TWD211584S - Lower shield for a substrate processing chamber - Google Patents

Lower shield for a substrate processing chamber Download PDF

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Publication number
TWD211584S
TWD211584S TW109306129F TW109306129F TWD211584S TW D211584 S TWD211584 S TW D211584S TW 109306129 F TW109306129 F TW 109306129F TW 109306129 F TW109306129 F TW 109306129F TW D211584 S TWD211584 S TW D211584S
Authority
TW
Taiwan
Prior art keywords
processing chamber
substrate processing
lower shield
design
dotted line
Prior art date
Application number
TW109306129F
Other languages
Chinese (zh)
Inventor
薩拉斯 巴布
安恩克斯納 朱普迪
岳生 歐
魏俊琪
泰銘 莫
和田優一
康 張
Original Assignee
美商應用材料股份有限公司
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 美商應用材料股份有限公司 filed Critical 美商應用材料股份有限公司
Publication of TWD211584S publication Critical patent/TWD211584S/en

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Abstract

【物品用途】;本設計係關於用於基板處理腔室的下屏蔽件之外觀設計。;【設計說明】;圖式所揭露之虛線部分，為本案不主張設計之部分。[Use of article]; This design is about the appearance design of the lower shield used in the substrate processing chamber. ;[Design Description];The dotted line portion disclosed in the drawing is the part of this case that does not require design.

Description

用於基板處理腔室的下屏蔽件 Lower shield for substrate processing chamber

本設計係關於用於基板處理腔室的下屏蔽件之外觀設計。 This design is about the appearance design of the lower shield used in the substrate processing chamber.

圖式所揭露之虛線部分，為本案不主張設計之部分。 The dotted line exposed in the diagram is a part of this case that does not advocate design.

TW109306129F 2019-08-28 2020-02-20 Lower shield for a substrate processing chamber TWD211584S (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US29/703,658 2019-08-28
US29/703,658 USD931241S1 (en) 2019-08-28 2019-08-28 Lower shield for a substrate processing chamber

Publications (1)

Publication Number Publication Date
TWD211584S true TWD211584S (en) 2021-05-11

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ID=75378497

Family Applications (2)

Application Number Title Priority Date Filing Date
TW109300802F TWD211387S (en) 2019-08-28 2020-02-20 Lower shield for a substrate processing chamber
TW109306129F TWD211584S (en) 2019-08-28 2020-02-20 Lower shield for a substrate processing chamber

Family Applications Before (1)

Application Number Title Priority Date Filing Date
TW109300802F TWD211387S (en) 2019-08-28 2020-02-20 Lower shield for a substrate processing chamber

Country Status (3)

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US (2) USD931241S1 (en)
JP (2) JP1683052S (en)
TW (2) TWD211387S (en)

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USD1055006S1 (en) 2022-03-18 2024-12-24 Applied Materials, Inc. Support ring for an interlocking process kit for a substrate processing chamber

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Also Published As

Publication number Publication date
JP1684624S (en) 2021-05-10
USD931241S1 (en) 2021-09-21
USD971167S1 (en) 2022-11-29
TWD211387S (en) 2021-05-11
JP1683052S (en) 2021-04-12

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