USD642605S1 - Lid assembly for a substrate processing chamber - Google Patents

Lid assembly for a substrate processing chamber Download PDF

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Publication number
USD642605S1
USD642605S1 US29/358,979 US35897910F USD642605S US D642605 S1 USD642605 S1 US D642605S1 US 35897910 F US35897910 F US 35897910F US D642605 S USD642605 S US D642605S
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United States
Prior art keywords
lid assembly
processing chamber
substrate processing
view
line
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
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US29/358,979
Inventor
Tetsuya Ishikawa
Alexander Tam
David H. Quach
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Applied Materials Inc
Original Assignee
Applied Materials Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
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Publication date
Application filed by Applied Materials Inc filed Critical Applied Materials Inc
Priority to US29/358,979 priority Critical patent/USD642605S1/en
Assigned to APPLIED MATERIALS, INC. reassignment APPLIED MATERIALS, INC. ASSIGNMENT OF ASSIGNORS INTEREST (SEE DOCUMENT FOR DETAILS). Assignors: ISHIKAWA, TETSUYA, QUACH, DAVID H., TAM, ALEXANDER
Priority to TW099303810F priority patent/TWD141830S1/en
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Publication of USD642605S1 publication Critical patent/USD642605S1/en
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FIG. 1 is a top plan view of a lid assembly for a substrate processing chamber showing our new design.
FIG. 2 is a side elevation view of the lid assembly of FIG. 1 as viewed from line FIG. 2 of FIG. 1.
FIG. 3 is a side elevation view of the lid assembly of FIG. 1 as viewed from line FIG. 3 of FIG. 1.
FIG. 4 is a side elevation view of the lid assembly of FIG. 1 as viewed from line FIG. 4 of FIG. 1.
FIG. 5 is a side elevation view of the lid assembly of FIG. 1, rotated 180°, as viewed from line FIG. 5 of FIG. 1.
FIG. 6 is an isometric top view of the lid assembly of FIG. 1.
FIG. 7 is another isometric top view of the lid assembly of FIG. 1.
FIG. 8 is an isometric bottom view of the lid assembly of FIG. 1; and,
FIG. 9 is a bottom plan view of the lid assembly of FIG. 1.
The broken line showing of structural features is included for the purpose of illustrating non-claimed subject matter and forms no part of the claimed design.

Claims (1)

  1. The ornamental design for a lid assembly for a substrate processing chamber, as shown and described.
US29/358,979 2010-04-02 2010-04-02 Lid assembly for a substrate processing chamber Active USD642605S1 (en)

Priority Applications (2)

Application Number Priority Date Filing Date Title
US29/358,979 USD642605S1 (en) 2010-04-02 2010-04-02 Lid assembly for a substrate processing chamber
TW099303810F TWD141830S1 (en) 2010-04-02 2010-08-03 Lid assembly for substrate processing chamber

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US29/358,979 USD642605S1 (en) 2010-04-02 2010-04-02 Lid assembly for a substrate processing chamber

Publications (1)

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USD642605S1 true USD642605S1 (en) 2011-08-02

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US29/358,979 Active USD642605S1 (en) 2010-04-02 2010-04-02 Lid assembly for a substrate processing chamber

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US (1) USD642605S1 (en)
TW (1) TWD141830S1 (en)

Cited By (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
USD841506S1 (en) * 2017-02-27 2019-02-26 Flir Systems, Inc. Detector
USD913979S1 (en) * 2019-08-28 2021-03-23 Applied Materials, Inc. Inner shield for a substrate processing chamber
USD931241S1 (en) * 2019-08-28 2021-09-21 Applied Materials, Inc. Lower shield for a substrate processing chamber
USD973609S1 (en) * 2020-04-22 2022-12-27 Applied Materials, Inc. Upper shield with showerhead for a process chamber
US12080522B2 (en) 2020-04-22 2024-09-03 Applied Materials, Inc. Preclean chamber upper shield with showerhead
US12100577B2 (en) 2019-08-28 2024-09-24 Applied Materials, Inc. High conductance inner shield for process chamber

Non-Patent Citations (1)

* Cited by examiner, † Cited by third party
Title
Tam, et al., U.S. Appl. No. 12/831,522, filed Jul. 7, 2010, entitled "Showerhead Assembly With Metrology Port Purge."

Cited By (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
USD841506S1 (en) * 2017-02-27 2019-02-26 Flir Systems, Inc. Detector
USD913979S1 (en) * 2019-08-28 2021-03-23 Applied Materials, Inc. Inner shield for a substrate processing chamber
USD931241S1 (en) * 2019-08-28 2021-09-21 Applied Materials, Inc. Lower shield for a substrate processing chamber
US12100577B2 (en) 2019-08-28 2024-09-24 Applied Materials, Inc. High conductance inner shield for process chamber
USD973609S1 (en) * 2020-04-22 2022-12-27 Applied Materials, Inc. Upper shield with showerhead for a process chamber
US12080522B2 (en) 2020-04-22 2024-09-03 Applied Materials, Inc. Preclean chamber upper shield with showerhead

Also Published As

Publication number Publication date
TWD141830S1 (en) 2011-08-01

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