USD703162S1 - Wafer holder for stepper - Google Patents
Wafer holder for stepper Download PDFInfo
- Publication number
- USD703162S1 USD703162S1 US29/448,577 US201329448577F USD703162S US D703162 S1 USD703162 S1 US D703162S1 US 201329448577 F US201329448577 F US 201329448577F US D703162 S USD703162 S US D703162S
- Authority
- US
- United States
- Prior art keywords
- stepper
- wafer holder
- view
- taken along
- along line
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Active
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Description
The broken lines shown in the drawings represent portions of the wafer holder for a stepper that form no part of the claimed design.
Claims (1)
- The ornamental design for a wafer holder for a stepper, as shown and described.
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2012025225 | 2012-10-17 | ||
JP2012-025225 | 2012-10-17 |
Publications (1)
Publication Number | Publication Date |
---|---|
USD703162S1 true USD703162S1 (en) | 2014-04-22 |
Family
ID=50482254
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
US29/448,577 Active USD703162S1 (en) | 2012-10-17 | 2013-03-13 | Wafer holder for stepper |
Country Status (1)
Country | Link |
---|---|
US (1) | USD703162S1 (en) |
Cited By (21)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
USD760180S1 (en) * | 2014-02-21 | 2016-06-28 | Hzo, Inc. | Hexcell channel arrangement for use in a boat for a deposition apparatus |
USD766850S1 (en) * | 2014-03-28 | 2016-09-20 | Tokyo Electron Limited | Wafer holder for manufacturing semiconductor |
USD784937S1 (en) * | 2014-11-13 | 2017-04-25 | Tokyo Electron Limited | Dummy wafer |
USD785576S1 (en) | 2014-11-13 | 2017-05-02 | Tokyo Electron Limited | Dummy wafer |
USD786810S1 (en) | 2014-11-13 | 2017-05-16 | Tokyo Electron Limited | Dummy wafer |
USD793972S1 (en) * | 2015-03-27 | 2017-08-08 | Veeco Instruments Inc. | Wafer carrier with a 31-pocket configuration |
USD793971S1 (en) | 2015-03-27 | 2017-08-08 | Veeco Instruments Inc. | Wafer carrier with a 14-pocket configuration |
USD806046S1 (en) | 2015-04-16 | 2017-12-26 | Veeco Instruments Inc. | Wafer carrier with a multi-pocket configuration |
USD873782S1 (en) * | 2016-05-17 | 2020-01-28 | Electro Scientific Industries, Inc | Component carrier plate |
USD894137S1 (en) | 2017-10-05 | 2020-08-25 | Applied Materials, Inc. | Target profile for a physical vapor deposition chamber target |
USD902165S1 (en) * | 2018-03-09 | 2020-11-17 | Applied Materials, Inc. | Target profile for a physical vapor deposition chamber target |
USD908645S1 (en) | 2019-08-26 | 2021-01-26 | Applied Materials, Inc. | Sputtering target for a physical vapor deposition chamber |
USD933725S1 (en) | 2019-02-08 | 2021-10-19 | Applied Materials, Inc. | Deposition ring for a substrate processing chamber |
USD937329S1 (en) | 2020-03-23 | 2021-11-30 | Applied Materials, Inc. | Sputter target for a physical vapor deposition chamber |
USD940765S1 (en) | 2020-12-02 | 2022-01-11 | Applied Materials, Inc. | Target profile for a physical vapor deposition chamber target |
USD941372S1 (en) * | 2020-03-20 | 2022-01-18 | Applied Materials, Inc. | Process shield for a substrate processing chamber |
USD941371S1 (en) * | 2020-03-20 | 2022-01-18 | Applied Materials, Inc. | Process shield for a substrate processing chamber |
USD942516S1 (en) * | 2019-02-08 | 2022-02-01 | Applied Materials, Inc. | Process shield for a substrate processing chamber |
