USD902165S1 - Target profile for a physical vapor deposition chamber target - Google Patents
Target profile for a physical vapor deposition chamber target Download PDFInfo
- Publication number
- USD902165S1 USD902165S1 US29/726,094 US202029726094F USD902165S US D902165 S1 USD902165 S1 US D902165S1 US 202029726094 F US202029726094 F US 202029726094F US D902165 S USD902165 S US D902165S
- Authority
- US
- United States
- Prior art keywords
- target
- vapor deposition
- physical vapor
- deposition chamber
- profile
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
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Description
The dashed lines in FIGS. 1-9 represent unclaimed environment and form no part of the claimed design.
Claims (1)
- The ornamental design for a target profile for a physical vapor deposition chamber target, as shown and described.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US29/726,094 USD902165S1 (en) | 2018-03-09 | 2020-02-28 | Target profile for a physical vapor deposition chamber target |
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US29/639,953 USD877101S1 (en) | 2018-03-09 | 2018-03-09 | Target profile for a physical vapor deposition chamber target |
US29/726,094 USD902165S1 (en) | 2018-03-09 | 2020-02-28 | Target profile for a physical vapor deposition chamber target |
Related Parent Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
US29/639,953 Division USD877101S1 (en) | 2018-03-09 | 2018-03-09 | Target profile for a physical vapor deposition chamber target |
Publications (1)
Publication Number | Publication Date |
---|---|
USD902165S1 true USD902165S1 (en) | 2020-11-17 |
Family
ID=67769548
Family Applications (2)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
US29/639,953 Active USD877101S1 (en) | 2018-03-09 | 2018-03-09 | Target profile for a physical vapor deposition chamber target |
US29/726,094 Active USD902165S1 (en) | 2018-03-09 | 2020-02-28 | Target profile for a physical vapor deposition chamber target |
Family Applications Before (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
US29/639,953 Active USD877101S1 (en) | 2018-03-09 | 2018-03-09 | Target profile for a physical vapor deposition chamber target |
Country Status (3)
Country | Link |
---|---|
US (2) | USD877101S1 (en) |
JP (2) | JP1651699S (en) |
TW (2) | TWD202101S (en) |
Cited By (9)
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USD933725S1 (en) * | 2019-02-08 | 2021-10-19 | Applied Materials, Inc. | Deposition ring for a substrate processing chamber |
USD933726S1 (en) * | 2020-07-31 | 2021-10-19 | Applied Materials, Inc. | Deposition ring for a semiconductor processing chamber |
USD937329S1 (en) | 2020-03-23 | 2021-11-30 | Applied Materials, Inc. | Sputter target for a physical vapor deposition chamber |
USD940765S1 (en) | 2020-12-02 | 2022-01-11 | Applied Materials, Inc. | Target profile for a physical vapor deposition chamber target |
USD946638S1 (en) | 2017-12-11 | 2022-03-22 | Applied Materials, Inc. | Target profile for a physical vapor deposition chamber target |
US11581166B2 (en) | 2020-07-31 | 2023-02-14 | Applied Materials, Inc. | Low profile deposition ring for enhanced life |
USD1007449S1 (en) | 2021-05-07 | 2023-12-12 | Applied Materials, Inc. | Target profile for a physical vapor deposition chamber target |
USD1012051S1 (en) * | 2019-06-17 | 2024-01-23 | Tokyo Electron Limited | Electrostatic chuck for semiconductor manufacturing device |
USD1012873S1 (en) * | 2020-09-24 | 2024-01-30 | Asm Ip Holding B.V. | Electrode for semiconductor processing apparatus |
Families Citing this family (11)
Publication number | Priority date | Publication date | Assignee | Title |
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USD851613S1 (en) * | 2017-10-05 | 2019-06-18 | Applied Materials, Inc. | Target profile for a physical vapor deposition chamber target |
US10746511B2 (en) | 2017-11-06 | 2020-08-18 | JMA Outdoors, Inc. | Apparatus for generating a vitals target |
USD877101S1 (en) | 2018-03-09 | 2020-03-03 | Applied Materials, Inc. | Target profile for a physical vapor deposition chamber target |
USD917003S1 (en) * | 2018-06-06 | 2021-04-20 | JMA Outdoors, Inc. | Simulating target |
JP1646505S (en) * | 2018-12-07 | 2019-11-25 | ||
USD904640S1 (en) * | 2019-01-21 | 2020-12-08 | Applied Materials, Inc. | Substrate carrier |
USD942516S1 (en) * | 2019-02-08 | 2022-02-01 | Applied Materials, Inc. | Process shield for a substrate processing chamber |
USD908645S1 (en) | 2019-08-26 | 2021-01-26 | Applied Materials, Inc. | Sputtering target for a physical vapor deposition chamber |
USD941372S1 (en) * | 2020-03-20 | 2022-01-18 | Applied Materials, Inc. | Process shield for a substrate processing chamber |
