
USD729730S1 (en) * 2013-06-06 2015-05-19 Jon Simon Gillespie-Brown Power charging ring

Cited By (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
USD845568S1 (en) * 2015-05-14 2019-04-09 Ebara Corporation Pad holder for polishing apparatus
USD836573S1 (en) * 2017-01-31 2018-12-25 Hitachi High-Technologies Corporation Ring for a plasma processing apparatus
USD962183S1 (en) * 2019-07-11 2022-08-30 Kokusai Electric Corporation Retainer plate of top heater for wafer processing furnace
USD962184S1 (en) * 2019-07-11 2022-08-30 Kokusai Electric Corporation Retainer plate of top heater for wafer processing furnace
USD918848S1 (en) * 2019-07-18 2021-05-11 Kokusai Electric Corporation Retainer of ceiling heater for semiconductor fabrication apparatus
USD940670S1 (en) * 2019-09-26 2022-01-11 Willbe S&T Co., Ltd. Retainer ring for chemical mechanical polishing device
USD947789S1 (en) * 2020-05-22 2022-04-05 Hosiden Corporation Electric connection terminal
USD981459S1 (en) * 2021-06-16 2023-03-21 Ebara Corporation Retaining ring for substrate

Also Published As

Publication number Publication date
JP1556433S (en) 2016-08-15
TWD179672S (en) 2016-11-21

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