USD933725S1 - Deposition ring for a substrate processing chamber - Google Patents

Deposition ring for a substrate processing chamber Download PDF

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Publication number
USD933725S1
USD933725S1 US29/679,746 US201929679746F USD933725S US D933725 S1 USD933725 S1 US D933725S1 US 201929679746 F US201929679746 F US 201929679746F US D933725 S USD933725 S US D933725S
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Prior art keywords
processing chamber
substrate processing
deposition ring
view
deposition
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US29/679,746
Inventor
Manjunatha P. Koppa
Aravind KAMATH
Cheng-Hsiung Matt Tsai
Manjunath H. Venkataswamappa
Steven V. Sansoni
David Or
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Applied Materials Inc
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Applied Materials Inc
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Priority to US29/679,746 priority Critical patent/USD933725S1/en
Assigned to APPLIED MATERIALS, INC. reassignment APPLIED MATERIALS, INC. ASSIGNMENT OF ASSIGNORS INTEREST (SEE DOCUMENT FOR DETAILS). Assignors: KAMATH, ARAVIND, TSAI, CHENG-HSIUNG MATT, H V, MANJUNATH, KOPPA, MANJUNATHA P., OR, DAVID, SANSONI, STEVEN V.
Priority to TW108304729F priority patent/TWD210892S/en
Priority to TW108304729D01F priority patent/TWD210893S/en
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FIG. 1 is an enlarged top isometric view of a deposition ring for a substrate processing chamber, according to the first embodiment of the novel design.
FIG. 2 is a top plan view thereof.
FIG. 3 is a bottom plan view thereof.
FIG. 4 is a front elevation view thereof.
FIG. 5 is a back elevation view thereof.
FIG. 6 is a left side elevation view thereof.
FIG. 7 is a right side elevation view thereof.
FIG. 8 is a cross-sectional view taken along line 8-8 in FIG. 2, enlarged for clarity.
FIG. 9 is an enlarged top isometric view of a deposition ring for a substrate processing chamber, according to the second embodiment of the novel design.
FIG. 10 is a top plan view thereof.
FIG. 11 is a bottom plan view thereof.
FIG. 12 is a front elevation view thereof.
FIG. 13 is a back elevation view thereof.
FIG. 14 is a left side elevation view thereof.
FIG. 15 is a right side elevation view thereof; and,
FIG. 16 is a cross-sectional view taken along line 16-16 in FIG. 10, enlarged for clarity.
The dashed lines in FIGS. 1-8 represent unclaimed environment forming no part of the claimed design.

Claims (1)

    CLAIM
  1. The ornamental design for a deposition ring for a substrate processing chamber, as shown and described.
US29/679,746 2019-02-08 2019-02-08 Deposition ring for a substrate processing chamber Active USD933725S1 (en)

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US29/679,746 USD933725S1 (en) 2019-02-08 2019-02-08 Deposition ring for a substrate processing chamber
TW108304729F TWD210892S (en) 2019-02-08 2019-08-08 Deposition ring for a substrate processing chamber
TW108304729D01F TWD210893S (en) 2019-02-08 2019-08-08 Deposition ring for a substrate processing chamber

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US29/679,746 USD933725S1 (en) 2019-02-08 2019-02-08 Deposition ring for a substrate processing chamber

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USD933725S1 true USD933725S1 (en) 2021-10-19

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Cited By (11)

* Cited by examiner, † Cited by third party
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USD954986S1 (en) * 2019-10-18 2022-06-14 Hitachi High-Tech Corporation Electrode cover for a plasma processing device
USD966357S1 (en) * 2020-12-02 2022-10-11 Applied Materials, Inc. Target profile for a physical vapor deposition chamber target
USD970566S1 (en) * 2020-03-23 2022-11-22 Applied Materials, Inc. Sputter target for a physical vapor deposition chamber
USD973609S1 (en) * 2020-04-22 2022-12-27 Applied Materials, Inc. Upper shield with showerhead for a process chamber
USD983297S1 (en) * 2021-02-03 2023-04-11 Bradley R. Mason Ring-shaped golf alignment stick stand
USD983915S1 (en) * 2021-02-03 2023-04-18 Bradley R. Mason Flattened ring-shaped golf alignment stick stand
USD984571S1 (en) * 2021-02-03 2023-04-25 Bradley R. Mason Disc-shaped golf alignment stick stand
USD989012S1 (en) * 2020-09-17 2023-06-13 Ebara Corporation Elastic membrane
USD992615S1 (en) * 2018-12-07 2023-07-18 Tokyo Electron Limited Focus ring
USD1006768S1 (en) * 2021-01-07 2023-12-05 Solaero Technologies Corp. Semiconductor wafer for mosaic solar cell fabrication
USD1007449S1 (en) 2021-05-07 2023-12-12 Applied Materials, Inc. Target profile for a physical vapor deposition chamber target

