USD790039S1 - Showerhead for a semiconductor processing chamber - Google Patents

Showerhead for a semiconductor processing chamber Download PDF

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Publication number
USD790039S1
USD790039S1 US29/560,680 US201629560680F USD790039S US D790039 S1 USD790039 S1 US D790039S1 US 201629560680 F US201629560680 F US 201629560680F US D790039 S USD790039 S US D790039S
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United States
Prior art keywords
showerhead
processing chamber
semiconductor processing
view
lines
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US29/560,680
Inventor
Lara Hawrylchak
Kong Lung Samuel Chan
Aaron Miller
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Applied Materials Inc
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Applied Materials Inc
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Priority to US29/560,680 priority Critical patent/USD790039S1/en
Assigned to APPLIED MATERIALS, INC. reassignment APPLIED MATERIALS, INC. ASSIGNMENT OF ASSIGNORS INTEREST (SEE DOCUMENT FOR DETAILS). Assignors: CHAN, KONG LUNG SAMUEL, HAWRYLCHAK, LARA, MILLER, AARON
Priority to TW105305434F priority patent/TWD182750S/en
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Publication of USD790039S1 publication Critical patent/USD790039S1/en
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FIG. 1 is an isometric top view of a showerhead for a semiconductor processing chamber showing my new design.
FIG. 2 is an isometric bottom view thereof.
FIG. 3 is a top plan view thereof.
FIG. 4 is a bottom plan view thereof.
FIG. 5 is a front elevational view thereof indicated by lines 5-5 of FIG. 3, the rear elevational view being a mirror image.
FIG. 6 is a side elevational view thereof indicated by lines 6-6 of FIG. 3, the opposite side elevational view being a mirror image.
FIG. 7 is a cross-sectional view thereof taken along lines 7-7 of FIG. 3.
FIG. 8 is a cross-sectional view thereof taken along lines 8-8 of FIG. 3.
FIG. 9 is an enlarged view of a portion of FIG. 7.
FIG. 10 is an enlarged view of another portion of FIG. 7; and,
FIG. 11 is an enlarged view of a portion of FIG. 8.

Claims (1)

    CLAIM
  1. The ornamental design for a showerhead for a semiconductor processing chamber, as shown and described.
US29/560,680 2016-04-08 2016-04-08 Showerhead for a semiconductor processing chamber Active USD790039S1 (en)

Priority Applications (2)

Application Number Priority Date Filing Date Title
US29/560,680 USD790039S1 (en) 2016-04-08 2016-04-08 Showerhead for a semiconductor processing chamber
TW105305434F TWD182750S (en) 2016-04-08 2016-09-13 Showerhead for a semiconductor processing chamber(3)

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US29/560,680 USD790039S1 (en) 2016-04-08 2016-04-08 Showerhead for a semiconductor processing chamber

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USD790039S1 true USD790039S1 (en) 2017-06-20

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US29/560,680 Active USD790039S1 (en) 2016-04-08 2016-04-08 Showerhead for a semiconductor processing chamber

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TW (1) TWD182750S (en)

Cited By (13)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
USD823985S1 (en) * 2016-12-16 2018-07-24 Kohler Co. Showerhead with non-uniform arrangement of spray nozzles of varying sizes
USD868993S1 (en) * 2017-08-31 2019-12-03 Hitachi High-Technologies Corporation Electrode plate for a plasma processing apparatus
USD908645S1 (en) * 2019-08-26 2021-01-26 Applied Materials, Inc. Sputtering target for a physical vapor deposition chamber
USD937329S1 (en) 2020-03-23 2021-11-30 Applied Materials, Inc. Sputter target for a physical vapor deposition chamber
USD940765S1 (en) 2020-12-02 2022-01-11 Applied Materials, Inc. Target profile for a physical vapor deposition chamber target
USD946638S1 (en) 2017-12-11 2022-03-22 Applied Materials, Inc. Target profile for a physical vapor deposition chamber target
USD967351S1 (en) 2020-10-20 2022-10-18 Applied Materials, Inc. Showerhead reflector
USD968563S1 (en) 2019-08-29 2022-11-01 Kohler Co. Showerhead
USD969980S1 (en) 2020-10-20 2022-11-15 Applied Materials, Inc. Deposition chamber showerhead
USD975239S1 (en) * 2019-10-30 2023-01-10 Kohler Co. Showerhead
US11551960B2 (en) 2020-01-30 2023-01-10 Applied Materials, Inc. Helical plug for reduction or prevention of arcing in a substrate support
US11577260B2 (en) 2018-08-22 2023-02-14 Kohler Co. Showerhead
USD1007449S1 (en) 2021-05-07 2023-12-12 Applied Materials, Inc. Target profile for a physical vapor deposition chamber target

