TWD186431S - Exhaust flow control ring for semiconductor substrate deposition apparatus - Google Patents

Exhaust flow control ring for semiconductor substrate deposition apparatus

Info

Publication number
TWD186431S
TWD186431S TW106302778F TW106302778F TWD186431S TW D186431 S TWD186431 S TW D186431S TW 106302778 F TW106302778 F TW 106302778F TW 106302778 F TW106302778 F TW 106302778F TW D186431 S TWD186431 S TW D186431S
Authority
TW
Taiwan
Prior art keywords
flow control
exhaust flow
control ring
semiconductor substrate
deposition apparatus
Prior art date
Application number
TW106302778F
Other languages
Chinese (zh)
Inventor
Ju Il Lee
Sung Hoon Jun
Dong Rak Jung
Seung Wook Kim
Original Assignee
Asm Ip Holding Bv
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Asm Ip Holding Bv filed Critical Asm Ip Holding Bv
Publication of TWD186431S publication Critical patent/TWD186431S/en

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Abstract

【物品用途】;本設計物品是一種用於半導體沉積設備的排氣流控制環,用以安裝在半導體沉積設備內。;【設計說明】;無。[Use of article]; This design article is an exhaust flow control ring for semiconductor deposition equipment, which is intended to be installed in semiconductor deposition equipment. ;[Design description];None.

TW106302778F 2017-04-03 2017-05-24 Exhaust flow control ring for semiconductor substrate deposition apparatus TWD186431S (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
KR20170015304 2017-04-03

Publications (1)

Publication Number Publication Date
TWD186431S true TWD186431S (en) 2017-11-01

Family

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TW106302778F TWD186431S (en) 2017-04-03 2017-05-24 Exhaust flow control ring for semiconductor substrate deposition apparatus

Country Status (2)

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US (1) USD876504S1 (en)
TW (1) TWD186431S (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
USD933725S1 (en) 2019-02-08 2021-10-19 Applied Materials, Inc. Deposition ring for a substrate processing chamber

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