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USD770992S1 (en) * 2015-06-12 2016-11-08 Hitachi High-Technologies Corporation Electrode cover for a plasma processing apparatus
US20170009367A1 (en) * 2015-07-09 2017-01-12 Applied Materials, Inc. Wafer electroplating chuck assembly
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USD796458S1 (en) * 2016-01-08 2017-09-05 Asm Ip Holding B.V. Gas flow control plate for semiconductor manufacturing apparatus
USD797067S1 (en) * 2015-04-21 2017-09-12 Applied Materials, Inc. Target profile for a physical vapor deposition chamber target
USD798248S1 (en) * 2015-06-18 2017-09-26 Applied Materials, Inc. Target profile for a physical vapor deposition chamber target
TWD186431S (en) 2017-04-03 2017-11-01 ＡＳＭ知識產權私人控股有&#x9 Exhaust flow control ring for semiconductor substrate deposition apparatus
USD801942S1 (en) * 2015-04-16 2017-11-07 Applied Materials, Inc. Target profile for a physical vapor deposition chamber target
TWD187432S (en) 2016-09-14 2017-12-21 日本華爾卡工業股份有限公&#x5 Composite sealing material
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USD810705S1 (en) * 2016-04-01 2018-02-20 Veeco Instruments Inc. Self-centering wafer carrier for chemical vapor deposition
USD819580S1 (en) * 2016-04-01 2018-06-05 Veeco Instruments, Inc. Self-centering wafer carrier for chemical vapor deposition
USD836572S1 (en) * 2016-09-30 2018-12-25 Applied Materials, Inc. Target profile for a physical vapor deposition chamber target
USD851613S1 (en) * 2017-10-05 2019-06-18 Applied Materials, Inc. Target profile for a physical vapor deposition chamber target
USD868124S1 (en) * 2017-12-11 2019-11-26 Applied Materials, Inc. Target profile for a physical vapor deposition chamber target
USD877101S1 (en) * 2018-03-09 2020-03-03 Applied Materials, Inc. Target profile for a physical vapor deposition chamber target
US20200090915A1 (en) * 2017-06-01 2020-03-19 Oerlikon Surface Solutions Ag, Pfäffikon Target assembly for safe and economic evaporation of brittle materials
USD888903S1 (en) * 2018-12-17 2020-06-30 Applied Materials, Inc. Deposition ring for physical vapor deposition chamber
USD891382S1 (en) * 2019-02-08 2020-07-28 Applied Materials, Inc. Process shield for a substrate processing chamber
USD908645S1 (en) * 2019-08-26 2021-01-26 Applied Materials, Inc. Sputtering target for a physical vapor deposition chamber
USD913979S1 (en) 2019-08-28 2021-03-23 Applied Materials, Inc. Inner shield for a substrate processing chamber
USD913980S1 (en) 2018-02-01 2021-03-23 Asm Ip Holding B.V. Gas supply plate for semiconductor manufacturing apparatus

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USD351450S (en) 1993-05-19 1994-10-11 Riteflite Pty. Limited Target for shooting
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Cited By (12)

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USD992615S1 (en) * 2018-12-07 2023-07-18 Tokyo Electron Limited Focus ring
USD954986S1 (en) * 2019-10-18 2022-06-14 Hitachi High-Tech Corporation Electrode cover for a plasma processing device
USD970566S1 (en) * 2020-03-23 2022-11-22 Applied Materials, Inc. Sputter target for a physical vapor deposition chamber
USD973609S1 (en) * 2020-04-22 2022-12-27 Applied Materials, Inc. Upper shield with showerhead for a process chamber
USD989012S1 (en) * 2020-09-17 2023-06-13 Ebara Corporation Elastic membrane
USD1021832S1 (en) 2020-09-17 2024-04-09 Ebara Corporation Elastic membrane
USD966357S1 (en) * 2020-12-02 2022-10-11 Applied Materials, Inc. Target profile for a physical vapor deposition chamber target
USD1006768S1 (en) * 2021-01-07 2023-12-05 Solaero Technologies Corp. Semiconductor wafer for mosaic solar cell fabrication
USD983297S1 (en) * 2021-02-03 2023-04-11 Bradley R. Mason Ring-shaped golf alignment stick stand
USD983915S1 (en) * 2021-02-03 2023-04-18 Bradley R. Mason Flattened ring-shaped golf alignment stick stand
USD984571S1 (en) * 2021-02-03 2023-04-25 Bradley R. Mason Disc-shaped golf alignment stick stand
USD1007449S1 (en) 2021-05-07 2023-12-12 Applied Materials, Inc. Target profile for a physical vapor deposition chamber target

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