USD941371S1 (en) * | 2020-03-20 | 2022-01-18 | Applied Materials, Inc. | Process shield for a substrate processing chamber |
JP1700776S (en) * | 2021-03-04 | 2021-11-29 |
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USD446231S1 (en) | 2000-08-21 | 2001-08-07 | Komatsu Industries Corporation | Nozzle for a plasma arc torch |
US6390905B1 (en) | 2000-03-31 | 2002-05-21 | Speedfam-Ipec Corporation | Workpiece carrier with adjustable pressure zones and barriers |
USD487254S1 (en) | 2002-05-24 | 2004-03-02 | Nichia Corporation | Light emitting diode |
US20040149567A1 (en) | 2002-12-16 | 2004-08-05 | Alexander Kosyachkov | Composite sputter target and phosphor deposition method |
USD496951S1 (en) | 2003-01-30 | 2004-10-05 | Thermal Dynamics Corporation | Mechanized cap for a plasma arc torch |
US6815352B1 (en) | 1999-11-09 | 2004-11-09 | Shin-Etsu Chemical Co., Ltd. | Silicon focus ring and method for producing the same |
USD503729S1 (en) | 2003-10-31 | 2005-04-05 | Nordson Corporation | Nozzle for dispensing adhesives and sealants |
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USD571831S1 (en) | 2005-07-29 | 2008-06-24 | Tokyo Electron Limited | Top panel for microwave introduction window of a plasma processing apparatus |
USD571833S1 (en) | 2005-07-29 | 2008-06-24 | Tokyo Electron Limited | Top panel for microwave introduction window of plasma processing apparatus |
USD572733S1 (en) | 2005-07-29 | 2008-07-08 | Tokyo Electron Limited | Top panel for microwave introduction window of a plasma processing apparatus |
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USD851613S1 (en) | 2017-10-05 | 2019-06-18 | Applied Materials, Inc. | Target profile for a physical vapor deposition chamber target |
USD860747S1 (en) * | 2017-10-16 | 2019-09-24 | William P. Russo | Tapered segment diamond blade |
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USD877101S1 (en) | 2018-03-09 | 2020-03-03 | Applied Materials, Inc. | Target profile for a physical vapor deposition chamber target |
-
2018
- 2018-03-09 US US29/639,953 patent/USD877101S1/en active Active
- 2018-09-07 JP JPD2019-5062F patent/JP1651699S/ja active Active
- 2018-09-07 JP JPD2018-19579F patent/JP1640252S/ja active Active
- 2018-09-10 TW TW107305358F patent/TWD202101S/en unknown
- 2018-09-10 TW TW108303594F patent/TWD203691S/en unknown
-
2020
- 2020-02-28 US US29/726,094 patent/USD902165S1/en active Active
Patent Citations (106)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US5320728A (en) | 1990-03-30 | 1994-06-14 | Applied Materials, Inc. | Planar magnetron sputtering source producing improved coating thickness uniformity, step coverage and step coverage uniformity |
USD363464S (en) | 1992-08-27 | 1995-10-24 | Tokyo Electron Yamanashi Limited | Electrode for a semiconductor processing apparatus |
USD351450S (en) | 1993-05-19 | 1994-10-11 | Riteflite Pty. Limited | Target for shooting |
USD376744S (en) * | 1994-08-03 | 1996-12-24 | Gerd Eisenblatter Gmbh | Support plate |
USD381030S (en) | 1995-11-21 | 1997-07-15 | Avi Tepman | Sputtering target |
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USD503729S1 (en) | 2003-10-31 | 2005-04-05 | Nordson Corporation | Nozzle for dispensing adhesives and sealants |
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USD649126S1 (en) | 2008-10-20 | 2011-11-22 | Ebara Corporation | Vacuum contact pad |
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USD633452S1 (en) | 2009-08-27 | 2011-03-01 | Ebara Corporation | Elastic membrane for semiconductor wafer polishing apparatus |
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USD678745S1 (en) * | 2011-07-07 | 2013-03-26 | Phuong Van Nguyen | Spinning insert polishing pad |
USD694790S1 (en) | 2011-09-20 | 2013-12-03 | Tokyo Electron Limited | Baffle plate for manufacturing semiconductor |
USD669509S1 (en) | 2011-10-19 | 2012-10-23 | Kjellberg Stiftung, rechtsfahige Stiftung des burge rlichen Rechts | Nozzle for torch |
USD691974S1 (en) | 2011-12-22 | 2013-10-22 | Tokyo Electron Limited | Holding pad for transferring a wafer |
USD683806S1 (en) | 2012-01-12 | 2013-06-04 | Surefire, Llc | Front plate for a firearm sound suppressor |
USD687790S1 (en) | 2012-03-20 | 2013-08-13 | Veeco Instruments Inc. | Keyed wafer carrier |
USD687791S1 (en) | 2012-03-20 | 2013-08-13 | Veeco Instruments Inc. | Multi-keyed wafer carrier |
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US10442056B2 (en) * | 2012-06-29 | 2019-10-15 | Ebara Corporation | Substrate holding apparatus and polishing apparatus |
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JP1651699S (en) | 2020-01-27 |
JP1640252S (en) | 2019-09-02 |
TWD203691S (en) | 2020-04-01 |
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