USD496951S1 - Mechanized cap for a plasma arc torch - Google Patents
Mechanized cap for a plasma arc torch Download PDFInfo
- Publication number
- USD496951S1 USD496951S1 US29/176,769 US17676903F USD496951S US D496951 S1 USD496951 S1 US D496951S1 US 17676903 F US17676903 F US 17676903F US D496951 S USD496951 S US D496951S
- Authority
- US
- United States
- Prior art keywords
- plasma arc
- arc torch
- mechanized cap
- mechanized
- cap
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
Images
Description
FIG. 1 is a perspective view of the mechanized cap for a plasma arc torch;
FIG. 2 is a side elevation view thereof;
FIG. 3 is a top plan view thereof; and,
FIG. 4 is a bottom elevation view thereof.
Claims (1)
- The ornamental design for a mechanized cap for a plasma arc torch, as shown and described.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US29/176,769 USD496951S1 (en) | 2003-01-30 | 2003-02-27 | Mechanized cap for a plasma arc torch |
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US29175106 | 2003-01-30 | ||
US29/176,769 USD496951S1 (en) | 2003-01-30 | 2003-02-27 | Mechanized cap for a plasma arc torch |
Related Parent Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
US29175106 Continuation | 2003-01-30 | 2003-01-30 |
Publications (1)
Publication Number | Publication Date |
---|---|
USD496951S1 true USD496951S1 (en) | 2004-10-05 |
Family
ID=33029356
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
US29/176,769 Expired - Lifetime USD496951S1 (en) | 2003-01-30 | 2003-02-27 | Mechanized cap for a plasma arc torch |
Country Status (1)
Country | Link |
---|---|
US (1) | USD496951S1 (en) |
Cited By (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
USD868124S1 (en) * | 2017-12-11 | 2019-11-26 | Applied Materials, Inc. | Target profile for a physical vapor deposition chamber target |
USD894137S1 (en) | 2017-10-05 | 2020-08-25 | Applied Materials, Inc. | Target profile for a physical vapor deposition chamber target |
USD902165S1 (en) | 2018-03-09 | 2020-11-17 | Applied Materials, Inc. | Target profile for a physical vapor deposition chamber target |
USD908645S1 (en) | 2019-08-26 | 2021-01-26 | Applied Materials, Inc. | Sputtering target for a physical vapor deposition chamber |
USD940765S1 (en) | 2020-12-02 | 2022-01-11 | Applied Materials, Inc. | Target profile for a physical vapor deposition chamber target |
USD970566S1 (en) | 2020-03-23 | 2022-11-22 | Applied Materials, Inc. | Sputter target for a physical vapor deposition chamber |
USD1007449S1 (en) | 2021-05-07 | 2023-12-12 | Applied Materials, Inc. | Target profile for a physical vapor deposition chamber target |
-
2003
- 2003-02-27 US US29/176,769 patent/USD496951S1/en not_active Expired - Lifetime
Cited By (9)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
USD894137S1 (en) | 2017-10-05 | 2020-08-25 | Applied Materials, Inc. | Target profile for a physical vapor deposition chamber target |
USD868124S1 (en) * | 2017-12-11 | 2019-11-26 | Applied Materials, Inc. | Target profile for a physical vapor deposition chamber target |
USD946638S1 (en) | 2017-12-11 | 2022-03-22 | Applied Materials, Inc. | Target profile for a physical vapor deposition chamber target |
USD902165S1 (en) | 2018-03-09 | 2020-11-17 | Applied Materials, Inc. | Target profile for a physical vapor deposition chamber target |
USD908645S1 (en) | 2019-08-26 | 2021-01-26 | Applied Materials, Inc. | Sputtering target for a physical vapor deposition chamber |
USD970566S1 (en) | 2020-03-23 | 2022-11-22 | Applied Materials, Inc. | Sputter target for a physical vapor deposition chamber |
USD940765S1 (en) | 2020-12-02 | 2022-01-11 | Applied Materials, Inc. | Target profile for a physical vapor deposition chamber target |
USD966357S1 (en) | 2020-12-02 | 2022-10-11 | Applied Materials, Inc. | Target profile for a physical vapor deposition chamber target |
USD1007449S1 (en) | 2021-05-07 | 2023-12-12 | Applied Materials, Inc. | Target profile for a physical vapor deposition chamber target |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
FEPP | Fee payment procedure |
Free format text: PAT HOLDER NO LONGER CLAIMS SMALL ENTITY STATUS, ENTITY STATUS SET TO UNDISCOUNTED (ORIGINAL EVENT CODE: STOL); ENTITY STATUS OF PATENT OWNER: LARGE ENTITY |