USD592029S1 - Polishing pad - Google Patents
Polishing pad Download PDFInfo
- Publication number
- USD592029S1 USD592029S1 US29/295,291 US29529107F USD592029S US D592029 S1 USD592029 S1 US D592029S1 US 29529107 F US29529107 F US 29529107F US D592029 S USD592029 S US D592029S
- Authority
- US
- United States
- Prior art keywords
- polishing pad
- view
- partially enlarged
- enlarged sectional
- along line
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
Images
Description
Claims (1)
- The ornamental design for a polishing pad, as shown and described.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US29/295,291 USD592029S1 (en) | 2004-10-26 | 2007-09-25 | Polishing pad |
Applications Claiming Priority (7)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2004032513 | 2004-10-26 | ||
JP2004032515 | 2004-10-26 | ||
JP2004032516 | 2004-10-26 | ||
JP2004032512 | 2004-10-26 | ||
JP2004032514 | 2004-10-26 | ||
US29/228,555 USD559066S1 (en) | 2004-10-26 | 2005-04-26 | Polishing pad |
US29/295,291 USD592029S1 (en) | 2004-10-26 | 2007-09-25 | Polishing pad |
Related Parent Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
US29/228,555 Division USD559066S1 (en) | 2004-10-26 | 2005-04-26 | Polishing pad |
Publications (1)
Publication Number | Publication Date |
---|---|
USD592029S1 true USD592029S1 (en) | 2009-05-12 |
Family
ID=38893603
Family Applications (5)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
US29/228,555 Expired - Lifetime USD559066S1 (en) | 2004-10-26 | 2005-04-26 | Polishing pad |
US29/295,291 Expired - Lifetime USD592029S1 (en) | 2004-10-26 | 2007-09-25 | Polishing pad |
US29/295,294 Expired - Lifetime USD592030S1 (en) | 2004-10-26 | 2007-09-25 | Polishing pad |
US29/295,292 Expired - Lifetime USD584591S1 (en) | 2004-10-26 | 2007-09-25 | Polishing pad |
US29/295,290 Expired - Lifetime USD600989S1 (en) | 2004-10-26 | 2007-09-25 | Polishing pad |
Family Applications Before (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
US29/228,555 Expired - Lifetime USD559066S1 (en) | 2004-10-26 | 2005-04-26 | Polishing pad |
Family Applications After (3)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
US29/295,294 Expired - Lifetime USD592030S1 (en) | 2004-10-26 | 2007-09-25 | Polishing pad |
US29/295,292 Expired - Lifetime USD584591S1 (en) | 2004-10-26 | 2007-09-25 | Polishing pad |
US29/295,290 Expired - Lifetime USD600989S1 (en) | 2004-10-26 | 2007-09-25 | Polishing pad |
Country Status (1)
Country | Link |
---|---|
US (5) | USD559066S1 (en) |
Cited By (24)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US9180570B2 (en) | 2008-03-14 | 2015-11-10 | Nexplanar Corporation | Grooved CMP pad |
USD795666S1 (en) * | 2014-06-06 | 2017-08-29 | Diamond Tool Supply, Inc. | Polishing pad |
US10011999B2 (en) | 2014-09-18 | 2018-07-03 | Diamond Tool Supply, Inc. | Method for finishing a surface using a grouting pan |
US10246885B2 (en) | 2014-09-18 | 2019-04-02 | Husqvarna Construction Products North America, Inc. | Grouting pan assembly with reinforcement ring |
USD852601S1 (en) * | 2017-04-24 | 2019-07-02 | Ehwa Diamond Ind. Co., Ltd. | Polishing pad |
USD854902S1 (en) | 2016-09-23 | 2019-07-30 | Husqvarna Construction Products North America, Inc. | Polishing or grinding pad |
US10414012B2 (en) | 2017-01-13 | 2019-09-17 | Husqvarna Construction Products North America, Inc. | Grinding pad apparatus |
USD873782S1 (en) * | 2016-05-17 | 2020-01-28 | Electro Scientific Industries, Inc | Component carrier plate |
US10667665B2 (en) | 2015-09-24 | 2020-06-02 | Husqvarna Ab | Method of using polishing or grinding pad assembly |