Citations (22)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6086677A (en) 1998-06-16 2000-07-11 Applied Materials, Inc. Dual gas faceplate for a showerhead in a semiconductor wafer processing system
US20030140851A1 (en) 2002-01-25 2003-07-31 Applied Materials, Inc. Gas distribution showerhead
US20050173569A1 (en) 2004-02-05 2005-08-11 Applied Materials, Inc. Gas distribution showerhead for semiconductor processing
US20060021703A1 (en) 2004-07-29 2006-02-02 Applied Materials, Inc. Dual gas faceplate for a showerhead in a semiconductor wafer processing system
US20060234514A1 (en) 2003-11-19 2006-10-19 Applied Materials, Inc. Gas distribution showerhead featuring exhaust apertures
USD566228S1 (en) * 2007-03-09 2008-04-08 Speakman Company Shower
USD593640S1 (en) * 2008-01-31 2009-06-02 Hansgrohe Ag Showerhead
US20090179085A1 (en) 2008-01-10 2009-07-16 Applied Materials, Inc. Heated showerhead assembly
US7658800B2 (en) * 2006-10-18 2010-02-09 Advanced Micro-Fabrication Equipment, Inc. Asia Gas distribution assembly for use in a semiconductor work piece processing reactor
USD639385S1 (en) * 2010-04-08 2011-06-07 Grohe Ag Shower head
USD641829S1 (en) * 2010-10-29 2011-07-19 Novellus Systems, Inc. Plasma reactor showerhead face plate having concentric ridge pattern
USD694359S1 (en) * 2012-07-11 2013-11-26 Hansgrohe Se Overhead shower
USD707328S1 (en) * 2013-02-07 2014-06-17 Hansgrohe Se Showerhead
USD733257S1 (en) * 2014-02-14 2015-06-30 Hansgrohe Se Overhead shower
USD736348S1 (en) * 2014-07-07 2015-08-11 Jiangmen Triumph Rain Showers Co., LTD Spray head for a shower
USD751176S1 (en) * 2014-08-07 2016-03-08 Hansgrohe Se Overhead shower
USD752708S1 (en) * 2014-12-01 2016-03-29 Shong I Copper Co., Ltd. Showerhead
US9343307B2 (en) 2013-12-24 2016-05-17 Ultratech, Inc. Laser spike annealing using fiber lasers
USD757893S1 (en) * 2014-11-04 2016-05-31 Custom Molded Products, Inc. Jet nozzle insert
US9353439B2 (en) * 2013-04-05 2016-05-31 Lam Research Corporation Cascade design showerhead for transient uniformity
US9464353B2 (en) * 2013-11-21 2016-10-11 Wonik Ips Co., Ltd. Substrate processing apparatus
US9484190B2 (en) * 2014-01-25 2016-11-01 Yuri Glukhoy Showerhead-cooler system of a semiconductor-processing chamber for semiconductor wafers of large area

