TWD203691S - Target profile for a physical vapor deposition chamber target - Google Patents

Target profile for a physical vapor deposition chamber target Download PDF

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Publication number
TWD203691S
TWD203691S TW108303594F TW108303594F TWD203691S TW D203691 S TWD203691 S TW D203691S TW 108303594 F TW108303594 F TW 108303594F TW 108303594 F TW108303594 F TW 108303594F TW D203691 S TWD203691 S TW D203691S
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Taiwan
Prior art keywords
target
vapor deposition
physical vapor
deposition chamber
profile
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Application number
TW108303594F
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Chinese (zh)
Inventor
威廉R 喬韓森
基倫古莫妮拉珊卓拉 沙芬戴亞
布拉尚普拉巴卡 卜拉布
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美商應用材料股份有限公司
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Publication of TWD203691S publication Critical patent/TWD203691S/en

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Abstract

【物品用途】;本設計所請求為用於物理氣相沉積腔室的靶材。;【設計說明】;圖式所揭露之虛線部分,為本案不主張設計之部分。;17–17剖面圖為俯視圖中之17–17剖面示意圖。[Use of item]; This design is requested to be a target for use in a physical vapor deposition chamber. ;[Design Description];The dotted line portion disclosed in the drawing is the part of this case that does not require design. ;The 17–17 section is a schematic diagram of the 17–17 section in the top view.

Description

用於物理氣相沉積腔室靶材的靶材輪廓Target profile for target in physical vapor deposition chamber

本設計所請求為用於物理氣相沉積腔室的靶材。This design requires a target for a physical vapor deposition chamber.

圖式所揭露之虛線部分,為本案不主張設計之部分。The dotted line exposed in the diagram is the part that does not advocate design in this case.

17–17剖面圖為俯視圖中之17–17剖面示意圖。Section 17-17 is a schematic view of section 17-17 in top view.

TW108303594F 2018-03-09 2018-09-10 Target profile for a physical vapor deposition chamber target TWD203691S (en)

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US29/639,953 2018-03-09
US29/639,953 USD877101S1 (en) 2018-03-09 2018-03-09 Target profile for a physical vapor deposition chamber target

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TWD203691S true TWD203691S (en) 2020-04-01

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JP1651699S (en) 2020-01-27
TWD202101S (en) 2020-01-11
USD877101S1 (en) 2020-03-03
USD902165S1 (en) 2020-11-17
JP1640252S (en) 2019-09-02

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