US10710214B2 (en) | 2018-01-11 | 2020-07-14 | Husqvarna Ab | Polishing or grinding pad with multilayer reinforcement |
USD894137S1 (en) | 2017-10-05 | 2020-08-25 | Applied Materials, Inc. | Target profile for a physical vapor deposition chamber target |
USD902165S1 (en) * | 2018-03-09 | 2020-11-17 | Applied Materials, Inc. | Target profile for a physical vapor deposition chamber target |
USD908645S1 (en) | 2019-08-26 | 2021-01-26 | Applied Materials, Inc. | Sputtering target for a physical vapor deposition chamber |
USD919396S1 (en) | 2017-08-30 | 2021-05-18 | Husqvarna Ab | Polishing or grinding pad assembly with abrasive disks, reinforcement and pad |
USD927952S1 (en) * | 2017-08-30 | 2021-08-17 | Husqvarna Ab | Polishing or grinding pad assembly with abrasive disk, spacer, reinforcement and pad |
USD933725S1 (en) | 2019-02-08 | 2021-10-19 | Applied Materials, Inc. | Deposition ring for a substrate processing chamber |
USD937329S1 (en) | 2020-03-23 | 2021-11-30 | Applied Materials, Inc. | Sputter target for a physical vapor deposition chamber |
USD940765S1 (en) | 2020-12-02 | 2022-01-11 | Applied Materials, Inc. | Target profile for a physical vapor deposition chamber target |
USD941372S1 (en) * | 2020-03-20 | 2022-01-18 | Applied Materials, Inc. | Process shield for a substrate processing chamber |
USD941371S1 (en) * | 2020-03-20 | 2022-01-18 | Applied Materials, Inc. | Process shield for a substrate processing chamber |
USD942516S1 (en) * | 2019-02-08 | 2022-02-01 | Applied Materials, Inc. | Process shield for a substrate processing chamber |
USD946638S1 (en) | 2017-12-11 | 2022-03-22 | Applied Materials, Inc. | Target profile for a physical vapor deposition chamber target |
USD958626S1 (en) * | 2017-08-30 | 2022-07-26 | Husqvarna Ab | Polishing or grinding pad assembly with abrasive disks, reinforcement and pad |
USD1007449S1 (en) | 2021-05-07 | 2023-12-12 | Applied Materials, Inc. | Target profile for a physical vapor deposition chamber target |
Families Citing this family (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US9211628B2 (en) * | 2011-01-26 | 2015-12-15 | Nexplanar Corporation | Polishing pad with concentric or approximately concentric polygon groove pattern |
US10586708B2 (en) | 2017-06-14 | 2020-03-10 | Rohm And Haas Electronic Materials Cmp Holdings, Inc. | Uniform CMP polishing method |
US10861702B2 (en) | 2017-06-14 | 2020-12-08 | Rohm And Haas Electronic Materials Cmp Holdings | Controlled residence CMP polishing method |
US10777418B2 (en) * | 2017-06-14 | 2020-09-15 | Rohm And Haas Electronic Materials Cmp Holdings, I | Biased pulse CMP groove pattern |
US10857648B2 (en) | 2017-06-14 | 2020-12-08 | Rohm And Haas Electronic Materials Cmp Holdings | Trapezoidal CMP groove pattern |
US10857647B2 (en) | 2017-06-14 | 2020-12-08 | Rohm And Haas Electronic Materials Cmp Holdings | High-rate CMP polishing method |
-
2005
- 2005-04-26 US US29/228,555 patent/USD559066S1/en not_active Expired - Lifetime
-
2007
- 2007-09-25 US US29/295,291 patent/USD592029S1/en not_active Expired - Lifetime
- 2007-09-25 US US29/295,294 patent/USD592030S1/en not_active Expired - Lifetime
- 2007-09-25 US US29/295,292 patent/USD584591S1/en not_active Expired - Lifetime
- 2007-09-25 US US29/295,290 patent/USD600989S1/en not_active Expired - Lifetime
Cited By (30)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US9180570B2 (en) | 2008-03-14 | 2015-11-10 | Nexplanar Corporation | Grooved CMP pad |
USD795666S1 (en) * | 2014-06-06 | 2017-08-29 | Diamond Tool Supply, Inc. | Polishing pad |
USD837015S1 (en) * | 2014-06-06 | 2019-01-01 | Husqvarna Construction Products North America, Inc. | Polishing pad |