Patent Citations (22)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6086677A (en) 1998-06-16 2000-07-11 Applied Materials, Inc. Dual gas faceplate for a showerhead in a semiconductor wafer processing system
US20030140851A1 (en) 2002-01-25 2003-07-31 Applied Materials, Inc. Gas distribution showerhead
US20060234514A1 (en) 2003-11-19 2006-10-19 Applied Materials, Inc. Gas distribution showerhead featuring exhaust apertures
US20050173569A1 (en) 2004-02-05 2005-08-11 Applied Materials, Inc. Gas distribution showerhead for semiconductor processing
US20060021703A1 (en) 2004-07-29 2006-02-02 Applied Materials, Inc. Dual gas faceplate for a showerhead in a semiconductor wafer processing system
US7658800B2 (en) * 2006-10-18 2010-02-09 Advanced Micro-Fabrication Equipment, Inc. Asia Gas distribution assembly for use in a semiconductor work piece processing reactor
USD566228S1 (en) * 2007-03-09 2008-04-08 Speakman Company Shower
US20090179085A1 (en) 2008-01-10 2009-07-16 Applied Materials, Inc. Heated showerhead assembly
USD593640S1 (en) * 2008-01-31 2009-06-02 Hansgrohe Ag Showerhead
USD639385S1 (en) * 2010-04-08 2011-06-07 Grohe Ag Shower head
USD641829S1 (en) * 2010-10-29 2011-07-19 Novellus Systems, Inc. Plasma reactor showerhead face plate having concentric ridge pattern
USD694359S1 (en) * 2012-07-11 2013-11-26 Hansgrohe Se Overhead shower
USD707328S1 (en) * 2013-02-07 2014-06-17 Hansgrohe Se Showerhead
US9353439B2 (en) * 2013-04-05 2016-05-31 Lam Research Corporation Cascade design showerhead for transient uniformity
US9464353B2 (en) * 2013-11-21 2016-10-11 Wonik Ips Co., Ltd. Substrate processing apparatus
US9343307B2 (en) 2013-12-24 2016-05-17 Ultratech, Inc. Laser spike annealing using fiber lasers
US9484190B2 (en) * 2014-01-25 2016-11-01 Yuri Glukhoy Showerhead-cooler system of a semiconductor-processing chamber for semiconductor wafers of large area
USD733257S1 (en) * 2014-02-14 2015-06-30 Hansgrohe Se Overhead shower
USD736348S1 (en) * 2014-07-07 2015-08-11 Jiangmen Triumph Rain Showers Co., LTD Spray head for a shower
USD751176S1 (en) * 2014-08-07 2016-03-08 Hansgrohe Se Overhead shower
USD757893S1 (en) * 2014-11-04 2016-05-31 Custom Molded Products, Inc. Jet nozzle insert
USD752708S1 (en) * 2014-12-01 2016-03-29 Shong I Copper Co., Ltd. Showerhead

Cited By (18)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
USD823985S1 (en) * 2016-12-16 2018-07-24 Kohler Co. Showerhead with non-uniform arrangement of spray nozzles of varying sizes
USD837935S1 (en) * 2016-12-16 2019-01-08 Kohler Co. Showerhead with non-uniform arrangement of spray nozzles of varying sizes
USD838339S1 (en) * 2016-12-16 2019-01-15 Kohler Co. Showerhead with non-uniform arrangement of spray nozzles of varying sizes
USD868993S1 (en) * 2017-08-31 2019-12-03 Hitachi High-Technologies Corporation Electrode plate for a plasma processing apparatus
USD946638S1 (en) 2017-12-11 2022-03-22 Applied Materials, Inc. Target profile for a physical vapor deposition chamber target
US11577260B2 (en) 2018-08-22 2023-02-14 Kohler Co. Showerhead
USD908645S1 (en) * 2019-08-26 2021-01-26 Applied Materials, Inc. Sputtering target for a physical vapor deposition chamber
USD968563S1 (en) 2019-08-29 2022-11-01 Kohler Co. Showerhead
USD1004052S1 (en) 2019-10-30 2023-11-07 Kohler Co. Showerhead
USD975239S1 (en) * 2019-10-30 2023-01-10 Kohler Co. Showerhead
US11551960B2 (en) 2020-01-30 2023-01-10 Applied Materials, Inc. Helical plug for reduction or prevention of arcing in a substrate support
USD970566S1 (en) 2020-03-23 2022-11-22 Applied Materials, Inc. Sputter target for a physical vapor deposition chamber
USD937329S1 (en) 2020-03-23 2021-11-30 Applied Materials, Inc. Sputter target for a physical vapor deposition chamber
USD969980S1 (en) 2020-10-20 2022-11-15 Applied Materials, Inc. Deposition chamber showerhead
USD967351S1 (en) 2020-10-20 2022-10-18 Applied Materials, Inc. Showerhead reflector
USD966357S1 (en) 2020-12-02 2022-10-11 Applied Materials, Inc. Target profile for a physical vapor deposition chamber target
USD940765S1 (en) 2020-12-02 2022-01-11 Applied Materials, Inc. Target profile for a physical vapor deposition chamber target
USD1007449S1 (en) 2021-05-07 2023-12-12 Applied Materials, Inc. Target profile for a physical vapor deposition chamber target

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Publication number Publication date
TWD182750S (en) 2017-05-01

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