USD946638S1 (en) | 2017-12-11 | 2022-03-22 | Applied Materials, Inc. | Target profile for a physical vapor deposition chamber target |
USD947802S1 (en) | 2020-05-20 | 2022-04-05 | Applied Materials, Inc. | Replaceable substrate carrier interfacing film |
USD1007449S1 (en) | 2021-05-07 | 2023-12-12 | Applied Materials, Inc. | Target profile for a physical vapor deposition chamber target |
-
2013
- 2013-03-13 US US29/448,577 patent/USD703162S1/en active Active
Cited By (24)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
USD760180S1 (en) * | 2014-02-21 | 2016-06-28 | Hzo, Inc. | Hexcell channel arrangement for use in a boat for a deposition apparatus |
USD766850S1 (en) * | 2014-03-28 | 2016-09-20 | Tokyo Electron Limited | Wafer holder for manufacturing semiconductor |
USD784937S1 (en) * | 2014-11-13 | 2017-04-25 | Tokyo Electron Limited | Dummy wafer |
USD785576S1 (en) | 2014-11-13 | 2017-05-02 | Tokyo Electron Limited | Dummy wafer |
USD786810S1 (en) | 2014-11-13 | 2017-05-16 | Tokyo Electron Limited | Dummy wafer |
USD793971S1 (en) | 2015-03-27 | 2017-08-08 | Veeco Instruments Inc. | Wafer carrier with a 14-pocket configuration |
USD793972S1 (en) * | 2015-03-27 | 2017-08-08 | Veeco Instruments Inc. | Wafer carrier with a 31-pocket configuration |
USD852762S1 (en) | 2015-03-27 | 2019-07-02 | Veeco Instruments Inc. | Wafer carrier with a 14-pocket configuration |
USD806046S1 (en) | 2015-04-16 | 2017-12-26 | Veeco Instruments Inc. | Wafer carrier with a multi-pocket configuration |
USD873782S1 (en) * | 2016-05-17 | 2020-01-28 | Electro Scientific Industries, Inc | Component carrier plate |
USD894137S1 (en) | 2017-10-05 | 2020-08-25 | Applied Materials, Inc. | Target profile for a physical vapor deposition chamber target |
USD946638S1 (en) | 2017-12-11 | 2022-03-22 | Applied Materials, Inc. | Target profile for a physical vapor deposition chamber target |
USD902165S1 (en) * | 2018-03-09 | 2020-11-17 | Applied Materials, Inc. | Target profile for a physical vapor deposition chamber target |
USD942516S1 (en) * | 2019-02-08 | 2022-02-01 | Applied Materials, Inc. | Process shield for a substrate processing chamber |
USD933725S1 (en) | 2019-02-08 | 2021-10-19 | Applied Materials, Inc. | Deposition ring for a substrate processing chamber |
USD908645S1 (en) | 2019-08-26 | 2021-01-26 | Applied Materials, Inc. | Sputtering target for a physical vapor deposition chamber |
USD941372S1 (en) * | 2020-03-20 | 2022-01-18 | Applied Materials, Inc. | Process shield for a substrate processing chamber |
USD941371S1 (en) * | 2020-03-20 | 2022-01-18 | Applied Materials, Inc. | Process shield for a substrate processing chamber |
USD937329S1 (en) | 2020-03-23 | 2021-11-30 | Applied Materials, Inc. | Sputter target for a physical vapor deposition chamber |
USD970566S1 (en) | 2020-03-23 | 2022-11-22 | Applied Materials, Inc. | Sputter target for a physical vapor deposition chamber |
USD947802S1 (en) | 2020-05-20 | 2022-04-05 | Applied Materials, Inc. | Replaceable substrate carrier interfacing film |
USD940765S1 (en) | 2020-12-02 | 2022-01-11 | Applied Materials, Inc. | Target profile for a physical vapor deposition chamber target |
USD966357S1 (en) | 2020-12-02 | 2022-10-11 | Applied Materials, Inc. | Target profile for a physical vapor deposition chamber target |
USD1007449S1 (en) | 2021-05-07 | 2023-12-12 | Applied Materials, Inc. | Target profile for a physical vapor deposition chamber target |
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