USD873108S1 (en) * | 2014-06-06 | 2020-01-21 | Husqvarna Ab | Polishing pad |
US10011999B2 (en) | 2014-09-18 | 2018-07-03 | Diamond Tool Supply, Inc. | Method for finishing a surface using a grouting pan |
US10246885B2 (en) | 2014-09-18 | 2019-04-02 | Husqvarna Construction Products North America, Inc. | Grouting pan assembly with reinforcement ring |
US10667665B2 (en) | 2015-09-24 | 2020-06-02 | Husqvarna Ab | Method of using polishing or grinding pad assembly |
US11084140B2 (en) | 2015-09-24 | 2021-08-10 | Husqvarna Ab | Method of using polishing or grinding pad assembly |
USD873782S1 (en) * | 2016-05-17 | 2020-01-28 | Electro Scientific Industries, Inc | Component carrier plate |
USD933440S1 (en) * | 2016-09-23 | 2021-10-19 | Husqvarna Ab | Polishing or grinding pad |
USD854902S1 (en) | 2016-09-23 | 2019-07-30 | Husqvarna Construction Products North America, Inc. | Polishing or grinding pad |
US10414012B2 (en) | 2017-01-13 | 2019-09-17 | Husqvarna Construction Products North America, Inc. | Grinding pad apparatus |
USD852601S1 (en) * | 2017-04-24 | 2019-07-02 | Ehwa Diamond Ind. Co., Ltd. | Polishing pad |
USD919396S1 (en) | 2017-08-30 | 2021-05-18 | Husqvarna Ab | Polishing or grinding pad assembly with abrasive disks, reinforcement and pad |
USD927952S1 (en) * | 2017-08-30 | 2021-08-17 | Husqvarna Ab | Polishing or grinding pad assembly with abrasive disk, spacer, reinforcement and pad |
USD958626S1 (en) * | 2017-08-30 | 2022-07-26 | Husqvarna Ab | Polishing or grinding pad assembly with abrasive disks, reinforcement and pad |
USD894137S1 (en) | 2017-10-05 | 2020-08-25 | Applied Materials, Inc. | Target profile for a physical vapor deposition chamber target |
USD946638S1 (en) | 2017-12-11 | 2022-03-22 | Applied Materials, Inc. | Target profile for a physical vapor deposition chamber target |
US10710214B2 (en) | 2018-01-11 | 2020-07-14 | Husqvarna Ab | Polishing or grinding pad with multilayer reinforcement |
USD902165S1 (en) * | 2018-03-09 | 2020-11-17 | Applied Materials, Inc. | Target profile for a physical vapor deposition chamber target |
USD942516S1 (en) * | 2019-02-08 | 2022-02-01 | Applied Materials, Inc. | Process shield for a substrate processing chamber |
USD933725S1 (en) | 2019-02-08 | 2021-10-19 | Applied Materials, Inc. | Deposition ring for a substrate processing chamber |
USD908645S1 (en) | 2019-08-26 | 2021-01-26 | Applied Materials, Inc. | Sputtering target for a physical vapor deposition chamber |
USD941371S1 (en) * | 2020-03-20 | 2022-01-18 | Applied Materials, Inc. | Process shield for a substrate processing chamber |
USD941372S1 (en) * | 2020-03-20 | 2022-01-18 | Applied Materials, Inc. | Process shield for a substrate processing chamber |
USD937329S1 (en) | 2020-03-23 | 2021-11-30 | Applied Materials, Inc. | Sputter target for a physical vapor deposition chamber |
USD970566S1 (en) | 2020-03-23 | 2022-11-22 | Applied Materials, Inc. | Sputter target for a physical vapor deposition chamber |
USD940765S1 (en) | 2020-12-02 | 2022-01-11 | Applied Materials, Inc. | Target profile for a physical vapor deposition chamber target |
USD966357S1 (en) | 2020-12-02 | 2022-10-11 | Applied Materials, Inc. | Target profile for a physical vapor deposition chamber target |
USD1007449S1 (en) | 2021-05-07 | 2023-12-12 | Applied Materials, Inc. | Target profile for a physical vapor deposition chamber target |
Also Published As
Publication number | Publication date |
---|---|
USD600989S1 (en) | 2009-09-29 |
USD559066S1 (en) | 2008-01-08 |
USD592030S1 (en) | 2009-05-12 |
USD584591S1 (en) | 2009-01-13 |
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